EP3626864B1 - Procédé d'élimination d'un revêtement en matière dure - Google Patents
Procédé d'élimination d'un revêtement en matière dure Download PDFInfo
- Publication number
- EP3626864B1 EP3626864B1 EP18195134.4A EP18195134A EP3626864B1 EP 3626864 B1 EP3626864 B1 EP 3626864B1 EP 18195134 A EP18195134 A EP 18195134A EP 3626864 B1 EP3626864 B1 EP 3626864B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- mol
- substrate
- hard material
- material coating
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000576 coating method Methods 0.000 title claims description 47
- 239000000463 material Substances 0.000 title claims description 47
- 239000011248 coating agent Substances 0.000 title claims description 44
- 238000000034 method Methods 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims description 70
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 30
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000007864 aqueous solution Substances 0.000 claims description 17
- 239000003792 electrolyte Substances 0.000 claims description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- 229910017052 cobalt Inorganic materials 0.000 claims description 11
- 239000010941 cobalt Substances 0.000 claims description 11
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 6
- 239000004615 ingredient Substances 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 3
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 claims description 3
- IRXRGVFLQOSHOH-UHFFFAOYSA-L dipotassium;oxalate Chemical compound [K+].[K+].[O-]C(=O)C([O-])=O IRXRGVFLQOSHOH-UHFFFAOYSA-L 0.000 claims description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 2
- 150000004692 metal hydroxides Chemical class 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- 229910052979 sodium sulfide Inorganic materials 0.000 claims description 2
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 claims 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 24
- 230000007704 transition Effects 0.000 description 11
- 239000000243 solution Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000523 sample Substances 0.000 description 5
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 238000000724 energy-dispersive X-ray spectrum Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-L Oxalate Chemical compound [O-]C(=O)C([O-])=O MUBZPKHOEPUJKR-UHFFFAOYSA-L 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 150000004763 sulfides Chemical class 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JOJPFQVZNUNZBO-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2].[Mn+2] JOJPFQVZNUNZBO-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- VDQVEACBQKUUSU-UHFFFAOYSA-M disodium;sulfanide Chemical compound [Na+].[Na+].[SH-] VDQVEACBQKUUSU-UHFFFAOYSA-M 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000011850 initial investigation Methods 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229910000471 manganese heptoxide Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- -1 sulfide ions Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Definitions
- the present invention relates to a method for removing a hard material coating which is applied to the substrate of a tool.
- the invention further relates to a mixture of substances, an aqueous solution and an electrolyte for use in this method.
- Cutting tools that are used in the metalworking sector, e.g. as milling cutters, are exposed to high mechanical and thermal loads. To improve the cutting performance and to extend the service life, these tools are coated with hard materials on the work surfaces after their mechanical manufacture. These hard materials are usually compounds of refractory metals (elements of the 4th, 5th and 6th subgroups of the periodic table, i.e. Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W) with the elements B, C, N, O and Si.
- refractory metals elements of the 4th, 5th and 6th subgroups of the periodic table, i.e. Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W
- Classic methods for stripping a tool include mechanical stripping using blasting material (such as sandblasting the tool) until the hard material coating has been removed.
- blasting material such as sandblasting the tool
- the tool is usually subjected to great forces, which can lead to deformations and mechanical damage to the substrate.
- WO 99/64646 A1 describes a method in which the hard material coating is applied to an intermediate layer applied to the substrate.
- This intermediate layer is dissolved by means of a solution that can pass through pores in the hard material coating, which subsequently also leads to the removal of the hard material coating.
- the solution includes hydrogen peroxide, disodium oxalate, and sodium hydroxide.
- the object of the present invention is to completely remove a hard material coating present on a tool without damaging the uncoated substrate in the process.
- a method for removing a hard material coating from the substrate of a tool comprising providing an electrolyte which is an aqueous solution with 4 to 6 mol / l OH - , 0.1 to 0.5 mol / l S 2- and 0.5 to 2 mol / l oxalate, placing the tool in the electrolyte and dissolving the hard material coating by contacting the tool with a DC voltage source.
- This electrochemical process for dissolving the hard material coating has proven to be advantageous, since in such an electrochemical process the substrate material forms a water-insoluble sulfide which serves as a passivation, whereby the underlying substrate is protected. At the same time, the hard material coating is dissolved. This effect proves to be an advantage in particular in uncoated areas of the substrate or in areas which no longer have any coating.
- the substrate has at least one of the metals W, Co or Fe or another metal which can form sulfides which are insoluble in water.
- Preferred substrate materials therefore include W, Co and / or Fe, since these form passivating sulfide layers.
- a base layer can be introduced between the hard material coating and the substrate.
- a TiN base layer is often provided for an AlTiN hard material coating.
- This base layer can simply be removed in a next step after the hard material coating has been removed.
- the tool is treated with a mixture comprising NH 3 and H 2 O 2 to remove a base layer arranged between the hard material coating and the substrate.
