EP3571327A1 - Procédé de fabrication d'un élément de palier lisse à plusieurs couches - Google Patents

Procédé de fabrication d'un élément de palier lisse à plusieurs couches

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Publication number
EP3571327A1
EP3571327A1 EP18719738.9A EP18719738A EP3571327A1 EP 3571327 A1 EP3571327 A1 EP 3571327A1 EP 18719738 A EP18719738 A EP 18719738A EP 3571327 A1 EP3571327 A1 EP 3571327A1
Authority
EP
European Patent Office
Prior art keywords
substrate
layer
target
particles
bearing element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP18719738.9A
Other languages
German (de)
English (en)
Inventor
Johann Nagl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Miba Gleitlager Austria GmbH
Original Assignee
Miba Gleitlager Austria GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Miba Gleitlager Austria GmbH filed Critical Miba Gleitlager Austria GmbH
Publication of EP3571327A1 publication Critical patent/EP3571327A1/fr
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02—Parts of sliding-contact bearings
    • F16C33/04—Brasses; Bushes; Linings
    • F16C33/06—Sliding surface mainly made of metal
    • F16C33/12—Structural composition; Use of special materials or surface treatments, e.g. for rust-proofing
    • F16C33/122—Multilayer structures of sleeves, washers or liners
    • F16C33/125—Details of bearing layers, i.e. the lining
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2223/00—Surface treatments; Hardening; Coating
    • F16C2223/30—Coating surfaces
    • F16C2223/60—Coating surfaces by vapour deposition, e.g. PVD, CVD
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2240/00—Specified values or numerical ranges of parameters; Relations between them
    • F16C2240/40—Linear dimensions, e.g. length, radius, thickness, gap
    • F16C2240/60—Thickness, e.g. thickness of coatings

