EP4267532A1 - Matériau céramique, poudre et système de couche - Google Patents
Matériau céramique, poudre et système de coucheInfo
- Publication number
- EP4267532A1 EP4267532A1 EP22702398.3A EP22702398A EP4267532A1 EP 4267532 A1 EP4267532 A1 EP 4267532A1 EP 22702398 A EP22702398 A EP 22702398A EP 4267532 A1 EP4267532 A1 EP 4267532A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- weight
- oxide
- material according
- ceramic material
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910010293 ceramic material Inorganic materials 0.000 title claims abstract description 31
- 239000000843 powder Substances 0.000 title claims description 8
- 239000010410 layer Substances 0.000 title description 27
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003381 stabilizer Substances 0.000 claims abstract description 22
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 claims abstract description 13
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 11
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 25
- 239000000919 ceramic Substances 0.000 claims description 22
- VQCBHWLJZDBHOS-UHFFFAOYSA-N erbium(iii) oxide Chemical compound O=[Er]O[Er]=O VQCBHWLJZDBHOS-UHFFFAOYSA-N 0.000 claims description 20
- 229910003454 ytterbium oxide Inorganic materials 0.000 claims description 11
- 229940075624 ytterbium oxide Drugs 0.000 claims description 11
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 10
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 10
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 9
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000002318 adhesion promoter Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 229910002080 8 mol% Y2O3 fully stabilized ZrO2 Inorganic materials 0.000 claims description 3
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 1
- 229910052702 rhenium Inorganic materials 0.000 claims 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- ZXGIFJXRQHZCGJ-UHFFFAOYSA-N erbium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Er+3].[Er+3] ZXGIFJXRQHZCGJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000006076 specific stabilizer Substances 0.000 abstract 1
- 229910000951 Aluminide Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/486—Fine ceramics
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62222—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3418—Silicon oxide, silicic acids or oxide forming salts thereof, e.g. silica sol, fused silica, silica fume, cristobalite, quartz or flint
Definitions
- the invention relates to a ceramic material and a powder that can be used for ceramic layer systems.
- Ceramics generally have a high temperature stability and are therefore often used as ceramic coatings on high-temperature components, such as for turbines, in particular for gas turbines.
- the object is achieved by a ceramic material according to claim 1, a ceramic powder according to claim 17 and a layer system according to claim 18.
- Ceramic layers based on zirconium oxide with stabilizers are known, with stabilized or fully stabilized zirconium oxide often being used here because of its better thermal stability.
- the aim of the idea is to use partially stabilized zirconium oxide with improved stability, in particular thermal stability, namely a ceramic material based on zirconium oxide (ZrCh), having: 1.0% by weight to 8.0% by weight Basic stabilizers: in particular with 2.0% to 8.0% by weight base stabilizers; yttrium oxide (Y2O3), and/or
- hafnium oxide HfCh
- Y2O3 yttrium oxide
- E ⁇ Ck erbium oxide
- Ytterbium oxide with a proportion of 0.2% by weight to 20.0% by weight, in particular with 1.0% by weight to 10.0% by weight, very particularly with 2.0% by weight to 9.0% by weight, and each optional aluminum oxide (AI2O3) 0.1% - 2.0%, and permitted impurity levels (each max.): calcium oxide (CaO) 0.1% - 0.2%,
- Iron oxide (Fe203) 0.1% - 0.2%
- Yttrium oxide (Y2O3) and hafnium oxide (HfCk) are preferably used as base stabilizers. Likewise, only yttrium oxide (Y2O3) can be used as a base stabilizer.
- the ceramic material preferably comprises 2.5% to 5.5% by weight yttrium oxide (Y2O3), in particular 3.0% to 5.0% by weight yttrium oxide (Y2O3), especially 3.5% to 4.0% by weight. % yttria (Y2O3) to achieve good phase stability.
- the ceramic material also preferably has hafnium oxide (HfO 2 ) > 2.0% by weight to 4.0% by weight, in particular 2.2% by weight to 4.0% by weight hafnium oxide (HfO 2 ), very particularly 2.4% by weight to 3 .0% by weight hafnium oxide (HfO2).
- hafnium oxide (HfO 2 ) content is 0.2% by weight to ⁇ 2.0% by weight, in particular 0.2% by weight to 1.8% by weight hafnium oxide (HfCk), especially 0 .2% by weight to 1.6% by weight of hafnium oxide (HfO 2 ).
- Secondary particles such as aluminum oxide (AI2O3) can be present with a proportion of 0.2% by weight to 1.5% by weight aluminum oxide (AI2O3), in particular from 0.2% by weight to 1.2% by weight.
- the proportion of aluminum oxide (AI2O3) can also be 1.5% by weight to 3.0% by weight aluminum oxide (AI2O3), in particular >2.0% by weight to 2.5% by weight aluminum oxide (AI2O3).
- ytterbium oxide (Yb 2 0 3) is preferably used as additional stabilizer.
- compositions are therefore Zr0 2 -Hf0 2 -Y 2 03-Yb 2 C>3 or also Zr0 2 -Hf0 2 -Y 2 03-Yb 2 03-Al 2 03.
- the weight of the additional stabilizers is preferably 5.5% by weight to 8.5% by weight ytterbium oxide (Yb 2 0 3) , in particular 6.0% by weight and to 8.0% by weight ytterbium oxide (Yb 2 0 3) , especially 6 .5% by weight to 7.5% by weight ytterbium oxide (Yb 2 0 3) , or
- a ceramic powder has, in particular, consists of a composition of a material according to the above lists with or without a binder.
- An advantageous layer system has a metallic sub strate, optionally a metallic adhesion promoter layer and at least one ceramic layer based on the ceramic material according to the invention.
