FI104297B1 - Skannauslaite pinnan skannaamiseksi optisesti viivaa pitkin - Google Patents

Skannauslaite pinnan skannaamiseksi optisesti viivaa pitkin

Info

Publication number
FI104297B1
FI104297B1 FI910150A FI910150A FI104297B1 FI 104297 B1 FI104297 B1 FI 104297B1 FI 910150 A FI910150 A FI 910150A FI 910150 A FI910150 A FI 910150A FI 104297 B1 FI104297 B1 FI 104297B1
Authority
FI
Finland
Prior art keywords
optical
scanning device
line
scanning
surface along
Prior art date
Application number
FI910150A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI910150A0 (fi
FI104297B (fi
FI910150A (fi
Inventor
Amstel Willem Dirk Van
Joseph Louis Horijon
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Publication of FI910150A0 publication Critical patent/FI910150A0/fi
Publication of FI910150A publication Critical patent/FI910150A/fi
Application granted granted Critical
Publication of FI104297B1 publication Critical patent/FI104297B1/fi
Publication of FI104297B publication Critical patent/FI104297B/fi

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0031Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • G01N2021/8905Directional selective optics, e.g. slits, spatial filters
    • G01N2021/8907Cylindrical optics

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Textile Engineering (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Lenses (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Epoxy Compounds (AREA)
  • Noodles (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Facsimile Scanning Arrangements (AREA)
FI910150A 1990-01-16 1991-01-11 Skannauslaite pinnan skannaamiseksi optisesti viivaa pitkin FI104297B (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9000100 1990-01-16
NL9000100 1990-01-16

Publications (4)

Publication Number Publication Date
FI910150A0 FI910150A0 (fi) 1991-01-11
FI910150A FI910150A (fi) 1991-07-17
FI104297B1 true FI104297B1 (fi) 1999-12-15
FI104297B FI104297B (fi) 1999-12-15

Family

ID=19856420

Family Applications (1)

Application Number Title Priority Date Filing Date
FI910150A FI104297B (fi) 1990-01-16 1991-01-11 Skannauslaite pinnan skannaamiseksi optisesti viivaa pitkin

Country Status (11)

Country Link
US (1) US5170037A (fr)
EP (1) EP0437883B1 (fr)
JP (1) JP2995238B2 (fr)
KR (1) KR0170783B1 (fr)
AT (1) ATE108029T1 (fr)
CA (1) CA2034017C (fr)
DE (1) DE69010318T2 (fr)
DK (1) DK0437883T3 (fr)
ES (1) ES2058766T3 (fr)
FI (1) FI104297B (fr)
IL (1) IL96947A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512760A (en) * 1993-05-06 1996-04-30 U.S. Philips Corporation Optical height detector with coaxial irradiation and image axes and plural detectors spaced along the image axis
DE19528519A1 (de) * 1995-08-03 1997-02-06 Tzn Forschung & Entwicklung Vorrichtung zur Detektion streifenförmiger Oberflächenfehler
DE19714221A1 (de) * 1997-04-07 1998-10-08 Zeiss Carl Fa Konfokales Mikroskop mit einem motorischen Scanningtisch
EP1436646A4 (fr) * 2001-09-13 2006-09-13 Anzpac Systems Ltd Procede et appareil d'inspection d'articles
US8441694B2 (en) * 2003-09-30 2013-05-14 Hewlett-Packard Development Company, L.P. Method and an apparatus for adjusting a scanning target area of an image reproduction device
KR100816078B1 (ko) * 2006-06-19 2008-03-24 광운대학교 산학협력단 공간영상 투영장치 및 그 방법
US7895009B2 (en) * 2007-11-07 2011-02-22 Amfit, Inc. Impression foam digital scanner

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH539892A (de) * 1971-03-22 1973-07-31 Zellweger Uster Ag Abtastvorrichtung für optisch erkennbare Zeichen
US3995110A (en) * 1973-12-20 1976-11-30 Xerox Corporation Flying spot scanner with plural lens correction
DE2550814C3 (de) * 1975-11-12 1979-08-09 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Zeilentastvorrichtung für Materialbahnen zur Fehlstellenermittlung
DE2827705C3 (de) * 1978-06-23 1981-07-30 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Gerät zur Feststellung von Fehlern an Bahnmaterial
DE3431540A1 (de) * 1984-07-02 1986-03-06 Elektro Optik Gmbh & Co Kg Verfahren zur korrektur der sphaerischen aberration und des astigmatismus eines ausmittigen lichtbuendels in einer spiegeloptik
US4872757A (en) * 1988-04-20 1989-10-10 Ball Corporation Optical convex surface profiling and gauging apparatus and method therefor

Also Published As

Publication number Publication date
DK0437883T3 (da) 1994-10-03
JP2995238B2 (ja) 1999-12-27
CA2034017C (fr) 2001-08-21
ES2058766T3 (es) 1994-11-01
FI910150A0 (fi) 1991-01-11
DE69010318D1 (de) 1994-08-04
CA2034017A1 (fr) 1991-07-17
FI104297B (fi) 1999-12-15
ATE108029T1 (de) 1994-07-15
IL96947A0 (en) 1992-03-29
JPH04212120A (ja) 1992-08-03
KR0170783B1 (ko) 1999-05-01
US5170037A (en) 1992-12-08
DE69010318T2 (de) 1995-01-26
FI910150A (fi) 1991-07-17
EP0437883A1 (fr) 1991-07-24
EP0437883B1 (fr) 1994-06-29
IL96947A (en) 1993-07-08

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Legal Events

Date Code Title Description
HC Name/ company changed in application

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V.

HC Name/ company changed in application

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V.

MA Patent expired