ES2090533T3 - Composicion de resina fotocurable. - Google Patents

Composicion de resina fotocurable.

Info

Publication number
ES2090533T3
ES2090533T3 ES92311396T ES92311396T ES2090533T3 ES 2090533 T3 ES2090533 T3 ES 2090533T3 ES 92311396 T ES92311396 T ES 92311396T ES 92311396 T ES92311396 T ES 92311396T ES 2090533 T3 ES2090533 T3 ES 2090533T3
Authority
ES
Spain
Prior art keywords
group
compound
lower alkyl
hydrolysis product
photocurable resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92311396T
Other languages
English (en)
Inventor
Masaji Nagahata
Hiroshi Masaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Starch and Chemical Investment Holding Corp
Original Assignee
National Starch and Chemical Investment Holding Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Starch and Chemical Investment Holding Corp filed Critical National Starch and Chemical Investment Holding Corp
Application granted granted Critical
Publication of ES2090533T3 publication Critical patent/ES2090533T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silicon Polymers (AREA)

Abstract

SE PRESENTA UNA COMPOSICION DE RESINA FOTOCURABLE QUE COMPRENDE LOS COMPONENTES A), B), C) Y D) O LOS COMPONENTES A), B) Y E) DE LOS SIGUIENTES COMPONENTES: A) UN COMPUESTO POLIMERIZABLE QUE TENGA AL MENOS UN GRUPO ETILENICAMENTE INSATURADO POR MOLECULA; B) UN INICIADOR DE LA FOTOPOLIMERIZACION; C) AL MENOS UN COMPUESTO DE LA FORMULA GENERAL: EN DONDE R1 REPRESENTA UN ATOMO DE HIDROGENO O UN GRUPO DE ALQUIL INFERIOR, A REPRESENTA -OESENTA UN GRUPO DE ALQUIL INFERIOR, X REPRESENTA UN GRUPO DE ALCOXIDO INFERIOR O UN ATOMO DE HALOGENO, Y M REPRESENTA 0, 1 O 2, O AL MENOS UN PRODUCTO DE HIDROLISIS QUE CONTIENE UN GRUPO DE SILANO DEL MISMO; D) AL MENOS UN COMPUESTO DE LA FORMULA GENERAL: EN DONDE R4 REPRESENTA GLICIDOXIDO O UN GRUPO DE HEPOXICICLOALQUIL C5-C6, R5 REPRESENTA UN GRUPO DE ALQUILENO C1C6, R6 REPRESENTA UN GRUPO DE ALQUIL INFERIOR, Y REPRESENTA UN GRUPO DE ALCOXIDO INFERIOR O UN ATOMO DE HALOGENO Y N REPRESENTA 0, 1 O 2, O AL MENOS UN PRODUCTO DE HIDROLISIS DEL MISMO QUE COMPRENDA UNGRUPO DE SILANO; E) UN PRODUCTO DE HIDROLISIS QUE CONTENGA UN GRUPO DE SILANO DE UNA MEZCLA DE AL MENOS UN COMPUESTO DE LA FORMULA (I) Y AL MENOS UN GRUPO DE LA FORMULA (II).
ES92311396T 1991-12-27 1992-12-14 Composicion de resina fotocurable. Expired - Lifetime ES2090533T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3346740A JPH05202146A (ja) 1991-12-27 1991-12-27 光硬化性樹脂組成物

Publications (1)

Publication Number Publication Date
ES2090533T3 true ES2090533T3 (es) 1996-10-16

Family

ID=18385496

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92311396T Expired - Lifetime ES2090533T3 (es) 1991-12-27 1992-12-14 Composicion de resina fotocurable.

Country Status (7)

