ES427084A1 - Un metodo de fabricacion de una placa de impresion fotogra-bada. - Google Patents
Un metodo de fabricacion de una placa de impresion fotogra-bada.Info
- Publication number
- ES427084A1 ES427084A1 ES427084A ES427084A ES427084A1 ES 427084 A1 ES427084 A1 ES 427084A1 ES 427084 A ES427084 A ES 427084A ES 427084 A ES427084 A ES 427084A ES 427084 A1 ES427084 A1 ES 427084A1
- Authority
- ES
- Spain
- Prior art keywords
- light
- polymer system
- curable polymer
- temperature
- polymerisation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 abstract 3
- 238000002844 melting Methods 0.000 abstract 2
- 230000008018 melting Effects 0.000 abstract 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 125000005395 methacrylic acid group Chemical group 0.000 abstract 1
- 229920005862 polyol Polymers 0.000 abstract 1
- -1 polyol compound Chemical class 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US36832673A | 1973-06-08 | 1973-06-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES427084A1 true ES427084A1 (es) | 1976-07-16 |
Family
ID=23450761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES427084A Expired ES427084A1 (es) | 1973-06-08 | 1974-06-07 | Un metodo de fabricacion de una placa de impresion fotogra-bada. |
Country Status (15)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2929313C2 (de) * | 1978-07-20 | 1997-05-15 | Minnesota Mining & Mfg | Formkörper mit einer Kunststoffschicht mit mikrostrukturierter Oberfläche sowie Verfahren zu ihrer Herstellung |
| DE2954645C2 (de) * | 1978-07-20 | 1994-02-10 | Minnesota Mining & Mfg | Oligomere Masse, insbesondere zur Herstellung von Formkörpern mit mikrostrukturierter Oberfläche |
| US4582885A (en) * | 1978-07-20 | 1986-04-15 | Minnesota Mining And Manufacturing Company | Shaped plastic articles having replicated microstructure surfaces |
| DE3131766A1 (de) * | 1981-08-11 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials |
| DE3328285A1 (de) * | 1983-08-05 | 1985-02-21 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von lichtgehaerteten schichten mit definierter haerte |
| AU3118784A (en) * | 1984-02-23 | 1985-08-29 | W.R. Grace & Co. | Acrylate-capped polyurethane use as solder mask |
| JPH021859A (ja) * | 1988-06-13 | 1990-01-08 | Toyobo Co Ltd | 感光性樹脂組成物 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1306927A (en) * | 1969-03-17 | 1973-02-14 | Broom & Wade Ltd | Control means for reversible fluid pressure operated rotary motors |
-
1974
- 1974-05-28 ZA ZA00743433A patent/ZA743433B/xx unknown
- 1974-05-30 GB GB24105/74A patent/GB1481472A/en not_active Expired
- 1974-06-05 SE SE7407419A patent/SE7407419L/xx unknown
- 1974-06-06 FI FI1743/74A patent/FI174374A7/fi unknown
- 1974-06-06 NO NO742048A patent/NO742048L/no unknown
- 1974-06-07 DK DK305774A patent/DK305774A/da unknown
- 1974-06-07 NL NL7407705A patent/NL7407705A/xx not_active Application Discontinuation
- 1974-06-07 BE BE145187A patent/BE816052A/xx unknown
- 1974-06-07 DE DE2427494A patent/DE2427494B2/de not_active Withdrawn
- 1974-06-07 JP JP49064189A patent/JPS5031906A/ja active Pending
- 1974-06-07 ES ES427084A patent/ES427084A1/es not_active Expired
- 1974-06-10 BR BR4767/74A patent/BR7404767D0/pt unknown
- 1974-06-10 IT IT23794/74A patent/IT1014913B/it active
- 1974-06-10 CH CH788174A patent/CH620527A5/fr not_active IP Right Cessation
- 1974-06-10 FR FR7419979A patent/FR2232782B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5031906A (enrdf_load_stackoverflow) | 1975-03-28 |
| FR2232782A1 (enrdf_load_stackoverflow) | 1975-01-03 |
| AU6960574A (en) | 1975-12-04 |
| BE816052A (fr) | 1974-12-09 |
| DK305774A (enrdf_load_stackoverflow) | 1975-01-27 |
| DE2427494A1 (de) | 1975-01-09 |
| GB1481472A (en) | 1977-07-27 |
| CH620527A5 (en) | 1980-11-28 |
| DE2427494B2 (de) | 1980-09-18 |
| NO742048L (enrdf_load_stackoverflow) | 1975-01-06 |
| NL7407705A (enrdf_load_stackoverflow) | 1974-12-10 |
| FR2232782B1 (enrdf_load_stackoverflow) | 1978-02-17 |
| BR7404767D0 (pt) | 1975-01-07 |
| SE7407419L (enrdf_load_stackoverflow) | 1974-12-09 |
| ZA743433B (en) | 1975-05-28 |
| IT1014913B (it) | 1977-04-30 |
| FI174374A7 (enrdf_load_stackoverflow) | 1974-12-09 |
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