- the mixture preferably comprises a freshly prepared solution of an aqueous NH 3 solution and an aqueous H 2 O 2 solution.
- the base layer is TiN.
- the method according to the invention can be used for any hard material coating if the hard material coating contains at least one of the refractory metals mentioned above (Ti, Zr, Hf, V, Nb, Ta, Cr, Mo or W).
- the hard material coating contains at least one of the refractory metals mentioned above (Ti, Zr, Hf, V, Nb, Ta, Cr, Mo or W).
- the tool is galvanically provided with a metal layer, for example a cobalt layer, on those parts of the substrate that do not have a hard material coating before it is placed in the electrolyte.
- a metal layer for example a cobalt layer
- the aqueous solution preferably comprises further constituents in a total amount of not more than 2 mol / l.
- the aqueous solution particularly preferably does not comprise any further constituents.
- Another aspect relates to an electrolyte with such an aqueous solution for a method for removing a hard material coating from the substrate of a tool.
- the samples examined (according to the substrate) consisted of high-speed steel and hard metal.
- the samples were each coated with TiN / AlTiN or AlCrN.
- the hard metal coating was incomplete, as it was important to have uncoated parts on the substrate to determine whether the set task had been completely achieved and to show that these were not attacked by the electrochemical treatment.
- the problem was solved by developing an alkaline electrolyte which contains oxalate and sulfide ions.
- the sulfide ions form an insoluble phase with the substrate, which is passivated to protect against attack by the stripping process.
- FIG. 11 to 26 it is a question of the representation of four representative points of four decoated samples with different substrate / layer combinations, ie, the Figures 11-14 , 15 to 18 , 19 to 22 and 23 to 26 each form a sample.
- the first of the figures that belong together i.e. Figures 11, 15 , 19th or 23
- the second figure in each case i.e. Figures 12, 16 , 20th or 24
- the third figure i.e. Fig. 13 , 17, 21 or 25
- the fourth fig. (I.e. Fig. 14 , 18, 22 or 26) represents the transition from the stripped substrate to the treated but originally uncoated substrate.
- Fig. 20 shows the exposed hard metal substrate after the stripping process, an attack can be seen, which is, however, significantly weaker than in the systems tested so far.
- the substrate is only attacked in those areas where there were pores in the TiN / AlTiN layer ( Fig. 21 ).
- the attack has only minor effects on the dimensions of the substrate.
- the TiN base layer of the TiN / AlTiN coating can be removed with a mixture of NH 3 (25%) and H 2 O 2 (30%) in a ratio of 1 + 3 at room temperature within 4-5 minutes without attacking the substrates.
- This mixture should always be freshly prepared in small quantities ( ⁇ 50ml), as H 2 O 2 decomposes quickly in an alkaline environment.
- Dissolved heavy metals (Co, Fe) catalyze the decomposition and lead to strong heating and foam formation.
- the solution can be applied to the substrates by means of a spraying process, the solution not being produced with a static mixer until immediately in front of the atomizing nozzle.
- the electrolyte system also works as expected with high speed steel substrates. The stripping is complete and the attack on the substrate is minimal.
- AlCrN can also be removed from high speed steel substrates with this system. Here, too, it can be observed that the attack on the substrate due to the milder conditions when removing AlCrN is less than with the high-speed steel TiN / AlTiN system.
- Galvanic Co layer as additional substrate protection The attack on the substrate was further restricted by a selective, thin galvanic coating of the hard metal substrate.
- cobalt was chosen because it is the matrix material of the hard metal and its use therefore does not introduce any undesired impurities into the system.
- any metal or alloy that can be electrodeposited is suitable as protection, which is insoluble in the stripping electrolyte and can then be removed again without attacking the substrate (e.g. iron, zinc, manganese, copper, etc.).
- the TiN / AlTiN layer despite its lower electrical conductivity and the ceramic structure, can be adhesively coated with cobalt at high currents.
- the method of reducing the current density in electroplating is a quick and simple solution that uses the lower electrical conductivity of the coating compared to the substrate to prevent electroplating of the free substrate.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
Claims (12)
- Procédé d'élimination d'un revêtement en matière dure du substrat d'un outil, comprenant :• la fourniture d'un électrolyte qui contient une solution aqueuse ayant 4 à 6 mol/l d'OH-, 0,1 à 0,5 mol/l de S2- et 0,5 à 2 mol/l d'oxalate,• le placement de l'outil dans l'électrolyte et• la dissolution du revêtement en matière dure en mettant l'outil en contact avec une source de tension continue.
- Procédé selon la revendication 1, caractérisé en ce que l'outil est ensuite traité avec un mélange comprenant du NH3 et du H2O2 pour éliminer une couche de base disposée entre le revêtement en matière dure et le substrat.
- Procédé selon la revendication 1 ou la revendication 2, caractérisé en ce que la couche de base est en TiN.