Country Link
US (1) US5629358A (es)
EP (1) EP0549228B1 (es)
JP (1) JPH05202146A (es)
AT (1) ATE141932T1 (es)
DE (1) DE69213193T2 (es)
DK (1) DK0549228T3 (es)
ES (1) ES2090533T3 (es)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3222386B2 (ja) * 1996-07-12 2001-10-29 信越化学工業株式会社 コーティング剤組成物及びそのコーティング組成物で処理してなる物品
DE19630100A1 (de) * 1996-07-25 1998-01-29 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung eines für optische Zwecke geeigneten Formkörpers
JP4050370B2 (ja) * 1998-01-07 2008-02-20 株式会社Ｋｒｉ 無機質含有感光性樹脂組成物および無機パターン形成方法
CN1337013A (zh) 1999-11-12 2002-02-20 日本板硝子株式会社 感光性组合物与光波导元件及其制造方法
KR100673265B1 (ko) * 2000-10-04 2007-01-22 엘지.필립스 엘시디 주식회사 액정표시장치
US7189781B2 (en) 2003-03-13 2007-03-13 H.B. Fuller Licensing & Finance Inc. Moisture curable, radiation curable sealant composition
JP4718114B2 (ja) * 2003-11-17 2011-07-06 信越化学工業株式会社 珪素含有高分子化合物、レジスト材料及びパターン形成方法
JP4880603B2 (ja) * 2004-08-11 2012-02-22 ダウ・コーニング・コーポレイション センサ応用のための半透膜を形成する光重合性シリコーン物質
US7457507B2 (en) * 2004-12-01 2008-11-25 Sanyo Electric Co., Ltd. Organometallic polymer material
US7391569B2 (en) * 2004-12-29 2008-06-24 3M Innovative Properties Company Projection system including intrinsic polarizer
US20090269514A1 (en) * 2005-04-14 2009-10-29 Sony Chemical & Information Device Corporation Polarizing Plate
US7713628B2 (en) 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
JP4633772B2 (ja) * 2006-10-31 2011-02-16 三洋化成工業株式会社 感光性樹脂組成物
JP4850770B2 (ja) * 2007-04-04 2012-01-11 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
EP2133744B1 (en) * 2007-04-04 2011-07-13 Asahi Kasei E-materials Corporation Photosensitive resin composition
JP4938571B2 (ja) * 2007-07-11 2012-05-23 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
DE102007040246A1 (de) * 2007-08-25 2009-02-26 Evonik Degussa Gmbh Strahlenhärtbare Formulierungen
KR101475780B1 (ko) * 2008-02-13 2014-12-23 주식회사 동진쎄미켐 보호막으로서 유용한 유-무기 복합체 수지 조성물
JP5581614B2 (ja) * 2008-07-31 2014-09-03 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
CN102232014B (zh) * 2008-12-01 2014-08-20 Aji株式会社 造形方法
EP2757122A2 (en) * 2009-12-14 2014-07-23 Showa Denko K.K. Photocurable moisture-proof insulating coating material for mounting circuit boards
JP2013543030A (ja) * 2010-10-19 2013-11-28 エイブルスティック・（シャンハイ）・リミテッド 発光デバイス用ハイブリッドシリコーン組成物
US8728345B2 (en) * 2011-12-19 2014-05-20 Momentive Performance Materials Inc. Epoxy-containing polysiloxane oligomer compositions, process for making same and uses thereof
JP6095310B2 (ja) * 2012-09-27 2017-03-15 株式会社タムラ製作所 硬化性白色樹脂組成物
CN103122068B (zh) * 2012-12-25 2015-07-08 中山大学 一种uv涂料用聚酰亚胺丙烯酸酯低聚物
JP6471493B2 (ja) * 2014-12-25 2019-02-20 東洋インキＳｃホールディングス株式会社 活性エネルギー線重合性樹脂組成物及び積層体
JP6528062B2 (ja) * 2015-02-17 2019-06-12 協立化学産業株式会社 半導体用光硬化性封止材及びその製造方法
CN111413848B (zh) * 2019-01-05 2022-10-28 郑州大学 一种有机硅改性丙烯酸酯类光刻胶及其制备方法
CN112430408A (zh) * 2020-11-27 2021-03-02 广州麦普实业有限公司 一种辐射固化墨水及应用
CN113174230B (zh) * 2021-04-23 2022-10-11 山东理工大学 一种用于布料激光焊接的硅溶胶树脂及其制备方法和应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018707B2 (ja) * 1974-10-09 1985-05-11 日本原子力研究所 防曇性被覆用硬化性樹脂組成物
JPS5643352A (en) * 1979-09-17 1981-04-22 Shin Etsu Chem Co Ltd Photocurable organopolysiloxane composition
US4348462A (en) * 1980-07-11 1982-09-07 General Electric Company Abrasion resistant ultraviolet light curable hard coating compositions
US4478876A (en) * 1980-12-18 1984-10-23 General Electric Company Process of coating a substrate with an abrasion resistant ultraviolet curable composition
US4486504A (en) * 1982-03-19 1984-12-04 General Electric Company Solventless, ultraviolet radiation-curable silicone coating compositions
JP2545867B2 (ja) * 1987-07-15 1996-10-23 日本合成ゴム株式会社 光硬化性樹脂組成物
US5128391A (en) * 1988-02-24 1992-07-07 Borden, Inc. Extensible and pasteurizable radiation curable coating for metal containing organofunctional silane adhesion promoter
US5221560A (en) * 1989-02-17 1993-06-22 Swedlow, Inc. Radiation-curable coating compositions that form transparent, abrasion resistant tintable coatings

Also Published As

Publication number Publication date
DK0549228T3 (da) 1996-10-14
EP0549228B1 (en) 1996-08-28
DE69213193T2 (de) 1997-01-23
JPH05202146A (ja) 1993-08-10
ATE141932T1 (de) 1996-09-15
DE69213193D1 (de) 1996-10-02
EP0549228A2 (en) 1993-06-30
EP0549228A3 (en) 1993-09-22
US5629358A (en) 1997-05-13

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