EP3750010B1 - Mikromechanisches uhrenbauteil - Google Patents

Mikromechanisches uhrenbauteil Download PDF

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Publication number
EP3750010B1
EP3750010B1 EP19707492.5A EP19707492A EP3750010B1 EP 3750010 B1 EP3750010 B1 EP 3750010B1 EP 19707492 A EP19707492 A EP 19707492A EP 3750010 B1 EP3750010 B1 EP 3750010B1
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EP
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Prior art keywords
distance
micro
substrate
etching
mechanical
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EP19707492.5A
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English (en)
French (fr)
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EP3750010A1 (de
Inventor
Julien PERRET
Rémy FOURNIER
Sylvain Jeanneret
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Patek Philippe SA Geneve
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Patek Philippe SA Geneve
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/06—Free escapements
    • G04B15/08—Lever escapements
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/08—Lubrication
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel

Definitions

  • the present invention relates, in a first aspect, to a watchmaking micromechanical part cut from a silicon substrate in the form of a plate and the cut edges of which comprise portions intended to serve as contact surfaces arranged to slide against corresponding contact zones of another micromechanical part in a timepiece, the cut edges of the part having a ribbed surface comprising alternating ribs and grooves, these ribs and these grooves being rectilinear.
  • This first aspect of the invention relates in particular to a watchmaking micromechanical part which conforms to the above definition and which forms part of a lever escapement.
  • the patent US 5,501,893 in the name of Robert Bosch GmbH proposes to etch profiles with almost vertical edges in a silicon substrate by applying a procedure that alternates the steps of depositing an inert passivation layer and plasma etching.
  • the steps of deposition of the passivation layer and those of etching all make use of fluorinated compounds, so that they take place in the same chemical context.
  • Each step lasts a few seconds, the passivation layer is formed over the entire surface of the substrate, so that the latter is protected against any subsequent etching.
  • the bombardment by ions which are accelerated vertically disintegrates the part of the passivation layer which is at the bottom of the profiles (but not that which covers the sides thereof). The bottom of the profiles is thus very quickly exposed to reactive etching.
  • the patent US 5,501,893 is incorporated by reference.
  • the sequence formed by an etching step followed by a step of depositing a passivation layer is repeated a large number of times. For example, between 100 and 1000 times to etch a groove which crosses vertically right through a substrate whose thickness is 500 microns.
  • the sidewalls produced by the alternating succession of deposition steps and etching steps do not produce perfectly straight sidewalls, but finely wavy sidewalls which present a alternating regularly spaced reliefs and hollows.
  • the amplitude of the ripple is a function of the frequency with which the deposition and etching steps alternate.
  • An object of the present invention is to remedy the drawbacks of the prior art which have just been explained.
  • the present invention achieves this object as well as others by providing a watchmaking micromechanical part in accordance with appended claim 1 and two manufacturing methods in accordance with appended claims 13 and 14 respectively.
  • the ribs and the furrows form a staggered pattern, with first intervals in which the spacing separating the ribs from each other is equal to a first distance, and at least a second interval in which the spacing between the ribs is equal to a second distance different from the first distance.
  • Tests carried out by the applicant have shown that the presence of a staggered pattern having the above characteristics improves tribology by reducing friction in the contact.
  • the ribs and the grooves are each contained in a plane parallel to the plate.
  • the ribs and the grooves are perpendicular to the main faces of the plate.
  • the grooves belonging to the first intervals preferably all have the same first depth. This depth is between 10 nm and 2 ⁇ m.
  • the second distance is preferably greater than the first distance.
  • the stepped pattern comprises a plurality of second intervals, and the second distance is between 200 nm and 50 ⁇ m, and preferably between 800 nm and 10 ⁇ m.
  • the grooves belonging to the second intervals all have the same depth. This depth is between 10 nm and 10 ⁇ m.
  • the staggered pattern comprises a single second interval comprising a single groove
  • the second distance is between 200 nm and 2/3 of the total height of the part, and preferably between between 1/3 and 1/2 of the total height of the room.
  • the depth of the single groove of the second interval is preferably between 10 nm and 50 ⁇ m.
  • the figure 1 is a schematic plan view showing a prior art Swiss lever escapement.
  • the mechanism shown comprises in particular an escape wheel 3, an anchor 5 and a large plate 7 through the center of which passes the axis of the balance wheel 9.
  • the two arms of the anchor each terminate in a pallet 11, 13.
  • the pallets are arranged to cooperate with the teeth 15 of the escapement wheel 3.
  • the escapement wheel is connected to the barrel (not shown) via a cog (not shown) which engages with the pinion of exhaust (referenced 17).
  • the escape wheel is thus permanently biased forwards (in other words, clockwise as shown in figure 1 ). It will be noted that at the moment represented, one of the teeth 15 of the escape wheel 3 is immobilized against the rest face of the entry pallet 11 of the anchor 5.
  • the anchor 5 begins a pivoting movement around the axis 19 in the clockwise direction. Pivoting the anchor clockwise causes the entry pallet to slide upwards (in the drawing) against the front flank of tooth 15. This release phase will end the instant the rest of the pallet will have ceased to obstruct the advance of the front flank of tooth 15. Then, it will be the flattened top of this same tooth (called the impulse plane of the tooth) which will be caused to slide against the face bottom of vane 11 (the vane impulse plane). The angled contact between the two impulse planes will also have the effect of pushing the vane back input 11 upwards, so that the pivoting movement of the anchor 5 in the clockwise direction will be accentuated.
