EP3864195A1 - Zusammensetzung zum verchromen eines substrats und verchromungsverfahren unter verwendung einer solchen zusammensetzung - Google Patents
Zusammensetzung zum verchromen eines substrats und verchromungsverfahren unter verwendung einer solchen zusammensetzungInfo
- Publication number
- EP3864195A1 EP3864195A1 EP19783073.0A EP19783073A EP3864195A1 EP 3864195 A1 EP3864195 A1 EP 3864195A1 EP 19783073 A EP19783073 A EP 19783073A EP 3864195 A1 EP3864195 A1 EP 3864195A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrate
- mol
- chromium
- salt
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 156
- 239000000758 substrate Substances 0.000 title claims abstract description 128
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 93
- 239000011651 chromium Substances 0.000 title claims abstract description 81
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 title claims abstract description 63
- 230000008569 process Effects 0.000 title abstract description 44
- 238000007747 plating Methods 0.000 title abstract description 43
- 238000000576 coating method Methods 0.000 claims abstract description 68
- 239000011248 coating agent Substances 0.000 claims abstract description 59
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims abstract description 40
- -1 alkali metal salt Chemical class 0.000 claims abstract description 23
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 21
- 239000004471 Glycine Substances 0.000 claims abstract description 19
- 150000003863 ammonium salts Chemical class 0.000 claims abstract description 19
- 150000001844 chromium Chemical class 0.000 claims abstract description 19
- 230000008021 deposition Effects 0.000 claims abstract description 13
- 238000007654 immersion Methods 0.000 claims abstract description 8
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- 150000001242 acetic acid derivatives Chemical class 0.000 claims description 3
- 150000003842 bromide salts Chemical class 0.000 claims description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 3
- 150000007942 carboxylates Chemical class 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- 150000004694 iodide salts Chemical class 0.000 claims description 3
- 150000002823 nitrates Chemical class 0.000 claims description 3
- 150000002826 nitrites Chemical class 0.000 claims description 3
- 235000021317 phosphate Nutrition 0.000 claims description 3
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 claims description 3
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 3
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 3
- 150000003871 sulfonates Chemical class 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- 150000003567 thiocyanates Chemical class 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- 150000003841 chloride salts Chemical class 0.000 claims 1
- 150000004673 fluoride salts Chemical class 0.000 claims 1
- 159000000013 aluminium salts Chemical class 0.000 abstract 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 abstract 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 16
- 238000012360 testing method Methods 0.000 description 14
- 230000032683 aging Effects 0.000 description 11
- 238000000151 deposition Methods 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 229910000831 Steel Inorganic materials 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000010959 steel Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 239000000470 constituent Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 6
- 238000007872 degassing Methods 0.000 description 6
- 238000005238 degreasing Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 238000000227 grinding Methods 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 238000005554 pickling Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- ZCSHACFHMFHFKK-UHFFFAOYSA-N 2-methyl-1,3,5-trinitrobenzene;2,4,6-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)C1NC([N+]([O-])=O)NC([N+]([O-])=O)N1.CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O ZCSHACFHMFHFKK-UHFFFAOYSA-N 0.000 description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical group [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- 230000001464 adherent effect Effects 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000001868 cobalt Chemical class 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001493 electron microscopy Methods 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910000601 superalloy Inorganic materials 0.000 description 2
- YPFNIPKMNMDDDB-UHFFFAOYSA-K 2-[2-[bis(carboxylatomethyl)amino]ethyl-(2-hydroxyethyl)amino]acetate;iron(3+) Chemical compound [Fe+3].OCCN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O YPFNIPKMNMDDDB-UHFFFAOYSA-K 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 1
- 229910021564 Chromium(III) fluoride Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- 239000011636 chromium(III) chloride Substances 0.000 description 1
- 235000007831 chromium(III) chloride Nutrition 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007749 high velocity oxygen fuel spraying Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- the present invention is in the field of electrochemical deposition of chromium on the surface of a substrate, with a view to improving its resistance to wear, such deposition being commonly qualified by the term "chromium plating".
