EP2953513B1 - Baking-plate assembly for a waffle-baking machine - Google Patents

Description

The invention relates to a baking plate arrangement for a Waffelbackautomaten with two pivotally interconnected baking plates, wherein at least one baking plate is biased in each case convexly with respect to a baking surface, so that when the baking plate assembly is closed before starting a baking process, a distance in a central region of the baking plates is smaller than a distance in an edge region of the baking plates to compensate for deformation of the baking plates during the baking process.
Such baking plate arrangements are used in industrial wafer baking machines for the fully automatic production of wafer sheets. For this purpose, a predetermined amount of dough is applied to the baking surface of one of the baking plates when the baking plate arrangement is open and the baking plate arrangement is closed. Subsequently, the arranged between the baking plate arrangements dough is baked. In order to fix the baking plates in the closed state, conventional baking plate arrangements have suitable closure devices.
Differently designed and known from the prior art baking plate arrangements are in the publications FR 2 365 293 A1 . DE 10 2005 014 561 A1 . US 2010 162 903 and DE 36 43 737 C1 described.

During this baking process steam is created between the baking plates. This steam escapes through a steam outlet area. For example, the steam may escape through a gap formed at the edges of the baking plates in the closed state.

A vapor pressure produced between the baking plates during the baking process can become so great that the baking plates are deformed concavely outward by the vapor pressure, especially in the middle region of the baking plates. Such particularly high vapor pressures occur, inter alia, in relatively large baking plates, in which the steam produced during baking can only be dissipated insufficiently via the steam outlet region. By this deformation, the baking result is impaired, since the deformation of the baking plates can often be many times greater than the predetermined thickness tolerance for the thickness of the baked product.

To counteract this deformation of the baking plates, it is known from practice to deform one or both baking plates usually convex and bias so that the caused by the vapor pressure deformation of the baking plates leads to flat baking surfaces of the baking plates. The required for a satisfactory baking result bias of the baking plates is dependent on various factors and must be determined separately by a complex adjustment process, if necessary in several steps in each case and for each baked product.

Depending on the size of the baking plates used and depending on the dough used in each case, however, to compensate for the deformation such a strong convex bias may be required that the baking surfaces abut each other in the central region with closed baking plate arrangement. As a result, after the dough has been applied to one of the baking surfaces when the baking plate arrangement is closed, the dough is displaced from the middle region, as a result of which the baking process is impaired.

The object of the invention is therefore considered to further develop baking plate assemblies with convexly biased baking plates so that the baking process is not affected even when using relatively large baking plates and any type of dough.

This object is achieved in that the baking plate assembly has a contact device which is arranged on the baking plate assembly, that the baking plates of a closed baking plate arrangement have a distance from each other. In this way it can be effectively prevented that the distance of the baking plates or baking surfaces of the closed baking sheet arrangement is so small that during baking in the central region of a baked wafer sheet a very thin spot or a defect is formed.

By such a contact device, the convexly biased baking plate or be the convexly biased baking plates against the occurring due to the convex bias deformation of the baking plate or the Back plates in the direction of flat baking surfaces deformed back so that caused by the convex bias deformation is at least partially compensated. At the same time, however, the necessary pretensioning force counteracting the vapor pressure occurring through the exiting steam during the baking process and generated by the convex pretension is maintained, so that the baking process is not adversely affected by the deformation of the baking plates caused by the vapor pressure. The baking plates are deformed only when exceeding a predetermined by the biasing force limiting vapor pressure.

In tests it has been shown that the baking pressure occurring at the beginning of the baking process initially increases sharply and then slowly drops again. The initially liquid dough cures in a time range substantially influenced by the used wafer dough with decreasing vapor pressure. By the investment device on the one hand touching the convex-biased baking plates can be avoided at the beginning of the baking process and on the other hand, a gap width at a time of the baking process are specified, where the wafer dough hardens. Between these times, a vapor pressure-induced deformation of the baking plates can be allowed, which leads to a bulging of the baking plates, since the defined distance of the baking plates must be reached only in a region of lower vapor pressure at which the waffle dough hardens.

Therefore, it is possible according to the invention, the required biasing force to the occurring during baking vapor pressure adapt, that the prestressed baking plates at the beginning of the baking process and from the time of curing to the end of the baking process are supported by the investment device and have a predetermined by the investment device distance. In this way, the baking plates can be made thinner, since a deformation of the baking plates is allowed.

