EP4267532A1 - Keramisches material, pulver sowie schichtsystem - Google Patents
Keramisches material, pulver sowie schichtsystemInfo
- Publication number
- EP4267532A1 EP4267532A1 EP22702398.3A EP22702398A EP4267532A1 EP 4267532 A1 EP4267532 A1 EP 4267532A1 EP 22702398 A EP22702398 A EP 22702398A EP 4267532 A1 EP4267532 A1 EP 4267532A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- weight
- oxide
- material according
- ceramic material
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910010293 ceramic material Inorganic materials 0.000 title claims abstract description 31
- 239000000843 powder Substances 0.000 title claims description 8
- 239000010410 layer Substances 0.000 title description 27
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003381 stabilizer Substances 0.000 claims abstract description 22
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 claims abstract description 13
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 11
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 25
- 239000000919 ceramic Substances 0.000 claims description 22
- VQCBHWLJZDBHOS-UHFFFAOYSA-N erbium(iii) oxide Chemical compound O=[Er]O[Er]=O VQCBHWLJZDBHOS-UHFFFAOYSA-N 0.000 claims description 20
- 229910003454 ytterbium oxide Inorganic materials 0.000 claims description 11
- 229940075624 ytterbium oxide Drugs 0.000 claims description 11
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 10
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 10
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 9
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000002318 adhesion promoter Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 229910002080 8 mol% Y2O3 fully stabilized ZrO2 Inorganic materials 0.000 claims description 3
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 1
- 229910052702 rhenium Inorganic materials 0.000 claims 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- ZXGIFJXRQHZCGJ-UHFFFAOYSA-N erbium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Er+3].[Er+3] ZXGIFJXRQHZCGJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000006076 specific stabilizer Substances 0.000 abstract 1
- 229910000951 Aluminide Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/486—Fine ceramics
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62222—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3418—Silicon oxide, silicic acids, or oxide forming salts thereof, e.g. silica sol, fused silica, silica fume, cristobalite, quartz or flint
Definitions
- the invention relates to a ceramic material and a powder that can be used for ceramic layer systems.
- Ceramics generally have a high temperature stability and are therefore often used as ceramic coatings on high-temperature components, such as for turbines, in particular for gas turbines.
- the object is achieved by a ceramic material according to claim 1, a ceramic powder according to claim 17 and a layer system according to claim 18.
- Ceramic layers based on zirconium oxide with stabilizers are known, with stabilized or fully stabilized zirconium oxide often being used here because of its better thermal stability.
- the aim of the idea is to use partially stabilized zirconium oxide with improved stability, in particular thermal stability, namely a ceramic material based on zirconium oxide (ZrCh), having: 1.0% by weight to 8.0% by weight Basic stabilizers: in particular with 2.0% to 8.0% by weight base stabilizers; yttrium oxide (Y2O3), and/or
- hafnium oxide HfCh
- Y2O3 yttrium oxide
- E ⁇ Ck erbium oxide
- Ytterbium oxide with a proportion of 0.2% by weight to 20.0% by weight, in particular with 1.0% by weight to 10.0% by weight, very particularly with 2.0% by weight to 9.0% by weight, and each optional aluminum oxide (AI2O3) 0.1% - 2.0%, and permitted impurity levels (each max.): calcium oxide (CaO) 0.1% - 0.2%,
- Iron oxide (Fe203) 0.1% - 0.2%
- Yttrium oxide (Y2O3) and hafnium oxide (HfCk) are preferably used as base stabilizers. Likewise, only yttrium oxide (Y2O3) can be used as a base stabilizer.
- the ceramic material preferably comprises 2.5% to 5.5% by weight yttrium oxide (Y2O3), in particular 3.0% to 5.0% by weight yttrium oxide (Y2O3), especially 3.5% to 4.0% by weight. % yttria (Y2O3) to achieve good phase stability.
- the ceramic material also preferably has hafnium oxide (HfO 2 ) > 2.0% by weight to 4.0% by weight, in particular 2.2% by weight to 4.0% by weight hafnium oxide (HfO 2 ), very particularly 2.4% by weight to 3 .0% by weight hafnium oxide (HfO2).