- the present invention relates to an aqueous composition for the electrolytic deposition of a chromium coating on the surface of a substrate, as well as to a method of electrolytic deposition of a chromium coating on the surface of a substrate using using such a composition.
- the invention also relates to a substrate covered on the surface with a chromium coating obtained by such a process.
- chromium plating The electroplating of a chromium surface coating on a substrate, also called chromium plating, is used in many fields, in particular in the aeronautical, automotive, mechanical, etc. fields, to improve the wear resistance of the parts (this is called hard chromium plating) or to make decorative deposits (this is then called decorative chromium plating), the thickness of the surface coating varying from a few tenths of a micron for decorative chromium plating to a few hundred microns for hard chromium plating.
- Hard chrome plating in which the present invention is more particularly concerned, makes it possible in particular to reduce the wear of the parts during relative movements as well as their coefficient of friction.
- chromium trioxide (Cr03) is generally used, a substance based on hexavalent chromium which, in aqueous solution, generates chromic acid.
- Hard chromium is obtained by electrolytic reduction of hexavalent chromium to metallic chromium on the surface of the part to be treated.
- substances based on hexavalent chromium are harmful to living organisms, it has been sought for several years to limit, or even completely eliminate, their use.
- Several technologies have been proposed by the prior art to replace the current hard chromium plating processes based on hexavalent chromium.
- Electrolytic or chemical deposition methods making it possible in particular to solve the difficulties introduced by complex geometric surfaces, have otherwise been proposed by the prior art. These methods generally use aqueous solutions of nickel or cobalt salts to produce metallic deposits, with or without inclusions of particles such as hard, self-lubricating particles, etc., on the surface of the part to be treated.
- cobalt salts like that of nickel salts, is undesirable due to the risk of toxicity to living organisms.
- the range of current density in which the chromium plating process can operate is particularly important, especially when the parts to be treated have a complex geometry. Indeed, during an electrolytic deposition, it is observed that for a current density imposed in the electrolytic bath, the actual current density on the surface of the treated part can vary locally very significantly. In order to guarantee a homogeneous chromium deposit on an entire part, it is therefore important to have a process that can operate with the widest possible current density range, this being all the more important. that the piece is more complex in shape.
- the present invention aims to remedy the drawbacks of the methods proposed by the prior art for hard chrome plating without hexavalent chromium, in particular the drawbacks set out above, by proposing a method, and a composition for its implementation, which allow, without use of substance toxic to living organisms, and in particular hexavalent chromium, to form on a substrate a coating of good quality chromium, having in particular a wear resistance which is at least equivalent to that obtained by the chromium plating processes hard of the prior art using hexavalent chromium, this coating being formed over the entire surface of the latter, regardless of the shape of the substrate, including for substrates of complex geometry.
- the invention also aims to ensure that this composition remains effective over time.
- An additional objective of the invention is that the cost of this composition and of the implementation of this process is as low as possible, this implementation being moreover easy.
- an aqueous liquid composition for the electrolytic deposition of a chromium coating on the surface of a substrate this electrolytic deposition also being designated, in the present description, by term "chrome plating".
- the aqueous composition according to the invention contains:
- the aqueous composition according to the invention is also preferably essentially devoid of hexavalent chromium. By this is meant that the composition does not contain hexavalent chromium, or only trace amounts.
- the glycine concentration in the composition can in particular be between 0.63 and 0.9 mol / l, in particular between 0.63 and 0.83 mol / l.
- the glycine concentration in the composition is between 0.6 and 2.8 mol / l, in particular between 0.63 and 2.8 mol / l, and for example between 0.67 and 2.8 mol / l.
- the aqueous composition according to the invention used as an electrolytic bath in a chromium-plating process, makes it possible to obtain, on the surface of the treated substrate, a coating of high-quality chromium, and this over all of this. surface, including when the substrate has a complex shape.
- this aqueous composition allows efficient operation of the chromium plating process which implements it over a very wide range of current density, of amplitude as high as 72 A / dm 2 , and which can even be greater than 84 A / dm 2 .