Conveniently, the biasing force is set so that the biasing force is greater than a occurring during the baking process and acting on the baking plates against the biasing force vapor pressure force. In this way, the baking plate is deformed more in the open state, so that according to the invention, even with smaller baking plates, a contact device is used to compensate for the deformation in the closed state of the baking plate arrangement.

Due to the high biasing force, the baking plates rest against the abutment device during the entire baking process and have a predetermined distance from one another by the abutment device. In this way, it is not necessary to adjust the preload force to the type of doughs used in each case or to the occurring at the dough types used in particular vapor pressure. In addition, an adjustment of the force exerted on the baking plates biasing force, or the forced deformation of the baking plates is facilitated and possibly no longer necessary.

In addition, it is possible in this way a deformation of a peripheral edge of the baking plates by the in the To avoid baking process resulting vapor pressure and to achieve a constant along the circumferential edge of the steam outlet. As a result, a particularly uniform baking result can be achieved. By a deformation of the peripheral edge of the advantageously over the entire baking surface area constant vapor pressure is influenced so that the vapor pressure is different regions and the baking result is affected.

According to the invention it is advantageously provided that the baking plate assembly has a baking tong frame with two frame parts pivotally connected to each other, wherein the baking plates are arranged on the frame parts. Backplate assemblies with rack plates arranged on frame parts are particularly inexpensive to produce.

According to the invention, the baking plates rest in sections on the frame parts. The frame parts are advantageously designed so that the frame parts can be biased together with the baking plates convex and / or can absorb biasing forces of the baking plates. When caused by the investment device deformation of the baking plates against the occurring due to the convex bias deformation of the baking plates act on the frame parts biasing forces through which the frame parts are deformed so that the steam pressure counteracting biasing forces are applied by the frame parts and on by the investment in Direction of flat baking surfaces deformed baking plates act.

The baking plates and the frame parts are advantageously biased so that the baking plates and the baking tongs are deformed in opposite directions, wherein a distance of the baking plates to the baking tongs in an edge region is smaller than in a central region. Due to the investment device, the prestressed baking plates are deformed back in the direction of flat baking surfaces, whereby the partially resting against the baking plates frame parts further deformed and the bias of the frame parts is increased. The vapor pressure counteracting biasing force is applied in this way of the frame parts, while the baking surfaces are approximately flat.

The closure devices of conventional breadboard assemblies typically include a first closure member pivotally mounted to a baking plate or frame member and a second closure member disposed on an opposing baking plate or frame member, wherein the first closure member and the second closure member engage with each other when the baking tray assembly is closed is. For closing and opening the baking plate arrangement, it is necessary to reduce the distance of the baking plates and frame parts to such an extent that the first closure part can be brought into engagement with the second closure part or the first closure part and the second closure part can be detached from one another. This distance is less than the desired distance in the baking process or as a thickness of a baked wafer. By the investment device is achieved as an additional advantage that the baking plates when opening and Closing the baking plate assembly in an area in which the closure device is arranged to deform easily, so that the distance between the baking plates and frame parts is sufficiently small to engage or disengage the closure parts. In this way, damage to the baked wafer during opening of the baking plate arrangement is avoided in particular.

In order to easily adjust the distance between the baking surfaces of the baking plates of the closed baking plate arrangement to the respective required convex bias of the baking plate or the baking plates, the invention provides that at least one contact element of a contact device is designed adjustable, so that the distance of the baking plates of the closed baking plate arrangement adjustable is. For example, the abutment element may be a threaded bolt arranged in the middle region of a baking plate, which abuts against the opposing baking plate when the baking plate arrangement is closed. By further screwing or unscrewing the threaded bolt into the baking plate, the distance of the baking surfaces or baking plates in the closed state can be easily varied.

Advantageously, the invention provides that the contact device is arranged on a baking plate. According to the invention, the abutment device may be a pin or pin arranged in a region of the baking surface of a baking plate, which on the baking surface of the baking surface is closed when the baking plate arrangement is closed abuts opposite baking plate and in this way predetermines the distance of the baking surfaces or baking plates with closed baking plate arrangement.

However, according to the invention, the abutment device can also be arranged on an outer surface of the baking plate, such as, for example, a surface of the baking plate opposite the baking surface of a baking plate. According to the invention, it is possible to arrange a stop profile which can be adjusted in height on the surface of the baking plate, which engages around a side surface of the baking plate and rests against an edge of the baking surface of the opposite baking plate when the baking plate arrangement is closed.