Definitions

  • the invention relates to a method for producing a multilayer sliding bearing element, according to which a metallic layer is deposited by means of sputtering at least one target in a chamber of a cathode sputtering system on a substrate, comprising the steps:
  • the invention relates to a multilayer sliding bearing element comprising a support layer and a metallic layer arranged thereon, wherein the metallic layer is produced by a sputtering method.
  • cathode sputtering in the plain bearing technology is already known from the prior art, for example DE 36 29 451 AI known.
  • the adhesive strength of the deposited layer on the substrate may be insufficient.
  • DE 40 27 362 A1 has described a method for producing a plain bearing which has an excellent bond between a plain bearing alloy layer and a surface layer thereof and comprises the following method steps:
  • this is connected in a first step as a cathode and applied a potential of 500 volts between this cathode and an additional anode.
  • the positively charged argon ions are brought into collision against the substrate with which the surface oxide film and the modified surface layer on the substrate have been removed.
  • the coating chamber is evacuated again to clean it.
  • argon gas is again introduced into the vacuum chamber.
  • a separate target which is connected for the coating of the substrate as a cathode, are generated by a glow discharge between the anode and this target, and thereby caused bombardment of the target with argon ions particles due to the impact energy and deposited on the substrate.
  • the evaporation of the target occurs only after the substrate has been heated, so that the reaction energy between the bearing alloy and the surface layer is increased, thereby accelerating the alloying thereof. As a result, a higher level of adhesion is obtained between the two, and in addition, the bonding between the particles of the surface layer alloy is increased, thereby producing a firmly adhered surface layer.
  • the object of the present invention was to provide a multilayer sliding bearing element with a high adhesive strength of a metallic layer deposited on a supporting layer by means of cathode sputtering processes.
  • the object is achieved with the aforementioned method, according to which it is provided that in the step of the ion etching of the substrate, the target is connected as an anode and at least a portion of the substrate particles are deposited on the target and then the target for the deposition of the metallic layer is reversed on the surface of the substrate. Furthermore, the object of the invention with the aforementioned Mehr Anlagenitla- gerelement is achieved, in which between the metallic layer and the support layer, a transition zone is formed in which both a portion of the material of the support layer and a portion of the material of the metallic layer is present wherein, starting at the surface of the support layer, the proportion of the material of the metallic layer within the transition zone increases.
  • substrate particles on the target By depositing substrate particles on the target during the ion etching, a mixture of substrate particles and target particles is already achieved on the target, which can then be deposited together on the substrate. Depending on the amount of substrate particles deposited on the target, there may also be a layer on the target consisting of only substrate particles. As a result, the target is atomized and the target particles are deposited on the substrate. The target particles now also comprise the previously deposited substrate particles, so that a mixture of the two particle types is precipitated. This in turn improves the adhesion of the metallic layer to the substrate since the transition from substrate to metallic layer does not occur abruptly. As an additional effect, a more efficient production of the multi-layer sliding bearing element can be realized with this method, since a cleaning of the coating chamber of particles originating from the substrate, as is carried out in the above cited prior art, is no longer absolutely necessary.
  • Adhesive strength can be further improved because during the ion etching relatively much substrate material is removed, which is available for the subsequent deposition of the metallic layer, whereby the layer thickness of the transition zone widened and thus the transition from the material of the transition zone can be made more gentle on the metallic layer. It can thus be achieved a stronger mechanical clamping of the components and thus an increase in the adhesion of the metallic layer on the substrate.
  • the substrate particles and target particles are alloy particles.
  • a further improvement of the adhesion of the metallic layer on the substrate can be achieved.
  • the surface of the substrate to be coated can also be cleaned, for example of oxides, ie non-metallic particles. Again, a shortening of the procedure can be achieved.
  • the non-metallic particles can also be deposited on the at least one target in this method step, so that they are at least partially re-transferred back into the substrate during the deposition of the metallic layer.
  • non-metallic particles which are also present on other surfaces of the supporting layer not provided with the metallic layer are present in the transition zone. Surprisingly, these particles do not interfere with the coating process and the adhesion of the metallic layer to the substrate. Presumably, this is because these non-metallic particles, which were concentrated on the substrate on the relatively thin surface layer, are distributed during the deposition of the metallic layer to a larger volume or a larger layer thickness. Not only is the intermediate rinsing of the coating chamber for the removal of oxidic constituents avoided with this embodiment variant, but these non-metallic particles, for example ceramic particles, optionally also have a reinforcing effect in the transition zone.
