ES8603087A1 - Mejoras en la fabricacion de fibras opticas - Google Patents
Mejoras en la fabricacion de fibras opticasInfo
- Publication number
- ES8603087A1 ES8603087A1 ES534837A ES534837A ES8603087A1 ES 8603087 A1 ES8603087 A1 ES 8603087A1 ES 534837 A ES534837 A ES 534837A ES 534837 A ES534837 A ES 534837A ES 8603087 A1 ES8603087 A1 ES 8603087A1
- Authority
- ES
- Spain
- Prior art keywords
- coating
- optical fibre
- inorganic layer
- fibre manufacture
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
- G02B6/4401—Optical cables
- G02B6/4415—Cables for special applications
- G02B6/4427—Pressure resistant cables, e.g. undersea cables
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/24—Coatings containing organic materials
- C03C25/40—Organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
- G02B6/4401—Optical cables
- G02B6/4402—Optical cables with one single optical waveguide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
- G02B6/4401—Optical cables
- G02B6/4429—Means specially adapted for strengthening or protecting the cables
- G02B6/443—Protective covering
Landscapes
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
Abstract
METODO PARA LA APLICACION SOBRE UNA FIBRA OPTICA DE VIDRIO, DE UN RECUBRIMIENTO DE BAJA PERMEABILIDAD AL AGUA. CONSISTE EN UTILIZAR UN PLASMA IMPULSADO, PARA MODIFICAR LA SUPERFICIE DE UN RECUBRIMIENTO PLASTICO DEL QUE LA FIBRA HA SIDO PROVISTA, MANEJANDO DICHO PLASMA EN UNA ATMOSFERA, QUE ES MEZCLA DE ARGON E HIDROGENO, O BIEN USAR PLASMA IMPULSADO, PARA DEPOSITAR SOBRE EL RECUBRIMIENTO DE PLASTICO UNA CAPA INORGANICA DE BAJA PERMEABILIDAD AL AGUA. UNO O AMBOS PROCESOS PUEDEN REALIZARSE EN UNA CAMARA (3) O EN OTRAS (9, 10) ANTERIOR Y POSTERIOR. EXISTEN TOBERAS DE ENTRADA (5), TOBERAS DE SALIDA (4), ASI COMO PLACAS DEFLECTORAS (6, 7), QUE EFECTUAN EL FILTRADO DE UNA CAMARA A OTRA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08320773A GB2144343A (en) | 1983-08-02 | 1983-08-02 | Optical fibre manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8603087A1 true ES8603087A1 (es) | 1985-11-01 |
ES534837A0 ES534837A0 (es) | 1985-11-01 |
Family
ID=10546649
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES534837A Granted ES534837A0 (es) | 1983-08-02 | 1984-08-02 | Mejoras en la fabricacion de fibras opticas |
Country Status (7)
Country | Link |
---|---|
US (1) | US4568563A (es) |
EP (1) | EP0135993A1 (es) |
JP (1) | JPS6036356A (es) |
KR (1) | KR850001511A (es) |
AU (1) | AU3129784A (es) |
ES (1) | ES534837A0 (es) |
GB (1) | GB2144343A (es) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4750806A (en) * | 1985-06-17 | 1988-06-14 | Alcatel Usa Corporation | Glass fibers and capillaries with high temperature resistant coatings |
GB2150858B (en) * | 1983-12-06 | 1986-11-26 | Standard Telephones Cables Ltd | Optical fibres |
GB2155024A (en) * | 1984-03-03 | 1985-09-18 | Standard Telephones Cables Ltd | Surface treatment of plastics materials |
CA1278193C (en) * | 1985-07-05 | 1990-12-27 | Brian G. Bagley | Method for preparation of silicate glasses of controlled index ofrefraction and optical device including same |
JP2588388B2 (ja) * | 1986-08-08 | 1997-03-05 | 株式会社 半導体エネルギー研究所 | 被膜作製方法 |
US4743662A (en) * | 1986-11-03 | 1988-05-10 | Dow Corning Corporation | Infusible preceramic polymers via plasma treatment |
US4764394A (en) * | 1987-01-20 | 1988-08-16 | Wisconsin Alumni Research Foundation | Method and apparatus for plasma source ion implantation |