In order to be able to produce as even wafer wafers without flaws using the baking plate arrangement, the invention provides that the contact device is arranged on one edge of the baking surface. By the abutment device is arranged outside the baking surface at the edge, the entire baking surface is available for the production of a wafer sheet.

The distance between the baking surfaces when the baking plate arrangement is closed can be set particularly effectively according to the invention by arranging the contact device in the middle region on the baking plate. Since a deformation or curvature in the central region is caused by the convex bias of the baking plate or the baking plates, which is to be at least partially compensated by means of the contact device, the arrangement of Investment device in the middle region of the baking plate particularly effective.

In order to use the entire baking surface for the production of wafer sheets and to be able to counteract effectively caused by the convex bias in the central region of the baking plate deformation or curvature is provided according to the invention that the investment device in a central region of the baking surface opposite top of the baking plate is arranged on the baking plate.

In a particularly advantageous embodiment of the baking plate arrangement according to the invention it is provided that the abutment device is arranged on a frame part. In this way, conventional baking plates can be used and easily replaced.

Advantageously, the invention provides that the contact device has a plurality of contact elements. For example, depending on a contact element on opposite sides of the edge of the baking surface can be arranged. But it is also possible and provided according to the invention that in each case a stop profile is arranged on opposite sides of the baking plate at the top of the baking plate.

Advantageously, the invention provides that two contact elements are provided, which are arranged on the baking plate arrangement such that the contact elements rest against one another when the baking plate arrangement is closed. That's not it Required that the abutment device bears against a baking surface or on the edge of the baking surface to specify the required distance of the baking surfaces or baking plates in the closed state of the baking plate assembly.

In a particularly advantageous embodiment of the baking plate arrangement according to the invention, provision is made for a first, adjustably configured contact element of a first upper side to be arranged in a middle region of the first upper side of a first baking plate and for a second, adjustable configured contact element of a second upper side to be in a middle region of the second Top is arranged on a second baking plate, wherein the first contact element and the second contact element abut each other with closed baking plate arrangement. Advantageously, the first contact element and the second contact element are designed adjustable in height.

So that the steam produced during baking can escape from the closed baking plate arrangement as quickly as possible, it is provided according to the invention that the installation device only partially cover a steam outlet region of the closed baking plate arrangement. Advantageously, the steam outlet area is not covered by the investment device.

In order to be able to easily retrofit existing baking plate arrangement and to be able to easily exchange damaged installation devices, it is provided according to the invention that the contact device is detachably arranged on the baking plate arrangement.

Advantageously, the invention provides that the baking plate is convexly biased in an area in which the contact device is arranged on the baking plate arrangement. By such a bias, a vapor pressure can be set, up to which the abutment device bears against the baking plate or the frame part or up to the two abutment elements abut each other, wherein until reaching this vapor pressure, the baking surfaces have a constant distance from one another.

In a particularly advantageous embodiment of the baking plate arrangement according to the invention, it is provided that the abutment device has at least one supporting element arranged on the upper side of a baking plate opposite the baking surface, the baking plate being supported against the supporting element when the baking plate is deformed by vapor pressure. In this way, a required convex bias can be reduced, since a occurring at a given vapor pressure maximum deformation of the baking plate is reduced.

Further advantageous embodiments of the baking plate arrangement according to the invention are explained in more detail with reference to an embodiment shown in the drawing.

• Fig. 1 eine schematisch dargestellte Schnittansicht einer Backplattenanordnung,
• Fig. 2 eine schematische Ansicht eines der in Fig. 1 dargestellten Gestellteile mit einer Backplatte und einer Anlageeinrichtung,
• Fig. 3 eine schematisch dargestellte Detailansicht der in Fig. 1 dargestellten Backplattenanordnung mit einer Anlageeinrichtung,
• Fig. 4 eine schematisch dargestellte Schnittansicht einer Backplatte mit einer mittig an der Backplatte angeordneten Anlageeinrichtung,
• Fig. 5 eine schematisch dargestellte Ansicht einer Backplatte mit an einem Rand einer Backfläche an der Backplatte angeordneten Anlageelementen,
• Fig. 6 ein schematisch dargestelltes Diagramm eines Dampfdruckverlaufs während eine Backprozesses,
• Fig. 7a eine schematische Darstellung einer aus dem Stand der Technik bekannten Auswölbung einer zweiseitig unterstützten Backplatte bei einem vorgegebenen Dampfdruck,
• Fig. 7b eine schematische Darstellung einer Auswölbung einer Backplatte mit einem Stützelement bei einem vorgegebenen Dampfdruck, der dem Dampfdruck bei der in Fig. 7a dargestellten Situation entspricht,
• Fig. 8a eine schematisch Darstellung einer Backplattenanordnung mit an konvex vorgespannten Gestellteilen gelagerten Backplatten in einem geöffneten Zustand,
• Fig. 8b eine schematische Darstellung der in Fig. 8a abgebildeten Backplattenanordnung in einem geschlossen Zustand.

