EP3028291B1 - Dvc utilizing mems resistive switches and mim capacitors - Google Patents

Dvc utilizing mems resistive switches and mim capacitors Download PDF

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Publication number
EP3028291B1
EP3028291B1 EP14755235.0A EP14755235A EP3028291B1 EP 3028291 B1 EP3028291 B1 EP 3028291B1 EP 14755235 A EP14755235 A EP 14755235A EP 3028291 B1 EP3028291 B1 EP 3028291B1
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EP
European Patent Office
Prior art keywords
electrically conductive
conductive layer
mems
electrically
mim capacitor
Prior art date
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EP14755235.0A
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German (de)
English (en)
French (fr)
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EP3028291A1 (en
Inventor
Richard L. Knipe
Charles G. Smith
Roberto Gaddi
Robertus Petrus Van Kampen
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Cavendish Kinetics Inc
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Cavendish Kinetics Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/38—Multiple capacitors, e.g. ganged
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/40—Structural combinations of variable capacitors with other electric elements not covered by this subclass, the structure mainly consisting of a capacitor, e.g. RC combinations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
    • H01G5/18—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes due to change in inclination, e.g. by flexing, by spiral wrapping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H59/00—Electrostatic relays; Electro-adhesion relays
    • H01H59/0009—Electrostatic relays; Electro-adhesion relays making use of micromechanics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/20—Resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors

Definitions

  • Embodiments of the present invention generally relate to a radio frequency (RF) digital variable capacitor (DVC) units for RF tuning and impedance matching.
  • RF radio frequency
  • DVC digital variable capacitor
  • MEMS capacitors can show non linear behavior when operated as a capacitor. This is a problem for RF applications when signals transmitted at one frequency can leak into other frequency channels.
  • One measure of this is the IP3 value or the value of input at which the third order nonlinearity times the input voltage or current is equal to the first order term times the input voltage or current.
  • the present invention generally relates to A MEMS DVC, comprising: an RF pad disposed over a substrate; and a MEMS device disposed over the substrate, the MEMS device comprising: one or more switching elements disposed within a cavity formed over the substrate, wherein an underside of the one or more switching elements is coated with an insulator, wherein a first metal feature is exposed through a window opened on the underside of the one or more switching elements; and a MIM capacitor, wherein the MIM capacitor is electrically coupled to the RF pad.
  • the MEMS capacitor is converted into a resistive switch which then switches in a metal insulator metal capacitor (MIM) device with conformal coatings of insulator and then metal over the first metal.
  • MIM metal insulator metal capacitor
  • the capacitance of the contact should be small in the open state so if the combined contact area of each switch is 1 micron by 1 micron and there are N in parallel, then the capacitance should be smaller than 1/100 of the step size or 8x10 -16 F which means the gap in the open state has to be greater than N time 10nm. If N is set at 20, then a gap of greater than 200nm in the off state and a contact resistance of 325 Ohms per cantilever in the on state is needed. With two contacts per cantilever then each contact has to be around 600Ohms.
  • the pull in area of the cantilever is 8 by 5 microns and the pull in gap reduces to 100nm, with a pull in voltage of 20 V the force is approximately
  • Figures 2A and 2B show the top and side view of the array of Ohmic switches as marked in Figure 1 as 3.
  • Figure 2A is a top view of an array of switches as marked as 3 in Figure 1 .
  • 11 marks the RF line running under the small switches which are marked as 14.
  • 12 and 13 show the pull in electrodes.
  • 2B shows the side view with pull up electrode 15, cavity 24, and insulating layer 31 under the switches and RF line 11.
  • 30 is a conductive ground plane.
  • 29 is the underlying silicon substrate that may also have CMOS address circuits designed in it to operate the digital variable capacitor.
  • 16 indicates one of two landing posts that are conductive and make contact with the conducting underside of the cantilever.
  • 16B is a surface material on the conducting post that provides good conductivity, low reactivity to the ambient materials and high melting temperature and hardness for long lifetime.
  • the underside 32 may be coated with an insulator but a window is opened on the underside 32 of the cantilever to provide a conducting region 16C for the conducting post to make electrical contact with when the MEMS is pulled down.
  • Figure 4A shows the cantilever pulled in with voltages applied to 12 and 13 ( Figures 3A and 3B ) so that the layer 22 ( Figure 3B ) land on the insulated bumps 15A and 15B ( Figure 3B ).
  • the conducting underside of the cantilever lands on the two conducting post (only one shown as the other is behind it) (16 in Figure 3B ). This gives the low resistance state.
  • Figure 4B shows the cantilever after it has been pulled to the roof using electrode 18 in Figure 3B . It makes contact with the insulating layer 19 shown in Figure 3B . This prevents any electrical contact between the pull up electrode and the cantilever.
  • the region in the dotted rectangles is shown in Figures 5A and 5B .
  • the cantilever may be an insulating layer over the top and most of the underside of the cantilever. A hole is made in the insulator on the underside of the cantilever to allow it to make contact with the conducting post 16. In this state the resistance of the cantilever to the RF line is very large and the capacitance coupling to that line is small.
  • FIG. 6 shows a schematic of the device with the MIM capacitor C MIM 1 connected to the array of MEMS cantilevers which switch one MIM capacitor and have a combined capacitance R ON when on and C OFF when off.
  • R ON is in series with C MIM and when off, C OFF is in series with C MIM .
  • R ON is the contact resistance of all the resistors in one array switching in parallel connected to one MIM capacitor.
  • the MEMS acts like a switch and is either connected to the RF line or not connected to anything.
  • C MIM 1 refers to the first MIM capacitor while C MIM N refers to the Nth MIM capacitor.
  • the design is such that R ON ⁇ C MIM and C OFF ⁇ C MIM . This means that when the MEMS cantilever is on, the capacitance between the RF line and ground is dominated by the C MIM value and when it is off it is dominated by C OFF . The resistance will be dominated by R ON the combined resistance of all the contacts in parallel.
  • the material for the contact has to be chosen so that it will last the billion cycles required for most products, and have a low contact resistance as well as being compatible with CMOS fabrication facilities.
  • the MEMS device is fabricated in its own cavity.
  • the sacrificial material is removed using a low pressure gas etch to remove it both above and below the MEMS switch leaving a cavity over the device and a small hole in the cavity close to the cantilever bridge anchors.
  • material is deposited, also at low pressures, which fills the cavity and seals a low pressure environment around the MEMS device.
  • the contact area will have a roughness to it so that the total area of the contact will not be physically touching.
  • the tunneling rate through a vacuum from one metal to another drops more than 5 orders of magnitude when the spacing increases by one nanometer, so the resistance is dominated by the asperities that are in physical contact.
  • the number and radius of these asperities will alter the contact resistance, so the metal processing has to be such that the asperity radius of curvature is small and that they are similar in size.
  • the resistance of the contact will depend on the resistivity of the contact material and the area of contact of the asperities. It also depends on the force at each asperity.
