ES2041765T3 - Soluciones de bano y procedimiento para eliminar capas de plomo/estano, plomo o estano de superficies de cobre o niquel. - Google Patents

Soluciones de bano y procedimiento para eliminar capas de plomo/estano, plomo o estano de superficies de cobre o niquel.

Info

Publication number
ES2041765T3
ES2041765T3 ES198888118274T ES88118274T ES2041765T3 ES 2041765 T3 ES2041765 T3 ES 2041765T3 ES 198888118274 T ES198888118274 T ES 198888118274T ES 88118274 T ES88118274 T ES 88118274T ES 2041765 T3 ES2041765 T3 ES 2041765T3
Authority
ES
Spain
Prior art keywords
lead
stane
copper
layers
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198888118274T
Other languages
English (en)
Inventor
Gunter Mika
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RUWEL-WERKE SPEZIALFABRIK fur LEITERPLATTEN GmbH
Original Assignee
RUWEL-WERKE SPEZIALFABRIK fur LEITERPLATTEN GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RUWEL-WERKE SPEZIALFABRIK fur LEITERPLATTEN GmbH filed Critical RUWEL-WERKE SPEZIALFABRIK fur LEITERPLATTEN GmbH
Application granted granted Critical
Publication of ES2041765T3 publication Critical patent/ES2041765T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Chemically Coating (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

LA PATENTE AFECTA A UNA SOLUCION CAUSTICA PARA LA ELIMINACION DE CAPAS DE PLOMO, ESTAÑO O PLOMO Y ESTAÑO APLICADAS SOBRE SUPERFICIES DE COBRE O NIQUEL. LA SOLUCION CAUSTICA CONSTA DE ACIDO NITRICO FUMANTE Y CONTIENE UNO O VARIOS INHIBIDORES COMO PLIMEROS DE BLOQUE DE PROPILENOXIDO Y ETILENOXIDO O POLIETILENGLICOLES Y/O POLIOLES CON UN PESO MOLECULAR MAYOR DE 2000.
ES198888118274T 1987-11-11 1988-11-03 Soluciones de bano y procedimiento para eliminar capas de plomo/estano, plomo o estano de superficies de cobre o niquel. Expired - Lifetime ES2041765T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873738307 DE3738307A1 (de) 1987-11-11 1987-11-11 Badloesungen und verfahren zum entfernen von blei/zinn-, blei- bzw. zinnschichten auf kupfer- oder nickeloberflaechen

Publications (1)

Publication Number Publication Date
ES2041765T3 true ES2041765T3 (es) 1993-12-01

Family

ID=6340281

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198888118274T Expired - Lifetime ES2041765T3 (es) 1987-11-11 1988-11-03 Soluciones de bano y procedimiento para eliminar capas de plomo/estano, plomo o estano de superficies de cobre o niquel.

Country Status (9)

Country Link
US (1) US4919752A (es)
EP (1) EP0315891B1 (es)
JP (1) JPH01156481A (es)
AT (1) ATE76663T1 (es)
CA (1) CA1313611C (es)
DE (1) DE3738307A1 (es)
DK (1) DK627788A (es)
ES (1) ES2041765T3 (es)
GB (1) GB2212112A (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4921571A (en) * 1989-07-28 1990-05-01 Macdermid, Incorporated Inhibited composition and method for stripping tin, lead or tin-lead alloy from copper surfaces
US5017267A (en) * 1990-07-17 1991-05-21 Macdermid, Incorporated Composition and method for stripping tin or tin-lead alloy from copper surfaces
US5244539A (en) * 1992-01-27 1993-09-14 Ardrox, Inc. Composition and method for stripping films from printed circuit boards
CA2090349C (en) * 1992-03-04 1999-08-17 John L. Cordani Composition and method for stripping tin or tin-lead alloy from copper surfaces
US5755950A (en) * 1995-06-07 1998-05-26 Dulin Metals Company Process for removing plating materials from copper-based substrates
JPH1072682A (ja) * 1996-08-30 1998-03-17 Mec Kk 錫および錫合金の剥離液
JP3345569B2 (ja) * 1997-07-14 2002-11-18 株式会社キッツ バルブ・管継手等の銅合金製配管器材の鉛溶出防止法及びその銅合金製配管器材
US6258294B1 (en) 1997-10-01 2001-07-10 Morton International, Inc. Composition for stripping solder and tin from printed circuit boards
EP1302569A3 (en) * 2001-10-11 2004-03-03 Shipley Co. L.L.C. Stripping solution
US7771542B1 (en) 2006-05-30 2010-08-10 Stone Chemical Company Compositions and methods for removing lead from metal surfaces
US8859479B2 (en) 2011-08-26 2014-10-14 United Technologies Corporation Chemical stripping composition and method
TWI521097B (zh) * 2014-06-25 2016-02-11 優勝奈米科技有限公司 剝錫添加劑及其應用
CN114453587B (zh) * 2021-12-31 2024-02-27 西安理工大学 纳米多孔铜镍合金的制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU38281A1 (es) * 1959-03-09
US3607781A (en) * 1968-01-15 1971-09-21 Wyandotte Chemicals Corp Corrosion inhibitor for hydrochloric acid pickling of steel
US3677949A (en) * 1970-09-04 1972-07-18 Enthone Selectively stripping tin and/or lead from copper substrates
US3922229A (en) * 1973-11-12 1975-11-25 Dow Chemical Co Powderless etching bath for magnesium printing plates
DE2824975A1 (de) * 1978-06-07 1979-12-20 Basf Ag Verwendung von wasserloeslichen, vernetzten stickstoffhaltigen kondensationsprodukten als zusatz fuer beiz-, polier- und entmetallisierungsbaeder
US4297257A (en) * 1980-04-17 1981-10-27 Dart Industries Inc. Metal stripping composition and method
JPS57164984A (en) * 1981-04-06 1982-10-09 Metsuku Kk Exfoliating solution for tin or tin alloy
US4397753A (en) * 1982-09-20 1983-08-09 Circuit Chemistry Corporation Solder stripping solution
JPS60149790A (ja) * 1984-01-18 1985-08-07 Metsuku Kk 錫又は錫合金の剥離液
US4713144A (en) * 1986-08-01 1987-12-15 Ardrox Inc. Composition and method for stripping films from printed circuit boards

Also Published As

Publication number Publication date
JPH0450390B2 (es) 1992-08-14
ATE76663T1 (de) 1992-06-15
DK627788D0 (da) 1988-11-10
JPH01156481A (ja) 1989-06-20
DE3738307C2 (es) 1993-04-22
GB8825828D0 (en) 1988-12-07
CA1313611C (en) 1993-02-16
EP0315891B1 (de) 1992-05-27
GB2212112A (en) 1989-07-19
DE3738307A1 (de) 1989-05-24
DK627788A (da) 1989-05-12
US4919752A (en) 1990-04-24
EP0315891A1 (de) 1989-05-17

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