- the chromium plating process using the composition according to the invention can thus function, to form a high quality chromium coating on the surface of the treated substrate, in a density range of current up to more than 100 A / dm 2 , in particular as wide as going from 13 A / dm 2 to more than 100 A / dm 2 .
- these properties are advantageously uniform over the entire surface of the substrate, even when it has a complex shape.
- the lifetime of the aqueous composition according to The invention having a pH of between 0 and 1, and a glycine concentration of between 0.6 and 0.9 mol / l, is significantly greater than for the equivalent aqueous compositions, that is to say containing the same components in the same concentrations, but whose pH is greater than 1 and / or the glycine concentration is greater than 0.9 mol / l.
- the aqueous composition according to the invention can thus advantageously be used, for the electrolytic deposition of chromium on the surface of a substrate, after having imposed the equivalent of 22 Ah / L, and even more than 50 Ah / L for certain embodiments, without significant loss of quality of the deposit produced, without having added one or more of its constituents in the composition.
- Such an advantageous result suggests, for industrial use, in which readjustments of the concentrations of the constituents of the aqueous composition used will be regularly carried out, a lifetime of the composition considerably higher and particularly important for the field of hard chrome plating.
- the pH of the aqueous composition according to the invention can be adjusted to a value between 0 and 1 according to any conventional method in itself for the skilled person, in particular by adding acid, for example hydrochloric acid, in said composition.
- the aqueous composition according to the invention may in particular contain one or more acids, for example hydrochloric acid, in an amount sufficient to confer on said aqueous composition a pH of between 0 and 1.
- the pH of the aqueous composition according to the invention is substantially equal to 0.5.
- the aqueous composition according to the invention is easy to prepare, by simple mixing of its constituents in water, and it has a low cost price.
- aqueous composition according to the invention can also respond to one or more of the characteristics described below, implemented in isolation or in each of their technically operative combinations.
- the preferred concentration values indicated below are all associated with even better performance of the chromium plating process implementing the composition according to the invention, in particular in terms of current density range in which this process works effectively.
- the tightened concentration ranges indicated below are thus associated with current density ranges, in which the chromium plating process operates, which are wider.
- the concentration of glycine in the composition is for example between 0.67 and 0.83 mol / l. Optimally, the concentration of glycine in the aqueous composition according to the invention can be approximately equal to 0.75 mol / l.
- trivalent chromium salt means a single trivalent chromium salt or a mixture of different trivalent chromium salts.
- the trivalent chromium salt contained in the aqueous composition according to the invention may contain, in addition to the Cr 3+ ion, any conventional counter-ion in itself for chromium-plating treatments, or any mixture of such counter-ions.
- the trivalent chromium salt can in particular be chosen from the group consisting of chlorides, iodides, fluorides, carboxylates, carbonates, nitrates, nitrites, phosphates, phosphites, acetates, bromides, sulfates, sulfites, sulfamates, which can be organic or inorganic, sulfonates, which can be organic or inorganics, thiocyanates, or any of their mixtures.
- At least one, preferably several, and preferably all, of the trivalent chromium salt, the alkali metal salt, the aluminum salt and, where appropriate, the salt of ammonium, is / are chosen from chlorides, iodides, fluorides, carboxylates, carbonates, nitrates, nitrites, phosphates, phosphites, acetates, bromides, sulfates, sulfites, sulfamates, which can be organic or inorganic, sulfonates, which can be organic or inorganic, thiocyanates, or any of their mixtures.
- Each of the salts forming part of the aqueous composition according to the invention can comprise a single counterion, or a mixture of several counterions.
- each salt is formed with a single counterion.
- the counterion (s) of the trivalent chromium salt, the counterion (s) of the alkali metal salt, the counter (s) -ion (s) of the aluminum salt, and where appropriate, the counterion (s) of the ammonium salt are identical.
- the aqueous composition according to the invention is then advantageously more stable over time.
- the trivalent chromium salt can for example be chosen from the following trivalent chromium salts: CrCl3, xH20, (CH3C02) 2Cr, xH20, (CH3C02) 7Cr3 (0H) 2, xH20, CrF3, xH20, etc.
