ES534837A0 - Mejoras en la fabricacion de fibras opticas - Google Patents

Mejoras en la fabricacion de fibras opticas

Info

Publication number
ES534837A0
ES534837A0 ES534837A ES534837A ES534837A0 ES 534837 A0 ES534837 A0 ES 534837A0 ES 534837 A ES534837 A ES 534837A ES 534837 A ES534837 A ES 534837A ES 534837 A0 ES534837 A0 ES 534837A0
Authority
ES
Spain
Prior art keywords
manufacture
optical fibers
fibers
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES534837A
Other languages
English (en)
Other versions
ES8603087A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia Spain SA
Original Assignee
Alcatel Espana SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Espana SA filed Critical Alcatel Espana SA
Publication of ES534837A0 publication Critical patent/ES534837A0/es
Publication of ES8603087A1 publication Critical patent/ES8603087A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
    • G02B6/4401—Optical cables
    • G02B6/4415—Cables for special applications
    • G02B6/4427—Pressure resistant cables, e.g. undersea cables
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10—Coating
    • C03C25/24—Coatings containing organic materials
    • C03C25/40—Organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10—Coating
    • C03C25/104—Coating to obtain optical fibres
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
    • G02B6/4401—Optical cables
    • G02B6/4402—Optical cables with one single optical waveguide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/44—Mechanical structures for providing tensile strength and external protection for fibres, e.g. optical transmission cables
    • G02B6/4401—Optical cables
    • G02B6/4429—Means specially adapted for strengthening or protecting the cables
    • G02B6/443—Protective covering

Landscapes

  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
ES534837A 1983-08-02 1984-08-02 Mejoras en la fabricacion de fibras opticas Expired ES8603087A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08320773A GB2144343A (en) 1983-08-02 1983-08-02 Optical fibre manufacture

Publications (2)

Publication Number Publication Date
ES534837A0 true ES534837A0 (es) 1985-11-01
ES8603087A1 ES8603087A1 (es) 1985-11-01

Family

ID=10546649

Family Applications (1)

Application Number Title Priority Date Filing Date
ES534837A Expired ES8603087A1 (es) 1983-08-02 1984-08-02 Mejoras en la fabricacion de fibras opticas

Country Status (7)

Country Link
US (1) US4568563A (es)
EP (1) EP0135993A1 (es)
JP (1) JPS6036356A (es)
KR (1) KR850001511A (es)
AU (1) AU3129784A (es)
ES (1) ES8603087A1 (es)
GB (1) GB2144343A (es)

Families Citing this family (62)

