ES487727A0 - Mejoras introducidas en un metodo de formacion electroliticade un deposito de paladio metalico. - Google Patents

Mejoras introducidas en un metodo de formacion electroliticade un deposito de paladio metalico.

Info

Publication number
ES487727A0
ES487727A0 ES487727A ES487727A ES487727A0 ES 487727 A0 ES487727 A0 ES 487727A0 ES 487727 A ES487727 A ES 487727A ES 487727 A ES487727 A ES 487727A ES 487727 A0 ES487727 A0 ES 487727A0
Authority
ES
Spain
Prior art keywords
improvements introduced
electrolytic formation
metallic pallet
deposit
pallet deposit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES487727A
Other languages
English (en)
Spanish (es)
Other versions
ES8101658A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oxy Metal Industries Corp
Original Assignee
Oxy Metal Industries Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oxy Metal Industries Corp filed Critical Oxy Metal Industries Corp
Publication of ES8101658A1 publication Critical patent/ES8101658A1/es
Publication of ES487727A0 publication Critical patent/ES487727A0/es
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ES487727A 1979-08-20 1980-01-15 Mejoras introducidas en un metodo de formacion electroliticade un deposito de paladio metalico. Granted ES487727A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6813479A 1979-08-20 1979-08-20

Publications (2)

Publication Number Publication Date
ES8101658A1 ES8101658A1 (es) 1980-12-16
ES487727A0 true ES487727A0 (es) 1980-12-16

Family

ID=22080625

Family Applications (1)

Application Number Title Priority Date Filing Date
ES487727A Granted ES487727A0 (es) 1979-08-20 1980-01-15 Mejoras introducidas en un metodo de formacion electroliticade un deposito de paladio metalico.

Country Status (11)

Country Link
JP (1) JPS5629689A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE879682A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR8000087A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1163952A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH649581A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2943399C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES487727A0 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2463823B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2057503B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
HK (1) HK67886A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL185577C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE8106693L (sv) * 1980-12-17 1982-06-18 Hooker Chemicals Plastics Corp Elektropleteringsbad innehallande palladium
US4392921A (en) * 1980-12-17 1983-07-12 Occidental Chemical Corporation Composition and process for electroplating white palladium
US4545868A (en) * 1981-10-06 1985-10-08 Learonal, Inc. Palladium plating
US4622110A (en) * 1981-10-06 1986-11-11 Learonal, Inc. Palladium plating
JPS5920992U (ja) * 1982-07-29 1984-02-08 東京瓦斯株式会社 固定管の内面円周自動溶接装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1970950A (en) * 1932-06-20 1934-08-21 Int Nickel Co Electrodeposition of platinum metals
GB958685A (en) * 1960-10-11 1964-05-21 Automatic Telephone & Elect Improvements in or relating to palladium plating
US3925170A (en) * 1974-01-23 1975-12-09 American Chem & Refining Co Method and composition for producing bright palladium electrodepositions

Also Published As

Publication number Publication date
NL7907968A (nl) 1981-02-24
BE879682A (fr) 1980-04-28
FR2463823B1 (fr) 1985-10-31
CA1163952A (en) 1984-03-20
BR8000087A (pt) 1981-03-24
FR2463823A1 (fr) 1981-02-27
CH649581A5 (de) 1985-05-31
DE2943399C2 (de) 1983-12-08
HK67886A (en) 1986-09-18
JPS5629689A (en) 1981-03-25
JPS6229516B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-06-26
NL185577B (nl) 1989-12-18
NL185577C (nl) 1990-05-16
ES8101658A1 (es) 1980-12-16
GB2057503B (en) 1983-05-18
GB2057503A (en) 1981-04-01
DE2943399A1 (de) 1981-03-26

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19960603