ES2071055T3 - Procedimiento de deposito de capas finas. - Google Patents
Procedimiento de deposito de capas finas.Info
- Publication number
- ES2071055T3 ES2071055T3 ES90402153T ES90402153T ES2071055T3 ES 2071055 T3 ES2071055 T3 ES 2071055T3 ES 90402153 T ES90402153 T ES 90402153T ES 90402153 T ES90402153 T ES 90402153T ES 2071055 T3 ES2071055 T3 ES 2071055T3
- Authority
- ES
- Spain
- Prior art keywords
- fine layer
- layer deposit
- deposit procedure
- deposition
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
Abstract
LA INVENCION SE REFIERE A UN PROCEDIMIENTO PARA DEPOSITAR CAPAS DELGADAS POR PLASMA CVD. SE CARACTERIZA POR UTILIZAR COMO ELECTRODO PARA CREAR LA DESCARGA, EL SUBSTRATO (4) MISMO QUE PREVIAMENTE SE HA HECHO CONDUCTOR POR EL DEPOSITO DE CAPAS CONDUCTORAS (5), LA TECNICA ES APLICABLE EN ESPECIAL AL DEPOSITO DE CAPAS ORGANO-SILICICAS SOBRE PLCAS DE VIDRIO DE GRANDES DIMENSIONES.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8910870A FR2650822B1 (fr) | 1989-08-14 | 1989-08-14 | Procede de depot de couches minces |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2071055T3 true ES2071055T3 (es) | 1995-06-16 |
Family
ID=9384698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES90402153T Expired - Lifetime ES2071055T3 (es) | 1989-08-14 | 1990-07-26 | Procedimiento de deposito de capas finas. |
Country Status (7)
Country | Link |
---|---|
US (1) | US5206060A (es) |
EP (1) | EP0413617B1 (es) |
JP (1) | JP3165143B2 (es) |
AT (1) | ATE120439T1 (es) |
DE (1) | DE69018159T2 (es) |
ES (1) | ES2071055T3 (es) |
FR (1) | FR2650822B1 (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NO931606L (no) * | 1992-05-26 | 1993-11-29 | Saint Gobain Vitrage | Vindusplate med en funksjonell film |
FR2701474B1 (fr) * | 1993-02-11 | 1995-03-31 | Saint Gobain Vitrage Int | Vitrage muni d'une couche fonctionnelle. |
US5354583A (en) * | 1992-11-09 | 1994-10-11 | Martin Marietta Energy Systems, Inc. | Apparatus and method for selective area deposition of thin films on electrically biased substrates |
JPH06326026A (ja) * | 1993-04-13 | 1994-11-25 | Applied Materials Inc | 半導体装置の薄膜形成方法 |
US5571571A (en) * | 1993-06-16 | 1996-11-05 | Applied Materials, Inc. | Method of forming a thin film for a semiconductor device |
US5508368A (en) * | 1994-03-03 | 1996-04-16 | Diamonex, Incorporated | Ion beam process for deposition of highly abrasion-resistant coatings |
US5888593A (en) * | 1994-03-03 | 1999-03-30 | Monsanto Company | Ion beam process for deposition of highly wear-resistant optical coatings |
US5846649A (en) * | 1994-03-03 | 1998-12-08 | Monsanto Company | Highly durable and abrasion-resistant dielectric coatings for lenses |
US6077567A (en) * | 1997-08-15 | 2000-06-20 | University Of Cincinnati | Method of making silica coated steel substrates |
FI20070991L (fi) * | 2007-12-19 | 2009-06-20 | Beneq Oy | Lasituote, tuotteen käyttö ja valmistusmenetelmä |
JP5015046B2 (ja) | 2008-03-17 | 2012-08-29 | 株式会社リコー | 情報処理装置及び情報処理方法 |
WO2013079798A1 (en) * | 2011-12-01 | 2013-06-06 | Beneq Oy | Surface treatment apparatus and method |
CN107056085B (zh) * | 2017-06-08 | 2023-09-05 | 东莞鑫泰玻璃科技有限公司 | 一种烤箱用隔热玻璃及其制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1542299A (en) * | 1976-03-23 | 1979-03-14 | Warner Lambert Co | Blade shields |
GB1582231A (en) * | 1976-08-13 | 1981-01-07 | Nat Res Dev | Application of a layer of carbonaceous material to a surface |
DE2847620C2 (de) * | 1978-11-02 | 1984-10-18 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur Herstellung von elektrischen Bauelementen, insbesondere Schichtkondensatoren |
CA1141020A (en) * | 1979-10-19 | 1983-02-08 | Slawomir W. Sapieha | Electrets from plasma polymerized material |
JPS58222438A (ja) * | 1982-06-18 | 1983-12-24 | Tdk Corp | 磁気記録媒体 |
JPS60163901A (ja) * | 1984-02-04 | 1985-08-26 | Japan Synthetic Rubber Co Ltd | プラズマ重合処理方法 |
EP0154814A3 (en) * | 1984-03-16 | 1987-08-26 | American Cyanamid Company | Substrates coated by plasma enhanced chemical vapor deposition, apparatus and process for their production |
