Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
  • C23C16/26—Deposition of carbon only
  • C23C16/27—Diamond only
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/02—Pretreatment of the material to be coated
  • C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
  • C23C16/0263—Irradiation with laser or particle beam
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
  • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
  • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
  • B23B27/148—Composition of the cutting inserts
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23C—MILLING
  • B23C5/00—Milling-cutters
  • B23C5/16—Milling-cutters characterised by physical features other than shape
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B24—GRINDING; POLISHING
  • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
  • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
  • C23C16/26—Deposition of carbon only
  • C23C16/27—Diamond only
  • C23C16/271—Diamond only using hot filaments
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B2226/00—Materials of tools or workpieces not comprising a metal
  • B23B2226/31—Diamond
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
  • B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
  • B23B2228/10—Coatings
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
  • B23B2228/10—Coatings
  • B23B2228/105—Coatings with specified thickness
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23C—MILLING
  • B23C2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
  • B23C2228/10—Coating

Definitions

• the present invention relates to a cutting tool according to the preamble of claim 1, a method for producing a diamond coating on a functional area of a cutting tool according to the
• Tools for machining with a tool head, a tool shank and with a clamping section for receiving in one
• Tool holder are known in a variety of forms from the prior art.
• Such tools have in their cutting part area on functional areas, which are adapted to the specific requirements of the materials to be processed.
• the tools mentioned are, in particular, those which are designed as drilling, milling, countersinking, turning, threading, contouring or reaming tools, which can have cutting bodies or guide strips as a functional area, the cutting bodies being used, for example, as alternating or indexable inserts may be formed and the guide rails may be formed, for example, as a support strips.
• such tool heads have functional areas that give the tool a high wear resistance in the machining of highly abrasive materials.
• Tool heads described which consist of a hard material with at least one Functional layer, which comprises a super hard material such as cubic boron nitride (CBN) or polycrystalline diamond (PCD).
• CBN cubic boron nitride
• PCD polycrystalline diamond
• Diamond deposition can be prepared in accordance with US 5,082,359 by a number of methods, such as laser evaporation and chemical etching or plasma etching using a corresponding patterned one
• Photoresists or by removal by means of a focused ion beam or by removal by means of a focused ion beam (focused ion beam milling).
• Focusing of the Ga + ion beam can be generated to a diameter of less than 0.1 pm crater with a distance of less than 1 pm.
• substrates in US 5,082,359 typical materials used in the semiconductor industry are mentioned, such as germanium, silicon, gallium arsenide and polished wafers of monocrystalline silicon, and other useful substrates are titanium, molybdenum, nickel, copper, tungsten, tantalum, steel, ceramics, Silicon carbide, silicon nitride, silicon aluminum oxynitride, boron nitride, aluminum oxide, zinc sulfide, zinc selenide, tungsten carbide, graphite, quartz glass, glass and sapphire.
• Binding matrix embedded are not named.
• CVD is performed by reacting methane and hydrogen under vacuum on a hot tungsten wire to deposit the carbon generated in high vacuum on the crater-like irregularities generated on the substrate surface in its diamond modification.
• Such a diamond coating process is described, for example, in WO 98/35071 A1.
• the deposition of a polycrystalline diamond film on a cemented carbide substrate of tungsten carbide embedded in a cobalt matrix is described in WO 2004/031437 A1.
• WO 2004/031437 A1 required a chemical or electrochemical etching in order to achieve a good adhesion of the CVD-produced diamond coating on the substrate.
• a hard metal contains sintered materials of hard material particles and bonding material, such as tungsten carbide grains, wherein the tungsten carbide grains form the hard materials and the cobalt-containing binder matrix acts as a binder to the WC grains and gives the layer the toughness required for the tool.
• US Pat. No. 6,096,377 A1 describes a method for coating a cemented carbide substrate with a diamond layer, the method having a
• Pretreatment of the substrate with a WC-selective etching step and with a cobalt selective etching step is effected by a seeding with diamond powder and a subsequent CVD diamond coating, wherein the cobalt selective etching step, the WC-selective etching step or
• DE 195 22 371 A1 describes for applying a
• Diamond layer on a cemented carbide substrate first a cobaltselective etching step with subsequent cleaning of the etched substrate surface and then a WC-selective etching step followed by cleaning.