It shows:

• Fig. 1 a schematically illustrated sectional view of a baking plate arrangement,
• Fig. 2 a schematic view of one of in Fig. 1 shown frame parts with a baking plate and a conditioning device,
• Fig. 3 a schematically illustrated detail view of in Fig. 1 illustrated baking plate assembly with a conditioning device,
• Fig. 4 a schematically illustrated sectional view of a baking plate with a centrally arranged on the baking plate investment facility,
• Fig. 5 a schematically illustrated view of a baking plate with arranged on an edge of a baking surface on the baking plate investment elements,
• Fig. 6 a schematic diagram of a vapor pressure profile during a baking process,
• Fig. 7a 3 is a schematic representation of a prior art known bulge of a two-sided supported baking plate at a predetermined vapor pressure,
• Fig. 7b a schematic representation of a bulge of a baking plate with a support element at a predetermined vapor pressure, the vapor pressure at the in Fig. 7a corresponds to the situation
• Fig. 8a 1 is a schematic representation of a baking plate arrangement with baking plates mounted on convexly prestressed frame parts in an opened state;
• Fig. 8b a schematic representation of in Fig. 8a pictured baking tray assembly in a closed state.

In the FIGS. 1 . 2 and 3 different views of a baking plate assembly 1 are shown. Fig. 1 shows a schematic sectional view of a baking plate assembly 1 with a baking plate assembly frame 2, which has two pivotally interconnected frame parts 3. On the frame parts 3, a baking plate 4 is arranged in each case. The baking plates 4 are each biased convexly relative to a baking surface 5 of the baking plates 4. The baking plate assembly 1 is shown closed in this illustration.

Fig. 2 shows a schematic view of one of in Fig. 1 shown frame parts 3 with a baking plate 4. The baking plate assembly 1 has a contact device 6. A detailed view of the investment device 6 is in Fig. 3 shown. The contact device 6 consists of four contact elements 7, wherein in each case two contact elements 7 are arranged on opposite sides of the baking plate assembly 1 on the baking plates 4. In each case, a first, adjustable ausgestaltetes contact element 8 is disposed on a first top 9 of a first baking plate 10 in a central region of the first top 9 and a second, adjustable ausgestaltetes contact element 11 on a second top 12 of a second baking plate 13 in a central region of second top 12 is arranged.

In the closed state of the baking plate arrangement 1, the first abutment element 8 and the second abutment element 11 abut each other. The first contact elements 8 and the second contact elements 11 are each set in height adjustable via an adjusting screw 14 on the first upper side 9 and the second upper side 12. In this way, a distance of the baking surfaces 5 of the baking plates 4 can be easily adapted to the respective requirements.

It is also possible to remove the contact elements 7 by loosening the adjusting screws 14 of the baking plates 4 and replace them with new contact elements 7. During baking, steam can escape from the baking plate arrangement 1 from a steam outlet region 15. The steam outlet region 15 corresponds to a gap between the baking surfaces 5 or an edge of the baking surfaces 5 in the closed state of the baking plate arrangement 1.

Fig. 4 shows a schematically illustrated sectional view of a baking plate 16 with a arranged in a center of the baking plate 16 contact device 17, wherein the contact device 17 is a contact element. The contact device 17 is arranged height-adjustable via an adjusting screw 18 on the baking plate 16. The contact device 16 and the adjusting screw 18 are designed in one piece.

The baking plate 16 may be used in a conventional baking tray assembly rack of a baking tray assembly wherein a head 19 of the abutment means 17 abuts a baking surface of an opposing baking tray when the baking tray assembly is closed.

In Fig. 5 schematically is a view of a baking plate 20 with an investment device 21 is shown. The abutment device 21 has six cylindrical abutment elements 24 arranged along an edge 22 of a baking surface 23 of the baking plate 20.