- hafnium oxide (HfO 2 ) content is 0.2% by weight to ⁇ 2.0% by weight, in particular 0.2% by weight to 1.8% by weight hafnium oxide (HfCk), especially 0 .2% by weight to 1.6% by weight of hafnium oxide (HfO 2 ).
- Secondary particles such as aluminum oxide (AI2O3) can be present with a proportion of 0.2% by weight to 1.5% by weight aluminum oxide (AI2O3), in particular from 0.2% by weight to 1.2% by weight.
- the proportion of aluminum oxide (AI2O3) can also be 1.5% by weight to 3.0% by weight aluminum oxide (AI2O3), in particular >2.0% by weight to 2.5% by weight aluminum oxide (AI2O3).
- ytterbium oxide (Yb 2 0 3) is preferably used as additional stabilizer.
- compositions are therefore Zr0 2 -Hf0 2 -Y 2 03-Yb 2 C>3 or also Zr0 2 -Hf0 2 -Y 2 03-Yb 2 03-Al 2 03.
- the weight of the additional stabilizers is preferably 5.5% by weight to 8.5% by weight ytterbium oxide (Yb 2 0 3) , in particular 6.0% by weight and to 8.0% by weight ytterbium oxide (Yb 2 0 3) , especially 6 .5% by weight to 7.5% by weight ytterbium oxide (Yb 2 0 3) , or
- a ceramic powder has, in particular, consists of a composition of a material according to the above lists with or without a binder.
- An advantageous layer system has a metallic sub strate, optionally a metallic adhesion promoter layer and at least one ceramic layer based on the ceramic material according to the invention.
- a metallic adhesion promoter layer between the ceramic mix layer and the metallic substrate is used for advantageous adhesion.
- a ceramic sub-layer (not the TGO) under the ceramic mix layer made of a ceramic material is at least 20% thinner and preferably has 8YSZ, ie with 3 mol% to 4 mol% yttria-stabilized zirconium oxide.
- Yttrium oxide is definitely used as a stabilizer.
- This ceramic material can be produced as a powder, so that further additives can be present, such as when using abrasive layers which have cubic boron nitride or other abrasive particles.
- a ceramic layer 10 is applied to metal, with nickel or cobalt-based superalloys preferably being used, a metallic adhesive layer 7 forming aluminum oxide being present in between.
- the metallic adhesion promoter layer is preferably an aluminide, platinum aluminide or represents a NiCoCrAl layer as the basis.
- the ceramic layer made of the ceramic material can be produced by means of EB-PVD, plasma spraying (APS, . . . ) and has a columnar structure or a DVC (dense decay cracked) structure.
- the layer 10 preferably has a layer thickness of 100 ⁇ m to 1000 ⁇ m.
- this ceramic layer 10 can also have a ceramic sub-layer 13 which clearly differs from the ceramic layer 16, ie has no Yb2Ü3 and/or no Er2 ⁇ 03.
- the layer thickness of the ceramic sub-layer 13 is at least 20% thinner than that of the ceramic material of the ceramic layer 16 according to the invention.
- the ceramic sub-layer has 8YSZ, i.e. with 3mol% to 4mol% yttrium-stabilized zirconium oxide.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
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Abstract
Durch die Auswahl von bestimmten Stabilisatoren und einen angepassten Anteil wird ein verbessertes keramisches Material zur Wärmedämmung erzielt: Basis von Zirkonoxid (ZrO2) aufweisend : 1,0Gew.% bis 9,0Gew.% Basis-Stabilisatoren: Yttriumoxid (Y2O3), Hafniumoxid (HfO2) wobei zumindest Yttriumoxid (Y2O3) verwendet wird, sowie zumindest einer der Zusatz-Stabilisatoren: Erbiumoxid (Er2O3) und/ oder Ytterbiumoxid (Yb2O3) mit einem Anteil von 0,2Gew.% bis 20Gew.%.
Description
Beschreibung
Keramisches Material, Pulver sowie Schichtsystem
Die Erfindung betrifft ein keramisches Material und ein Pul ver, das für keramische Schichtsysteme verwendet werden kann.
