EP2985367A4 - ELECTROPLATING APPARATUS FOR PREVENTING EXCESSIVE PLATING OF AN EDGE - Google Patents
ELECTROPLATING APPARATUS FOR PREVENTING EXCESSIVE PLATING OF AN EDGEInfo
- Publication number
- EP2985367A4 EP2985367A4 EP13881849.7A EP13881849A EP2985367A4 EP 2985367 A4 EP2985367 A4 EP 2985367A4 EP 13881849 A EP13881849 A EP 13881849A EP 2985367 A4 EP2985367 A4 EP 2985367A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- edge
- preventing excessive
- electroplating apparatus
- excessive plating
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/008—Current shielding devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130038912A KR101495419B1 (ko) | 2013-04-10 | 2013-04-10 | 에지 과도금을 방지하기 위한 전기도금장치 |
PCT/KR2013/011554 WO2014168314A1 (ko) | 2013-04-10 | 2013-12-12 | 에지 과도금을 방지하기 위한 전기도금장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2985367A1 EP2985367A1 (en) | 2016-02-17 |
EP2985367A4 true EP2985367A4 (en) | 2016-12-28 |
Family
ID=51689696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP13881849.7A Withdrawn EP2985367A4 (en) | 2013-04-10 | 2013-12-12 | ELECTROPLATING APPARATUS FOR PREVENTING EXCESSIVE PLATING OF AN EDGE |
Country Status (6)
Country | Link |
---|---|
US (1) | US20160076166A1 (ko) |
EP (1) | EP2985367A4 (ko) |
JP (1) | JP6089125B2 (ko) |
KR (1) | KR101495419B1 (ko) |
CN (1) | CN105189830B (ko) |
WO (1) | WO2014168314A1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101633617B1 (ko) * | 2014-12-12 | 2016-06-28 | 주식회사 포스코 | 수평셀 전기도금장치의 에지마스크 및 이를 포함하는 수평셀 전기도금장치 |
KR101666461B1 (ko) | 2014-12-24 | 2016-10-14 | 주식회사 포스코 | 에지 영역 과도금 방지를 위한 전기 도금 장치 |
KR101674793B1 (ko) * | 2015-03-02 | 2016-11-10 | 주식회사 포스코 | 유체유동을 이용한 센터링장치 및 이를 포함하는 전기도금설비 |
KR102065220B1 (ko) | 2017-12-22 | 2020-01-10 | 주식회사 포스코 | 에지 마스크를 구비한 전기 도금 장치 |
CN109234776B (zh) * | 2018-09-17 | 2020-04-10 | 芜湖海成科技有限公司 | 一种便捷式导电工装 |
KR102022920B1 (ko) * | 2019-06-25 | 2019-09-19 | 주식회사 태성 | 롤투롤 수평식 연속 도금장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6217736B1 (en) * | 1997-04-25 | 2001-04-17 | Atotech Deutschland Gmbh | Method and apparatus for electrolytically treating a board-shaped substrate comprising shielding edge regions of the substrate during electrolytic treatment |
JP2004315922A (ja) * | 2003-04-18 | 2004-11-11 | Nippon Steel Corp | 連続式電気めっき設備のエッジマスク装置 |
CN202509143U (zh) * | 2012-02-01 | 2012-10-31 | 湖南中精伦金属材料有限公司 | 一种电镀镍边缘屏蔽装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08239796A (ja) * | 1995-03-01 | 1996-09-17 | Nippon Steel Corp | 電気めっき用エッジマスク装置および電気めっき方法 |
FR2750438B1 (fr) * | 1996-06-27 | 1998-08-07 | Usinor Sacilor | Procede et installation de revetement electrolytique par une couche metallique de la surface d'un cylindre pour coulee continue de bandes metalliques minces |
JP4177902B2 (ja) * | 1998-04-23 | 2008-11-05 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | プレート形状の被処理物を電気分解的に処理するための装置と電気分解的処理の際に被処理物のエッジ範囲を電気的に遮蔽するための方法 |
KR20010059601A (ko) * | 1999-12-30 | 2001-07-06 | 이구택 | 에지부 도금층이 균일한 전기도금방법 |
JP3508725B2 (ja) * | 2001-02-07 | 2004-03-22 | Jfeスチール株式会社 | 鋼帯の電気めっき装置および電気めっき鋼帯の製造方法 |
US20060037865A1 (en) * | 2004-08-19 | 2006-02-23 | Rucker Michael H | Methods and apparatus for fabricating gas turbine engines |
JP4977046B2 (ja) | 2008-01-21 | 2012-07-18 | Jx日鉱日石金属株式会社 | エッジオーバーコート防止装置及びそれを用いた電気めっき材の製造方法 |
-
2013
- 2013-04-10 KR KR20130038912A patent/KR101495419B1/ko active IP Right Grant
- 2013-12-12 EP EP13881849.7A patent/EP2985367A4/en not_active Withdrawn
- 2013-12-12 JP JP2015562897A patent/JP6089125B2/ja active Active
- 2013-12-12 CN CN201380074786.5A patent/CN105189830B/zh active Active
- 2013-12-12 US US14/783,836 patent/US20160076166A1/en not_active Abandoned
- 2013-12-12 WO PCT/KR2013/011554 patent/WO2014168314A1/ko active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6217736B1 (en) * | 1997-04-25 | 2001-04-17 | Atotech Deutschland Gmbh | Method and apparatus for electrolytically treating a board-shaped substrate comprising shielding edge regions of the substrate during electrolytic treatment |
JP2004315922A (ja) * | 2003-04-18 | 2004-11-11 | Nippon Steel Corp | 連続式電気めっき設備のエッジマスク装置 |
CN202509143U (zh) * | 2012-02-01 | 2012-10-31 | 湖南中精伦金属材料有限公司 | 一种电镀镍边缘屏蔽装置 |
Non-Patent Citations (1)
Title |
---|
See also references of WO2014168314A1 * |
Also Published As
Publication number | Publication date |
---|---|
US20160076166A1 (en) | 2016-03-17 |
JP2016513752A (ja) | 2016-05-16 |
KR101495419B1 (ko) | 2015-02-24 |
KR20140122768A (ko) | 2014-10-21 |
JP6089125B2 (ja) | 2017-03-01 |
CN105189830A (zh) | 2015-12-23 |
WO2014168314A1 (ko) | 2014-10-16 |
CN105189830B (zh) | 2018-03-06 |
EP2985367A1 (en) | 2016-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20151106 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20161125 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 17/00 20060101AFI20161118BHEP |
|
17Q | First examination report despatched |
Effective date: 20180605 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20200825 |