US5110409A (en) * | 1987-02-09 | 1992-05-05 | Ibm | Enhanced plasma etching |
US4985112A (en) * | 1987-02-09 | 1991-01-15 | International Business Machines Corporation | Enhanced plasma etching |
US4842941A (en) * | 1987-04-06 | 1989-06-27 | General Electric Company | Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby |
US4927704A (en) * | 1987-08-24 | 1990-05-22 | General Electric Company | Abrasion-resistant plastic articles and method for making them |
US5051308A (en) * | 1987-08-24 | 1991-09-24 | General Electric Company | Abrasion-resistant plastic articles |
US4964694A (en) * | 1988-07-26 | 1990-10-23 | Fujikura Ltd. | Optical fiber and apparatus for producing same |
DE3926592A1 (de) * | 1989-08-11 | 1991-02-14 | Rheydt Kabelwerk Ag | Optische faser |
US5141595A (en) * | 1990-03-05 | 1992-08-25 | Northrop Corporation | Method and apparatus for carbon coating and boron-doped carbon coating |
US5109442A (en) * | 1990-03-28 | 1992-04-28 | Fiberchem Inc. | Waterproof optical fiber chemical sensor and method of making same |
US5254372A (en) * | 1991-02-27 | 1993-10-19 | Nichols Technologies, Inc. | Method and apparatus for plasma treatment of a filament |
US5389195A (en) * | 1991-03-07 | 1995-02-14 | Minnesota Mining And Manufacturing Company | Surface modification by accelerated plasma or ions |
FR2681472B1 (fr) | 1991-09-18 | 1993-10-29 | Commissariat Energie Atomique | Procede de fabrication de films minces de materiau semiconducteur. |
US5521351A (en) * | 1994-08-30 | 1996-05-28 | Wisconsin Alumni Research Foundation | Method and apparatus for plasma surface treatment of the interior of hollow forms |
US5683757A (en) * | 1995-08-25 | 1997-11-04 | Iskanderova; Zelina A. | Surface modification of polymers and carbon-based materials by ion implantation and oxidative conversion |
US6253704B1 (en) | 1995-10-13 | 2001-07-03 | Mattson Technology, Inc. | Apparatus and method for pulsed plasma processing of a semiconductor substrate |
US5983828A (en) * | 1995-10-13 | 1999-11-16 | Mattson Technology, Inc. | Apparatus and method for pulsed plasma processing of a semiconductor substrate |
US6794301B2 (en) | 1995-10-13 | 2004-09-21 | Mattson Technology, Inc. | Pulsed plasma processing of semiconductor substrates |
KR970064327A (ko) * | 1996-02-27 | 1997-09-12 | 모리시다 요이치 | 고주파 전력 인가장치, 플라즈마 발생장치, 플라즈마 처리장치, 고주파 전력 인가방법, 플라즈마 발생방법 및 플라즈마 처리방법 |
FR2748851B1 (fr) * | 1996-05-15 | 1998-08-07 | Commissariat Energie Atomique | Procede de realisation d'une couche mince de materiau semiconducteur |
FR2753540B1 (fr) * | 1996-09-13 | 1998-11-13 | Alcatel Cable | Conducteur optique et son procede de fabrication |
US6291313B1 (en) | 1997-05-12 | 2001-09-18 | Silicon Genesis Corporation | Method and device for controlled cleaving process |
US5985742A (en) | 1997-05-12 | 1999-11-16 | Silicon Genesis Corporation | Controlled cleavage process and device for patterned films |
US6033974A (en) * | 1997-05-12 | 2000-03-07 | Silicon Genesis Corporation | Method for controlled cleaving process |
US20070122997A1 (en) * | 1998-02-19 | 2007-05-31 | Silicon Genesis Corporation | Controlled process and resulting device |
US6027988A (en) * | 1997-05-28 | 2000-02-22 | The Regents Of The University Of California | Method of separating films from bulk substrates by plasma immersion ion implantation |
US6548382B1 (en) * | 1997-07-18 | 2003-04-15 | Silicon Genesis Corporation | Gettering technique for wafers made using a controlled cleaving process |
