ES2160423T3 - Procedimiento para la obtencion de capas funcionales de metal, ceramica o ceramica/metal en la pared interna de cuerpos huecos. - Google Patents

Procedimiento para la obtencion de capas funcionales de metal, ceramica o ceramica/metal en la pared interna de cuerpos huecos.

Info

Publication number
ES2160423T3
ES2160423T3 ES99100868T ES99100868T ES2160423T3 ES 2160423 T3 ES2160423 T3 ES 2160423T3 ES 99100868 T ES99100868 T ES 99100868T ES 99100868 T ES99100868 T ES 99100868T ES 2160423 T3 ES2160423 T3 ES 2160423T3
Authority
ES
Spain
Prior art keywords
ceramic
metal
procedure
internal wall
functional layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES99100868T
Other languages
English (en)
Inventor
Steffen Beyer
Reiner Dietsch
Hermann Mai
Wolfgang Pompe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airbus DS GmbH
Original Assignee
Astrium GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Astrium GmbH filed Critical Astrium GmbH
Application granted granted Critical
Publication of ES2160423T3 publication Critical patent/ES2160423T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321Discharge generated by other radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/046Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
  • Chemically Coating (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

SE DESCRIBE UN PROCEDIMIENTO PARA CONSEGUIR CAPAS FUNCIONALES DE METAL, CERAMICA O CERAMICA/METAL SOBRE LA PARED INTERNA DE CUERPOS HUECOS UTILIZANDO EL PROCEDIMIENTO DE LA DEPOSICION POR LASER PULSADO (PLD), UTILIZANDOSE EN COMBINACION CON UN TRATAMIENTO DE CAPA FINA POR LASER DENSIDADES DE CORRIENTE DE ENERGIA Y DE MATERIA COMO FUNCION DE LA SEPARACION DE LAS ZONAS DE CONDENSACION DE LA SUPERFICIE DEL SUSTRATO, UTILIZANDOSE IMPULSOS DE LASER CON ENERGIAS DE 1 - 2 JULIOS EN TASAS DE IMPULSOS DE REPETICION DE 10 HZ HASTA 50 HZ, Y FORMANDOSE UN REVESTIMIENTO DIRECTO INTERNO SEGUN LA LONGITUD DEL IMPULSO ELEGIDO Y LA ATMOSFERA DE GAS RESIDUAL EN LA CAMARA DE SEDIMENTACION EN VACIO MEDIANTE CORRIENTE DE PLASMA UNA ESTRUCTURA TIPICA EN CAPAS, VIDRIOSA - AMORFA, COLUMNAR O POLICRISTALINA, Y ESTANDO FORMADO EL MATERIAL DE LA CAPA O EL MATERIAL DIANA TANTO POR SUSTANCIAS CONDUCTORAS COMO TAMBIEN POR SUSTANCIAS AISLANTES.
ES99100868T 1998-01-22 1999-01-19 Procedimiento para la obtencion de capas funcionales de metal, ceramica o ceramica/metal en la pared interna de cuerpos huecos. Expired - Lifetime ES2160423T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19802298A DE19802298C2 (de) 1998-01-22 1998-01-22 Verfahren zur Erzielung funktioneller Metall-, Keramik- oder Keramik/Metall-Schichten auf der Innenwand von Hohlkörpern

Publications (1)

Publication Number Publication Date
ES2160423T3 true ES2160423T3 (es) 2001-11-01

Family

ID=7855336

Family Applications (1)

Application Number Title Priority Date Filing Date
ES99100868T Expired - Lifetime ES2160423T3 (es) 1998-01-22 1999-01-19 Procedimiento para la obtencion de capas funcionales de metal, ceramica o ceramica/metal en la pared interna de cuerpos huecos.

Country Status (5)

Country Link
US (1) US6146714A (es)
EP (1) EP0931851B1 (es)
JP (1) JPH11315368A (es)
DE (1) DE19802298C2 (es)
ES (1) ES2160423T3 (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2310106A1 (es) * 2006-11-28 2008-12-16 Jose Maximino Portales Procedimiento para la decoracion en bajo relive de materiales ceramicos, porcelanicos y vidrio y producto obtenido.