The baking plate 20 may also be used in a conventional baking tray assembly rack of a baking tray assembly wherein heads 25 of the abutment members 24 abut an edge of a baking surface of an opposing baking tray when the baking tray assembly is closed.

In experiments, an in Fig. 6 set schematically illustrated vapor pressure profile within a closed baking plate arrangement, not shown, with two baking plates and a contact device during a baking process. In the illustrated diagram, a vapor pressure profile of a vapor pressure p over a baking time t is plotted.

The baking process begins at t _start and a pressure p ₀ between the baking plates corresponding to the ambient pressure. As a result of the heating, the vapor pressure or the pressure between the baking plates p increases, until the time t _{k, 1} a pressure p _{k has been} reached. When the pressure p _k is reached, the pressure p becomes so great that the baking plates are arched outward and a distance between the baking plates in a central region of the baking plates increases.

The pressure p continues to increase until a maximum vapor pressure p _{max is} reached. Subsequently, the pressure p decreases continuously. At a time t _{k, 2} , the pressure p has dropped to the level p _k and the distance of the baking plates is essentially predetermined by the investment device. At or shortly after this time t _{k, 2} , the waffle dough begins to harden.

The convex bias of the baking plates is thus adapted to the baking process, that at the beginning of the curing of the wafer dough, the distance of the baking plates is predetermined by the investment device, so that a wafer with a predetermined thickness can be produced. At the same time is avoided with the help of the investment device that touch the convexly biased baking plates at time t ₀ .

Fig. 7a shows a schematic representation of a known from the prior art arrangement of a baking plate 4 on a frame part 3. During a baking process acts on a baking surface 5 of the baking plate 4 a marked by arrows, area-distributed pressure force 26th

By this pressing force 26, the baking plate 4 is deformed and reaches at a certain, indicated by arrows pressing force 27 in the lower region of the Fig. 7a schematically illustrated deformation state 28 of the baking plate 4. In the illustration, each one of the distributed pressure forces 26 and 27 characterizing arrow is exemplified by a reference numeral.

The baking plate 4 is mounted on opposite sides of the frame part 3 and is supported in the direction of the pressing force 27 against the frame part 3. This is characterized in the representation of the deformation state 28 by a floating bearing 29 and a fixed bearing 30. In this deformation state 28, the baking plate 4 has a maximum deformation 31 in the middle of the baking plate 4.

In Fig. 7b schematically shows a fixed to a frame part 3 baking plate 4 is shown, wherein on the frame part 3, a support member 32 is arranged. By acting on the baking plate 4 and indicated by arrows pressing force 26, the baking plate is deformed.

If a certain, indicated by arrows pressing force 27 is reached, the baking plate 4 in the lower part of the Fig. 7b shown deformation state 33. In the illustration, one of the distributed pressure forces 26 and 27 characterizing arrow is exemplified by a reference numeral.

In this deformation state 33, the baking plate 4 is deformed so far that the baking plate bears against the support element 32. An attachment point of the baking plate 4 on the support element 32 is characterized in the deformation state 33 by another floating bearing 34.

In the deformation state 33, the baking plate between the bearings 29 and 34, and between the bearings 30 and 34 bulged. A deformation 35 is smaller than the deformation 31 in the in Fig. 7a illustrated arrangement. By the use of an additional support member 32nd Therefore, the baking plate 4 can be used with a lower convex bias.

In Fig. 8a schematically an open baking plate assembly 36 is shown with a baking tong frame 37. The baking tong set has two frame parts 38 pivotally connected to one another, wherein in each case a baking plate 39 is arranged on the frame parts 38. The frame parts 38 and the baking plates 39 are each biased convexly in opposite directions, so that a distance between the frame parts 38 and arranged on the frame parts 38 baking plates 39 is smaller in an edge region than in a central region.

The baking plates 39 rest in sections on holding elements 40 of the frame parts 38. Between the baking plates 39, a contact device 41 is arranged.

In Fig. 8b is the in Fig. 8a illustrated baking tong assembly 36 is shown schematically in a closed state. In the closed state, the abutment 41 rests against both baking plates 39, so that the baking plates 39 are deformed in the direction of flat baking surfaces 42. As a result of the deformation of the baking plates 39, the frame parts 38 are further deformed via the holding elements 40, so that a deformation energy caused by the deformation of the baking plates 39 and the frame parts 38 and a vapor pressure occurring during a baking process between the closed baking plates 39 is maintained.

