EP3591471A3 - Control apparatus, exposure apparatus, and method of manufacturing article - Google Patents
Control apparatus, exposure apparatus, and method of manufacturing article Download PDFInfo
- Publication number
- EP3591471A3 EP3591471A3 EP19182155.2A EP19182155A EP3591471A3 EP 3591471 A3 EP3591471 A3 EP 3591471A3 EP 19182155 A EP19182155 A EP 19182155A EP 3591471 A3 EP3591471 A3 EP 3591471A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- moving member
- control apparatus
- manufacturing article
- driving
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/32—Automatic controllers electric with inputs from more than one sensing element; with outputs to more than one correcting element
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/41—Servomotor, servo controller till figures
- G05B2219/41427—Feedforward of position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Feedback Control In General (AREA)
- Control Of Multiple Motors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018127798A JP7148295B2 (ja) | 2018-07-04 | 2018-07-04 | 制御装置、露光装置及び物品の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3591471A2 EP3591471A2 (en) | 2020-01-08 |
EP3591471A3 true EP3591471A3 (en) | 2020-06-10 |
Family
ID=67060313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19182155.2A Pending EP3591471A3 (en) | 2018-07-04 | 2019-06-25 | Control apparatus, exposure apparatus, and method of manufacturing article |
Country Status (7)
Country | Link |
---|---|
US (2) | US10969698B2 (ko) |
EP (1) | EP3591471A3 (ko) |
JP (2) | JP7148295B2 (ko) |
KR (1) | KR102451339B1 (ko) |
CN (1) | CN110687756B (ko) |
SG (2) | SG10202102082UA (ko) |
TW (1) | TWI765160B (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020124010A (ja) * | 2019-01-29 | 2020-08-13 | キヤノン株式会社 | 制御装置、露光装置、および物品の製造方法 |
JP2022129161A (ja) * | 2021-02-24 | 2022-09-05 | キヤノン株式会社 | 制御装置、位置決め装置、リソグラフィー装置および物品製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5877845A (en) * | 1996-05-28 | 1999-03-02 | Nippon Kogaku Kk | Scanning exposure apparatus and method |
US20060238739A1 (en) * | 2005-04-25 | 2006-10-26 | Asml Netherlands B.V. | Lithographic apparatus, position quantity controller and control method |
US20110090475A1 (en) * | 2009-10-19 | 2011-04-21 | Canon Kabushiki Kaisha | Scanning exposure apparatus, control apparatus and method of manufacturing device |
WO2011145743A1 (en) * | 2010-05-18 | 2011-11-24 | Nikon Corporation | Determination of a commutation offset and a compensation map for a stage |
US20130265558A1 (en) * | 2012-04-06 | 2013-10-10 | Canon Kabushiki Kaisha | Control apparatus, lithography apparatus, and method of manufacturing article |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003264133A (ja) * | 2002-03-08 | 2003-09-19 | Nikon Corp | ステージ制御装置、露光装置、デバイス製造方法、及びステージ制御方法 |
JP2003264134A (ja) * | 2002-03-08 | 2003-09-19 | Nikon Corp | ステージ制御装置、露光装置、及びデバイス製造方法 |
WO2005036620A1 (ja) * | 2003-10-10 | 2005-04-21 | Nikon Corporation | 露光方法及び露光装置、並びにデバイス製造方法 |
TWI573175B (zh) * | 2003-10-28 | 2017-03-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
TWI242490B (en) | 2003-12-12 | 2005-11-01 | Ind Tech Res Inst | Servo motor control apparatus for electric injection molding machine |