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US4750806A (en) * 1985-06-17 1988-06-14 Alcatel Usa Corporation Glass fibers and capillaries with high temperature resistant coatings
GB2150858B (en) * 1983-12-06 1986-11-26 Standard Telephones Cables Ltd Optical fibres
GB2155024A (en) * 1984-03-03 1985-09-18 Standard Telephones Cables Ltd Surface treatment of plastics materials
CA1278193C (en) * 1985-07-05 1990-12-27 Brian G. Bagley Method for preparation of silicate glasses of controlled index ofrefraction and optical device including same
JP2588388B2 (ja) * 1986-08-08 1997-03-05 株式会社 半導体エネルギー研究所 被膜作製方法
US4743662A (en) * 1986-11-03 1988-05-10 Dow Corning Corporation Infusible preceramic polymers via plasma treatment
US4764394A (en) * 1987-01-20 1988-08-16 Wisconsin Alumni Research Foundation Method and apparatus for plasma source ion implantation
US4985112A (en) * 1987-02-09 1991-01-15 International Business Machines Corporation Enhanced plasma etching
US5110409A (en) * 1987-02-09 1992-05-05 Ibm Enhanced plasma etching
US4842941A (en) * 1987-04-06 1989-06-27 General Electric Company Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5051308A (en) * 1987-08-24 1991-09-24 General Electric Company Abrasion-resistant plastic articles
US4964694A (en) * 1988-07-26 1990-10-23 Fujikura Ltd. Optical fiber and apparatus for producing same
DE3926592A1 (de) * 1989-08-11 1991-02-14 Rheydt Kabelwerk Ag Optische faser
US5141595A (en) * 1990-03-05 1992-08-25 Northrop Corporation Method and apparatus for carbon coating and boron-doped carbon coating
US5109442A (en) * 1990-03-28 1992-04-28 Fiberchem Inc. Waterproof optical fiber chemical sensor and method of making same
US5254372A (en) * 1991-02-27 1993-10-19 Nichols Technologies, Inc. Method and apparatus for plasma treatment of a filament
US5389195A (en) * 1991-03-07 1995-02-14 Minnesota Mining And Manufacturing Company Surface modification by accelerated plasma or ions
FR2681472B1 (fr) 1991-09-18 1993-10-29 Commissariat Energie Atomique Procede de fabrication de films minces de materiau semiconducteur.
US5521351A (en) * 1994-08-30 1996-05-28 Wisconsin Alumni Research Foundation Method and apparatus for plasma surface treatment of the interior of hollow forms
US5683757A (en) * 1995-08-25 1997-11-04 Iskanderova; Zelina A. Surface modification of polymers and carbon-based materials by ion implantation and oxidative conversion
US6794301B2 (en) 1995-10-13 2004-09-21 Mattson Technology, Inc. Pulsed plasma processing of semiconductor substrates
US6253704B1 (en) 1995-10-13 2001-07-03 Mattson Technology, Inc. Apparatus and method for pulsed plasma processing of a semiconductor substrate
US5983828A (en) * 1995-10-13 1999-11-16 Mattson Technology, Inc. Apparatus and method for pulsed plasma processing of a semiconductor substrate
KR970064327A (ko) * 1996-02-27 1997-09-12 모리시다 요이치 고주파 전력 인가장치, 플라즈마 발생장치, 플라즈마 처리장치, 고주파 전력 인가방법, 플라즈마 발생방법 및 플라즈마 처리방법
FR2748851B1 (fr) * 1996-05-15 1998-08-07 Commissariat Energie Atomique Procede de realisation d'une couche mince de materiau semiconducteur
FR2753540B1 (fr) * 1996-09-13 1998-11-13 Alcatel Cable Conducteur optique et son procede de fabrication
US6162705A (en) * 1997-05-12 2000-12-19 Silicon Genesis Corporation Controlled cleavage process and resulting device using beta annealing
US6033974A (en) * 1997-05-12 2000-03-07 Silicon Genesis Corporation Method for controlled cleaving process
US6291313B1 (en) 1997-05-12 2001-09-18 Silicon Genesis Corporation Method and device for controlled cleaving process
US20070122997A1 (en) * 1998-02-19 2007-05-31 Silicon Genesis Corporation Controlled process and resulting device
US6027988A (en) * 1997-05-28 2000-02-22 The Regents Of The University Of California Method of separating films from bulk substrates by plasma immersion ion implantation
US6548382B1 (en) * 1997-07-18 2003-04-15 Silicon Genesis Corporation Gettering technique for wafers made using a controlled cleaving process
FR2773261B1 (fr) 1997-12-30 2000-01-28 Commissariat Energie Atomique Procede pour le transfert d'un film mince comportant une etape de creation d'inclusions
US6291326B1 (en) 1998-06-23 2001-09-18 Silicon Genesis Corporation Pre-semiconductor process implant and post-process film separation
DE19847774C2 (de) * 1998-10-16 2002-10-17 Peter Foernsel Vorrichtung zur Plasmabehandlung von stab- oder fadenförmigem Material
US6221740B1 (en) 1999-08-10 2001-04-24 Silicon Genesis Corporation Substrate cleaving tool and method
US6500732B1 (en) 1999-08-10 2002-12-31 Silicon Genesis Corporation Cleaving process to fabricate multilayered substrates using low implantation doses
US6263941B1 (en) 1999-08-10 2001-07-24 Silicon Genesis Corporation Nozzle for cleaving substrates
WO2001011930A2 (en) * 1999-08-10 2001-02-15 Silicon Genesis Corporation A cleaving process to fabricate multilayered substrates using low implantation doses
US6536958B2 (en) * 2000-12-20 2003-03-25 Triquint Technology Holding Co. Optical device package with hermetically bonded fibers
FR2823599B1 (fr) 2001-04-13 2004-12-17 Commissariat Energie Atomique Substrat demomtable a tenue mecanique controlee et procede de realisation
US8187377B2 (en) * 2002-10-04 2012-05-29 Silicon Genesis Corporation Non-contact etch annealing of strained layers
FR2848336B1 (fr) * 2002-12-09 2005-10-28 Commissariat Energie Atomique Procede de realisation d'une structure contrainte destinee a etre dissociee
FR2856844B1 (fr) * 2003-06-24 2006-02-17 Commissariat Energie Atomique Circuit integre sur puce de hautes performances
FR2857953B1 (fr) 2003-07-21 2006-01-13 Commissariat Energie Atomique Structure empilee, et procede pour la fabriquer
FR2861497B1 (fr) * 2003-10-28 2006-02-10 Soitec Silicon On Insulator Procede de transfert catastrophique d'une couche fine apres co-implantation
US7354815B2 (en) * 2003-11-18 2008-04-08 Silicon Genesis Corporation Method for fabricating semiconductor devices using strained silicon bearing material
FR2889887B1 (fr) * 2005-08-16 2007-11-09 Commissariat Energie Atomique Procede de report d'une couche mince sur un support
FR2891281B1 (fr) 2005-09-28 2007-12-28 Commissariat Energie Atomique Procede de fabrication d'un element en couches minces.
US7811900B2 (en) * 2006-09-08 2010-10-12 Silicon Genesis Corporation Method and structure for fabricating solar cells using a thick layer transfer process
US8293619B2 (en) 2008-08-28 2012-10-23 Silicon Genesis Corporation Layer transfer of films utilizing controlled propagation
US9362439B2 (en) 2008-05-07 2016-06-07 Silicon Genesis Corporation Layer transfer of films utilizing controlled shear region
US8993410B2 (en) 2006-09-08 2015-03-31 Silicon Genesis Corporation Substrate cleaving under controlled stress conditions
FR2910179B1 (fr) * 2006-12-19 2009-03-13 Commissariat Energie Atomique PROCEDE DE FABRICATION DE COUCHES MINCES DE GaN PAR IMPLANTATION ET RECYCLAGE D'UN SUBSTRAT DE DEPART
FR2922359B1 (fr) * 2007-10-12 2009-12-18 Commissariat Energie Atomique Procede de fabrication d'une structure micro-electronique impliquant un collage moleculaire
FR2925221B1 (fr) * 2007-12-17 2010-02-19 Commissariat Energie Atomique Procede de transfert d'une couche mince
US8330126B2 (en) * 2008-08-25 2012-12-11 Silicon Genesis Corporation Race track configuration and method for wafering silicon solar substrates
US8329557B2 (en) * 2009-05-13 2012-12-11 Silicon Genesis Corporation Techniques for forming thin films by implantation with reduced channeling
FR2947098A1 (fr) * 2009-06-18 2010-12-24 Commissariat Energie Atomique Procede de transfert d'une couche mince sur un substrat cible ayant un coefficient de dilatation thermique different de celui de la couche mince
US20120006468A1 (en) * 2010-07-07 2012-01-12 Schlumberger Technology Corporation Inline plasma treatment of an optical fiber cable structure
US20120321776A1 (en) * 2011-06-17 2012-12-20 Robert Vetrecin Process for in situ plasma polymerization of silicone coatings for surgical needles

