EP2873307A1 - Surface-wave applicator for plasma production - Google Patents
Surface-wave applicator for plasma productionInfo
- Publication number
- EP2873307A1 EP2873307A1 EP13735272.0A EP13735272A EP2873307A1 EP 2873307 A1 EP2873307 A1 EP 2873307A1 EP 13735272 A EP13735272 A EP 13735272A EP 2873307 A1 EP2873307 A1 EP 2873307A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- tube
- applicator
- dielectric
- plasma
- coaxial assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000004020 conductor Substances 0.000 claims abstract description 49
- 230000005684 electric field Effects 0.000 claims description 20
- 230000005415 magnetization Effects 0.000 claims description 18
- 230000001902 propagating effect Effects 0.000 claims description 15
- 239000003989 dielectric material Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 239000012809 cooling fluid Substances 0.000 claims description 7
- 230000008878 coupling Effects 0.000 claims description 7
- 238000010168 coupling process Methods 0.000 claims description 7
- 238000005859 coupling reaction Methods 0.000 claims description 7
- 238000005086 pumping Methods 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 4
- 230000000644 propagated effect Effects 0.000 abstract 1
- 210000002381 plasma Anatomy 0.000 description 108
- 239000007789 gas Substances 0.000 description 48
- 238000010586 diagram Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 5
- 238000013461 design Methods 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000013529 heat transfer fluid Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4615—Microwave discharges using surface waves
Definitions
- the present invention relates to a surface wave applicator for plasma production, and to a device and method for producing surface wave plasma.
- Surface wave plasmas are a type of high frequency plasma (HF), that is, at a frequency of 1 MHz or less to more than 10 GHz [1] in which the plasma is maintained by a electromagnetic wave (in particular radiofrequency or microwave) propagating along a dielectric tube in contact with the plasma.
- HF high frequency plasma
- the plasma can be generated outside the dielectric tube or inside thereof, or both inside and outside the tube.
- the plasma and the dielectric tube constitute the propagation medium of the microwaves that generate the plasma along the propagation zone.
- the microwave electromagnetic field is called surface because the intensity of the electric field is maximum at the interface between the dielectric tube and the plasma.
- surface wave plasmas are produced in the absence of a static magnetic field, except at low pressure where an axial magnetic field (i.e. in the tube direction) can be applied to improve the radial confinement of the plasma and / or produce plasma excitation at the electron cyclotron resonance.
- the surface wave plasmas are produced in a dielectric tube by a surface electromagnetic wave generated from a gap gap field applicator (or "gap" according to the English terminology), as schematized on Figure 1.
- FIG. 1 illustrates a sectional view of half of a dielectric tube 3 containing a plasma 4.
- the X axis is the axis of revolution of the tube 3.
- electrically conductive elements 2a, 2b which have, in this configuration, main surfaces respectively parallel and perpendicular to the dielectric tube 3.
- the elements 2a and 2b are spaced apart from a gap G, whose width is typically of the order of a few mm.
- An electromagnetic surface wave W is generated from the gap G.
- the electric field has only a radial component, that is to say in the case illustrated in FIG. perpendicular to the surface of the conductive element 2a and the thickness of the conductive element 2b.
- the electromagnetic wave W thus propagates in a direction perpendicular to the gap, and substantially symmetrically (waves W1 and W2) on either side of the axis of the gap G (which is perpendicular to the X axis dielectric tube 1).
- the dielectric tube passes through a box (the applicator is then called “surfatron”) or a waveguide (the applicator is then called “surfaguide”) which allows to apply to the tube, over a short length , the microwave electric field that will produce the plasma along which it can propagate.
- a box the applicator is then called “surfatron”
- a waveguide the applicator is then called “surfaguide”
- Fig. 2A illustrates an example of a surfatron
- Figure 2B illustrates an example of a surfaguide.
- the surfatron of Figure 2A is a cylindrical box closed by a conductive partition 2b.
- the dielectric tube 3 which is perpendicular to the partition 2b, has an axial conductive strip 2a along its entire length.
- the tube 3 is arranged inside the cylindrical box, a gap G being formed between the end of the tube 3 and the conductive partition 2a.