  • the impulse plane of the tooth the flattened top of this same tooth
  • the angled contact between the two impulse planes will also have the effect of pushing the vane back input 11 upwards, so that the pivoting movement of the anchor 5 in the clockwise direction will be accentuated.
  • This impulse phase will end when the input paddle 11 has been pushed back far enough to provide a completely clear passage for the tooth 15.
  • the two successive phases which have just been described during which a tooth 15 of the wheel escapement 3 slides against the surfaces of one of the pallets 11, 13 of the anchor 5, each generating considerable friction.
  • the figures 2A, 2B and 2C are schematic sectional views showing the ribbed surfaces presented by the cut edges of three watchmaking micromechanical parts 1, 10 and 20 which respectively correspond to three variants of a first particular embodiment of the invention.
  • the ribs 21a and the grooves 23a presented by the cut edges of the part 1 form a staggered or stepped pattern, with first intervals 25a in which the ribs are separated from each other. others by narrow furrows whose width is equal to a first distance, and second intervals 27a in which the ribs are separated from each other by a wide furrow whose width is equal to a second distance greater than the first distance.
  • the first intervals 25a and the second intervals 27a alternate cyclically so that a second interval is always inserted between two first intervals and vice versa.
  • the ribbed surface of the cut edge of the part 1 has a pattern which is repeated periodically over the entire height of the part.
  • this pattern is formed of two narrow grooves followed by a single wide groove.
  • the narrow grooves may for example have a width of 2 ⁇ m and a depth comprised between 10 nm and 2 ⁇ m.
  • the wide grooves can have a width of 8 ⁇ m and a depth comprised between 10 nm and 10 ⁇ m.
  • the pattern on the ribbed surface of the cut edge of the part shown in the figure 2B is quite similar to the pattern of the figure 2A . It can in fact be observed that the ribs 21b and the grooves 23b which the cut edges of the piece 10 present form a stepped pattern, or in other words staggered, with first intervals 25b in which the grooves 23b are narrow, and second intervals 27b in which the grooves 23b are wide. Moreover, as was already the case with the example of the figure 2A , the ribbed surface of the cut edge of the part 10 has a pattern which is repeated periodically over the entire height of the part. We can see that in the variant of the figure 2B , this pattern is formed of a single narrow furrow followed by a wide furrow.
  • the narrow grooves may for example have a width of 1 ⁇ m and a depth comprised between 10 nm and 2 ⁇ m.
  • the wide grooves can have a width of 9 ⁇ m and a depth comprised between 10 nm and 10 ⁇ m.
  • the pattern on the ribbed surface of the cut edge of the part shown in the Fig. 2C is quite similar to the patterns of figures 2A and 2B . It can in fact be observed that the ribbed surface of the cut edge of the part 20 has a pattern which is repeated periodically over the entire height of the part.
  • this pattern is made up of five narrow furrows followed by a single wide furrow.
  • the narrow grooves may for example have a width of 1 ⁇ m and a depth comprised between 10 nm and 2 ⁇ m.
  • the wide grooves can have a width of 9 ⁇ m and a depth comprised between 10 nm and 10 ⁇ m.
  • the picture 3 is a schematic sectional view showing the ribbed surface presented by the cut edges of a watchmaking micromechanical part 100 in accordance with a second particular embodiment of the invention.
  • the single second interval 127 is itself formed of a single groove 123 whose width is equal to said second distance.
  • this second distance is greater than a quarter of the total thickness of part 100.
  • part 100 could have a thickness of between 80 ⁇ m and 500 ⁇ m, and said second distance could be between 20 ⁇ m and 150 ⁇ m.
  • the first intervals 125 are two in number. The two intervals 125 each extend between one of the two main surfaces of the part 100 and the second interval 127. It can also be seen that in the example illustrated the two intervals 125 comprise the same number of grooves 123, and that they therefore have the same width. It will however be understood that according to other variants of this embodiment, the two intervals 125 could not comprise the same number of grooves.
  • the grooves which form the first intervals 125 are narrow grooves which can have, for example, a width of 1 ⁇ m and a depth comprised between 10 nm and 2 ⁇ m.
  • the present invention also relates to a method making it possible to manufacture watchmaking micromechanical parts such as those which are the subject of the appended figures 2A, 2B, 2C and 3. A particular mode of implementation of the method of the invention will now be described. .
  • the method of the invention comprises a first step consisting in providing a silicon substrate in the form of a plate.
  • the substrate could not be made entirely of silicon or even be made of doped silicon.
  • the substrate could be formed of silicon on insulator (SOI according to its English abbreviation).
  • SOI silicon on insulator
  • such a substrate with a sandwich structure comprises two layers of silicon connected by a layer silicon oxide intermediate.
  • the substrate could alternatively consist of a layer of silicon added to another type of base, such as metal for example.
  • the next step of the process consists in depositing and structuring an openwork etching mask on a horizontal surface of the substrate.
  • the etching mask is formed on one of the two main faces of the wafer-shaped substrate. If we refer to Figures 2A, 2B, 2C and 3 , it will be understood that in the examples illustrated the etching mask is formed on the upper horizontal face of the substrate.
  • the mask is formed from a material capable of withstanding subsequent etching steps. In accordance with the present example, the etching mask is made of silicon oxide.
  • the method continues with a step consisting of etching the exposed surface of the substrate by reactive ion etching through the apertures of the mask, so as to dig into the substrate to a depth equal to a first distance.