- Procédé selon l'une des revendications 1 à 3, caractérisé en ce que le revêtement en matière dure se compose d'AlCrN ou d'AlTiN.
- Procédé selon l'une des revendications 1 à 4, caractérisé en ce que l'outil, avant d'être placé dans l'électrolyte, est galvaniquement muni d'une couche métallique, de préférence une couche de cobalt, sur les parties du substrat ne présentant pas de revêtement en matière dure.
- Mélange de substances pour préparer une solution aqueuse selon la revendication 7, qui est composé de :• 70 à 87 % en moles d'un hydroxyde métallique,• 1 à 6 % en moles d'un sulfure hydrosoluble,• 11 à 24 % en moles d'acide oxalique ou d'un sel de l'acide oxalique,• 2 % en moles au maximum d'autres composants.
- Solution aqueuse destinée à un procédé d'élimination d'un revêtement en matière dure du substrat d'un outil selon la revendication 1, comprenant :• 4 à 6 mol/l d'OH-,• 0,1 à 0,5 mol/l de S2-,• 0,5 à 2 mol/l d'oxalate.
- Solution aqueuse selon la revendication 7, caractérisée par :• 4,8 à 5,2 mol/l d'OH-, de préférence de KOH ou de NaOH,• 0,24 à 0,27 6 mol/l de S2-, de préférence de K2S ou de Na2S,• 0,8 à 1,2 mol/l d'oxalate, de préférence d'oxalate de sodium ou d'oxalate de potassium.
- Solution aqueuse selon la revendication 7 ou la revendication 8, caractérisée en ce que la solution aqueuse contient d'autres composants dans une quantité totale n'excédant pas 2 mol/l.
- Solution aqueuse selon la revendication 7 ou la revendication 8, caractérisée en ce que la solution aqueuse ne contient pas d'autres composants.
- Electrolyte destiné à un procédé d'élimination d'un revêtement en matière dure du substrat d'un outil selon la revendication 1, comprenant un mélange de substances selon la revendication 6 ou une solution aqueuse selon l'une des revendications 7 à 10.
- Cellule galvanique comprenant un électrolyte selon la revendication 11.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DK18195134.4T DK3626864T3 (da) | 2018-09-18 | 2018-09-18 | Fremgangsmåde til fjernelse af en hårdmaterialecoating |
ES18195134T ES2875760T3 (es) | 2018-09-18 | 2018-09-18 | Procedimiento para eliminar un recubrimiento de materia dura |
EP18195134.4A EP3626864B1 (fr) | 2018-09-18 | 2018-09-18 | Procédé d'élimination d'un revêtement en matière dure |
PCT/EP2019/075008 WO2020058336A1 (fr) | 2018-09-18 | 2019-09-18 | Procédé destiné à éliminer un revêtement de matière dure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP18195134.4A EP3626864B1 (fr) | 2018-09-18 | 2018-09-18 | Procédé d'élimination d'un revêtement en matière dure |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3626864A1 EP3626864A1 (fr) | 2020-03-25 |
EP3626864B1 true EP3626864B1 (fr) | 2021-03-17 |
Family
ID=63642688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP18195134.4A Active EP3626864B1 (fr) | 2018-09-18 | 2018-09-18 | Procédé d'élimination d'un revêtement en matière dure |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP3626864B1 (fr) |
DK (1) | DK3626864T3 (fr) |
ES (1) | ES2875760T3 (fr) |
WO (1) | WO2020058336A1 (fr) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3083165A (en) * | 1958-09-10 | 1963-03-26 | Pennsalt Chemicals Corp | Aluminum etchant compositions |
US4720332A (en) * | 1986-04-21 | 1988-01-19 | Coffey Barry W | Nickel strip formulation |
JP4824163B2 (ja) | 1998-06-11 | 2011-11-30 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | 硬質材層を除去するための方法 |
FR2997941B1 (fr) * | 2012-11-15 | 2023-03-03 | Arkema France | Procede de preparation de sulfure de metal alcalin |
KR20170004970A (ko) * | 2014-03-18 | 2017-01-11 | 플라티트 아게 | 스틸과 초경합금 기판에서 세라믹 하드 물질층의 디코팅 방법 |
-
2018
- 2018-09-18 ES ES18195134T patent/ES2875760T3/es active Active
- 2018-09-18 EP EP18195134.4A patent/EP3626864B1/fr active Active
- 2018-09-18 DK DK18195134.4T patent/DK3626864T3/da active
-
2019
- 2019-09-18 WO PCT/EP2019/075008 patent/WO2020058336A1/fr active Application Filing
Non-Patent Citations (1)
Title |
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None * |
Also Published As
Publication number | Publication date |
---|---|
EP3626864A1 (fr) | 2020-03-25 |
ES2875760T3 (es) | 2021-11-11 |
DK3626864T3 (da) | 2021-06-07 |
WO2020058336A1 (fr) | 2020-03-26 |
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