Claims (15)

1. Baking plates assembly (1, 36) for a waffle baking machine with two baking plates (4, 10, 13, 16, 20, 39) pivotably connected to one another, characterized in that at least one baking plate (4, 10, 13, 16, 20, 39) is respectively convexly prestressed with regard to a baking surface (5, 23), so that, in a closed baking plates assembly (1, 36), before the start of a baking process, a distance in a middle region of the baking plates (4, 10, 13, 16, 20, 39) is smaller than a distance in a peripheral region of the baking plates (4, 10, 13, 16, 20, 39), in order to compensate for deformations of the baking plates (4, 10, 13, 16, 20, 39) during the baking process, and in that the baking plates assembly (1, 36) comprises a contact unit (6, 17, 21, 41), which is arranged on the baking plates assembly (1, 36) such that the baking surfaces (5) of a closed baking plates assembly (1, 36) have a distance to one another.
2. Baking plates assembly (1, 36) according to claim 1, characterized in that the baking plates assembly (1, 36) comprises a baking tongs frame (2, 37) with two frame parts (3, 38) pivotably connected to one another, wherein the baking plates (4, 10, 13, 16, 20, 39) are arranged on the frame parts (3, 38).
3. Baking plates assembly (1, 36) according to claim 1 or claim 2, characterized in that at least one contact element (7, 8, 11, 24) of a contact unit (6, 17, 21, 41) is adjustably configured, so that the distance of the baking plates (4, 10, 13, 16, 20, 39) of the closed baking plates assembly (1, 36) is settable.
4. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that the contact unit (6, 17, 21, 41) is arranged on a baking plate (4, 10, 13, 16, 20, 39) .
5. Baking plates assembly (1, 36) according to claim 4, characterized in that the contact unit (6, 17, 21, 41) is arranged on an edge (22) of the baking surface (5, 23).
6. Baking plates assembly (1, 36) according to claim 4, characterized in that the contact unit (6, 17, 21, 41) is arranged in the middle region on the baking plate (4, 10, 13, 16, 20, 39).
7. Baking plates assembly (1, 36) according to claim 4, characterized in that the contact unit (6, 17, 21, 41) is arranged on the baking plate (4, 10, 13, 16, 20, 39), in a middle region, of an upper side (9, 12) of the baking plate (4, 10, 13, 16, 20, 39) opposite the baking surface (5, 23).
8. Baking plates assembly (1, 36) according to claim 2 or claim 3, characterized in that the contact unit (6, 17, 21, 41) is arranged on a frame part (3, 38).
9. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that the contact unit (6, 17, 21, 41) comprises multiple contact elements (7, 8, 11, 24).
10. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that two contact elements (7, 8, 11, 24) are provided, which are arranged on the baking plates assembly (1, 36) such that the contact elements (7, 8, 11, 24), in a closed baking plates assembly (1, 36), abut on one another.
11. Baking plates assembly (1, 36) according to claim 9, characterized in that a first, adjustably configured contact element (8) is arranged on a first upper side (9) in a middle region of the first upper side (9) of a first baking plate (10), and in that a second, adjustably configured contact element (11) is arranged on a second upper side (12) in the middle region of the second upper side (12) on a second baking plate (13), wherein the first contact element (8) and the second contact element (11) abut on one another in a closed baking plates assembly (1, 36) .
12. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that the contact unit (6, 17, 21, 41) covers a steam outlet region (15) of the closed baking plates assembly (1, 36) only in sections.
13. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that the contact unit (6, 17, 21, 41) is detachably arranged on the baking plates assembly (1, 36).
14. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that the baking plates (4, 10, 13, 16, 20, 39) is convexly prestressed in a region in which the contact unit (6, 17, 21, 41) is arranged on the baking plates assembly (1, 36).
15. Baking plates assembly (1, 36) according to one of the preceding claims, characterized in that the contact unit (6, 17, 21, 41) comprises at least one support element (32) arranged on the upper side (9, 12), of a baking plate (4, 10, 13, 16, 20, 39), opposite of the baking surface (5, 23), wherein the baking plate (4, 10, 13, 16, 20, 39) rests against the support element (32) in a steam-pressure contingent deformation of the baking plate (6, 10, 13, 16, 20, 39) .

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