FR2773261B1 (fr) | 1997-12-30 | 2000-01-28 | Commissariat Energie Atomique | Procede pour le transfert d'un film mince comportant une etape de creation d'inclusions |
US6291326B1 (en) | 1998-06-23 | 2001-09-18 | Silicon Genesis Corporation | Pre-semiconductor process implant and post-process film separation |
DE19847774C2 (de) * | 1998-10-16 | 2002-10-17 | Peter Foernsel | Vorrichtung zur Plasmabehandlung von stab- oder fadenförmigem Material |
US6500732B1 (en) | 1999-08-10 | 2002-12-31 | Silicon Genesis Corporation | Cleaving process to fabricate multilayered substrates using low implantation doses |
US6221740B1 (en) | 1999-08-10 | 2001-04-24 | Silicon Genesis Corporation | Substrate cleaving tool and method |
EP1212787B1 (en) * | 1999-08-10 | 2014-10-08 | Silicon Genesis Corporation | A cleaving process to fabricate multilayered substrates using low implantation doses |
US6263941B1 (en) | 1999-08-10 | 2001-07-24 | Silicon Genesis Corporation | Nozzle for cleaving substrates |
US6536958B2 (en) * | 2000-12-20 | 2003-03-25 | Triquint Technology Holding Co. | Optical device package with hermetically bonded fibers |
FR2823599B1 (fr) | 2001-04-13 | 2004-12-17 | Commissariat Energie Atomique | Substrat demomtable a tenue mecanique controlee et procede de realisation |
US8187377B2 (en) * | 2002-10-04 | 2012-05-29 | Silicon Genesis Corporation | Non-contact etch annealing of strained layers |
FR2848336B1 (fr) * | 2002-12-09 | 2005-10-28 | Commissariat Energie Atomique | Procede de realisation d'une structure contrainte destinee a etre dissociee |
FR2856844B1 (fr) * | 2003-06-24 | 2006-02-17 | Commissariat Energie Atomique | Circuit integre sur puce de hautes performances |
FR2857953B1 (fr) | 2003-07-21 | 2006-01-13 | Commissariat Energie Atomique | Structure empilee, et procede pour la fabriquer |
FR2861497B1 (fr) * | 2003-10-28 | 2006-02-10 | Soitec Silicon On Insulator | Procede de transfert catastrophique d'une couche fine apres co-implantation |
US7354815B2 (en) * | 2003-11-18 | 2008-04-08 | Silicon Genesis Corporation | Method for fabricating semiconductor devices using strained silicon bearing material |
FR2889887B1 (fr) * | 2005-08-16 | 2007-11-09 | Commissariat Energie Atomique | Procede de report d'une couche mince sur un support |
FR2891281B1 (fr) | 2005-09-28 | 2007-12-28 | Commissariat Energie Atomique | Procede de fabrication d'un element en couches minces. |
US8293619B2 (en) | 2008-08-28 | 2012-10-23 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled propagation |
US9362439B2 (en) | 2008-05-07 | 2016-06-07 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled shear region |
US7811900B2 (en) * | 2006-09-08 | 2010-10-12 | Silicon Genesis Corporation | Method and structure for fabricating solar cells using a thick layer transfer process |
US8993410B2 (en) | 2006-09-08 | 2015-03-31 | Silicon Genesis Corporation | Substrate cleaving under controlled stress conditions |
FR2910179B1 (fr) * | 2006-12-19 | 2009-03-13 | Commissariat Energie Atomique | PROCEDE DE FABRICATION DE COUCHES MINCES DE GaN PAR IMPLANTATION ET RECYCLAGE D'UN SUBSTRAT DE DEPART |
FR2922359B1 (fr) * | 2007-10-12 | 2009-12-18 | Commissariat Energie Atomique | Procede de fabrication d'une structure micro-electronique impliquant un collage moleculaire |
FR2925221B1 (fr) * | 2007-12-17 | 2010-02-19 | Commissariat Energie Atomique | Procede de transfert d'une couche mince |