  • Reactive ion etching is known to those skilled in the art as such.
  • the gas most used for the etching step is SF6, and the main parameters making it possible to optimize the etching are the flow of SF6 which is advantageously between 200 and 780 sccm, and preferably between 350 and 600 sccm; the power of the radiofrequency used to excite the plasma which is advantageously between 1000 and 3000 Watts at 2.45 GHz, and preferably between 1500 and 2600 Watts at 2.45 GHz; and the duration of an etching step which is advantageously between 0.8 seconds and 35 seconds and preferably between 1.5 and 7 seconds.
  • the parameters are chosen so that, at the end of the step, the ion etching has dug the silicon substrate to a depth equal to a first predefined distance (for example 2 microns with regard to the example of the figure 2A ).
  • the next step in the process consists in depositing a chemically inert passivation layer on the surfaces exposed by the etching during the previous step.
  • the most commonly used gas for the passivation step is C4F8, and the main parameters making it possible to optimize the deposition of the passivation layer are the flow of C4F8 which is advantageously between 10 and 780 sccm, and preferably between 50 and 400 sccm; the power of the radiofrequency used to excite the plasma which is advantageously between 1000 and 3000 Watts at 2.45 GHz, and preferably between 1500 and 2600 Watts at 2.45 GHz; and the duration of a passivation step which is advantageously between 0.8 seconds and 20 seconds and preferably between 1 and 4 seconds.
  • the process sequence comprising the etching step and the passivation step which have just been described is then repeated.
  • This first iterative sequence is executed consecutively a first predetermined number (n) of times, or equivalently, the first iterative sequence is executed as many times as there are grooves in a first interval (in other words 2 times in the example which is the subject of figure 2A , 1 times according to figure 2B and 5 times according to Fig. 2C ).
  • the parameters of the engraving process it is possible to adapt the parameters of the engraving process. It is for example possible to vary simultaneously the flow of the reactive gas and the duration of an etching step. Indeed, by increasing the flow of active gas, the etching is accelerated. However, this also increases the density of the reactive gas molecules, which makes the etching more isotropic, and therefore makes the grooves deeper. To play on the depth of the grooves, the gas flow factor is therefore greater than the duration of the etching step.
  • the next step in the process is to etch the exposed surface of the substrate by reactive ion etching through the openings in the mask, so as to dig into the substrate on a depth equal to a second distance different from the first distance.
  • the etching parameters are chosen so that, at the end of the step, the ion etching has dug the substrate in silicon over a depth equal to the second predefined distance (for example 8 microns with regard to the example of the figure 2A ).
  • the next step in the process consists in depositing a chemically inert passivation layer on the surfaces exposed by the etching during the previous step.
  • the process sequence comprising the etching step and the passivation step which have just been described is then repeated.
  • This second iterative sequence is performed consecutively a second predetermined number (m) of times, or equivalently, the second iterative sequence is performed as many times as there are grooves in a second interval (in other words, 1 time in each examples illustrated by Figures 2A, 2B, 2C and 3 ).
  • m second predetermined number
  • the flow of the method returns to the start of the first iterative sequence so as to begin etching a new first interval.
  • the process sequence of first etching a first interval and then a second interval can itself be repeated.
  • This third iterative sequence is performed a third determined number (v) of times, or equivalently, the third iterative sequence is performed once for every second interval that the ribbed surface of the cut edge of the part has.
  • the watchmaking micromechanical part is then stripped of its mask before being preferably covered with a layer of silicon oxide before it is finally released from the substrate.
  • the figure 4 is a double graph showing the evolution of the flow of the reactive gas and of the flow of the passivation gas during six consecutive steps of a particular implementation of the method of the invention used to produce the watch micromechanical parts which are the subject from Figures 2A, 2B, 2C and 3 .
  • the way of implementing the figure 4 allows more specifically to produce the micromechanical part of the example of the figure 2A .
  • the graph shows a first iterative sequence comprising a G1 etching step followed by a passivation P1.
  • the flow of SF6 is 400 sccm for 5 seconds.
  • the flux of C4F8 is 200 sccm for 2 seconds.
  • the first iterative sequence is then repeated once so as to complete a first interval formed by two grooves.
  • the method passes to a second sequence consisting of an etching step G2 followed by a passivation step P2.
  • the flow of SF6 is 400 sccm for 35 seconds.
  • the flux of C4F8 is 200 sccm for 15 seconds.
  • the surface of the cut edges of the watch micromechanical part is ribbed and comprises alternating ribs and rectilinear grooves.
  • these ribs and these grooves were horizontal, or in other words, each contained in a plane parallel to the plate.
  • the schematic partial plan view of the figure 5 illustrates a third exemplary embodiment of the invention, the micromechanical part being constituted by an escape wheel.
  • the ribs and the grooves are oriented perpendicular to the main plane of the escape wheel.
  • the partial view of the figure 5 only shows one of the teeth (reference 200) of the escape wheel.
  • the impulse plane of tooth 200 has alternating ridges 221 and grooves 223 which are straight and vertical. It can be seen that the ribs 221 and furrows 223 form a staggered pattern, with first intervals 225 in which the furrows 223 are narrow, and second intervals 227 in which the furrows are wide. Additionally, ribs 221 and grooves 223 exhibit a pattern that repeats periodically across the width of the pulse plane of tooth 200.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Micromachines (AREA)