  • the transition zone has a layer thickness between 0.3 ⁇ and 5 ⁇ , which in turn a more or less gentle transition from the substrate to the metallic layer can be achieved.
  • Figure 1 is a multi-layer sliding bearing element in side view.
  • Fig. 2 is a sputtering chamber.
  • alloying compositions are specified below or in general terms, these are to be understood, unless stated otherwise, in such a way that the proportions are stated in each case in% by weight.
  • Fig. 1 shows a multi-layer sliding bearing element 1 in the form of a plain bearing half shell. Shown is a two-layer variant of the multi-layer sliding bearing element 1, consisting of a support layer 2 and a sliding layer 3, which is on a front side 4 (radially inner side) of the multi-layer sliding bearing element 1, which is zuwendbar a component to be supported, arranged.
  • a bearing metal layer 5 may be arranged between the sliding layer 3 and the support layer 2, as indicated by dashed lines in Fig. 1.
  • the multi-layer sliding bearing element 1 can also be designed differently, for example as a bearing bush, as indicated by dashed lines in FIG. 1.
  • embodiments such as thrust rings, axially running sliding shoes, or the like are possible.
  • the support layer 2 is preferably made of steel, but may also consist of a material which gives the multilayer sliding bearing element 1 the required structural strength. Such materials are known from the prior art.
  • the sliding layer 3 may be made of an alloy having one element selected from the group consisting of tin, aluminum, copper, silver, carbon, molybdenum, indium as the base element constituting the skin component of the alloy. However, it can also be provided that the sliding layer 3 consists of only one element, for example silver, Tin, carbon, indium. Particularly preferably, the sliding layer 3, or generally the metallic layer, is produced only from silver or from one or as a silver-based alloy.
  • a sliding bearing element blank 6 is prepared.
  • the slide bearing element blank 6 consists at least of the support layer 2, but may also have at least one of the above-mentioned layers, in particular the bearing metal layer 5.
  • the production of this slide bearing element blank 6 (FIG. 2) can be done according to the prior art, for example by a steel plate a bearing metal layer is applied and connected by rollers. Other known methods are also applicable.
  • the multilayer guide bearing element 1 can also consist of only the support layer 2 and the sliding layer 3.
  • the plain bearing element blank 6 can be brought into the corresponding shape, for example the shape of a half shell, by reshaping before the sliding layer 3 is deposited thereon.
  • the sliding layer 3 is deposited on the sliding bearing element blank 6 from the gas phase by a sputtering method (cathode sputtering method). Since this method is known in principle from the prior art, reference is made to avoid repetition. It should be noted at this point that it is possible within the scope of the invention to deposit other layers of the multilayer bearing element 1 by Gasphasenab divorce by a sputtering method on the Gleitlagerelementrohling 6, for example, the bearing metal layer 5.
  • the sliding bearing ment blank 6 are introduced into the deposition chamber 7 via a lock.
  • the Gleitlagerelementrohling 6 can be arranged during the deposition of the sliding layer 3 on a carrier 8 and held by this.
  • the single-layer or multi-layer sliding bearing element blank 6 forms the substrate for the subsequent deposition of the metallic layer.
  • a slide bearing element blank 6 is referred to below, then these embodiments also apply to the simultaneous coating of a plurality of slide bearing element blanks 6, although this is not explicitly mentioned.
  • the Gleitlagerelementrohling 6 is shown planar, it can - as described above - already be formed, so for example, have the shape of a half-shell, so that therefore the slide bearing element blank 6 to be coated may have a curved surface to be coated.
  • the target 9 for the deposition of the metallic layer, in particular the sliding layer 3 is arranged coaxially with this half-shell.
  • the sliding layer 3 can preferably be produced with a layer thickness of at least 5 ⁇ m, preferably at least 15 ⁇ m, and a maximum of 60 ⁇ m, preferably a maximum of 50 ⁇ m, if a bearing metal layer 3 is arranged. In the absence of a bearing metal layer 3 are preferably layer thicknesses of at least 20 ⁇ , preferably at least 50 ⁇ , and at most 500 ⁇ , preferably generated at most 200 ⁇ .
  • at least one target 9 is arranged in the deposition chamber 7, at least one target 9 is arranged. It is also possible to arrange a plurality of targets 9.
  • the target 9 preferably has the same metals from which the deposited sliding layer 3 is produced, for example, the above-mentioned elements of said base alloys. In particular, the target 9 contains these metals in the same relative amounts to one another, so that therefore the target 9 can have at least approximately the same, in particular exactly the same, composition as the sliding layer 3 to be produced.