- the surfaguide of FIG. 2B comprises a GO waveguide, which is traversed perpendicularly by the dielectric tube 3, the pitch gap G being formed between the wall of the waveguide and the tube.
- the surface wave is symmetrical with respect to the gap.
- FIG. 3 illustrates the evolution of the radial and axial components of the electric field of the plasma 4 towards the outside of the dielectric tube 3 (medium A consisting for example of air or of a dielectric), as a function of the distance r in the radial direction from the Z axis of the tube 3.
- the ordinate axis indicates the intensity of the electrical component of the electromagnetic wave expressed in relative units.
- FIG. 3 shows that the axial component (dotted line curve) of the electrical component of the electromagnetic wave is continuous from the plasma 4 towards the external medium A, while the radial component (solid line curve) of the electric field a large discontinuity in the dielectric tube 3.
- the impedance matching systems of these devices are also expensive and bulky.
- the plasma is produced on either side of the wave launch gap (by the upstream wave and the downstream wave).
- the range of frequencies accessible to surface wave plasmas is much wider since it starts at less than 1 MHz (the beginning of the radio frequency domain (RF)) and covers the microwave domain up to more than 10 GHz.
- RF radio frequency domain
- An object of the invention is to provide a surface wave applicator that overcomes the aforementioned drawbacks.
- a surface wave applicator for the production of plasma comprising:
- an electrically conductive coaxial assembly formed of a central core and an outer tubular conductor surrounding the central core and separated therefrom by an annular volume of propagation of an electromagnetic wave
- a dielectric tube inserted, at the end of said coaxial assembly, into said annular volume of propagation of the electromagnetic wave and extending beyond the plane of leaving the applicator over a length at least equal to twice the outside diameter of said tube, so that an electromagnetic wave propagating in the coaxial assembly is introduced into the section of said dielectric tube in the longitudinal direction of said tube in order to produce a surface wave plasma along the portion of the dielectric tube whose inner wall and / or the outer wall is in contact with a plasma gas.
- the ends of the central core and the outer conductor of the coaxial assembly are coplanar.
- the outer conductor at least partially surrounds the dielectric tube beyond the plane of the end of the central core.
- the central core occupies at least partially the interior volume of the dielectric tube beyond the plane of the end of the outer conductor.
- the coaxial assembly further comprises an impedance matching device.
- the length of the dielectric tube inserted in the coaxial assembly is chosen to ensure impedance matching between the impedance of the plasma and the characteristic impedance of the coaxial assembly.
- the coaxial assembly may comprise a circulation circuit of a cooling fluid arranged in the central core and / or in the outer conductor.
- the dielectric tube may comprise a circulation circuit of a cooling dielectric fluid arranged in the interior volume and / or in the thickness of said tube.
- the applicator further comprises a cylindrical permanent magnet whose direction of magnetization is parallel to the axis of the applicator, arranged at the end of the central core.
- the applicator further comprises:
- a cylindrical permanent magnet whose direction of magnetization is parallel to the axis of the applicator, arranged at the end of the central core and,
- At least one annular permanent magnet whose direction of magnetization is parallel to the axis of the applicator and in the same direction as the magnetization of the central cylindrical magnet, arranged around the end of the outer conductor,
- the magnetization of said magnets being chosen so as to form a magnetic field capable of providing, in a zone distant from the end of the applicator, an electron cyclotron resonance coupling with the microwave electric field generated by said applicator, the outer radius and the magnetization of the annular magnet being further selected so that the magnetic field lines generated by said magnets pass through the electron cyclotron resonance coupling zone in a direction substantially parallel to the axis of the applicator .
- the applicator comprises a confinement tube made of a dielectric material extending concentrically around the dielectric tube, said confinement tube being embedded in the external electrical conductor of the coaxial assembly.
- Another object relates to a device for producing surface wave plasma, comprising an enclosure containing a plasmagenic gas and at least one applicator as described above, in which a part of the inner wall and / or the outer wall of the tube dielectric extending beyond the exit plane of the applicator is in contact with the plasma gas.
- the dielectric tube is sealed and constitutes said chamber containing the plasma gas.