Claims (15)

  1. Mikromechanisches Uhrenbauteil (1; 10; 20; 100; 200), das in einem Substrat aus Silizium in Plattenform ausgeschnitten wird und dessen ausgeschnittene Ränder Abschnitte umfassen, die dazu vorgesehen sind, als Kontaktflächen zu dienen, die gestaltet sind, um gegen entsprechende Kontaktzonen eines anderen mikromechanischen Bauteils in einer Uhr zu gleiten, und wobei die ausgeschnittenen Ränder eine gerippte Fläche aufweisen, die einen Wechsel von Rippen (21a; 21b; 21c; 121; 221) und Furchen (23a; 23b; 23c; 123; 223) umfasst, wobei die Rippen und die Furchen geradlinig sind; dadurch gekennzeichnet, dass die Rippen und die Furchen ein abgestuftes Motiv bilden, das mehrere erste Intervalle (25a; 25b; 25c; 125; 225), in denen der Zwischenraum, der die Rippen voneinander trennt, gleich einem ersten Abstand ist, und mindestens ein zweites Intervall (27a; 27b; 27c; 127, 227) umfasst, in dem der Zwischenraum zwischen den Rippen gleich einem zweiten Abstand ist, der sich von dem ersten Abstand unterscheidet, wobei der erste Abstand zwischen 200 nm und 5 µm beträgt.
  2. Mikromechanisches Uhrenbauteil (1; 10; 20; 100; 200) nach Anspruch 1, dadurch gekennzeichnet, dass der erste Abstand zwischen 200 nm und 2 µm beträgt.
  3. Mikromechanisches Uhrenbauteil (1; 10; 20; 100) nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass die Rippen und die Furchen jeweils in einer Ebene parallel zu der Platte enthalten sind.
  4. Mikromechanisches Uhrenbauteil (200) nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass die Rippen und die Furchen senkrecht zu den Hauptseiten der Platte sind.
  5. Mikromechanisches Uhrenbauteil (1; 10; 20; 100; 200) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der zweite Abstand größer als der erste Abstand ist.
  6. Mikromechanisches Uhrenbauteil (1; 10; 20; 100; 200) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Furchen, die zu den ersten Intervallen (25a, 25b, 25c; 125; 225) gehören, alle die gleiche Tiefe aufweisen.
  7. Mikromechanisches Uhrenbauteil (1; 10; 20; 200) nach Anspruch 5 oder nach Anspruch 5 und 6, dadurch gekennzeichnet, dass das abgestufte Motiv eine Vielzahl von zweiten Intervallen (27a; 27b; 27c; 227) umfasst, und dadurch, dass der zweite Abstand zwischen 200 nm und 50 µm beträgt.
  8. Mikromechanisches Uhrenbauteil (1; 10; 20; 200) nach Anspruch 7, dadurch gekennzeichnet, dass die Furchen, die zu den zweiten Intervallen (27a; 27b; 27c; 227) gehören, alle die gleiche Tiefe aufweisen, und dadurch, dass die zweite Tiefe zwischen 10 nm und 10 µm beträgt.
  9. Mikromechanisches Uhrenbauteil (100) nach Anspruch 5 oder nach Anspruch 5 und 6, dadurch gekennzeichnet, dass das abgestufte Motiv ein einziges zweites Intervall (127) umfasst, das eine einzige Furche (123) umfasst, und dadurch, dass der zweite Abstand zwischen 200 nm und 2/3 der Gesamthöhe des Bauteils beträgt.
  10. Mikromechanisches Uhrenbauteil (100) nach Anspruch 9, dadurch gekennzeichnet, dass die Tiefe der einzigen Furche (123) des zweiten Intervalls (127) zwischen 10 nm und 50 µm beträgt.
  11. Mikromechanisches Uhrenbauteil (1; 10; 20; 100) nach Anspruch 3 und 6, dadurch gekennzeichnet, dass die erste Tiefe zwischen 10 nm und 2 µm beträgt.
  12. Mikromechanisches Uhrenbauteil (200) nach Anspruch 4 und 6, dadurch gekennzeichnet, dass die erste Tiefe zwischen 500 nm und 4 µm beträgt.
  13. Verfahren zur Herstellung eines mikromechanischen Bauteils aus monokristallinem oder polykristallinem Silizium nach Anspruch 1 und 3, wobei das Verfahren die folgenden Schritte umfasst:
    a) Bereitstellen eines Substrats aus Silizium;
    b) Abscheiden und Strukturieren einer durchbrochenen Ätzmaske auf einer horizontalen Fläche des Substrats;
