EP4317536A4 - SILVER-PLATED MATERIAL AND METHOD FOR MANUFACTURING SAME - Google Patents

SILVER-PLATED MATERIAL AND METHOD FOR MANUFACTURING SAME

Info

Publication number
EP4317536A4
EP4317536A4 EP22832665.8A EP22832665A EP4317536A4 EP 4317536 A4 EP4317536 A4 EP 4317536A4 EP 22832665 A EP22832665 A EP 22832665A EP 4317536 A4 EP4317536 A4 EP 4317536A4
Authority
EP
European Patent Office
Prior art keywords
silver
manufacturing same
plated material
plated
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP22832665.8A
Other languages
German (de)
French (fr)
Other versions
EP4317536A1 (en
EP4317536B1 (en
Inventor
Yutaro HIRAI
Kentaro Arai
Yosuke Sato
Eri FUNADA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Metaltech Co Ltd
Original Assignee
Dowa Metaltech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Metaltech Co Ltd filed Critical Dowa Metaltech Co Ltd
Publication of EP4317536A1 publication Critical patent/EP4317536A1/en
Publication of EP4317536A4 publication Critical patent/EP4317536A4/en
Application granted granted Critical
Publication of EP4317536B1 publication Critical patent/EP4317536B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/46—Electroplating: Baths therefor from solutions of silver
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
EP22832665.8A 2021-06-29 2022-05-27 Silver-plated material and method for manufacturing same Active EP4317536B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021107489A JP7749358B2 (en) 2021-06-29 2021-06-29 Silver-plated material and its manufacturing method
PCT/JP2022/021697 WO2023276507A1 (en) 2021-06-29 2022-05-27 Silver-plated material and method for manufacturing same

Publications (3)

Publication Number Publication Date
EP4317536A1 EP4317536A1 (en) 2024-02-07
EP4317536A4 true EP4317536A4 (en) 2025-04-23
EP4317536B1 EP4317536B1 (en) 2026-02-25

Family

ID=84691269

Family Applications (1)

Application Number Title Priority Date Filing Date
EP22832665.8A Active EP4317536B1 (en) 2021-06-29 2022-05-27 Silver-plated material and method for manufacturing same

Country Status (6)

Country Link
US (1) US20240287697A1 (en)
EP (1) EP4317536B1 (en)
JP (1) JP7749358B2 (en)
CN (1) CN117529581A (en)
MX (1) MX2023015085A (en)
WO (1) WO2023276507A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119301312A (en) * 2022-03-31 2025-01-10 同和金属技术有限公司 Silver-plated material and method for producing the same
CN117512725B (en) * 2023-11-07 2024-06-25 东莞市贝沃金属有限公司 Tin-zinc wire silver plating process for high-current fuse

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2429970A (en) * 1944-01-11 1947-10-28 Du Pont Silver plating

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247372A (en) * 1978-08-29 1981-01-27 Learonal, Inc. Silver plating
JPS5743995A (en) * 1980-08-27 1982-03-12 Sumitomo Electric Ind Ltd Silver plating liquid and silver plating method
KR101074744B1 (en) * 2002-11-28 2011-10-19 신꼬오덴기 고교 가부시키가이샤 Electrolytic silver plating solution
JP2009079250A (en) 2007-09-26 2009-04-16 Dowa Metaltech Kk Copper or copper alloy member having silver alloy layer formed as outermost surface layer, and manufacturing method therefor
SG179381A1 (en) * 2010-09-21 2012-04-27 Rohm & Haas Elect Mat Method of electroplating silver strike over nickel
US8980077B2 (en) * 2012-03-30 2015-03-17 Rohm And Haas Electronic Materials Llc Plating bath and method
US9074681B2 (en) * 2012-11-20 2015-07-07 United Technologies Corporation Hardened silver coated journal bearing surfaces and method
WO2016121312A1 (en) * 2015-01-30 2016-08-04 Ｄｏｗａメタルテック株式会社 Silver-plated member and method for manufacturing same
US12297556B2 (en) * 2020-02-25 2025-05-13 Dowa Metaltech Co., Ltd. Silver-plated product and method for producing same
JP6916971B1 (en) * 2020-09-15 2021-08-11 Ｄｏｗａメタルテック株式会社 Silver plating material and its manufacturing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2429970A (en) * 1944-01-11 1947-10-28 Du Pont Silver plating