- the dielectric tube is located inside the enclosure.
- the enclosure comprises a confinement tube made of a dielectric material extending concentrically around the dielectric tube, said confinement tube being embedded in the external electrical conductor of the coaxial assembly of the applicator.
- the dielectric tube may be open at its end opposite the coaxial assembly, the plasmagenic gas being in contact with the inner wall and the outer wall of the tube.
- the dielectric tube may be closed at its end opposite the coaxial assembly, the plasmagenic gas being in contact only with the outer wall of the tube.
- the dielectric tube may be closed at its end opposite the coaxial assembly, the inside of said tube being evacuated or filled with a material (solid or fluid) dielectric.
- the chamber may comprise a device for introducing the plasma gas into the chamber and a device for pumping the plasma gas from inside to outside the chamber.
- the central core comprises a conduit for introducing the plasma gas into the chamber.
- the plasma gas pressure inside the chamber is preferably less than 133 Pa when a suitable magnetic field providing electronic cyclotron resonance is applied.
- Another object relates to a method of producing surface wave plasma along a dielectric tube whose inner wall and / or the outer wall is in contact with a plasma gas, characterized in that includes:
- said dielectric tube being inserted at the end of said coaxial assembly into the annular volume of propagation of the electromagnetic wave and extending beyond the plane of exit of the coaxial assembly over a length at least equal to twice the outside diameter of said tube.
- the electromagnetic wave is a microwave wave.
- the plasma gas pressure is less than 133 Pa and the plasma is produced by electron cyclotron resonance.
- the electromagnetic wave is a radiofrequency wave.
- the coaxial assembly is cooled by a circulation of a cooling fluid inside said assembly.
- the dielectric tube is cooled by circulating a dielectric cooling fluid inside said dielectric tube.
- FIG. 1 is a block diagram of a conventional surface wave applicator
- FIGS. 2A and 2B respectively show illustrations of a surfatron and a surfaguide belonging to the state of the art
- FIG. 3 is a graph illustrating the evolution of the radial and axial components of the electric field of the plasma towards the outside of the dielectric tube
- FIG. 4 is a block diagram of a surface wave applicator according to a first embodiment of the invention
- FIG. 5 is a block diagram of a surface wave applicator according to a second embodiment of the invention (production of plasma inside the dielectric tube),
- FIG. 6 is a block diagram of a surface wave applicator according to a third embodiment of the invention (production of plasma outside the dielectric tube),
- FIG. 7 presents an exemplary embodiment making it possible to obtain an impedance matching between the impedance of the plasma and the characteristic impedance of the coaxial line
- FIG. 8 is a block diagram of a plasma production device according to a particular embodiment of the invention, corresponding to the production of plasma in a dynamic regime, involving a gas introduction and a pumping,
- FIG. 9 is a block diagram of a variant of a surface wave applicator according to the invention, in which a magnetic field is also applied by means of a permanent magnet arranged at the end of the central soul,
- FIG. 10 is a block diagram of a variant of a surface wave applicator according to the invention, in which a magnetic field is also applied by means of a first permanent magnet arranged at the end of the central core and a second annular permanent magnet arranged at the end of the outer conductor,
- FIG. 11A is a block diagram of a surface wave applicator according to another embodiment of the invention (confinement of the plasma produced outside the dielectric tube);
- Fig. 11B is a block diagram of a less advantageous variant of Fig. 11A.
- FIG. 4 is a block diagram of a surface wave applicator 1 for plasma production according to the invention.
- Said applicator comprises a coaxial assembly 2 electrically conductive, formed of a central core 20 and an outer tubular conductor 21 surrounding the central core 20 and separated therefrom by an annular volume 22 for propagating an electromagnetic wave W .
- Such a coaxial assembly 2 is known in itself and its design is within the reach of the skilled person.
- a dielectric tube 3 is inserted at the end of the coaxial assembly 2 in the annular volume 22 of propagation of the electromagnetic wave while extending beyond the exit plane of the applicator.
- the applicator output plane is the interface between the coaxial assembly 2 and a volume containing a plasma gas, said output plane constituting a boundary between the applicator and the plasma generated by the electromagnetic wave from said gas plasma.