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2777810B1 (fr) * 1998-04-28 2000-05-19 Air Liquide Procede et dispositif de traitement de la surface interne d'une bouteille de gaz
WO2000031315A1 (en) * 1998-11-20 2000-06-02 Fernandez Felix E Apparatus and method for pulsed laser deposition of materials on wires and pipes
US6499426B1 (en) * 1999-12-10 2002-12-31 Saint-Gobain Industrial Ceramics, Inc. System and method for coating non-planar surfaces of objects with diamond film
US6419998B1 (en) * 2000-06-19 2002-07-16 Mcgrath Thomas Method for deposition of metal catalysts on inert supports
DE10103474B4 (de) * 2000-09-19 2004-10-28 Friedrich-Wilhelm Prof. Dr.-Ing. Bach Verfahren und Vorrichtung zum Beschichten einer Oberfläche eines Bauteils mit Beschichtungsmaterial
DE10126926B4 (de) * 2001-06-01 2015-02-19 Astrium Gmbh Brennkammer mit Innenmantel aus einem keramischen Komposit-Material und Verfahren zur Herstellung
DE10151716A1 (de) * 2001-10-19 2003-05-08 Bayerische Motoren Werke Ag Legierungspulver zur Beschichtung insbesondere des Ventilsitzbereiches eines Zylinderkopfes einer Brennkraftmaschine sowie Beschichtungsverfahren
DE10319206B4 (de) * 2003-04-25 2013-08-14 Lim Laserinstitut Mittelsachsen Gmbh Verwendung von KrF-Excimerlasern zur Laserpulsabscheidung und zur Spannungsreduzierung von dünnen Schichten
EP1745247B1 (en) 2004-04-23 2015-11-11 Philip Morris Products S.a.s. Aerosol generators and methods for producing aerosols
DE102004028348B4 (de) * 2004-06-11 2006-12-21 Mtu Aero Engines Gmbh Verfahren zum Beschichten von Bauteilen
DE102008056411A1 (de) * 2008-11-07 2010-05-20 Dürr Systems GmbH Beschichtungsanlagenbauteil, insbesondere Glockenteller, und entsprechendes Herstellungsverfahren
DE102008061917B4 (de) * 2008-12-15 2010-11-04 Astrium Gmbh Heißgaskammer
US20110146576A1 (en) * 2009-12-18 2011-06-23 Todd Jay Rockstroh Systems for applying a thermal barrier coating to a superalloy substrate
US20110151270A1 (en) * 2009-12-18 2011-06-23 Todd Jay Rockstroh Methods of laser assisted plasma coating at atmospheric pressure and superalloy substrates comprising coatings made using the same
WO2015023766A1 (en) * 2013-08-14 2015-02-19 Lawrence Livermore National Security, Llc System and method for laser peening and high velocity laser accelerated deposition inside pipes, tanks and other vessels
EP2839905A1 (en) * 2013-08-22 2015-02-25 Astrium GmbH Manufacturing of components from parts made from different materials, particularly of space transportation components such as combustion chambers for thrusters
US11015244B2 (en) * 2013-12-30 2021-05-25 Advanced Material Solutions, Llc Radiation shielding for a CVD reactor
GB201508703D0 (en) * 2015-05-21 2015-07-01 Rolls Royce Plc Additive layer repair of a metallic component
CN108588566B (zh) * 2018-06-20 2020-06-30 华东交通大学 一种FexWyC-贝氏体成分和组织双重梯度复合材料
FR3096929B1 (fr) * 2019-06-06 2021-09-03 Schott Vtf Méthode de réalisation d’un panneau décoratif
GB202203879D0 (en) * 2022-03-21 2022-05-04 Rolls Royce Plc Apparatus and method for coating substrate
CN114990650B (zh) * 2022-05-30 2024-01-05 江苏大学 一种激光调谐电流波形制备功能性梯度镀层的方法及装置
CN115369364A (zh) * 2022-07-29 2022-11-22 松山湖材料实验室 曲面薄膜沉积方法及其装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE293608C (es) *
DE295666C (es) * 1914-03-03 1916-12-12
US4340617A (en) * 1980-05-19 1982-07-20 Massachusetts Institute Of Technology Method and apparatus for depositing a material on a surface
JPS62174369A (ja) * 1986-01-27 1987-07-31 Mitsubishi Electric Corp セラミツクスコ−テイング装置
JPS62192579A (ja) * 1986-02-19 1987-08-24 Mitsubishi Electric Corp レ−ザ−によるセラミツクスコ−テイング装置
FR2607830B1 (fr) * 1986-12-08 1993-04-09 Univ Limoges Procede et dispositif pour le depot par vaporisation a l'interieur d'un tube
DD293608A5 (de) * 1987-12-08 1991-09-05 Zi Fuer Festkoerperphysik Und Werkstofforschung,De Verfahren zur herstellung hochtemperatur-supraleitender schichten
DD295666A5 (de) * 1988-02-08 1991-11-07 Zi Fuer Isotopen- Und Strahlenforschung,De Verfahren zur erzeugung duenner supraleitender schichten durch laserinduzierte ionenabscheidung
US5578350A (en) * 1990-07-03 1996-11-26 Fraunhofer-Gesellschaft Method for depositing a thin layer on a substrate by laser pulse vapor deposition
GB2250751B (en) * 1990-08-24 1995-04-12 Kawasaki Heavy Ind Ltd Process for the production of dielectric thin films
US5733609A (en) * 1993-06-01 1998-03-31 Wang; Liang Ceramic coatings synthesized by chemical reactions energized by laser plasmas
US5372862A (en) * 1993-10-14 1994-12-13 Krishnaswamy; Jayaram Coating technique for synchrotron beam tubes
DE4339490C1 (de) * 1993-11-19 1995-03-23 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Innenwandbeschichtung von Hohlkörpern, insbesondere kleiner Abmessungen
US5620754A (en) * 1994-01-21 1997-04-15 Qqc, Inc. Method of treating and coating substrates
DE4417114A1 (de) * 1994-05-16 1995-11-23 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur teilchenselektiven Abscheidung dünner Schichten mittels Laserimpuls-Abscheidung (PLD)
FR2742926B1 (fr) * 1995-12-22 1998-02-06 Alsthom Cge Alcatel Procede et dispositif de preparation de faces de laser