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
AUGUSTIN ARUN ET AL: "Effect of current density during electrodeposition on microstructure and hardness of textured Cu coating in the application of antimicrobial Al touch surface", JOURNAL OF THE MECHANICAL BEHAVIOR OF BIOMEDICAL MATERIALS, ELSEVIER, AMSTERDAM, NL, vol. 63, 15 July 2016 (2016-07-15), pages 352 - 360, XP029680237, ISSN: 1751-6161, DOI: 10.1016/J.JMBBM.2016.07.013 *
See also references of WO2023276507A1 *

Also Published As

Publication number Publication date
JP7749358B2 (en) 2025-10-06
US20240287697A1 (en) 2024-08-29
MX2023015085A (en) 2024-01-18
JP2023005513A (en) 2023-01-18
WO2023276507A1 (en) 2023-01-05
CN117529581A (en) 2024-02-06
EP4317536A1 (en) 2024-02-07
EP4317536B1 (en) 2026-02-25

Similar Documents

Publication Publication Date Title
EP4104236A4 (en) ELECTROLYTE MATERIAL AND METHOD OF MANUFACTURE
EP4001148C0 (en) CONTAINER AND METHOD FOR MANUFACTURING SAME
EP4101021A4 (en) ELECTROLYTE MATERIAL AND METHOD FOR PRODUCTION
EP4250413A4 (en) ELECTRODE ARRANGEMENT AND METHOD FOR MANUFACTURING SAME
EP4710902A3 (en) ABSORBENT ARTICLES AND METHOD FOR THEIR MANUFACTURING
EP4251415C0 (en) COMPOSITE MATERIAL AND METHOD FOR PRODUCTION OF IT
EP4119497A4 (en) LIGHT-EMITTING MATERIAL AND METHOD FOR PRODUCING SAME
EP4300632A4 (en) POSITIVE ELECTRODE ACTIVE MATERIAL AND METHOD FOR PRODUCING SAME
EP3766436A4 (en) EMBOLIC MATERIAL AND METHOD OF MANUFACTURING THEREOF
EP4122620C0 (en) CAN BODY AND METHOD FOR MANUFACTURING SAME
EP4223479C0 (en) PACKAGING MATERIAL AND METHOD FOR MANUFACTURING SUCH PACKAGING MATERIAL
EP4252540A4 (en) TISSUE-SHAPED PROTEIN COMPONENT AND METHOD FOR THE PRODUCTION THEREOF
EP4215569C0 (en) PEEK MOLDED BODIES AND METHOD FOR THE PRODUCTION THEREOF
EP4144881A4 (en) ALLOY MATERIAL AND METHOD FOR PRODUCING THEREOF
EP4507010A4 (en) PACKAGING AND METHOD FOR MANUFACTURING THE PACKAGING
EP4467602A4 (en) RUBBER COMPOSITION AND METHOD FOR MANUFACTURING IT
EP4414058A4 (en) SEPARATOR AND METHOD FOR MANUFACTURING IT
EP4467687A4 (en) SILVER-PLATED MATERIAL AND METHOD FOR MANUFACTURING IT
EP4241796A4 (en) BIOCOMPATIBLE MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
EP4155264A4 (en) COMPOSITION AND METHOD FOR THE PRODUCTION THEREOF
EP4379863A4 (en) Negative Electrodeactive Material and Method for its Production
EP4535375A4 (en) ELECTRODE AND METHOD FOR MANUFACTURING THE ELECTRODE
EP4365973A4 (en) ELECTRODE AND METHOD FOR MANUFACTURING THE ELECTRODE
EP4220747A4 (en) ELECTRODE AND METHOD FOR MANUFACTURING THE ELECTRODE
EP4318666A4 (en) CATHODE ACTIVE MATERIAL AND METHOD FOR THE PRODUCTION THEREOF

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20231023

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DAV Request for validation of the european patent (deleted)
DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20250324

RIC1 Information provided on ipc code assigned before grant

Ipc: C25D 5/00 20060101ALI20250318BHEP

Ipc: H01R 13/03 20060101ALI20250318BHEP

Ipc: C25D 7/00 20060101ALI20250318BHEP

Ipc: C25D 5/12 20060101ALI20250318BHEP

Ipc: C25D 3/46 20060101AFI20250318BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20251105

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: CH

Ref legal event code: F10

Free format text: ST27 STATUS EVENT CODE: U-0-0-F10-F00 (AS PROVIDED BY THE NATIONAL OFFICE)

Effective date: 20260225

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602022031278

Country of ref document: DE

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20260225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260525

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20260522

Year of fee payment: 5

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260526

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260525

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1890898

Country of ref document: AT

Kind code of ref document: T

Effective date: 20260225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260625

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260625

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20260526

Year of fee payment: 5

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20260225