US7446854B2 (en) * | 2006-02-07 | 2008-11-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7576832B2 (en) | 2006-05-04 | 2009-08-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7630059B2 (en) | 2006-07-24 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2009088018A (ja) | 2007-09-27 | 2009-04-23 | Nikon Corp | ステージ制御方法、ステージ制御装置、露光方法及び露光装置並びにデバイス製造方法 |
US8853988B2 (en) * | 2009-03-18 | 2014-10-07 | Nikon Corporation | Control systems and methods for compensating for effects of a stage motor |
JP5375323B2 (ja) * | 2009-05-15 | 2013-12-25 | 株式会社ニコン | 移動体装置、露光装置、及び移動体制御方法 |
US8278940B2 (en) * | 2009-09-30 | 2012-10-02 | Tektronix, Inc. | Signal acquisition system having a compensation digital filter |
CN103293861B (zh) | 2012-02-22 | 2015-07-22 | 上海微电子装备有限公司 | 工件台和掩模台的同步控制方法及其系统 |
NL2010456A (en) * | 2012-04-18 | 2013-10-21 | Asml Holding Nv | Lithographic apparatuses and methods for compensating for eigenmode coupling. |
TWM497772U (zh) * | 2014-10-13 | 2015-03-21 | Cheng Shi Entpr Co Ltd | 水平量測裝置及使用其之半導體製程機台 |
NL2016797A (en) * | 2015-06-19 | 2016-12-22 | Asml Netherlands Bv | Control system, positioning system, lithographic apparatus and device manufacturing method. |
US10759519B2 (en) * | 2017-10-31 | 2020-09-01 | The Boeing Company | Adaptive feedback control of force fighting in hybrid actuation systems |
-
2018
- 2018-07-04 JP JP2018127798A patent/JP7148295B2/ja active Active
-
2019
- 2019-06-20 SG SG10202102082UA patent/SG10202102082UA/en unknown
- 2019-06-20 SG SG10201905706WA patent/SG10201905706WA/en unknown
- 2019-06-24 TW TW108121930A patent/TWI765160B/zh active
- 2019-06-25 EP EP19182155.2A patent/EP3591471A3/en active Pending
- 2019-06-27 US US16/454,500 patent/US10969698B2/en active Active
- 2019-07-03 KR KR1020190079783A patent/KR102451339B1/ko active IP Right Grant
- 2019-07-04 CN CN201910596648.2A patent/CN110687756B/zh active Active
-
2021
- 2021-03-05 US US17/193,075 patent/US11630398B2/en active Active
-
2022
- 2022-09-09 JP JP2022143931A patent/JP7371190B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5877845A (en) * | 1996-05-28 | 1999-03-02 | Nippon Kogaku Kk | Scanning exposure apparatus and method |
US20060238739A1 (en) * | 2005-04-25 | 2006-10-26 | Asml Netherlands B.V. | Lithographic apparatus, position quantity controller and control method |
US20110090475A1 (en) * | 2009-10-19 | 2011-04-21 | Canon Kabushiki Kaisha | Scanning exposure apparatus, control apparatus and method of manufacturing device |
WO2011145743A1 (en) * | 2010-05-18 | 2011-11-24 | Nikon Corporation | Determination of a commutation offset and a compensation map for a stage |
US20130265558A1 (en) * | 2012-04-06 | 2013-10-10 | Canon Kabushiki Kaisha | Control apparatus, lithography apparatus, and method of manufacturing article |
Also Published As
Publication number | Publication date |
---|---|
US20210191281A1 (en) | 2021-06-24 |
JP2020008652A (ja) | 2020-01-16 |
SG10201905706WA (en) | 2020-02-27 |
US11630398B2 (en) | 2023-04-18 |
CN110687756B (zh) | 2022-08-23 |
JP2022188045A (ja) | 2022-12-20 |
TWI765160B (zh) | 2022-05-21 |
KR102451339B1 (ko) | 2022-10-07 |
TW202006485A (zh) | 2020-02-01 |
SG10202102082UA (en) | 2021-04-29 |
JP7371190B2 (ja) | 2023-10-30 |
US20200012200A1 (en) | 2020-01-09 |
KR20200004759A (ko) | 2020-01-14 |
US10969698B2 (en) | 2021-04-06 |
CN110687756A (zh) | 2020-01-14 |
JP7148295B2 (ja) | 2022-10-05 |
EP3591471A2 (en) | 2020-01-08 |
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