- the dielectric tube thus comprises a first portion inserted into the annular volume 22 and a second portion protruding from the exit plane of the applicator, whose inner wall and / or the outer wall is likely to be in contact with a plasma gas.
- a plasmagene gas is brought into contact with the tube 3, the plasmagenic gas being able to be located inside and / or outside said tube or on either side of the tube, according to the applications, some examples of which will be described in detail below.
- the tube 3 may be of any dielectric material, which is a medium adapted to the propagation of an electromagnetic wave without significant losses.
- the tube 3 may be of silica (SiO 2 ), alumina (Al 2 O 3 ) or aluminum nitride (AlN), without the invention being limited to these materials.
- the tube 3 generally has a circular section and extends in a longitudinal direction X.
- the radius of the tube 3 is typically of the order of one centimeter, that is to say between a few millimeters and a few centimeters depending on the application and the operating conditions.
- the dielectric tube 3 may have a gradual change in its diameter as is the case with some devices using surface wave plasmas.
- the thickness of the tube 3 is generally of the order of one millimeter.
- the thickness of the portion of the tube 3 inserted in the coaxial assembly is chosen so that the tube 3 occupies substantially the entire width of the annular volume 22.
- sealing of the junction between the tube and the annular volume vis-à-vis the plasma gas by any suitable means.
- the length of the tube depends on the intended application.
- the length of the tube 3 is large in front of the diameter of the coaxial applicator (which is of the order of 1 cm) and may, depending on the application, have a length that may range from about 5 cm to 1 cm. meter order.
- the length of the portion of the tube 3 extending beyond the exit plane of the applicator advantageously corresponds to the length on which it is desired to generate the plasma.
- the length of the portion of the extension extending beyond the outlet plane of the applicator greater than or equal to twice the outside diameter of the tube 3 is chosen, so as to produce the plasma essentially along said portion of the tube. tube.
- the tube extends beyond the outlet plane of the applicator over a short length, that is to say typically smaller than the outside diameter of the tube, the plasma is generated directly at the outlet the applicator without creating a surface wave, which corresponds to a situation not covered by the present invention, wherein a plasma sheet is formed in the exit plane of the applicator.
- the tube 3 can be open at its end 33 opposite to the coaxial assembly 2; alternatively, the tube 3 can be closed at this end 33.
- An electromagnetic wave W propagating in the annular volume 22 of the coaxial assembly 2 is introduced into the section of the dielectric tube 3 in the longitudinal direction X of said tube and propagates longitudinally in the thickness of said tube.
- the electromagnetic wave propagates in an electromagnetic transverse mode (TEM), that is to say a mode where the electric field is purely radial.
- TEM electromagnetic transverse mode
- the normal to the metal surface of the central core and the external conductor changes direction, passing from a radial direction to the axial direction, parallel to the X axis.
- An axial electric field component (in addition to the radial component) thus appears, which constitutes a very favorable situation for launching a surface wave (which comprises both an axial component and a radial component (see FIG. 3) along the dielectric tube beyond the exit plane of the applicator.
- the exit plane may consist of the plane defining the end of the central core 20 and / or of the outer conductor 21, the central core and / or the outer conductor 21 being in contact with the plasma gas.
- the ends of the central core 20 and the outer conductor 21 are coplanar and form said output plane Y.
- the ends of the central core 20 and the outer conductor 21 are not necessarily coplanar.
- the exit plane of the applicator is defined as the plane defining the end of the portion of the coaxial assembly which is in contact with the plasma gas, depending on whether the plasma gas is located inside and / or outside the dielectric tube 3.
- the plasmagenic gas is confined inside the dielectric tube 3 and the external conductor 21 protrudes from the central core 20.
- outlet plane Y of the applicator corresponds to the plane of the end of the central core 20, whatever the position of the end of the outer conductor 21.
- the plasmagenic gas is confined in an enclosure outside the dielectric tube 3, the external conductor flush with the wall of said enclosure and the central core 20 protruding from the external conductor 21.
