ES8106020A1 - Procedimiento para la fabricacion de capas de metales,de oxidos de metales o de carburos de metales adherentes a po- liolefinas - Google Patents

Procedimiento para la fabricacion de capas de metales,de oxidos de metales o de carburos de metales adherentes a po- liolefinas

Info

Publication number
ES8106020A1
ES8106020A1 ES495953A ES495953A ES8106020A1 ES 8106020 A1 ES8106020 A1 ES 8106020A1 ES 495953 A ES495953 A ES 495953A ES 495953 A ES495953 A ES 495953A ES 8106020 A1 ES8106020 A1 ES 8106020A1
Authority
ES
Spain
Prior art keywords
polyolefins
production
adhesive layers
metal
reactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES495953A
Other languages
English (en)
Other versions
ES495953A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ruhrchemie AG
Original Assignee
Ruhrchemie AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ruhrchemie AG filed Critical Ruhrchemie AG
Publication of ES495953A0 publication Critical patent/ES495953A0/es
Publication of ES8106020A1 publication Critical patent/ES8106020A1/es
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/405Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/406Oxides of iron group metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/408Oxides of copper or solid solutions thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Chemically Coating (AREA)
  • Chemical Vapour Deposition (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

METODO DE FABRICACION DE RECLUBRIMIENTOS METALICOS SOBRE POLIOLEFINAS. SE CALIENTA LA POLIOLEFINA A UNA TEMPERATURA DE 50-300 GC. SE PONE EN CONTACTO CON UNA COMBINACION METALICA DE FACIL DESCOMPONIBILIDAD TERMICA, TAL COMO ALQUILOS, ARILOS ARALQUILOS O CARBONILOS METALICOS, EN PRESENCIA DE UN AGENTE PORTADOR GASEIFORME, TAL COMO NITROGENO, HIDROGENO, OXIDO DE CARBONO, GASES NOBLES, ETC. SE OBTIENE SOBRE LA OLEFINA UN RECUBRIMIENTO CUYA ESTRUCTURA Y PROPIEDADES DEPENDEN DE LA TEMPERATURA DE DESCOMPOSICION, LA VELOCIAD DE LA CORRIENTE DEL GAL Y LA PRESION PARCIAL DE LA COMBINACION METALICA EN LA FASE GASEOSA.
ES495953A 1979-10-17 1980-10-15 Procedimiento para la fabricacion de capas de metales,de oxidos de metales o de carburos de metales adherentes a po- liolefinas Expired ES8106020A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792941896 DE2941896A1 (de) 1979-10-17 1979-10-17 Verfahren zur herstellung von haftfaehigen schichten auf polyolefinen

Publications (2)

Publication Number Publication Date
ES495953A0 ES495953A0 (es) 1981-07-01
ES8106020A1 true ES8106020A1 (es) 1981-07-01

Family

ID=6083621

Family Applications (1)

Application Number Title Priority Date Filing Date
ES495953A Expired ES8106020A1 (es) 1979-10-17 1980-10-15 Procedimiento para la fabricacion de capas de metales,de oxidos de metales o de carburos de metales adherentes a po- liolefinas

Country Status (6)

Country Link
EP (1) EP0027625B1 (es)
JP (1) JPS5665029A (es)
AT (1) ATE1753T1 (es)
CA (1) CA1162798A (es)
DE (2) DE2941896A1 (es)
ES (1) ES8106020A1 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3133871A1 (de) * 1981-08-27 1983-03-10 M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München Verfahren zur herstellung homogener beschichtungen aus zwei oder mehreren metallen und/oder metallverbindungen
DE3219989A1 (de) * 1982-05-27 1983-12-01 Maschf Augsburg Nuernberg Ag Selektiv absorbierende schicht fuer solarkollektoren sowie verfahren zu deren herstellung
DE3419856C1 (de) * 1984-05-28 1986-03-13 Hoechst Ag, 6230 Frankfurt Verfahren zur Verbesserung des Benetzungsverhaltens der Oberflaeche von Kunststoff-Formteilen fuer verfahrenstechnische Anwendungen
JP2566203B2 (ja) * 1985-08-30 1996-12-25 日新製鋼株式会社 耐黒変性に優れた溶融めっき鋼板の製造方法
JPS62182279A (ja) * 1986-02-05 1987-08-10 Futaki Itsuo 無機質被膜の形成方法とそのための溶液
JPH062943B2 (ja) * 1986-03-07 1994-01-12 エヌ・イーケムキャット株式会社 金属薄膜の形成方法
DE3716235C2 (de) * 1987-05-12 1995-11-30 Atotech Deutschland Gmbh Herstellung von Polymer-Metallverbindungen durch Abscheidung in Glimmentladungszonen
DE3744062A1 (de) * 1987-12-22 1989-07-13 Schering Ag Verfahren zur herstellung fest haftender metallischer strukturen auf fluor-polymeren und thermoplastischen kunststoffen
DE3800712A1 (de) * 1988-01-13 1989-07-27 Philips Patentverwaltung Verfahren zur plasmaaktivierten reaktiven abscheidung von elektrisch leitendem mehrkomponentenmaterial aus einer gasphase
DE3806587A1 (de) * 1988-02-26 1989-09-07 Schering Ag Verfahren zur herstellung fest haftender metallischer strukturen auf polyimid
DE3828211A1 (de) * 1988-08-16 1990-02-22 Schering Ag Verfahren zur haftfesten abscheidung von silberfilmen
JP4601975B2 (ja) * 2004-03-01 2010-12-22 東京エレクトロン株式会社 成膜方法
US10762309B2 (en) 2014-12-19 2020-09-01 Avery Dennison Retail Information Services, Llc RFID mobile workstation device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA935336A (en) * 1970-05-29 1973-10-16 V. Melnikov Valery Method of depositing inorganic coatings from vapour phase
JPS5541275B2 (es) * 1974-08-16 1980-10-23
DD120473A1 (es) * 1975-10-02 1976-06-12

Also Published As

Publication number Publication date
ES495953A0 (es) 1981-07-01
JPS635424B2 (es) 1988-02-03
DE3061044D1 (en) 1982-12-09
EP0027625B1 (de) 1982-11-03
ATE1753T1 (de) 1982-11-15
CA1162798A (en) 1984-02-28
DE2941896A1 (de) 1981-04-30
EP0027625A1 (de) 1981-04-29
JPS5665029A (en) 1981-06-02

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