  • targets 9 can all have the same composition. However, it is also possible to use differently composed targets 9, the sum of the targets 9 qualitatively giving the sum of the metals to be deposited.
  • the target (s) 9 and the sliding bearing element blank (s) 6 are correspondingly electrically contacted so that an electrical potential prevails therebetween.
  • the deposition chamber 7 is purged and evacuated after the sliding bearing member blank 6 has been placed therein for deposition. This can be the case, for example, if the slide bearing element blank 6 is not introduced, but the deposition chamber 7 is opened for this purpose.
  • the purge gas used may also be the process gas, for example argon, which is also used during the deposition of the metallic layer on the plain bearing element blank 6.
  • the pressure for the subsequent treatment of the plain bearing element blank 6 can be between 5.m- 3 mbar and 0.1 mbar
  • the sliding bearing element blank 6 is connected as cathode and the at least one target 9 as an anode.
  • ions from the (inert) gas in the deposition chamber 7 a part of the sliding bearing element blank 6 in the form of substrate particles of These then move towards the anode, that is to the target 9, and settle on their surface at least in part, in particular in their entirety.
  • the following parameters can be used:
  • Duration of treatment 2 minutes to 60 minutes
  • the slide bearing element blank 6 it can be provided that not only metallic components of the slide bearing element blank 6 are removed, but that at the same time adhering thereto impurities, in particular in the form of ceramic particles, such as oxides, are removed. It can therefore be dispensed with a separate cleaning of Gleitlagerelementrohlings 6 of these coatings. These ceramic particles can also be at least partially precipitated on the surface of the target 9, so that they subsequently return to the sliding bearing element blank 6 during the actual coating step.
  • substrate particles in this embodiment also includes these particles which originate from impurities.
  • the removed particles are oxidized by means of a process gas mixture (eg an argon / oxygen mixture) during the cleaning of the substrate (during the ion etching), and these are then precipitated on the target 9.
  • a process gas mixture eg an argon / oxygen mixture
  • ceramic particles such as oxides, are generated to a greater extent, for example, to reinforce the metallic layer.
  • particles may be reactively sputtered in the coating process by means of a gas mixture, which may also produce ceramic particles.
  • the incorporation of ceramic particles can also be used to form an electrically insulating layer in the multilayer sliding bearing element 1.
  • a process gas mixture for example argon with oxygen, can be used so that the particles to be separated are oxidized.
  • pure inert gas for the further course of the deposition. Remains of the previously existing additional gas are still consumed.
  • This procedure can generally be used for the installation of ceramic particles, ie not only for the formation of an electrically insulating layer.
  • the deposition chamber 7 can be cleaned if necessary, so in particular with an inert gas one or more times rinsed and evacuated for the deposition of the sliding layer 3.
  • the deposition of the metallic layer on the substrate so in this example, the sliding layer 3 on the Gleitlagerelementrohling 6 immediately following the ion etching in the same deposition chamber 7.
  • the deposition of the metallic layer, ie in particular the sliding layer 3 takes place in a process gas, for example consisting of or comprising argon.
  • a process gas for example consisting of or comprising argon.
  • the separation chamber 7 can have at least one inlet 10 and for its removal at least one outlet 11.
  • sputtering method For deposition by sputtering method (sputtering method), the following parameters can be used:
  • Process gas mixture: argon, (oxygen)
  • Process gas pressure 2xe "3 mbar to 0.1 mbar, temperature: 80 ° C to 240 ° C coating rate: 0.1 ⁇ / minute to 5 ⁇ / minute coating time: 5 minutes to 380 minutes
  • process gas ions are accelerated onto the target 9 and knock out therefrom the metal atoms to be deposited (ie the target particles), which are subsequently accelerated in the direction of the slide bearing element blank 6 and precipitate on its surface, so that the sliding layer 3 builds up becomes.
  • the metallic layer in particular the sliding layer 3 can be deposited on the sliding bearing element blank 6 from the gas phase in a process gas.
  • substrate particles After substrate particles have been deposited on the target 9 during the pretreatment, they are also atomized again during the at least partial sputtering of the target 9 and thus at least partly return to the surface of the slide bearing element blank 6 to be coated.
  • the pretreatment has been carried out .
  • either only these substrate particles are deposited on the plain bearing element blank 6 or already a mixture of the substrate particles and the target particles.
  • the proportion of substrate particles in the mixture of substrate and target particles decreases until the substrate particles are completely used up and subsequently only the target particles on the sliding bearing element blank 6 for forming the metallic layer knock down.
  • the duration of the pretreatment (which is responsible inter alia for the amount of substrate particles on the target 9), chosen so that the transition zone 12 has a layer thickness between 0.3 ⁇ and 5 ⁇ , in particular between 0, 5 ⁇ and 3 ⁇ having.