Keramiken weisen im Allgemeinen eine hohe Temperaturstabili tät auf und werden daher oft als keramische Beschichtungen auf Hochtemperaturbauteilen, wie für Turbinen, insbesondere für Gasturbinen verwendet.
Es ist das stetige Bestreben die Wärmedämmeigenschaften des keramischen Materials zu verbessern.
Es ist daher Aufgabe der Erfindung oben genannte Aufgabe zu lösen.
Die Aufgabe wird gelöst durch ein keramisches Material nach Anspruch 1, ein keramisches Pulver nach Anspruch 17 und ein Schichtsystem nach Anspruch 18.
Keramische Schichten auf der Basis Zirkonoxid mit Stabilisa toren sind bekannt, wobei hier oft stabilisiertes oder voll stabilisiertes Zirkonoxid aufgrund seiner besseren thermi schen Stabilität verwendet wird.
Ziel der Idee ist es aber, teilstabilisiertes Zirkonoxid mit einer verbesserten, insbesondere thermischen Stabilität zu verwenden, nämlich ein keramisches Material auf der Basis von Zirkonoxid (ZrCh), aufweisend: l,0Gew.% bis 8,0Gew.% Basis-Stabilisatoren: insbesondere mit 2,0Gew.% bis 8,0Gew.% Basis-Stabilisatoren; Yttriumoxid (Y2O3), und/oder
Hafniumoxid (HfCh), wobei zumindest Yttriumoxid (Y2O3) verwendet wird, sowie
zumindest einer der Zusatz-Stabilisatoren: Erbiumoxid (E^Ck) und/oder
Ytterbiumoxid (Yb2Ck) mit einem Anteil von 0,2Gew.% bis 20,0Gew.%, insbesondere mit l,0Gew.% bis 10,0Gew.%, ganz insbesondere mit 2,0Gew.% bis 9,0Gew.%, sowie jeweils optional Aluminiumoxid (AI2O3) 0,1% - 2,0%, und zugelassene Verunreinigungslevel (jeweils max.): Kalziumoxid (CaO) 0,1% - 0,2%,
Eisenoxid (Fe203) 0,1% - 0,2%,
Magnesiumoxid (MgO) 0,1% - 0,2%,
Siliziumoxid (S1O2) 0,1% - 0,3%,
Titanoxid (TiCk) 0,1% - 0,2%.
Vorzugsweise werden Yttriumoxid (Y2O3) und Hafniumoxid (HfCk) als Basis-Stabilisatoren verwendet. Ebenso kann auch nur Yttriumoxid (Y2O3) als Basis-Stabilisator verwendet werden.
Das keramische Material weist vorzugsweise 2,5Gew.% bis 5,5Gew.% Yttriumoxid (Y2O3), insbesondere 3,0Gew.% bis 5,0Gew.% Yttriumoxid (Y2O3), ganz insbesondere 3,5Gew.% bis 4,0Gew.% Yttriumoxid (Y2O3) auf, um eine gute Phasenstabili tät zu erzielen.
Das keramische Material weist ebenso vorzugsweise Hafniumoxid (Hf02) > 2,0Gew.% bis 4,0Gew.% auf, insbesondere 2,2Gew.% bis 4,0Gew.% Hafniumoxid (Hf02), ganz insbesondere 2,4Gew.% bis 3,0Gew.% Hafniumoxid (Hf02).
Ebenso vorteilhaft ist ein keramisches Material, bei dem der Gehalt an Hafniumoxid (Hf02) 0,2Gew.% bis <2,0Gew.% beträgt, insbesondere 0,2Gew.% bis l,8Gew.% Hafniumoxid (HfCk), ganz insbesondere 0,2Gew.% bis l,6Gew.% Hafniumoxid (Hf02) be trägt.
Sekundärpartikel wie Aluminiumoxid (AI2O3) können mit einem Anteil von 0,2Gew.% bis l,5Gew.% Aluminiumoxid (AI2O3) vor handen sein, insbesondere von 0,2Gew.% bis l,2Gew.%.