    c) Angreifen der Fläche des Substrats durch die Durchbrechungen der Maske durch reaktives Ionenätzen, derart dass in dem Substrat gegraben wird, bis ein erster Abstand erreicht wird;
    d) Abscheiden einer chemisch inerten Passivierungsschicht auf den durch das Ätzen während des vorhergehenden Schritts freigelegten Flächen;
    e) Wiederholen der Ausführung einer ersten Folge von Schritten, die den Schritt (c), gefolgt vom Schritt (d) umfasst, bis die erste Folge eine erste vorbestimmte Anzahl (n) von Malen durchgeführt wurde, soweit das reaktive Ionenätzen nicht durch die gesamte Dicke des Substrats gegraben hat;
    f) Befreien des mikromechanischen Bauteils von der Maske und dem Substrat;
    dadurch gekennzeichnet, dass das Verfahren zwischen dem Schritt e) und dem Schritt f) eine zweite Folge von Schritten umfasst, die lediglich durchzuführen sind, wenn der Schritt e) während der Ausführung des Verfahrens noch keine bestimmte Anzahl (v) von Malen durchgeführt wurde, wobei die zweite Folge die folgenden Schritte umfasst:
    x) Angreifen der Fläche des Substrats durch die Durchbrechungen der Maske durch reaktives Ionenätzen, derart dass in dem Substrat gegraben wird, bis ein zweiter Abstand erreicht wird, der sich von dem ersten Abstand unterscheidet;
    y) Abscheiden einer chemisch inerten Passivierungsschicht auf den durch das Ätzen während des vorhergehenden Schritts freigelegten Flächen;
    z) Wiederholen der Ausführung einer zweiten Folge von Schritten, die den Schritt x), gefolgt vom Schritt y) umfasst, bis die zweite Folge eine zweite vorbestimmte Anzahl (m) von Malen durchgeführt wurde; dann Zurückkehren zum Schritt c).
  14. Verfahren zur Herstellung eines mikromechanischen Bauteils aus mono- oder polykristallinem Silizium nach Anspruch 1 und 4, wobei das Verfahren die folgenden Schritte umfasst:
    a) Bereitstellen eines Substrats aus Silizium;
    b) Abscheiden und Strukturieren einer durchbrochenen Ätzmaske auf einer horizontalen Fläche des Substrats;
    c) Angreifen der Fläche des Substrats durch die Durchbrechungen der Maske durch reaktives Ionenätzen, derart dass in dem Substrat gegraben wird, bis ein erster Abstand erreicht wird;
    d) Abscheiden einer chemisch inerten Passivierungsschicht auf den durch das Ätzen während des vorhergehenden Schritts freigelegten Flächen;
    e) Wiederholen der Ausführung einer Folge von Schritten, die den Schritt (c), gefolgt vom Schritt (d) umfasst, bis die Folge eine vorbestimmte Anzahl von Malen durchgeführt wurde, oder das reaktive Ionenätzen durch die gesamte Dicke des Substrats gegraben hat;
    f) Befreien des mikromechanischen Bauteils von der Maske und dem Substrat;
    dadurch gekennzeichnet, dass während des Schrittes (b) die Ätzmaske derart strukturiert wird, dass die Ränder der Öffnungen der durchbrochenen Maske nicht glatt sind, sondern im Gegenteil ein ausgebogtes Profil aufweisen, das aus einem Wechsel von Erhabenheiten und Höhlungen besteht, die ein abgestuftes Motiv mit mehreren ersten Intervallen, in denen der Zwischenraum, der die Erhabenheiten voneinander trennt, gleich einem ersten Abstand ist, und mindestens einem zweiten Intervall bilden, in dem der Zwischenraum zwischen den Erhabenheiten gleich einem zweiten Abstand ist, der sich von dem ersten Abstand unterscheidet, wobei der erste Abstand zwischen 500 nm und 4 µm beträgt.
  15. Verfahren zur Herstellung eines mikromechanischen Bauteils nach Anspruch 14, dadurch gekennzeichnet, dass der erste Abstand zwischen 200 nm und 2 µm beträgt.
EP19707492.5A 2018-02-07 2019-02-04 Mikromechanisches uhrenbauteil Active EP3750010B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP18155609 2018-02-07
PCT/IB2019/050875 WO2019155347A1 (fr) 2018-02-07 2019-02-04 Pièce de micromécanique horlogère