- the trivalent chromium salt is a chromium chloride, for example CrCl3,6H20.
- the concentration of trivalent chromium salt in the composition is for example between 0.41 and 0.86 mol / l.
- the concentration of trivalent chromium salt in the aqueous composition according to the invention can be approximately equal to 0.79 mol / l.
- aluminum salt means a single aluminum salt or a mixture of different aluminum salts.
- the aluminum salt contained in the aqueous composition according to the invention may contain, in addition to the aluminum ion, any conventional counter-ion in itself for chromium-plating treatments, or any mixture of such counter-ions, in particular a or more of the counterions listed above.
- the aluminum salt is an AICI3 aluminum chloride.
- the concentration of aluminum salt in the aqueous composition according to the invention is preferably between 0.06 and 0.7 mol / l, for example between 0.06 and 0.62 mol / l.
- the concentration of aluminum salt in the aqueous composition according to the invention can be approximately equal to 0.26 mol / l.
- alkali metal salt is understood to mean a single alkali metal salt or a mixture of different alkali metal salts.
- the alkali metal is preferably sodium or potassium, or a mixture thereof.
- the alkali metal salt contained in the aqueous composition according to the invention may contain, in addition to the ion of the alkali metal, any conventional counter-ion in itself for chromium-plating treatments, or any mixture of such counter-ions, in in particular one or more of the counterions listed above.
- the alkali metal salt is sodium chloride NaCI and / or potassium chloride KCI.
- the concentration of alkali metal salt in the aqueous composition according to the invention is preferably between 0.2 and 1.9 mol / l, for example between 0.26 and 1.88 mol / l.
- ammonium salt means a single ammonium salt or a mixture of different ammonium salts.
- ammonium salt contained in the aqueous composition according to the invention may contain, in addition to the ammonium ion, any conventional counter-ion in itself for chromium-plating treatments, or any mixture of such counter-ions, in particular a or more of the counterions listed above.
- the ammonium salt is an ammonium chloride NH 4 CI.
- the concentration of ammonium salt in the aqueous composition according to the invention is preferably between 0 and 1.0 mol / l, for example between 0 and 0.93 mol / l.
- the aqueous composition contains:
- an alkali metal salt concentration of between 0.2 and 1.3 mol / l, for example between 0.26 and 1.28 mol / l, and preferably between 0.5 and 0.7 mol / l, for example between 0.54 and 0.66 mol / l; and preferably approximately equal to 0.60 mol / l.
- the aqueous composition is devoid of ammonium salt, and it contains an alkali metal salt concentration of between 1.5 and 1.9 mol / l, for example between 1.54 and 1.88 mol / l.
- each of these variants of the aqueous composition according to the invention used in a chromium-plating process, allows this process to work, by forming on the surface of the substrate a high-quality chrome coating, in a very wide current density range, even for compositions devoid of ammonium salt.
- a particular aqueous composition according to the invention contains:
- trivalent chromium for example trivalent chromium chloride
- alkali metal salt for example sodium chloride
- ammonium salt for example of ammonium chloride
- Another particular aqueous composition according to the invention contains:
- trivalent chromium salt for example trivalent chromium chloride
- alkali metal salt for example sodium chloride
- aluminum salt for example aluminum chloride; its pH being between 0 and 1;
- composition being devoid of ammonium salt.
- aqueous composition according to the invention may, if appropriate, contain substances other than those listed above, with the exclusion of hexavalent chromium, these substances however not having to interfere with the action of the essential constituents of the composition.
- the aqueous composition according to the invention may for example contain one or more surfactants.
- the aqueous composition according to the invention is substantially free from one or more, preferably all, of the following substances: boric acid / borate, or other compound based on boron, quaternary ammonium, oxalate, vanadium, manganese, iron , cobalt, molybdenum, nickel, tungsten, indium.
- substantially free is meant the fact that the aqueous composition does not contain these substances, except in the trace state, that is to say in a non-operating amount.
