ES2310967B2 - Metodo de fabricacion para dispositivo enfocador de fluido a escala m icrometrica. - Google Patents

Metodo de fabricacion para dispositivo enfocador de fluido a escala m icrometrica. Download PDF

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Publication number
ES2310967B2
ES2310967B2 ES200701626A ES200701626A ES2310967B2 ES 2310967 B2 ES2310967 B2 ES 2310967B2 ES 200701626 A ES200701626 A ES 200701626A ES 200701626 A ES200701626 A ES 200701626A ES 2310967 B2 ES2310967 B2 ES 2310967B2
Authority
ES
Spain
Prior art keywords
wafer
fluid
focusing
focused
photolithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES200701626A
Other languages
English (en)
Spanish (es)
Other versions
ES2310967A1 (es
Inventor
Antonio Luque Estepa
Jose Manuel Quero Reboul
Francisco A. Perdigones Sanchez
Alfonso Miguel Gañan Calvo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universidad de Sevilla
Original Assignee
Universidad de Sevilla
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universidad de Sevilla filed Critical Universidad de Sevilla
Priority to ES200701626A priority Critical patent/ES2310967B2/es
Priority to PCT/ES2008/000413 priority patent/WO2008148917A2/fr
Publication of ES2310967A1 publication Critical patent/ES2310967A1/es
Application granted granted Critical
Publication of ES2310967B2 publication Critical patent/ES2310967B2/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/04Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • B05B7/0433Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of gas surrounded by an external conduit of liquid upstream the mixing chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00Other mixers; Mixing plants; Combinations of mixers
    • B01F33/30Micromixers
    • B01F33/301Micromixers using specific means for arranging the streams to be mixed, e.g. channel geometries or dispositions
    • B01F33/3011Micromixers using specific means for arranging the streams to be mixed, e.g. channel geometries or dispositions using a sheathing stream of a fluid surrounding a central stream of a different fluid, e.g. for reducing the cross-section of the central stream or to produce droplets from the central stream
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/08Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0884Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point the outlet orifices for jets constituted by a liquid or a mixture containing a liquid being aligned
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B1/00Devices without movable or flexible elements, e.g. microcapillary devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00119Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502769Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements
    • B01L3/502776Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements specially adapted for focusing or laminating flows
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
    • B81C2201/019Bonding or gluing multiple substrate layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Dispersion Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Micromachines (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
ES200701626A 2007-06-06 2007-06-06 Metodo de fabricacion para dispositivo enfocador de fluido a escala m icrometrica. Active ES2310967B2 (es)

Priority Applications (2)

Application Number Priority Date Filing Date Title
ES200701626A ES2310967B2 (es) 2007-06-06 2007-06-06 Metodo de fabricacion para dispositivo enfocador de fluido a escala m icrometrica.
PCT/ES2008/000413 WO2008148917A2 (fr) 2007-06-06 2008-06-05 Procédé de fabrication d'un dispositif pour focalisation de fluide micrométrique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES200701626A ES2310967B2 (es) 2007-06-06 2007-06-06 Metodo de fabricacion para dispositivo enfocador de fluido a escala m icrometrica.

Publications (2)

Publication Number Publication Date
ES2310967A1 ES2310967A1 (es) 2009-01-16
ES2310967B2 true ES2310967B2 (es) 2009-07-21

Family

ID=40094229

Family Applications (1)

Application Number Title Priority Date Filing Date
ES200701626A Active ES2310967B2 (es) 2007-06-06 2007-06-06 Metodo de fabricacion para dispositivo enfocador de fluido a escala m icrometrica.

Country Status (2)

Country Link
ES (1) ES2310967B2 (fr)
WO (1) WO2008148917A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104865002A (zh) * 2015-05-05 2015-08-26 苏州曼普拉斯传感科技有限公司 一种mems压力传感器装置及封装方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091434B2 (en) 2008-04-18 2015-07-28 The Board Of Trustees Of The University Of Alabama Meso-scaled combustion system
US10369579B1 (en) 2018-09-04 2019-08-06 Zyxogen, Llc Multi-orifice nozzle for droplet atomization

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2199048A1 (es) * 2002-02-04 2004-02-01 Univ Sevilla Dispositivo multidispositivo y procedimiento para la produccion de chorros capilares y particulas micro y nanometricos.
ES2273572A1 (es) * 2005-05-04 2007-05-01 Universidad De Sevilla Procedimiento de preparacion de particulas de tamaño micro y nanometrico con productos labiles y particulas obtenidas.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW577855B (en) * 2003-05-21 2004-03-01 Univ Nat Cheng Kung Chip-type micro-fluid particle 3-D focusing and detection device
US7115230B2 (en) * 2003-06-26 2006-10-03 Intel Corporation Hydrodynamic focusing devices
US20070054119A1 (en) * 2005-03-04 2007-03-08 Piotr Garstecki Systems and methods of forming particles

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2199048A1 (es) * 2002-02-04 2004-02-01 Univ Sevilla Dispositivo multidispositivo y procedimiento para la produccion de chorros capilares y particulas micro y nanometricos.
ES2273572A1 (es) * 2005-05-04 2007-05-01 Universidad De Sevilla Procedimiento de preparacion de particulas de tamaño micro y nanometrico con productos labiles y particulas obtenidas.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104865002A (zh) * 2015-05-05 2015-08-26 苏州曼普拉斯传感科技有限公司 一种mems压力传感器装置及封装方法

Also Published As

Publication number Publication date
WO2008148917A3 (fr) 2009-01-29
WO2008148917A2 (fr) 2008-12-11
ES2310967A1 (es) 2009-01-16

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