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2310106A1 (es) * 2006-11-28 2008-12-16 Jose Maximino Portales Procedimiento para la decoracion en bajo relive de materiales ceramicos, porcelanicos y vidrio y producto obtenido.

Also Published As

Publication number Publication date
JPH11315368A (ja) 1999-11-16
EP0931851B1 (de) 2001-07-11
EP0931851A1 (de) 1999-07-28
US6146714A (en) 2000-11-14
DE19802298C2 (de) 2000-11-23
DE19802298A1 (de) 1999-07-29

Similar Documents

Publication Publication Date Title
ES2160423T3 (es) Procedimiento para la obtencion de capas funcionales de metal, ceramica o ceramica/metal en la pared interna de cuerpos huecos.
Lenzner et al. Precision laser ablation of dielectrics in the 10-fs regime.
Kononenko et al. Laser ablation of metals and ceramics in picosecond–nanosecond pulsewidth in the presence of different ambient atmospheres
EP1844635B1 (en) Atmospheric-pressure plasma jet
US20070108910A1 (en) Plasma extraction microcavity plasma device and method
WO2002043619A3 (en) Method for manufacturing a medical device having a coated portion by laser ablation
Cho et al. Cold plasma jets made of a syringe needle covered with a glass tube
WO2005125288A3 (en) Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
Fiedler et al. Machining of biocompatible ceramics with femtosecond laser pulses
Mihailescu et al. Pulsed laser deposition: an overview
ES2026557T3 (es) Procedimiento para la fabricacion de preformas para fibras opticas y mandril utilizable para la realizacion de este procedimiento, aplicacion a la fabricacion de fibras opticas monomodales.
RU94042468A (ru) Устройство для удаления загрязнений с поверхностей подложки, ориентированных в несовмещающихся плоскостях, при сохранении молекулярной кристаллической структуры обрабатываемых поверхностей подложки (варианты) и устройство для удаления загрязнений с поверхности подложки при сохранении молекулярной кристаллической структуры обрабатываемой поверхности подложки
JPS6431466A (en) Forming method for silicon thin film for thin film transistor
WO2002059046A3 (en) Method of activation of chemically pure and potable water
BR9805925A (pt) Eletrodo frio para descargas de gás
KR960023227A (ko) 증착 피막 형성 장치 및 그 장치에 사용하기 위한 전극
RU2005136816A (ru) Рентгеновская трубка
ES2054182T3 (es) Dispositivo y procedimiento para el revestimiento de piezas de trabajo por medio de una descarga de arco electrico.
CN106851955A (zh) 一种产生大体积大气压均匀放电的装置及方法
EP2936538B1 (en) Pulsed plasma deposition device
GB1399571A (en) Workpiece support for glow discharge apparatus
RU2002135702A (ru) Импульсный плазменный электрический реактивный двигатель
SU1754165A1 (ru) Способ очистки фильтров
Pai Microplasma transistor for harsh environment applications
Dinescu et al. Cold Atmospheric Pressure Plasma Jets and Their Applications

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 931851

Country of ref document: ES