- the present invention relates to a method of electroplating a chromium coating on the surface of a substrate, known as a chromium plating process.
- This process includes:
- an electrolytic bath of an aqueous composition according to the invention, meeting one or more of the above characteristics, of the substrate and of an anode,
- the electrolytic reduction of trivalent chromium into hard metallic chromium occurs on the surface of the part to be treated.
- the chromium coating thus formed by the process according to the invention on the surface of the substrate has the entirely advantageous properties set out above.
- the current applied between the substrate and the anode can be of the pulsed type.
- a direct current is applied between the substrate and the anode.
- Such a characteristic advantageously makes it possible to overcome the difficulties of implementing pulsed currents on an industrial scale, and to simplify the implementation of the chroming process according to the invention.
- the method according to the invention is in particular entirely suitable for industrial implementation, in a simple manner.
- the direct current density imposed between the substrate and the anode is between 10 and 100 A / dm 2 , preferably between 20 and 40 A / dm 2 , and preferably approximately equal to 30 A / dm 2 .
- the temperature of the electrolytic bath is preferably between 20 and 80 ° C, more preferably between 20 and 60 ° C, and preferably between 40 and 60 ° C. It is for example around 45 ° C or 50 ° C.
- a current between the substrate and the anode is carried out for an adequate time to form on the surface of the substrate a chromium coating with a thickness of between 5 and 500 ⁇ m. It is within the skill of a person skilled in the art to know how to choose this duration, depending in particular on the other operating parameters, in particular the temperature of the aqueous composition, its exact composition and the current density applied.
- a person skilled in the art can for this purpose test several durations of application of the current, then measure, for each sample substrate treated, the thickness of the chromium coating formed on its surface, for example by electron microscopy, and deduce therefrom the appropriate current application time corresponding to these operating parameters and to the thickness of the chromium coating targeted.
- the substrate to which the chroming process according to the invention is applied is formed from metallic material or any other material having an electrically conductive surface.
- the chroming process according to the invention proves to be particularly advantageous for use on steel substrates.
- the present description includes, in the term steel, steel alloys, in particular stainless steels.
- the chromium plating process according to the invention can also, for example, be implemented on substrates made of nickel-based superalloy, of cobalt-based superalloy, of bronze, of aluminum alloy, of magnesium alloy, of titanium alloy, etc.
- the substrate may have been covered by one or more sublayers, for example a nickel sublayer, this by any conventional method per se.
- the anode used in the chroming process according to the invention can be formed from any conventional material in itself for the electrolytic deposition of metal, in particular chromium, on a substrate. It can for example be formed from an inert and conductive material such as graphite, iridiated titanium, platinized titanium or titanium coated with a mixture of metal oxide (MMO) or any other conductive material coated with one of these materials.
- an inert and conductive material such as graphite, iridiated titanium, platinized titanium or titanium coated with a mixture of metal oxide (MMO) or any other conductive material coated with one of these materials.
- the method according to the invention may comprise preliminary stages of degreasing, in particular of alkaline degreasing, and / or of pickling, of the substrate.
- the method according to the invention comprises a step of alkaline degreasing of the substrate, by bringing into contact, in particular by immersion, of the substrate in an alkaline composition, such as the composition sold under the name Presol 7045 by the company Coventya.
- This contacting is for example carried out for a period of 20 minutes, the composition being at a temperature of approximately 60 ° C.
- This preliminary degreasing step can be followed by a pickling step.
- a step of stripping the substrate may in particular consist of an electrolytic pickling in a composition based on sulfuric acid, for example containing a mixture of sulfuric acid and ethylene glycol.
- This etching step can be carried out in a conventional manner, for example being carried out at ambient temperature, that is to say at a temperature of approximately 20 ° C., by applying for example, for the anodic phase, a density of current of 40 A / dm 2 for 45 seconds, and, for the cathode phase, a current density of 30 A / dm 2 for 4 minutes.
- the method according to the invention can also comprise final stages of:
- the chrome-plating process according to the invention may also comprise a step of heat treatment of the substrate covered with a coating of chromium obtained, for example at a temperature between 250 ° C and 700 ° C for a period of between 20 and 200 minutes .