- the output plane Y of the applicator corresponds to the plane of the end of the outer conductor 21 and the wall of the enclosure, whatever the position of the end of the central core 20.
- the invention proposes to launch an electromagnetic wave in the longitudinal direction of said tube from an electromagnetic wave introduced in the section. dielectric tube.
- the efficiency of the system is thus substantially improved since, assuming a perfect impedance matching, all the incident electromagnetic power is introduced and then propagates in the dielectric tube.
- the impedance matching device - which is in itself a device known to those skilled in the art - in the coaxial assembly, as close as possible to the plasma.
- FIG. 7 describes an example where the impedance matching between the impedance of the plasma Z p and the characteristic impedance Z c of the coaxial assembly is obtained by a quarter-wave transformer of impedance Z, where:
- the dielectric tube 3 must be introduced into the coaxial assembly over a length corresponding to a quarter wavelength ( ⁇ / 4) in the dielectric.
- those skilled in the art are able to determine the impedance matching means between a given coaxial structure and a given load impedance.
- ISM frequencies (acronym for "industrial, scientific and medical) such as 13.56 MHz, 27.12 MHz or 40.68 MHz for the RF domain, and 433 MHz, 2.45 GHz or 5.80 GHz for the microwave field.
- the power applied may be between 1 or a few watts (for example lighting) and a few hundred watts, or more (eg treatment of gaseous effluents).
- said plasmagenic gas may be located inside and / or outside the dielectric tube 3.
- the plasma gas may be any gas whose components make it possible to generate a plasma under the effect of the electromagnetic wave propagating in the dielectric tube 3.
- the plasma gas may thus be conventionally constituted by one or more rare gases (in particular argon) and mercury.
- gases such as nitrogen, oxygen, halogenated gases, or any other gas having physicochemical properties of interest for targeted application can also be envisaged.
- the plasmagenic gas is confined inside the dielectric tube 3, which is sealed at its end 33 opposite to the coaxial assembly 2.
- Figure 5 illustrates an example of such an embodiment.
- the plasma gas 4 is enclosed in the dielectric tube 3 which is sealed at one of its ends around the central core 20 and at its other end 33 by a sealed wall.
- the outer conductor 21 may at least partially surround the dielectric tube 3, beyond the exit plane of the applicator which, in this embodiment, corresponds to the end of the central core 20.
- This configuration makes it possible, for example, to form a shield at the level of the exit plane of the applicator and thus to prevent the transmission of the electromagnetic radiation to the outside.
- the plasma gas 4 is confined in a chamber (not shown) and the dielectric tube 3 is itself inserted into said chamber.
- This embodiment is particularly advantageous insofar as the plasma generated outside the dielectric tube, the plasma absorbs the electromagnetic radiation.
- a particular example is that of lighting, where the bulb constitutes said enclosure containing the plasma gas, the dielectric tube being arranged inside the bulb.
- the tube 3 is open at its end 33 and thus communicates with the volume of the chamber, plasma can also be formed inside said tube 3.
- the central core 20 can occupy at least part of the inside of the dielectric tube 3, beyond the exit plane of the applicator which, in this mode of embodiment, corresponds to the end of the outer conductor 21.
- This embodiment is particularly advantageous for cooling the central core 20 by means of an internal circulation of water or any heat transfer fluid in the case of a heat pipe)
- the sealing of the plasma volume can be achieved by known techniques.
- the sealing of the plasma volume vis-à-vis the applicator can be ensured by the establishment of O-rings between the dielectric tube and the central core and the outer conductor of the coaxial assembly.
- the dielectric tube may be brazed to the central core and the outer conductor of the coaxial assembly.
- the dielectric tube may be sealed, near its end inserted into the annular volume of the coaxial assembly, by a plug of dielectric material.
- the dielectric tube 3 can be inserted inside a sealed enclosure, the outer conductor of the coaxial assembly preferably flush with the inner wall of the said enclosure (as illustrated in Figure 8 for example).
- the seal between the coaxial assembly and the wall of the enclosure through which it passes is ensured by any appropriate means, such as O-rings, brazing, etc.
- the applicator operates in static mode, that is to say without plasma gas flow.