Ebenso kann der Anteil an Aluminiumoxid (AI2O3) auch l,5Gew.% bis 3,0Gew.% Aluminiumoxid (AI2O3), insbesondere >2,0Gew.% bis 2,5Gew.% Aluminiumoxid (AI2O3) betragen.
Als Zusatz-Stabilisatoren wird vorzugsweise nur Ytterbiumoxid (Yb203) verwendet.
Andere vorteilhafte Varianten sind als Zusatz-Stabilisatoren nur Erbiumoxid (Er2C>3) oder dass als Zusatz-Stabilisatoren nur Ytterbiumoxid (Yb2C>3) und Erbiumoxid (Er2C>3) verbunden sind.
Vorteilhafte Zusammensetzungen sind also Zr02-Hf02-Y203-Yb2C>3 oder auch Zr02-Hf02-Y203-Yb203-Al203.
Die Gewichte der Zusatzstabilisatoren betragen vorzugsweise 5,5Gew.% bis 8,5Gew.% Ytterbiumoxid (Yb203) , insbesondere 6,0Gew.-& bis 8,0Gew.% Ytterbiumoxid (Yb203) , ganz insbeson dere 6,5Gew.% bis 7,5Gew.% Ytterbiumoxid (Yb203) , bzw.
2,0Gew.% bis 4,0Gew.% Erbiumoxid (Er203) , insbesondere 2,5Gew.% bis 3,5Gew.% Erbiumoxid (Er203) .
Für die Anteile untereinander gilt insbesondere:
(8.0 - x)Gew.% Y203 + (2-4)xGew.% Yb203/Er203, insbesondere (6.0 - x)Gew.% Y203 + (2-4)xGew.% Yb203/Er203, wobei x den Gewichtsanteil der Zusatzstabilisatoren dar stellt.
Ein keramisches Pulver weist auf, insbesondere besteht aus einer Zusammensetzung eines Materials gemäß obigen Auflistun gen mit oder ohne Binder.
Ein vorteilhaftes Schichtsystem weist ein metallisches Sub strat, optional eine metallische Haftvermittlerschicht und
zumindest eine keramische Schicht auf der Basis des erfin dungsgemäßen keramischen Materials auf.
Eine metallische Haftvermittlerschicht zwischen der kera mischen Schicht und dem metallischen Substrat, insbesondere auf der Basis NiCoCrAlY, dient zur vorteilhaften Haftung.
Eine keramische Unterschicht (nicht die TGO) unter der kera mischen Schicht aus einem keramischen Material ist mindestens 20% dünner ausgebildet und weist vorzugsweise 8YSZ auf, also mit 3mol% bis 4mol% Yttrium-stabilisiertes Zirkonoxid.
Yttriumoxid wird auf jeden Fall als Stabilisator verwendet.
Dieses keramische Material kann als Pulver hergestellt wer den, so dass noch weitere Zusätze vorhanden sein können wie bei der Verwendung von abrasiven Schichten, die kubisches Bornitrid oder andere abrasive Partikel aufweisen.
In einem Schichtsystem (Figur 1) wird eine keramische Schicht 10 auf Metall aufgebracht, wobei bei vorzugsweise verwendetem Nickel oder kobaltbasierten Superlegierungen eine metallische Haftschicht 7 dazwischen vorhanden ist, die Aluminiumoxid bildet.
Die metallische Haftvermittlerschicht ist vorzugsweise ein Aluminid, Platinaluminid oder als Basis eine NiCoCrAl-Schicht darstellt.
Die keramische Schicht aus dem keramischen Material kann mit tels EB-PVD, Plasmaspritzen (APS, ...) hergestellt werden und weist eine kolumnare Struktur auf oder eine DVC (Dense Ver fiele Cracked) Struktur auf.
Die Schicht 10 weist eine vorzugsweise Schichtdicke von lOOpm bis lOOOpm auf.
Wie in der Figur 2 gezeigt kann diese keramische Schicht 10 auch eine keramische Unterschicht 13 aufweisen, die sich
deutlich von der keramischen Schicht 16 unterscheidet, d.h. kein Yb2Ü3 und/oder kein Er2<03 aufweist.