- a heat treatment step makes it possible in particular to increase the hardness of the chromium coating covering the substrate, by a phenomenon of structural hardening.
- Another aspect of the invention relates to a substrate, in particular a metal substrate or one having an electrically conductive surface, for example a steel substrate, obtained by a chromium-plating process according to the invention.
- This substrate is covered on the surface with a chromium coating with a thickness of between 5 and 500 ⁇ m, in particular between 15 and 450 ⁇ m.
- This coating has characteristics equivalent to those of chromium coatings formed by the chroming processes of the prior art using hexavalent chromium, in particular in terms of hardness, coefficient of friction and resistance to wear. It has in particular a Vickers hardness, measured for an applied load of 100 g, which is greater than 800 Hv after degassing at 190 ° C for 3 hours, and which is even greater than 1200 Hv after a heat treatment at 300 ° C for 120 minutes.
- This substrate can be any mechanical part, including a part of complex geometry. Its properties, in particular of resistance to wear, make it entirely suitable for use under heavy constraints, in any industrial field, in particular in the aeronautical field.
- FIGS. 1 to 4 in which:
- FIG. 1 shows a photograph of steel substrates treated by a chroming process according to the invention, the aqueous composition used having a pH of 0.5 and having different stages of aging (expressed in Ah / L), the lower part of the treated substrates having been rubbed with abrasive paper;
- FIG. 2 shows a photograph of steel substrates treated by a chroming process according to the invention, the aqueous composition used having a pH of 1 and having different stages of aging (expressed in Ah / L), the lower part treated substrates having been rubbed with abrasive paper;
- FIG. 3 shows a photograph of a substrate partially covered with a chromium coating after a Hull cell test using an aqueous composition according to the invention, the values of current density associated varying between 0 A / dm 2 (on the right in the figure) and more than 100 A / dm 2 (on the left in the figure), a chromium coating being observed for current densities greater than or equal to 13 A / dm 2 ;
- FIG. 4 shows photographs of steel substrates treated by a chromium plating process, respectively using an aqueous composition containing a glycine concentration of 0.75 mol / l (a /), an aqueous composition comprising a glycine concentration of 1 mol / l (b /) and of an aqueous composition comprising a glycine concentration of 1.25 mol / l (c /), each aqueous composition used having different stages of aging (expressed in Ah / L), and the lower part of the treated substrates having been rubbed with abrasive paper.
- Example 1 shows photographs of steel substrates treated by a chromium plating process, respectively using an aqueous composition containing a glycine concentration of 0.75 mol / l (a /), an aqueous composition comprising a glycine concentration of 1 mol / l (b /) and of an aqueous composition comprising a glycine concentration of
- XC38 cylindrical steel substrates 20 mm in diameter and 200 mm long, are subjected to the following stages of a chromium-plating process according to the invention:
- Electrolytic pickling in sulfuric medium by immersion of the substrate in a composition of sulfuric acid and ethylene glycol at room temperature, applying for the anodic phase a current density of 40 A / dm 2 for 45 s and for the cathodic phase a current density of 30 A / dm 2 for 4 min.
- the substrate is immersed, with an iridized titanium anode, in a bath of an aqueous composition according to the invention, containing, in solution in water:
- the pH of this aqueous composition has previously been adjusted to a value of 0.5 by adding an appropriate amount of hydrochloric acid to the composition.
- the temperature of the aqueous composition is 45 ° C.
- Different substrates are treated successively in a bath of this aqueous composition.
- a current density of 40 A / dm 2 is imposed between the substrate and the anode, for a sufficient period of time to form a chromium coating of thickness 50 ⁇ m on the surface of the substrate, which for each coating in this specific case corresponds to an amount of electrical charge imposed per volume of aqueous composition of between 2.2 and 2.3 Ah / L.
- Several substrates are thus treated successively in this same bath at different stages of aging, until a bath aging of 38.1 Ah / L is reached.
- each substrate is subjected to a degassing step for 3 h at 190 ° C.