- the applicator can be implemented in dynamic mode, that is to say in an enclosure containing a device for pumping plasma gas from outside to inside the chamber.
- FIG. 8 This particular embodiment is illustrated in FIG. 8, where a pumping device 5 has been schematized in the enclosure.
- the core may comprise a conduit 23 for introducing plasma gas into the chamber.
- This embodiment of the invention is advantageous when implementing a chemical reaction in the plasma (for example for the treatment of effluents), since a renewal of the plasma gas and the evacuation of the products of the reaction are then necessary.
- This cooling can be effected by circulating a suitable fluid (for example, water) inside the central core and / or the outer conductor of the coaxial assembly.
- a suitable fluid for example, water
- surface wave plasmas are produced in the absence of a static magnetic field, except at low pressure where an axial magnetic field (in the tube direction) can be applied to improve the radial confinement of the plasma (decrease in plasma losses on the walls of the tube) and / or produce a plasma excitation at the electron cyclotron resonance.
- a first simplified embodiment, illustrated in FIG. 9, can be obtained by inserting at the end of the central core 20 of the coaxial structure a cylindrical magnet 200 of axial magnetization.
- Another embodiment makes it possible to benefit from the electronic cyclotron resonance (ECR) mode.
- ECR electronic cyclotron resonance
- m e is the mass of the electron
- e is the charge of the electron
- B 0 is the intensity of the magnetic field corresponding to the electron cyclotron resonance (ECR) for the microwave frequency f 0 .
- the applicator comprises, as illustrated in FIG. 10:
- a cylindrical permanent magnet 200 arranged at the end of the central core 20 and whose magnetization direction (represented by an arrow) is parallel to the axis X; said magnet has a radius substantially identical to that of the central core 20 (concretely, the cylindrical magnet may have a radius slightly less than that of the central core and be housed in a cylindrical housing provided at the end of the central soul);
- annular magnet 201 arranged at the end of the outer conductor 21 of the coaxial assembly and whose magnetization direction (represented by an arrow) is parallel to the axis X and in the same direction as that of the magnet cylindrical 200.
- said annular magnet has an inner radius substantially equal to that of the outer conductor 21, which corresponds to the outer radius of the annular volume 22 of propagation of microwaves, noted R.
- the annular magnet may have an inner radius slightly greater than that of the outer conductor and outer radius less than that of the outer conductor and be housed in an annular housing provided at the end of the outer conductor.
- the magnets can be made integral with the coaxial assembly by any appropriate means.
- the magnetization of the cylindrical magnet 200 and the annular magnet 201 is chosen so as to form a magnetic field suitable for providing, in a zone distant from the plane Y output of the applicator, an electron cyclotron resonance coupling with the microwave electric field generated by the applicator.
- the cylindrical magnet 200 and the annular magnet 201 make it possible to generate magnetic field lines that pass through the electron cyclotron resonance coupling zone in a direction substantially parallel to the X axis of the applicator.
- This effect can be obtained by a judicious choice of the outer radius and the magnetization of the annular magnet 201.
- the electron cyclotron resonance zone is delimited, in the radial direction, by the zone in which the microwave electric field is the strongest, the use of an annular magnet whose outside radius is much greater than the radius of this zone makes it possible to obtain a zone of ECR substantially parallel to the output plane Y of the applicator.
- This zone of strong electric field is considered to extend over a radius of the order of twice the radius of the applicator.
- the annular magnet 201 has an outer radius greater than the radius of the strong electric field area, the ECR region is substantially parallel to the exit plane of the applicator over its entire radius 2R range.
- the field lines that start from the pole located at the exit plane of the applicator to reach the opposite pole remain substantially parallel to the axis X of the applicator during their crossing of the zone Z RC E of radius 2R, including the periphery of this zone.
- the annular magnet has the effect of "straightening" the field lines at the periphery of the ECR area.
- the electromagnetic field which is maximum at the interface between the plasma and the dielectric tube along which said plasma is generated, can thus be absorbed by the annular volume of gas extending around said tube.
- the dielectric tube for confining the plasma is designated by the reference 6.
- the end of the tube 6 opposite to the coaxial assembly is closed, so that the tube 6 constitutes an enclosure capable of enclosing plasma gas.