• a diamond layer is then applied by means of a CVD process.
• Pretreatment process with initially a cobalt-selective etching step and a subsequent WC-selective etching step in many cases not led to a sufficient layer adhesion of the diamond layer.
• the surface comprises a cobalt enrichment, which is a good
• WO 97/07264 describes a pretreatment process of a hard metal for CVD diamond coating, wherein in a first step, an electrochemical etching of the cemented carbide is carried out by in one
• Electrolytes for example, 10% NaOH
• the substrate is connected as an anode and thereby electrochemically etched.
• the cobalt binder material is selectively etched.
• the diamond layer is applied by CVD method.
• WO 2004/031437 A1 is based on a first chemical etching step in the acidic range, which etches the bonding material, in particular cobalt.
• electrochemical etching processes with direct current or alternating current with HCl or H 2 SO 4 are used, but HNO 3 or mixtures of H 2 SO 4 / H 2 O 2 , HCl / H 2 O 2 and HCl / HNO 3 can additionally also be used for the etching become.
• a second etching step the hard material particles, in particular the tungsten carbide grains, are then etched.
• known chemicals are used which selectively etch WC. Examples include treatment with potassium hexacyanoferrate (III) / lye mixtures, KMnO 4 / lye mixtures and electrochemical processes with NaOH, KOH or Na 2 CO 3 .
• a further cobalse-selective etching step is carried out, which is preferably carried out as an electrochemical etching with sulfuric acid or hydrochloric acid.
• a porous zone in which the binder material is removed is produced on the surface of the substrate already profiled by the first two steps.
• the actual diamond coating is also done by means of a CVD process. In this case, the diamond grows on the surface generated, and due to the depth profile of the pretreated substrate to form an excellent clamping for the diamond layer in the substrate.
• DE 10 2006 026 253 A1 likewise discloses coated bodies and processes for their production, wherein the body has a substrate made of a hard metal or cermet, consisting of hard material particles and binder material, and an adhering diamond layer applied thereto.
• the substrate consists predominantly of WC and cobalt, wherein at least part of the hard material particles below the diamond layer has trans-crystalline depressions in the form of holes.
• an acidic etching in the blasted functional area is carried out in concentrated sulfuric acid.
• the tool is connected as an anode and switched, for example, the outer stainless steel container as a cathode.
• Passivation layer which is closed after about 10 seconds so far that almost no further etching attack can take place. After this etching step, the resulting passivation layer is removed again with 10% NaOH and Typically, the cycle of electrochemical etching in acid is repeated several times with subsequent removal of the passivation layer in the alkaline.
• the method according to this prior art should be adjusted so that - in WC-Co hard metal - the cobalt loss is higher than the WC loss.
• HAUBNER et al. For example, carbon can diffuse from the CVD diamond coating into the cobalt-containing binder matrix, forming cobalt droplets during diamond deposition from the gas phase, which deleteriously disrupt the substrate texture and cause some brittleness.
• cobalt is a catalyst for diamond growth and its more or less spontaneous conversion into graphite. Therefore, it is understandable that, for empirical reasons, it has been attempted in the art to remove cobalt from the binder matrix to reduce the influence of cobalt on diamond deposition.
• Embedding of the WC grains as hard material particles is no longer possible.
• the integrity and mechanical strength of the substrate surface can no longer be guaranteed, especially in the case of heavy loads as a tool. Therefore, structural defects occur in the substrate / diamond interphase, so that finally the diamond layer can come off with parts of the substrate structure, so that tools coated in this way become unusable.
• the present invention relates to a cutting tool having at least one diamond-coated functional area with a substrate surface lying below the diamond layer of a hard metal or a ceramic material, wherein the substrate surface carbide and / or nitride-based and / or oxide-based hard particles containing in a cobalt-containing
• Binding matrix embedded wherein the diamond layer without cobalt in a substantial amount of the binding matrix of the substrate surface by means of chemical or
• the present invention further relates to a method for producing a diamond coating on a functional region of a cutting tool, wherein the diamond coating is applied to a substrate surface made of a hard metal or a ceramic material, wherein the substrate surface
• CVD Vapor deposition
• cobalt-containing substrate surface is applied.
• a functional area of a tool containing hard material particles, eg WC grains, embedded in a cobalt-containing binder matrix by means of ion beams, eg N + , N ++ and / or C + , substantially no cobalt from the binding matrix will be produced but the irradiated ions are incorporated into the structure of the binding matrix.
• cobalt could be converted by the incident light ions to cobalt nitrides or cobalt carbonitrides or to cobalt carbides, which do not have the catalytic effect for the conversion of the cubic diamond phase in the hexagonal graphitic phase, so that the cubic diamond crystals sufficient Have time to grow on the substrate surface without undergoing in situ re-conversion into graphite.