  • layer thickness of the transition zone 12 on the multilayer sliding bearing element 1 is meant that layer thickness which is determined by means of EDX according to the following method. A radial line scan is performed over the binding zone and the X-ray signal for substrate (A) and sliding layer material (B) is measured. The signal strengths (increase of A with simultaneous decrease of B uu) follow a logistic function. The layer thickness is now the distance between two points where the signal strength B increases from 10% to 90%.
  • the method for producing the multi-layer sliding bearing element 1 can be provided that during the deposition of the metallic Layer are formed on the substrate at least a portion of the substrate particles and a portion of the target particles alloy particles.
  • the metallic layer is alloyed with the material of the substrate, that is to say the material to be coated of the multilayer sliding bearing element 1. Examples include silver with iron.
  • a multilayer sliding bearing element 1 can be produced, comprising a supporting layer 2 and a sliding layer 3 arranged thereon, wherein the sliding layer 3 is produced by a sputtering method, and between the sliding layer 3 and the supporting layer 2 a transition zone 12 is formed in which both a Proportion of the material of the support layer 2 and a portion of the material of the sliding layer 3 is present, starting at the surface of the support layer 2, the proportion of the material of the sliding layer 3 within the transition zone 12 increases.
  • a multilayer plain bearing element 1 can be produced in which non-metallic particles are contained in the transition zone 12 which are also surface contaminated on other surfaces of the support layer 2 not provided with the sliding layer 3. conditions exist.
  • a further tribologically active layer can be applied to the free surface of the metallic layer, such as, for example, a running-in layer or a bonded coating layer.
  • the following sliding layers 3 were prepared by the method described. In this case, 6 half-shells consisting of a supporting layer 2 made of steel were introduced as Gleitlagerelementrohlinge, wherein a sliding layer 3 was applied with a thickness of about 20 ⁇ . The generation of the sliding layer 3 can be carried out both from a single source (target 9), and simultaneously from multiple sources (targets 9) of the same or different composition. As a sliding layer 3 alloys were prepared in the following variants of the composition. For the evaluation of the adhesion (a) after coating and (b) after heat aging in nitrogen atmosphere at 180 ° C for 1000h: cross-sections were made. There were determined (1) visible detachment in% in cross-section after coating and (2) detachment after scrap test by means of hard metal bits. The adhesion is assessed according to the grading system, where 1 stands for excellent adhesion and 5 for complete delamination.
  • Process gas argon process gas pressure: le "2 mbar, Temperature: 130 ° C
  • Layer thickness of the transition zone 0.8 ⁇ layer thickness of the overlay total: 25 ⁇
  • alloys than slip layer 3 can be made, such as, for example, SnCu9Sb4Bil, CuA110Fe3, Ag, AlSn20Fel.
  • the listed alloy compositions are therefore only exemplary and not limiting.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Sliding-Contact Bearings (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La présente invention concerne un procédé de fabrication d'un élément de palier lisse à plusieurs couches (1) selon lequel, dans une chambre d'un système de pulvérisation cathodique, sur un substrat, une couche métallique est déposée par pulvérisation cathodique d'au moins une cible, ledit procédé comprenant les étapes consistant à : déposer un substrat dans la chambre du système de pulvérisation cathodique, réaliser une attaque ionique de la surface du substrat à recouvrir par bombardement ionique au moyen duquel des particules de substrat sont éliminées de la surface du substrat, déposer la couche métallique sur le substrat à partir de laquelle on obtient des particules cibles à partir d'au moins une cible connectée en tant que cathode, lesdites particules se déposant sur le substrat. Dans l'étape d'attaque ionique du substrat, la cible est connectée en tant qu'anode et au moins une partie des particules de substrat se dépose sur la cible. La polarité de la cible est ensuite inversée pour déposer la couche métallique sur la surface du substrat.
EP18719738.9A 2017-01-23 2018-01-23 Procédé de fabrication d'un élément de palier lisse à plusieurs couches Pending EP3571327A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ATA50039/2017A AT519107B1 (de) 2017-01-23 2017-01-23 Verfahren zur Herstellung eines Mehrschichtgleitlagerelementes
PCT/AT2018/060020 WO2018132859A1 (fr) 2017-01-23 2018-01-23 Procédé de fabrication d'un élément de palier lisse à plusieurs couches

Publications (1)

Publication Number Publication Date
EP3571327A1 true EP3571327A1 (fr) 2019-11-27

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP18719738.9A Pending EP3571327A1 (fr) 2017-01-23 2018-01-23 Procédé de fabrication d'un élément de palier lisse à plusieurs couches

Country Status (6)

Country Link
US (1) US11286552B2 (fr)
EP (1) EP3571327A1 (fr)
JP (1) JP7177778B2 (fr)
CN (1) CN110191974A (fr)
AT (1) AT519107B1 (fr)
WO (1) WO2018132859A1 (fr)

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AT519107B1 (de) 2018-04-15
AT519107A4 (de) 2018-04-15
US11286552B2 (en) 2022-03-29
JP2020505514A (ja) 2020-02-20
US20200040441A1 (en) 2020-02-06
CN110191974A (zh) 2019-08-30
WO2018132859A1 (fr) 2018-07-26
JP7177778B2 (ja) 2022-11-24

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