- the dielectric confinement tube may constitute the envelope of a light bulb.
- the dielectric tube 3 along which the plasma is generated can be open or closed at its opposite end to the coaxial assembly.
- the tube 3 is open so that the inside of the tube 3 communicates with the outside of said tube, which makes it possible to generate plasma both inside and outside the tube 3, said plasma being confined externally by the tube 6.
- the tube 3 is closed and evacuated or filled with a dielectric material, for example in liquid form, the plasmagenic gas being contained in the confinement tube 6, outside the tube 3. thus plasma in an annular volume between the tubes 3 and 6.
- a dielectric material for example in liquid form
- the tube 3 is closed and contains the plasma gas, the tube 6 not containing plasma gas.
- plasma is formed in the tube 3 only.
- the dielectric confinement tube 6 is advantageously embedded in the outer tubular conductor 21 of the coaxial assembly, to a depth p.
- This embedding has the effect of promoting the formation of the two axial and radial components of the electric field HF in the exit plane of said confinement tube, as occurs for the dielectric tube 3 along which the plasma is generated.
- the depth p is advantageously substantially equal to (2k + 1) ⁇ / 4, where k is an integer and ⁇ is the wavelength of the electromagnetic wave propagating within the dielectric tube 3 inserted into the coaxial set.
- Said wavelength ⁇ is given by the formula: where A 0 is the wavelength of the electromagnetic wave propagating in the vacuum or in the air, and ⁇ is the relative permittivity of the dielectric material of the confinement tube 6 with respect to the permittivity of the vacuum.
- k 0 is chosen, ie a embedment depth of the confinement tube of the order of ⁇ / 4.
- the external electrical conductor may have a shoulder 21a projecting from the outlet plane Y of the applicator.
- This shoulder makes it possible to prevent the electromagnetic wave from propagating radially outside the dielectric confinement tube 6 in the exit plane.
- FIG. 11B presents for comparison a situation in which the confinement tube 6 is simply in contact with the exit surface of the external electrical conductor 21.
- Applicators according to the various embodiments of the invention can be advantageously used, unitarily or in combination to form extended sources, in multiple applications.
- the invention makes it possible to remedy the disadvantages of the existing devices described above.
- the applicator has a design and manufacture substantially simpler than existing devices, and adapted to a wide range of frequencies (RF and microwave).
- the radial size of the applicator is determined by the overall size of the coaxial assembly (typically the external diameter of the outer tubular conductor), which is generally substantially smaller than that of tangential wave launch devices. such as surfatron and surfaguide illustrated in Figures 2A and 2B.
- the diameter of a coaxial applicator is of the order of 1 to 2 cm while the dimensions of a surfaguide are of the order of the wavelength of the electromagnetic wave.
- the applicator works with conventional impedance matching devices, depending on the frequency of the electromagnetic wave employed, and therefore does not require the implementation of bulky and expensive devices.
- the surface wave being launched in a single direction (that is, the direction of the end 33 of the dielectric tube 3 opposite the coaxial assembly 2), there is no loss of energy.
- the energy efficiency of the applicator is therefore optimal.
- the applicator can be readily adapted to cyclotron electron resonance (ECR) coupling to form and maintain the plasma at low pressure.