• diamond-coated functional areas have surprisingly been found in cutting tools compared to diamond coatings based on cobalt
• the cobalt remains in the inventive irradiation of the substrate surface with the much lighter ion species N + , N ++ and / or C + substantially in the binding matrix and yet leads to much better adhering diamond coatings as in the prior art.
• the embedding of the hard material particles, such as WC in the binding matrix and thus the integrity of the hard material particles cobalt phase is virtually unaffected, whereby it retains its advantageous properties for cutting tools and, for example, not embrittled.
• the cutting tools according to the invention can be used for all purposes where the use of at least partially diamond-coated tool is technically useful to either particularly abrasive materials -.
• CFRP materials - to machine or to achieve high tool life in the manufacture of machine components or both.
• the tools can be designed as a rotating or standing tool, in particular as a drilling, milling, countersinking, turning, threading, contouring or reaming tool.
• the tools may be monolithic or modular tools.
• An advantageous tool is one in which on a support body at least one cutting body, in particular an insert, preferably a removable or indexable insert, is provided and / or at least one guide strip, In particular, a support strip is provided, wherein the cutting body or the guide bar is diamond coated at least in a partial area.
• the tools of the present invention contain hard particles selected from the group consisting of: the carbides, carbonitrides and nitrides of the metals of IV, V and VI. Subgroup of the Periodic Table of the
• Elements and boron nitride in particular cubic boron nitride; as well as oxidic hard materials, in particular aluminum oxide and chromium oxide; and in particular titanium carbide, titanium nitride, titanium carbonitride; Vanadium carbide, niobium carbide, tantalum carbide; Chromium carbide, molybdenum carbide tungsten carbide; and mixtures and mixed phases thereof.
• the binding matrix for the hard material particles may additionally contain aluminum, chromium, molybdenum and / or nickel.
• a preferred tool with functional areas or monoliths of ceramic material is one in which the ceramic material is a
• Sintered material of the above-mentioned hard material particles in a binding matrix which in addition to cobalt additionally contains aluminum, chromium, molybdenum and / or nickel.
• An advantageous tool as a ceramic material is a sintered carbide or carbonitride hard metal.
• the diamond coating of the cutting tools is polycrystalline and is deposited by chemical vapor deposition (CVD).
• Typical layer thicknesses for the diamond layering on the tool surfaces are in the range from 3 to 15 ⁇ m, in particular from 6 to 12 ⁇ m.
• the ion beam used for the process according to the invention is produced by means of a commercial ion beam generator, the following
• ionic species can be used: lithium, boron, carbon, silicon,
• Methane is used as the carbon source for the CVD diamond coating, in which hydrogen is added in molar excess to the methane.
• a particularly advantageous growth behavior and adhesion of the diamond layer and crystal size of the individual diamond crystals during CVD deposition from methane / H 2 can be achieved if, following the ion beam pretreatment of the substrate surface diamond nanocrystals by means of ultrasound on the
• Carbide tools made of a 10M% Co carbide with a mean WC particle size of 0.6 ⁇ m were heated for 3.5 h
• a commercially available ion generator was used (ion generator" Hardion "of the company Quertech, Caen).
• the layer adhesion was tested by the classic beam wear test according to a standard from CemeCon. In this beam wear test, the layer is irradiated with a corundum beam having an average particle size of approximately 13 ⁇ m until either a chipping or a radiation through of the diamond layer to be tested occurs. If there is no damage to the coating after 2 minutes of jet time, the sample is considered a runner. Of good layer adhesion becomes
• treated tools had 80% runners and no single result under 110 sec beam time, while the average life

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• General Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Organic Chemistry (AREA)
• Inorganic Chemistry (AREA)
• Optics & Photonics (AREA)
• Health & Medical Sciences (AREA)
• Physics & Mathematics (AREA)
• Toxicology (AREA)
• Manufacturing & Machinery (AREA)
• Chemical Vapour Deposition (AREA)
• Cutting Tools, Boring Holders, And Turrets (AREA)
• Drilling Tools (AREA)
• Powder Metallurgy (AREA)

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• 2014
  • 2014-06-02 DE DE102014210371.1A patent/DE102014210371A1/de not_active Withdrawn
• 2015
  • 2015-06-02 JP JP2016570815A patent/JP2017524543A/ja not_active Withdrawn
  • 2015-06-02 KR KR1020167035937A patent/KR20170016376A/ko unknown
  • 2015-06-02 EP EP15733363.4A patent/EP3149221A1/de not_active Withdrawn
  • 2015-06-02 WO PCT/EP2015/062266 patent/WO2015185555A1/de active Application Filing
• 2016
  • 2016-12-02 US US15/367,688 patent/US20170145563A1/en not_active Abandoned

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