- the adhesion of the coating is evaluated by rubbing with abrasive paper from the lower part of the substrate.
- Figure 1 shows a photograph of the substrates thus obtained.
- the values expressed in Ah / L associated with each substrate correspond to the stages of aging of the aqueous composition at the end of the treatment of this substrate, the various substrates having been successively treated in the composition.
- the thickness of the coating measured by electron microscopy, is between 5 and 500 ⁇ m.
- Vickers hardness measured for an applied load of 100 g, is greater than 800 Hv.
- the coating is not peeled off when the substrate is subjected to the grinding wheel test according to standard ASTM B571.
- the coating is not peeled off after a grinding thickness greater than 100 ⁇ m.
- the resistance to wear of a coating is equivalent to that obtained for the coatings obtained by the processes using hexavalent chromium of the prior art.
- Example 2 XC38 steel substrates identical to those described in Example 1 are treated, in accordance with the present invention, as indicated in Example 1, with the difference that the pH of the aqueous composition used has been adjusted to a value of 1, by adding hydrochloric acid to the composition.
- the adhesion of the coating is evaluated by rubbing with abrasive paper from the lower part of the substrate.
- Figure 2 shows a photograph of the substrates thus obtained.
- the values expressed in Ah / L associated with each substrate correspond to the stages of aging of the aqueous composition at the end of the treatment of this substrate, the various substrates having been successively treated in the composition.
- the metallic coatings are all adherent to the substrate even when they have been formed in an electrolytic bath in which the equivalent of 22.4 Ah / L has been imposed, and this without having performed adding one or more constituents to the bath. A loss of adhesion is then observed, as shown by the white arrows which designate the areas rubbed with abrasive paper.
- the properties of the coatings formed on the substrates are similar to those described above for the coatings of Example 1.
- a method according to the invention is implemented according to the conditions described in Example 1, for a substrate as described in Example 1.
- the current density imposed between the substrate and the anode is 40 A / dm 2 for 40 min.
- a chromium coating with a thickness of 50 ⁇ m is obtained on the surface of the substrate.
- This coating has:
- Example 2 The performances indicated above in Example 1, in terms of adhesion to the substrate and absence of a negative effect on the mechanical properties of the substrate, are also achieved.
- C1 to C13 or not in accordance with the invention (called C14 to C20) are tested to assess the current density range in which a chromium plating process using them can operate.
- the Hull cell has a trapezoidal shape and makes it possible to position the cathode and the anode, constituting opposite walls of the cell, in a manner that is not parallel to one another.
- the other two walls are parallel and insulating.
- brass plates are used at the cathode and an iridized titanium grid is used at the anode.
- the temperature of the composition is 45 ° C., and a current intensity of 8 A is applied for 1 min 30 s
- I represents the current intensity at A crossing the cell
- d represents the distance in cm between the origin of the cathode and the point considered, the origin of the cathode corresponding to the end of the cathode closest to the anode
- aqueous composition in accordance with the invention described in Example 1, here called C1 For the aqueous composition in accordance with the invention described in Example 1, here called C1, one thus determines for example extreme values of current density, for the range of operating current density associated with the composition, which are equal to 13 A / dm 2 for the low value, and greater than 100 A / dm 2 for the high value.
- compositions in accordance with the present invention are all associated with very wide current density ranges, the most effective composition being composition C1.
- the results obtained are significantly lower when the pH of the aqueous composition is greater than 1, than when the pH is between 0 and 1 as recommended by the present invention.
- a Hull cell test is also carried out, under the operating conditions described above, but with a temperature of the composition of 50 ° C. or 55 ° C., for a composition in accordance with the invention containing, in solution in l water:
- This solution is devoid of ammonium salt. Its pH has previously been adjusted to a value of 0.5 by adding an appropriate amount of hydrochloric acid to the composition.
- composition B1 a concentration equal to 0.75 ml / l (composition B1), a concentration equal to 1 mol / l (composition B2) and a concentration equal to 1.25 mol / l (composition B3).
