EP4317536A4 - Matériau plaqué argent et son procédé de fabrication - Google Patents
Matériau plaqué argent et son procédé de fabricationInfo
- Publication number
- EP4317536A4 EP4317536A4 EP22832665.8A EP22832665A EP4317536A4 EP 4317536 A4 EP4317536 A4 EP 4317536A4 EP 22832665 A EP22832665 A EP 22832665A EP 4317536 A4 EP4317536 A4 EP 4317536A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- silver
- manufacturing same
- plated material
- plated
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021107489A JP7749358B2 (ja) | 2021-06-29 | 2021-06-29 | 銀めっき材およびその製造方法 |
| PCT/JP2022/021697 WO2023276507A1 (fr) | 2021-06-29 | 2022-05-27 | Matériau plaqué argent et son procédé de fabrication |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP4317536A1 EP4317536A1 (fr) | 2024-02-07 |
| EP4317536A4 true EP4317536A4 (fr) | 2025-04-23 |
Family
ID=84691269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP22832665.8A Pending EP4317536A4 (fr) | 2021-06-29 | 2022-05-27 | Matériau plaqué argent et son procédé de fabrication |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240287697A1 (fr) |
| EP (1) | EP4317536A4 (fr) |
| JP (1) | JP7749358B2 (fr) |
| CN (1) | CN117529581A (fr) |
| MX (1) | MX2023015085A (fr) |
| WO (1) | WO2023276507A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117512725B (zh) * | 2023-11-07 | 2024-06-25 | 东莞市贝沃金属有限公司 | 用于大电流保险管的锡锌线镀银工艺 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2429970A (en) * | 1944-01-11 | 1947-10-28 | Du Pont | Silver plating |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4247372A (en) * | 1978-08-29 | 1981-01-27 | Learonal, Inc. | Silver plating |
| JPS5743995A (en) * | 1980-08-27 | 1982-03-12 | Sumitomo Electric Ind Ltd | Silver plating liquid and silver plating method |
| KR101074744B1 (ko) | 2002-11-28 | 2011-10-19 | 신꼬오덴기 고교 가부시키가이샤 | 전해 은도금액 |
| JP2009079250A (ja) | 2007-09-26 | 2009-04-16 | Dowa Metaltech Kk | 最表層として銀合金層が形成された銅または銅合金部材およびその製造方法 |
| EP2431501B1 (fr) * | 2010-09-21 | 2013-11-20 | Rohm and Haas Electronic Materials LLC | Procédé de dépôt électrique d'argent sur du nickel |
| US8980077B2 (en) | 2012-03-30 | 2015-03-17 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| WO2016121312A1 (fr) | 2015-01-30 | 2016-08-04 | Dowaメタルテック株式会社 | Élément plaqué d'argent et procédé pour la fabrication de ce dernier |
| EP4083270A4 (fr) * | 2020-02-25 | 2023-12-20 | Dowa Metaltech Co., Ltd. | Matériau plaqué argent, et procédé de fabrication de celui-ci |
| JP6916971B1 (ja) * | 2020-09-15 | 2021-08-11 | Dowaメタルテック株式会社 | 銀めっき材およびその製造方法 |
-
2021
- 2021-06-29 JP JP2021107489A patent/JP7749358B2/ja active Active
-
2022
- 2022-05-27 WO PCT/JP2022/021697 patent/WO2023276507A1/fr not_active Ceased
- 2022-05-27 CN CN202280040124.5A patent/CN117529581A/zh active Pending
- 2022-05-27 US US18/572,459 patent/US20240287697A1/en active Pending
- 2022-05-27 MX MX2023015085A patent/MX2023015085A/es unknown
- 2022-05-27 EP EP22832665.8A patent/EP4317536A4/fr active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2429970A (en) * | 1944-01-11 | 1947-10-28 | Du Pont | Silver plating |
Non-Patent Citations (2)
| Title |
|---|
| AUGUSTIN ARUN ET AL: "Effect of current density during electrodeposition on microstructure and hardness of textured Cu coating in the application of antimicrobial Al touch surface", JOURNAL OF THE MECHANICAL BEHAVIOR OF BIOMEDICAL MATERIALS, ELSEVIER, AMSTERDAM, NL, vol. 63, 15 July 2016 (2016-07-15), pages 352 - 360, XP029680237, ISSN: 1751-6161, DOI: 10.1016/J.JMBBM.2016.07.013 * |
| See also references of WO2023276507A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7749358B2 (ja) | 2025-10-06 |
| CN117529581A (zh) | 2024-02-06 |
| WO2023276507A1 (fr) | 2023-01-05 |
| MX2023015085A (es) | 2024-01-18 |
| JP2023005513A (ja) | 2023-01-18 |
| US20240287697A1 (en) | 2024-08-29 |
| EP4317536A1 (fr) | 2024-02-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
| 17P | Request for examination filed |
Effective date: 20231023 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| DAV | Request for validation of the european patent (deleted) | ||
| DAX | Request for extension of the european patent (deleted) | ||
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20250324 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 5/00 20060101ALI20250318BHEP Ipc: H01R 13/03 20060101ALI20250318BHEP Ipc: C25D 7/00 20060101ALI20250318BHEP Ipc: C25D 5/12 20060101ALI20250318BHEP Ipc: C25D 3/46 20060101AFI20250318BHEP |
|
| GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: GRANT OF PATENT IS INTENDED |