US8330126B2 (en) * | 2008-08-25 | 2012-12-11 | Silicon Genesis Corporation | Race track configuration and method for wafering silicon solar substrates |
US8329557B2 (en) * | 2009-05-13 | 2012-12-11 | Silicon Genesis Corporation | Techniques for forming thin films by implantation with reduced channeling |
FR2947098A1 (fr) * | 2009-06-18 | 2010-12-24 | Commissariat Energie Atomique | Procede de transfert d'une couche mince sur un substrat cible ayant un coefficient de dilatation thermique different de celui de la couche mince |
US20120006468A1 (en) * | 2010-07-07 | 2012-01-12 | Schlumberger Technology Corporation | Inline plasma treatment of an optical fiber cable structure |
US20120321776A1 (en) * | 2011-06-17 | 2012-12-20 | Robert Vetrecin | Process for in situ plasma polymerization of silicone coatings for surgical needles |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US313029A (en) * | 1885-02-24 | Method of making ornamental and other designs in relief | ||
US3288638A (en) * | 1962-10-09 | 1966-11-29 | Martin Marietta Corp | Method and apparatus for the treatment of plastic materials |
US3471316A (en) * | 1965-06-14 | 1969-10-07 | Continental Can Co | Method of forming a flexible organic layer on metal by a pulsed electrical abnormal glow discharge |
US3761299A (en) * | 1970-10-13 | 1973-09-25 | Eastman Kodak Co | Treating polymeric surfaces |
US3677799A (en) * | 1970-11-10 | 1972-07-18 | Celanese Corp | Vapor phase boron deposition by pulse discharge |
DE2444926C3 (de) * | 1974-09-20 | 1979-10-11 | Felten & Guilleaume Carlswerk Ag, 5000 Koeln | Verfahren und Vorrichtung zur Isolierung von Drähten in der Gasphase |
US4091166A (en) * | 1977-06-17 | 1978-05-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Boron trifluoride coatings for thermoplastic materials and method of applying same in glow discharge |
CA1127890A (en) * | 1979-02-01 | 1982-07-20 | Paul W. France | Optical fibres and coatings therefor |
US4227907A (en) * | 1979-10-22 | 1980-10-14 | The United States Of America As Represented By The Secretary Of The Army | Laser photochemical synthesis coating of optical fiber |
JPS6059928B2 (ja) * | 1980-09-08 | 1985-12-27 | 信越化学工業株式会社 | 塩化ビニル系樹脂成形品の表面処理方法 |
US4402993A (en) * | 1981-03-20 | 1983-09-06 | Gulf & Western Manufacturing Company | Process for coating optical fibers |
GB2105371B (en) * | 1981-08-18 | 1985-10-02 | Secr Defence | Carbon deposited on fibre by glow discharge method |
GB2105729B (en) * | 1981-09-15 | 1985-06-12 | Itt Ind Ltd | Surface processing of a substrate material |
-
1983
- 1983-08-02 GB GB08320773A patent/GB2144343A/en not_active Withdrawn
-
1984
- 1984-07-10 EP EP84304691A patent/EP0135993A1/en not_active Withdrawn
- 1984-07-24 JP JP59153924A patent/JPS6036356A/ja active Pending
- 1984-07-30 AU AU31297/84A patent/AU3129784A/en not_active Abandoned
- 1984-08-01 KR KR1019840004592A patent/KR850001511A/ko not_active Application Discontinuation
- 1984-08-02 ES ES534837A patent/ES534837A0/es active Granted
-
1985
- 1985-06-21 US US06/747,389 patent/US4568563A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4568563A (en) | 1986-02-04 |
GB2144343A (en) | 1985-03-06 |
AU3129784A (en) | 1985-02-07 |
EP0135993A1 (en) | 1985-04-03 |
GB8320773D0 (en) | 1983-09-01 |
JPS6036356A (ja) | 1985-02-25 |
KR850001511A (ko) | 1985-03-30 |
ES534837A0 (es) | 1985-11-01 |
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