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Publication number Priority date Publication date Assignee Title
US313029A (en) * 1885-02-24 Method of making ornamental and other designs in relief
US3288638A (en) * 1962-10-09 1966-11-29 Martin Marietta Corp Method and apparatus for the treatment of plastic materials
US3471316A (en) * 1965-06-14 1969-10-07 Continental Can Co Method of forming a flexible organic layer on metal by a pulsed electrical abnormal glow discharge
US3761299A (en) * 1970-10-13 1973-09-25 Eastman Kodak Co Treating polymeric surfaces
US3677799A (en) * 1970-11-10 1972-07-18 Celanese Corp Vapor phase boron deposition by pulse discharge
DE2444926C3 (de) * 1974-09-20 1979-10-11 Felten & Guilleaume Carlswerk Ag, 5000 Koeln Verfahren und Vorrichtung zur Isolierung von Drähten in der Gasphase
US4091166A (en) * 1977-06-17 1978-05-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Boron trifluoride coatings for thermoplastic materials and method of applying same in glow discharge
CA1127890A (en) * 1979-02-01 1982-07-20 Paul W. France Optical fibres and coatings therefor
US4227907A (en) * 1979-10-22 1980-10-14 The United States Of America As Represented By The Secretary Of The Army Laser photochemical synthesis coating of optical fiber
JPS6059928B2 (ja) * 1980-09-08 1985-12-27 信越化学工業株式会社 塩化ビニル系樹脂成形品の表面処理方法
US4402993A (en) * 1981-03-20 1983-09-06 Gulf & Western Manufacturing Company Process for coating optical fibers
GB2105371B (en) * 1981-08-18 1985-10-02 Secr Defence Carbon deposited on fibre by glow discharge method
GB2105729B (en) * 1981-09-15 1985-06-12 Itt Ind Ltd Surface processing of a substrate material

Also Published As

Publication number Publication date
US4568563A (en) 1986-02-04
AU3129784A (en) 1985-02-07
GB8320773D0 (en) 1983-09-01
EP0135993A1 (en) 1985-04-03
GB2144343A (en) 1985-03-06
JPS6036356A (ja) 1985-02-25
ES8603087A1 (es) 1985-11-01
KR850001511A (ko) 1985-03-30

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