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EP3750010A1 EP3750010A1 (de) 2020-12-16
EP3750010B1 true EP3750010B1 (de) 2022-01-19

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US (1) US11829107B2 (de)
EP (1) EP3750010B1 (de)
JP (1) JP7204761B2 (de)
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EP3141520A1 (de) * 2015-09-08 2017-03-15 Nivarox-FAR S.A. Herstellungsverfahren für ein mikromechanisches uhrenbauteil und entsprechendes mikromechanisches uhrenbauteil

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CH710846A2 (fr) * 2015-03-13 2016-09-15 Swatch Group Res & Dev Ltd Pièce de micromécanique comportant un réservoir tribologique micro-structuré pour une substance lubrifiante.
EP3141520A1 (de) * 2015-09-08 2017-03-15 Nivarox-FAR S.A. Herstellungsverfahren für ein mikromechanisches uhrenbauteil und entsprechendes mikromechanisches uhrenbauteil

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US11829107B2 (en) 2023-11-28
CN111684364B (zh) 2021-10-19
JP7204761B2 (ja) 2023-01-16
EP3750010A1 (de) 2020-12-16
WO2019155347A1 (fr) 2019-08-15
US20210034015A1 (en) 2021-02-04
JP2021513069A (ja) 2021-05-20
CN111684364A (zh) 2020-09-18

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