- a metallic adhesion promoter layer between the ceramic mix layer and the metallic substrate is used for advantageous adhesion.
- a ceramic sub-layer (not the TGO) under the ceramic mix layer made of a ceramic material is at least 20% thinner and preferably has 8YSZ, ie with 3 mol% to 4 mol% yttria-stabilized zirconium oxide.
- Yttrium oxide is definitely used as a stabilizer.
- This ceramic material can be produced as a powder, so that further additives can be present, such as when using abrasive layers which have cubic boron nitride or other abrasive particles.
- a ceramic layer 10 is applied to metal, with nickel or cobalt-based superalloys preferably being used, a metallic adhesive layer 7 forming aluminum oxide being present in between.
- the metallic adhesion promoter layer is preferably an aluminide, platinum aluminide or represents a NiCoCrAl layer as the basis.
- the ceramic layer made of the ceramic material can be produced by means of EB-PVD, plasma spraying (APS, . . . ) and has a columnar structure or a DVC (dense decay cracked) structure.
- the layer 10 preferably has a layer thickness of 100 ⁇ m to 1000 ⁇ m.
- this ceramic layer 10 can also have a ceramic sub-layer 13 which clearly differs from the ceramic layer 16, ie has no Yb2Ü3 and/or no Er2 ⁇ 03.
- the layer thickness of the ceramic sub-layer 13 is at least 20% thinner than that of the ceramic material of the ceramic layer 16 according to the invention.
- the ceramic sub-layer has 8YSZ, i.e. with 3mol% to 4mol% yttrium-stabilized zirconium oxide.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Structural Engineering (AREA)
- Composite Materials (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Matériau céramique amélioré destiné à l'isolation thermique, obtenu au moyen de la sélection suivante de stabilisants spécifiques et des proportions adaptées : une base de dioxyde de zirconium (ZrO2) comprenant : 1,0 % en poids à 9,0 % en poids de stabilisants de base : de l'oxyde d'yttrium (Y2O3), de l'oxyde d'hafnium (HfO2), au moins de l'oxyde d'yttrium (Y2O3) étant utilisé, et au moins l'un des stabilisants supplémentaires : de l'oxyde d'erbium (Er2O3) et/ou de l'oxyde d'ytterbium (Yb2O3) selon une proportion de 0,2 % en poids à 20 % en poids.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102021201565.4A DE102021201565A1 (de) | 2021-02-18 | 2021-02-18 | Keramisches Material, Pulver sowie Schichtsystem |
PCT/EP2022/050634 WO2022174996A1 (fr) | 2021-02-18 | 2022-01-13 | Matériau céramique, poudre et système de couche |
Publications (1)
Publication Number | Publication Date |
---|---|
EP4267532A1 true EP4267532A1 (fr) | 2023-11-01 |
Family
ID=80225660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP22702398.3A Pending EP4267532A1 (fr) | 2021-02-18 | 2022-01-13 | Matériau céramique, poudre et système de couche |
Country Status (6)
Country | Link |
---|---|
US (1) | US20240109812A1 (fr) |
EP (1) | EP4267532A1 (fr) |
KR (1) | KR20230146058A (fr) |
CN (1) | CN116888089A (fr) |
DE (1) | DE102021201565A1 (fr) |
WO (1) | WO2022174996A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN115927995B (zh) * | 2022-12-26 | 2024-07-30 | 中国科学院赣江创新研究院 | 一种钨铜复合材料的热防护涂层及其制备方法和应用 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9617267D0 (en) * | 1996-08-16 | 1996-09-25 | Rolls Royce Plc | A metallic article having a thermal barrier coating and a method of application thereof |
US6887595B1 (en) * | 2003-12-30 | 2005-05-03 | General Electric Company | Thermal barrier coatings having lower layer for improved adherence to bond coat |
DE102017005800A1 (de) * | 2017-06-21 | 2018-12-27 | H.C. Starck Surface Technology and Ceramic Powders GmbH | Zirkoniumoxidpulver zum thermischen Spritzen |
DE102017223879A1 (de) | 2017-12-29 | 2019-07-04 | Siemens Aktiengesellschaft | Keramisches Material, Verfahren zur Herstellung, Schicht und Schichtsystem |
DE102018203895A1 (de) | 2018-03-14 | 2019-09-19 | Siemens Aktiengesellschaft | Keramisches Material, Schicht und Schichtsystem |
DE102018221940A1 (de) | 2018-12-17 | 2020-06-18 | Siemens Aktiengesellschaft | Keramisches Material, Schicht und Schichtsystem |
DE102019217445A1 (de) * | 2019-11-12 | 2021-05-12 | Siemens Aktiengesellschaft | Keramisches Material, Pulver sowie Schichtsystem |
-
2021
- 2021-02-18 DE DE102021201565.4A patent/DE102021201565A1/de not_active Withdrawn
-
2022
- 2022-01-13 US US18/277,072 patent/US20240109812A1/en active Pending
- 2022-01-13 CN CN202280015553.7A patent/CN116888089A/zh active Pending
- 2022-01-13 WO PCT/EP2022/050634 patent/WO2022174996A1/fr active Application Filing
- 2022-01-13 KR KR1020237031224A patent/KR20230146058A/ko unknown
- 2022-01-13 EP EP22702398.3A patent/EP4267532A1/fr active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2022174996A1 (fr) | 2022-08-25 |
CN116888089A (zh) | 2023-10-13 |
KR20230146058A (ko) | 2023-10-18 |
US20240109812A1 (en) | 2024-04-04 |
DE102021201565A1 (de) | 2022-08-18 |
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