JPS55154563A - Manufacture of covered tool material - Google Patents

Manufacture of covered tool material

Info

Publication number
JPS55154563A
JPS55154563A JP6165179A JP6165179A JPS55154563A JP S55154563 A JPS55154563 A JP S55154563A JP 6165179 A JP6165179 A JP 6165179A JP 6165179 A JP6165179 A JP 6165179A JP S55154563 A JPS55154563 A JP S55154563A
Authority
JP
Japan
Prior art keywords
covered
thin layer
layer
plasmatic
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6165179A
Other languages
Japanese (ja)
Inventor
Masaaki Tobioka
Takaharu Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP6165179A priority Critical patent/JPS55154563A/en
Publication of JPS55154563A publication Critical patent/JPS55154563A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Powder Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To plan mass production without raising the temp. of a base material by applying electric energy to a mixed gas forming a covered thin layer from the outside to generate plasma and depositing the layer on the material surface in the plasmatic atmosphere. CONSTITUTION:When a base material is covered with a thin layer by chemical vapor deposition or other method, a mixed gas of one or more among halide, hydride, carbonyl compound and organometallic compound of ametallic element forming the layer, nonmetallic element-contg. boron halide, boron hydride, hydrocarbon, nitrogen and/or ammonia, CO and/or CO2, and a carrier gas is fed into an evacuated reactor or the like. By applying electric energy from the outside, plasma is generated, and in this plasmatic atmosphere the covered thin layer is deposited on the material surface. By this method a tool material covered with a wear resistant thin layer is obtd. at a low cost of equipment.
JP6165179A 1979-05-18 1979-05-18 Manufacture of covered tool material Pending JPS55154563A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6165179A JPS55154563A (en) 1979-05-18 1979-05-18 Manufacture of covered tool material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6165179A JPS55154563A (en) 1979-05-18 1979-05-18 Manufacture of covered tool material

Publications (1)

Publication Number Publication Date
JPS55154563A true JPS55154563A (en) 1980-12-02

Family

ID=13177337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6165179A Pending JPS55154563A (en) 1979-05-18 1979-05-18 Manufacture of covered tool material

Country Status (1)

Country Link
JP (1) JPS55154563A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58104015A (en) * 1981-12-11 1983-06-21 Canon Inc Apparatus for preparation of deposited film
JPS59122870U (en) * 1983-02-07 1984-08-18 手嶋 立男 Ceramic tools
JPS59170263A (en) * 1983-03-15 1984-09-26 Mitsubishi Metal Corp Surface-coated sintered hard alloy member for cutting tool
JPS59170264A (en) * 1983-03-15 1984-09-26 Mitsubishi Metal Corp Surface coated sintered hard alloy member for cutting tool
US4670172A (en) * 1985-03-29 1987-06-02 Borg-Warner Corporation Process and kit for working metals

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58104015A (en) * 1981-12-11 1983-06-21 Canon Inc Apparatus for preparation of deposited film
JPS59122870U (en) * 1983-02-07 1984-08-18 手嶋 立男 Ceramic tools
JPS59170263A (en) * 1983-03-15 1984-09-26 Mitsubishi Metal Corp Surface-coated sintered hard alloy member for cutting tool
JPS59170264A (en) * 1983-03-15 1984-09-26 Mitsubishi Metal Corp Surface coated sintered hard alloy member for cutting tool
JPS6151031B2 (en) * 1983-03-15 1986-11-07 Mitsubishi Metal Corp
JPS6151030B2 (en) * 1983-03-15 1986-11-07 Mitsubishi Metal Corp
US4670172A (en) * 1985-03-29 1987-06-02 Borg-Warner Corporation Process and kit for working metals

Similar Documents

Publication Publication Date Title
MY107421A (en) Gas feeding device and deposition film forming apparatus employing the same.
MY104628A (en) Process for forming metal deposited film containing aluminum as main component by use of alkyl aluminum hydride.
ES8503453A1 (en) Method of making amorphous semiconductor alloys and devices using microwave energy.
TW362118B (en) Method for depositing amorphous SiNC coatings
SE7609616L (en) DEVICE FOR DEPOSITING COATINGS BY CHEMICAL APPROACH
ZA951047B (en) Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic susbtance
US3368914A (en) Process for adherently depositing a metal carbide on a metal substrate
ES8606524A1 (en) Process for transition metal nitrides thin film deposition.
JPS6417870A (en) Manufacture of carbon
KR890003981A (en) Halogen-containing carbon material and its deposition method
ES455227A1 (en) Process for coating substrate
ES8106020A1 (en) Method for the production of adhesive layers on polyolefins.
JPS55154563A (en) Manufacture of covered tool material
EP0119103A3 (en) Process gas introduction and channeling system
KR960034479A (en) METHOD FOR MANUFACTING OXIDE FILM AND METHOD FOR PRODUCING THE SAME
JPS57158370A (en) Formation of metallic thin film
ES8401680A1 (en) Method of vapor deposition.
SE7501316L (en) METHOD OF PRODUCING DIFFUSION LAYERS OF CARBIDES, NITRIDES AND / OR CARBONITRIDES.
JPS56116869A (en) Inductive reduced pressure gaseous phase method
ES8401675A1 (en) Method of making a borided dispenser cathode
JPS54152281A (en) Surface-coated tool component and manufacturing method
ES327660A1 (en) A method of treating graphite articles and products obtained thereby
ES8402881A1 (en) Selectively absorbent layer for solar collectors, and method of making it
WO1999028519A3 (en) Method for producing a bc(n):h layer
JPS64266A (en) Production of diamondlike carbon