  • Titanium nitride is a good material because it is already used in CMOS fabrication, where it is used as a barrier layer. It also does not tarnish easily and so the contact surface should have a low probability of contamination. It is a very hard material however, and its resistivity is not very low.
  • TiN is that it makes a very durable material for MEMS fabrication so it is possible to use the same material for the MEMS and contact resistance.
  • a sub 100nm layer of material can be patterned over the bottom contact and in an area on the underside of the MEMS where the bottom contact touches the MEMS device when it is down.
  • TiN, Tu, Pt, Ir, Rh, Ru, and Mo Materials that are allowed in a CMOS fabrication facility or can already found in one that have low values of resistivity and do not react strongly with the environment, include: TiN, Tu, Pt, Ir, Rh, Ru, and Mo.
  • TiN, Mo and Tu are materials that can be relatively easily etched, while the others do not etch quite so easily. They are all relatively hard and have high melting temperatures and they all have values of resistivity below 10 -5 Ohmcm.
  • the resistance of the contact does not alter with the power applied to the contact.
  • the resistance of an asperity contact reduces quickly with extra force, however when a suitable force has been applied, the resistance stabilizes and is no longer strongly dependent on the applied force. This is the regime to be working in.
  • Increasing temperature can cause softening of the contacts and thus a change in the hardness.
  • the heating can come from the current flow through the asperities.
  • it is useful to have a material that has a high melting temperature.
  • Figure 7 shows a possible implementation of the resistively switched digital variable capacitor shown from the top.
  • 1 marks where the RF pad will sit connected by the grey track to the arrays of small hybrid ohmic-MIM switches 3 containing 20 or so small switches working in parallel (5). At the end of the array of switches there is a track 4 going to ground.
  • 17 marks the top oxide which fills the etch holes used to remove the sacrificial layers. It enters these holes and helps support the ends of the cantilevers, while also sealing the cavity so that there is a low pressure environment in the cavities.
  • 16B indicates the landing post that is conductive and makes contact with the conducting underside of the cantilever.
  • 16A is a surface material on the conducting post that provides good conductivity, low reactivity to the ambient materials and high melting temperature and hardness for long lifetime.
  • the underside of the bridge may be coated with an insulator but a window is opened on the underside of the cantilever to provide a conducting region 16C for the conducting post to make electrical contact with when the MEMS is pulled down.
  • MIM 25 is a dielectric layer which is deposited on top of pull in electrodes 12 and 13 and on top of RF line 11.
  • the metal feature 16B, the dielectric 25 and the RF line 11 implement a MIM capacitor.
  • the top electrode of this MIM is either electrically floating, when the MEMS bridge is in UP position, or grounded via the ohmic contact between 16A and 16C, when the MEMS bridge is in DOWN position.
  • the metal feature 16A+16B that is the top electrode of the MIM, is electrically connected to a reference DC potential by a variable resistor.
  • the reference DC potential can be either the common ground, or a separate terminal of the device.
  • the variable resistor can be implemented, as an example implementation, by a transistor or a separate higher resistance MEMS ohmic switch.
  • a control logic will be used to set the value of the variable resistor, acting as follows.
  • the variable resistor When the MEMS bridge (20+21+22) is in the UP or DOWN position, the variable resistor will normally be set to its highest value. This value will be designed so that the current flowing in the variable resistor will be significantly lower than the coupling between the MEMS bridge and the RF line 11.
  • the variable resistor When the position of the MEMS bridge is changed from the DOWN to the UP position or from the UP to the DOWN position, the variable resistor will temporarily be set to its lowest value for a small length of time until the state transition is completed. This will reduce the electric field in the gap between the moveable bridge and the MIM-cap during the switching event which improves the hot-switch performance and avoids surface degradation.
  • Low capacitance means high impedance of the switch, small RF current flowing through the device for a given rms voltage; this minimizes reliability issues due to arcing during opening of the ohmic switch, since the current cannot go to zero instantaneously due to circuit level inductance in the application circuit.
  • the intrinsic Q of the device is the ratio of 1/(omega*C) and the ohmic resistance of the switch; a small C (in the order of 5 to 10fF) at for example 1GHz gives a Q of 100 for a resistance of more than 100ohms; in general, breaking up the device in a large number of branches each one made of a ohmic switch with a very small MIM in series relaxes the requirements for the ohmic resistance value in order to achieve an overall small equivalent series resistance (ESR) and high device Q factor.
  • ESR overall small equivalent series resistance
  • FIGS 10A-10G are schematic illustrations of a MEMS DVC 1000 at various stages of fabrication according to one embodiment.
  • the substrate 1002 has a plurality electrodes 1004A-1004E formed therein and an electrically conductive material 1004F that will form the bottom "metal" of the MIM.
  • Figure 10A shows the MEMS device while Figure 10B shows the MIM.
  • the MIM is disposed on the same substrate 1002, but outside of the cavity of the MEMS device.
  • the electrodes 1004A-1004E and the electrically conductive material 1004F may be formed during the same deposition and patterning process and thus, of the same material.
  • the RF electrode 1004C is directly coupled to the electrically conductive material 1004F.
  • the electrodes 1004A-1004E and the electrically conductive material 1004F may comprise different materials and be formed in different processes.
  • the electrodes 1004A-1004E are formed separate from the electrically conductive material 1004F and that the electrically conductive material 1004F is formed simultaneously with the RF pad such that the electrically conductive material 1004F is directly coupled to the pad.