Die Schichtdicke der keramischen Unterschicht 13 jedoch min- destens 20% dünner ausgebildet ist als die des erfindungsge mäßen keramischen Materials der keramischen Schicht 16.
Die keramische Unterschicht weist 8YSZ auf, also mit 3mol% bis 4mol% Yttrium-stabilisiertes Zirkonoxid.
Claims
1. Keramisches Material auf der Basis von Zirkonoxid (ZrCd) aufweisend (in Gew.%): l,0Gew.% bis 8,0Gew.% Basis-Stabilisatoren: insbesondere mit 2,0Gew.% bis 8,0Gew.% Basis- Stabilisatoren:
Yttriumoxid (Y2O3), und/oder
Hafniumoxid (HfCb) wobei zumindest Yttriumoxid (Y2O3) verwendet wird, sowie zumindest einer der Zusatz-Stabilisatoren:
Erbiumoxid (E^Ch) und/oder
Ytterbiumoxid (Yb2C>3) mit einem Anteil von 0,2Gew.% bis 20,0Gew.%, insbesondere mit l,0Gew.% bis 10,0Gew.%, ganz insbesondere mit 2,0Gew.% bis 9,0Gew.%, sowie jeweils optional Aluminiumoxid (AI2O3) 0,1% - 2,0%, und zugelassene Verunreinigungslevel:
Kalziumoxid (CaO) max. 0,1% - 0,2%,
Eisenoxid (Fe203) max. 0,1% - 0,2%,
Magnesiumoxid (MgO) max. 0,1% - 0,2%,
Siliziumoxid (S1O2) max. 0,1% - 0,3%,
Titanoxid (T1O2) max. 0,1% - 0,2%.
2. Keramisches Material nach Anspruch 1, das Yttriumoxid (Y2O3) und Hafniumoxid (Hf02) als Basis- Stabilisatoren aufweist.
3. Keramisches Material nach Anspruch 1, das nur Yttriumoxid (Y2O3) als Basis-Stabilisator aufweist.
4. Keramisches Material nach einem oder mehreren der An sprüche 1, 2 oder 3, aufweisend 2,5Gew.% bis 5,5Gew.% Yttriumoxid (Y2O3), insbesondere 3,0Gew.% bis 5,0Gew.% Yttriumoxid (Y2O3), ganz insbesondere 3,5Gew.% bis 4,0Gew.% Yttriumoxid (Y2O3).
5. Keramisches Material nach einem oder mehreren der An sprüche 1, 2 oder 4, bei dem der Gehalt an Hafniumoxid (HfCb) > 2,0Gew.% bis 4,0Gew.% beträgt, insbesondere 2,2Gew.% bis 4,0Gew.% Hafniumoxid (HfCb), ganz insbesondere 2,4Gew.% bis 3,0Gew.% Hafniumoxid (HfCb).
6. Keramisches Material nach einem oder mehreren der An sprüche 1, 2 oder 4, bei dem der Gehalt an Hafniumoxid (HfCb) 0,2Gew.% bis <2,0Gew.% beträgt, insbesondere 0,2Gew.% bis l,8Gew.% Hafniumoxid (HfCb), ganz insbesondere 0,2Gew.% bis l,6Gew.% Hafniumoxid (HfCb) beträgt.
7. Keramisches Material nach einem oder mehreren der An sprüche 1, 2, 3, 4, 5 oder 6, bei dem der Gehalt an Aluminiumoxid (AI2O3) 0,2Gew.% bis l,5Gew.% Aluminiumoxid (AI2O3), insbesondere 0,2Gew.% bis l,2Gew.% Aluminiumoxid (AI2O3) beträgt.
8. Keramisches Material nach einem oder mehreren der An sprüche 1, 2, 3, 4, 5 oder 6, aufweisend l,5Gew.% bis 3,0Gew.% Aluminiumoxid (AI2O3), insbesondere >2,0Gew.% bis 2,5Gew.% Aluminiumoxid (AI2O3).