- a method is used for substrates as described in Example 1 according to the conditions described in Example 1, except for the pH value which is equal to 1 and the glycine concentration which is equal to 0.75 mol / l for the composition B1, to 1.00 mol / l for the composition B2 or at 1.25 mol / l for composition B3.
- composition B1, B2 and B3 For each composition B1, B2 and B3, the following experiment is carried out.
- a current density of 40 A / dm 2 is imposed between the substrate and the anode, for a sufficient period of time to form a chromium coating of thickness 50 ⁇ m on the surface of the substrate, which for each coating corresponds to an amount of electrical charge imposed per volume of aqueous composition of between 2.2 and 2.3 Ah / L.
- each substrate is subjected to a degassing step for 3 h at 190 ° C.
- FIG. 4 shows photographs of the substrates thus obtained, respectively in a / for composition B1, in b / for composition B2 and in c / for composition B3.
- composition B1 according to the invention, a loss of adhesion of the metallic coating (indicated by a white arrow in the figure) is observed in the area rubbed with abrasive paper for the coatings.
- metals which have been formed in the electrolytic baths in which the equivalent of 24.6 Ah / L or more has been imposed.
- the metal coating remains adherent.
- composition B2 the loss of adhesion of the coating is observed at much shorter aging times, immediately after
- the electrolytic baths based on the compositions containing 1 mol / l of glycine and more have a greatly reduced lifetime, compared to the baths formed on the basis of the compositions according to the invention containing at most 0.9 mol / l of glycine.
- the latter advantageously have a long service life, during which they make it possible to form on the surface of the substrate a metallic coating of chromium having good adhesion.
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- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR1859485A FR3087209B1 (fr) | 2018-10-12 | 2018-10-12 | Composition pour le chromage d’un substrat et procede de chromage mettant en œuvre une telle composition |
PCT/EP2019/077573 WO2020074694A1 (fr) | 2018-10-12 | 2019-10-11 | Composition pour le chromage d'un substrat et procédé de chromage mettant en œuvre une telle composition |
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EP3864195A1 true EP3864195A1 (de) | 2021-08-18 |
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EP19783073.0A Pending EP3864195A1 (de) | 2018-10-12 | 2019-10-11 | Zusammensetzung zum verchromen eines substrats und verchromungsverfahren unter verwendung einer solchen zusammensetzung |
Country Status (4)
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US (1) | US20210355593A1 (de) |
EP (1) | EP3864195A1 (de) |
FR (1) | FR3087209B1 (de) |
WO (1) | WO2020074694A1 (de) |
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JPS53106348A (en) | 1977-02-28 | 1978-09-16 | Toyo Soda Mfg Co Ltd | Electrolytic bath for chromium plating |
US20090211914A1 (en) | 2008-02-21 | 2009-08-27 | Ching-An Huang | Trivalent Chromium Electroplating Solution and an Operational Method Thereof |
TW201213624A (en) * | 2010-09-30 | 2012-04-01 | China Steel Corp | Trivalent chromium electroplating solution and electroplating method using the same |
US9756611B2 (en) | 2013-11-12 | 2017-09-05 | Qualcomm Incorporated | System and method for channel selection to reduce impact to an existing network |
EP2899299A1 (de) | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Galvanisierbad auf der Basis von dreiwertigem Chrom und Verfahren zur Abscheidung von Chrom |
CN105506713B (zh) * | 2014-09-25 | 2018-05-08 | 通用电气公司 | 通过电镀形成铬基涂层的方法、所用电解液以及所形成的涂层 |
-
2018
- 2018-10-12 FR FR1859485A patent/FR3087209B1/fr active Active
-
2019
- 2019-10-11 WO PCT/EP2019/077573 patent/WO2020074694A1/fr unknown
- 2019-10-11 EP EP19783073.0A patent/EP3864195A1/de active Pending
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FR3087209A1 (fr) | 2020-04-17 |
US20210355593A1 (en) | 2021-11-18 |
FR3087209B1 (fr) | 2022-11-04 |
WO2020074694A1 (fr) | 2020-04-16 |
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