US4693927A (en) * | 1984-03-19 | 1987-09-15 | Fuji Photo Film Company Limited | Magnetic recording medium and process for producing the same |
US4612207A (en) * | 1985-01-14 | 1986-09-16 | Xerox Corporation | Apparatus and process for the fabrication of large area thin film multilayers |
FR2591587A1 (fr) * | 1985-12-17 | 1987-06-19 | Saint Gobain Vitrage | Film organo-mineral depose sur un substrat en verre eventuellement revetu d'une ou plusieurs couches metalliques minces. |
DE3624467A1 (de) * | 1986-07-19 | 1988-01-28 | Leybold Heraeus Gmbh & Co Kg | Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen |
JPH01195285A (ja) * | 1988-01-29 | 1989-08-07 | Stanley Electric Co Ltd | メタライズガラス基板の製造方法 |
-
1989
- 1989-08-14 FR FR8910870A patent/FR2650822B1/fr not_active Expired - Fee Related
-
1990
- 1990-07-26 EP EP90402153A patent/EP0413617B1/fr not_active Expired - Lifetime
- 1990-07-26 ES ES90402153T patent/ES2071055T3/es not_active Expired - Lifetime
- 1990-07-26 AT AT90402153T patent/ATE120439T1/de not_active IP Right Cessation
- 1990-07-26 DE DE69018159T patent/DE69018159T2/de not_active Expired - Fee Related
- 1990-08-09 US US07/565,295 patent/US5206060A/en not_active Expired - Lifetime
- 1990-08-13 JP JP21174390A patent/JP3165143B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3165143B2 (ja) | 2001-05-14 |
FR2650822A1 (fr) | 1991-02-15 |
DE69018159D1 (de) | 1995-05-04 |
US5206060A (en) | 1993-04-27 |
DE69018159T2 (de) | 1995-10-26 |
FR2650822B1 (fr) | 1993-01-08 |
JPH03183781A (ja) | 1991-08-09 |
ATE120439T1 (de) | 1995-04-15 |
EP0413617A1 (fr) | 1991-02-20 |
EP0413617B1 (fr) | 1995-03-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES2071055T3 (es) | Procedimiento de deposito de capas finas. | |
ATE404904T1 (de) | Elektrochrome vorrichtungen | |
GB2363131B (en) | Soil-resistant coating for glass surfaces | |
WO1987007651A1 (en) | Semiconductor manufacturing apparatus | |
TW352471B (en) | Method for preventing B-P-Si glass from subsiding | |
JPS64263A (en) | Method for forming high resistance layer by cathode sputtering and device therefor | |
ES8505838A1 (es) | Un metodo perfeccionado de depositar una pelicula electricamente conductora, delgada y transmisora de la luz | |
JPS6461376A (en) | Component member for semiconductor production | |
KR970077471A (ko) | 오염물 격납층을 구비한 기질 지지 척 및 그 제작 방법 | |
IT1204006B (it) | Procedimento per la preparazione di film poliolefinici metallizzabili | |
DK144585A (da) | Fremgangsmaade til overtraekning ved fremstilling af ikke-iriserende glasstruktur | |
TW353152B (en) | Method of producing liquid crystal display device | |
IT1211938B (it) | Apparecchiatura e procedimento per la deposizione di uno strato sottile su un substrato trasparente, particolarmente per la realizzazione di vetrature | |
SE8205395D0 (sv) | Method and apparatus for the vapor deposition of material upon a substrate | |
EP0132322A3 (en) | Thermal crackers for forming pnictide films in high vacuum processes | |
GB2414018A (en) | Deposition of layers on substrates | |
GB2260342B (en) | Process for the selective deposition of thin diamond film by chemical vapour deposition | |
DE69325034D1 (de) | Unterdruckhaltevorrichtung für substrate mit keramischer vakuumspannplatte | |
PT95435A (pt) | Processo de producao de uma pelicula depositada e de um dispositivo semicondutor | |
JPS6455382A (en) | Apparatus for forming uniform layer on substrate by cathodic sputtering | |
JPS5710224A (en) | Forming method for silicone single crystalline film | |
JPS55130841A (en) | Increasing method of adhesive strength between photoresist film and glass | |
SI0891872T1 (en) | Process for obtaining a pattern on a transparent substrat | |
JPS5530172A (en) | Forming conductive layers on glass | |
BR8105449A (pt) | Processo de remocao de revestimentos eletrocondutivos a partir de eletrodos com nucleos metalicos |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
Ref document number: 413617 Country of ref document: ES |