9. Keramisches Material nach einem oder mehreren der An sprüche 1, 2, 3, 4, 5, 6, 7 oder 8, das als Zusatz-Stabilisatoren nur Ytterbiumoxid (YbC>) aufweist.
10. Keramisches Material nach einem oder mehreren der An sprüche 1, 2, 3, 4, 5, 6, 7 oder 8, das als Zusatz-Stabilisatoren nur Erbiumoxid (E^Ch) auf weist.
11. Keramisches Material nach einem oder mehreren der An sprüche 1, 2, 3, 4, 5, 6, 7 oder 8, das als Zusatz-Stabilisatoren Ytterbiumoxid (Yb2C>3) und Erbiumoxid (E^Ch) aufweist.
12. Keramisches Material nach einem oder mehreren der An sprüche 1, 2, 3, 4, 5, 6, 7 oder 8, aufweisend, insbesondere bestehend aus Hf 02-Y203-Yb203-ZrC>2.
13. Keramisches Material nach einem oder mehreren der An sprüche 1 bis 9, aufweisend, insbesondere bestehend aus Hf 02-Y203-Yb203-Zr02-Al203.
14. Keramisches Material nach einem oder mehreren der An sprüche 1 bis 9 oder 11, 12 oder 13, aufweisend 5,5Gew.% bis 8,5Gew.% Ytterbiumoxid (Yb2C>3) , insbesondere 6,0 Gew.-& bis 8,0Gew.% Ytterbiumoxid (Yb2C>3) , ganz insbesondere 6,5Gew.% bis 7,5Gew.% Ytterbiumoxid (Yb203) .
15. Keramisches Material nach einem oder mehreren der An sprüche 1 bis 8 oder 10, 11, 12, 13 oder 14, aufweisend 2,0Gew.% bis 4,0Gew.% Erbiumoxid (E^Ch), insbesondere 2,5Gew.% bis 3,5Gew.% Erbiumoxid (E^Ch).
16. Keramisches Material nach einem oder mehreren der An sprüche 1 bis 15, aufweisend
(8.0 - x)Gew.% Y203 + (2-4)xGew.% Yb203/Er203,
insbesondere (6.0 - x)Gew.% Y2O3 + (2-4)xGew.% Yb203/Er203.
17. Keramisches Pulver aufweisend, insbesondere bestehend aus, einer Zusammensetzung eines Materials gemäß einem oder meh reren der Ansprüche 1 bis 16.
18. Schichtsystem (1) zumindest aufweisend ein metallisches Substrat (4), optional eine metallische Haftvermittlerschicht (7) und zumindest eine keramische Schicht (13, 10) auf der Basis des erfindungsgemäßen Materials gemäß einem oder meh reren der Ansprüche 1 bis 16, oder hergestellt mittels eines Pulvers gemäß Anspruch 17.
19. Schichtsystem nach Anspruch 18, aufweisend eine metallische Haftvermittlerschicht (7) zwischen der ke ramischen Schicht (13, 10) und dem metallischen Substrat (4), insbesondere auf der Basis NiCoCrAlY, optional mit Silizium (Si), Rhenium (Re) und /oder Tantal (Ta).
20. Schichtsystem nach einem oder beiden der Ansprüche 18 oder 19, bei dem eine keramische Unterschicht (13) unter der kerami schen Schicht (10) aus einem Material gemäß einem oder meh reren der Ansprüche 1 bis 16, vorhanden ist, die mindestens 20% dünner ausgebildet ist und insbesondere 8YSZ aufweist, also mit 3mol% bis 4mol% Yttrium-stabilisiertes Zirkonoxid.
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PCT/EP2022/050634 WO2022174996A1 (de) | 2021-02-18 | 2022-01-13 | Keramisches material, pulver sowie schichtsystem |
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DE102017005800A1 (de) * | 2017-06-21 | 2018-12-27 | H.C. Starck Surface Technology and Ceramic Powders GmbH | Zirkoniumoxidpulver zum thermischen Spritzen |
DE102017223879A1 (de) | 2017-12-29 | 2019-07-04 | Siemens Aktiengesellschaft | Keramisches Material, Verfahren zur Herstellung, Schicht und Schichtsystem |
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