  • the substrate 1002 may comprise a single layer substrate or a multi layer substrate such as a CMOS substrate having one or more layers of interconnects.
  • suitable material that may be used for the electrodes 1004A-1004E and the electrically conductive material 1004F include titanium nitride, aluminum, tungsten, copper, titanium, and combinations thereof including multi-layer stacks of different material.
  • an electrically insulating layer 1006 is then deposited over the electrodes 1004A-1004E and the electrically conductive material 1004F.
  • Suitable materials for the electrically insulating layer 1006 include silicon based materials including silicon oxide, silicon dioxide, silicon nitride and silicon oxynitride.
  • the electrically insulating layer 1006 is removed over the grounding electrodes 1004A, 1004E as well as from over the RF electrode 1004C to expose the underlying electrodes 1004A, 1004C, 1004E.
  • Electrically conductive material 1008 may then be deposited over the electrically insulating layer 1006.
  • the electrically conductive material 1008 provides the direct electrical connection to the grounding electrodes 1004A, 1004E and to the RF electrode 1004C. Additionally, the electrically conductive material 1008 provides the upper "metal" in the MIM. In one embodiment, the upper metal of the MIM is spaced from and electrically disconnected from the MEMS device, yet directly connected to the RF pad. In another embodiment, the upper metal of the MIM is directly connected to the RF electrode 1004C while the bottom metal of the MIM is directly connected to the RF pad. Suitable materials that may be used for the electrically conductive material 1008 include titanium, titanium nitride, tungsten, aluminum, combinations thereof and multilayer stacks that include different material layers.
  • the surface material 1010 may be formed over the electrically conductive material 1008 formed over the RF electrode 1004C to form an electrically conductive landing post.
  • electrically insulating landing structures 1012 may be formed over the electrically insulating layer 1006 to permit the switching element 1014 to land thereon when the switching element 1014 is in the C max position.
  • the switching element 1014 may have insulating material coating the bottom surface thereof and thus, an area 1024 of exposed conductive material may be present that will land on the surface material 1010.
  • An additional electrically insulating layer 1018 may be formed over the pull-off (i.e. , pull-up) electrode 1020, and a sealing layer 1022 may seal the entire MEMS device such that the switching element 1014 is disposed within a cavity.
  • acrificial material is used to define the boundary of the cavity.
  • the MEMS DVC shown in Figures 10A-10G has an RF electrode 1004C that is directly connected to either the top or bottom metal of the MIM.
  • the other metal of the MIM that is not directly connected to the RF electrode 1004C is directly connected to the RF pad.
  • the MIM capacitor can be formed simultaneously with the MEMS device for form a MEMS DVC.
  • FIGS 11A-11D are schematic illustrations of a MEMS DVC 1100 at various stages of fabrication according to another embodiment.
  • the materials used for the MEMS DVC may be the same as those used for fabrication of the MEMS DVC 1000.
  • electrodes 1104A-1104E are formed over the substrate 1102.
  • an electrically insulating layer 1106 may be deposited and patterned to expose the ground electrodes 1104A, 1104E, as shown in Figure 11B .
  • the electrically insulating layer 1106 remains over the RF electrode 1104C as the MIM will be formed within the MEMS device in this embodiment.
  • Electrically conductive material 1108 may then be deposited and patterned to form the electrical connection to the ground electrode 1104A, 1104E and to form the second metal of the MIM. As shown in Figure 11C , the MIM is formed within the MEMS device rather than as a separate device outside of the cavity of the MEMS device.
  • the remainder of the processing may occur to form the MEMS DVC 1100 shown in Figure 11D .
  • the surface material 1110 may be formed over the electrically conductive material 1108 formed over the RF electrode 1104C to form an electrically conductive landing post.
  • electrically insulating landing structures 1112 may be formed over the electrically insulating layer 1106 to permit the switching element 1114 to land thereon when the switching element 1114 is in the C max position.
  • the switching element 1114 may have insulating material coating the bottom surface thereof and thus, an area 1124 of exposed conductive material may be present that will land on the surface material 1110.
  • An additional electrically insulating layer 1118 may be formed over the pull-off (i.e. , pull-up) electrode 1120, and a sealing layer 1122 may seal the entire MEMS device such that the switching element 1114 and MIM is disposed within a cavity.
  • a sealing layer 1122 may seal the entire MEMS device such that the switching element 1114 and MIM is disposed within a cavity.
  • sacrificial material is used to define the boundary of the cavity.
  • each switching element 1114 (there could be one or many switching elements within a cavity) has a corresponding MIM structure within the cavity.
  • the MEMS DVC By using a MIM capacitor, either within or outside the cavity, the MEMS DVC will have a low resistance and thus, a consistent resonant frequency.

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
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EP14755235.0A 2013-08-01 2014-08-01 Dvc utilizing mems resistive switches and mim capacitors Active EP3028291B1 (en)

Applications Claiming Priority (2)

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US201361861326P 2013-08-01 2013-08-01
PCT/US2014/049329 WO2015017743A1 (en) 2013-08-01 2014-08-01 Dvc utilizing mems resistive switches and mim capacitors

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EP3028291A1 EP3028291A1 (en) 2016-06-08
EP3028291B1 true EP3028291B1 (en) 2018-04-25

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US (1) US10566140B2 (ja)
EP (1) EP3028291B1 (ja)
JP (1) JP6397913B2 (ja)
CN (1) CN105556635B (ja)
WO (1) WO2015017743A1 (ja)

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CN105556635B (zh) 2018-01-26
WO2015017743A1 (en) 2015-02-05
JP6397913B2 (ja) 2018-09-26
JP2016531435A (ja) 2016-10-06
EP3028291A1 (en) 2016-06-08
US10566140B2 (en) 2020-02-18
US20160172112A1 (en) 2016-06-16
CN105556635A (zh) 2016-05-04

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