- ECR cyclotron electron resonance
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1256673A FR2993428B1 (en) | 2012-07-11 | 2012-07-11 | SURFACE WAVE APPLICATOR FOR PLASMA PRODUCTION |
PCT/EP2013/064578 WO2014009412A1 (en) | 2012-07-11 | 2013-07-10 | Surface-wave applicator for plasma production |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2873307A1 true EP2873307A1 (en) | 2015-05-20 |
EP2873307B1 EP2873307B1 (en) | 2016-07-06 |
Family
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EP13735272.0A Active EP2873307B1 (en) | 2012-07-11 | 2013-07-10 | Surface-wave applicator and method for plasma production |
Country Status (5)
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---|---|
EP (1) | EP2873307B1 (en) |
JP (1) | JP6263175B2 (en) |
CN (1) | CN104782235B (en) |
FR (1) | FR2993428B1 (en) |
WO (1) | WO2014009412A1 (en) |
Families Citing this family (5)
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FR3042092B1 (en) * | 2015-10-05 | 2019-07-26 | Sairem Societe Pour L'application Industrielle De La Recherche En Electronique Et Micro Ondes | ELEMENTARY DEVICE FOR PRODUCING PLASMA WITH COAXIAL APPLICATOR |
FR3052326B1 (en) * | 2016-06-07 | 2018-06-29 | Thales | PLASMA GENERATOR |
KR101820242B1 (en) * | 2016-08-02 | 2018-01-18 | 한국기초과학지원연구원 | Water-cooled type surface wave plasma generating apparatus |
KR101830007B1 (en) * | 2016-11-11 | 2018-02-19 | 한국기초과학지원연구원 | COAXIAL CABLE COUPLED and WATER-COOLED TYPE SURFACE WAVE PLASMA GENERATING APPARATUS |
US11564292B2 (en) * | 2019-09-27 | 2023-01-24 | Applied Materials, Inc. | Monolithic modular microwave source with integrated temperature control |
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JPS579868A (en) * | 1980-06-18 | 1982-01-19 | Toshiba Corp | Surface treating apparatus with microwave plasma |
FR2583250B1 (en) * | 1985-06-07 | 1989-06-30 | France Etat | METHOD AND DEVICE FOR EXCITTING A MICROWAVE PLASMA WITH ELECTRONIC CYCLOTRONIC RESONANCE |
JPH0594899A (en) * | 1991-10-02 | 1993-04-16 | Nippon Steel Corp | Plasma processor |
JPH0685525A (en) * | 1992-08-31 | 1994-03-25 | Kyocera Corp | 1/2 wavelength antenna |
JPH05347508A (en) * | 1992-10-30 | 1993-12-27 | Harada Ind Co Ltd | Wide band microwave antenna |
JPH0729889A (en) * | 1993-07-08 | 1995-01-31 | Anelva Corp | Microwave plasma treatment processing equipment |
JPH0821476B2 (en) * | 1993-09-20 | 1996-03-04 | ニチメン電子工研株式会社 | ECR plasma generator |
JPH07161491A (en) * | 1993-12-02 | 1995-06-23 | Daido Steel Co Ltd | Microwave plasma processing device |
JPH0935651A (en) * | 1995-07-20 | 1997-02-07 | Nissin Electric Co Ltd | Ion source |
JPH09245997A (en) * | 1996-03-05 | 1997-09-19 | Nissin Electric Co Ltd | Plasma chamber having cover-enclosed inner wall and antenna |
JPH1083895A (en) * | 1996-09-06 | 1998-03-31 | Hitachi Ltd | Plasma processing device |
JPH11102799A (en) * | 1997-09-26 | 1999-04-13 | Mitsubishi Electric Corp | Plasma generator |
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JP2000277295A (en) * | 1999-03-25 | 2000-10-06 | Toshiba Corp | Plasma treatment apparatus |
JP2002093597A (en) * | 2000-09-14 | 2002-03-29 | Miura Gakuen | Plasma-generating antenna, plasma treatment apparatus, plasma treatment method, production method of object to be treated and production method of semiconductor device |
FR2840451B1 (en) * | 2002-06-04 | 2004-08-13 | Centre Nat Rech Scient | DEVICE FOR PRODUCING A PLASMA TABLECLOTH |
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2012
- 2012-07-11 FR FR1256673A patent/FR2993428B1/en not_active Expired - Fee Related
-
2013
- 2013-07-10 CN CN201380036340.3A patent/CN104782235B/en active Active
- 2013-07-10 JP JP2015520974A patent/JP6263175B2/en active Active
- 2013-07-10 EP EP13735272.0A patent/EP2873307B1/en active Active
- 2013-07-10 WO PCT/EP2013/064578 patent/WO2014009412A1/en active Application Filing
Non-Patent Citations (1)
Title |
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See references of WO2014009412A1 * |
Also Published As
Publication number | Publication date |
---|---|
FR2993428A1 (en) | 2014-01-17 |
EP2873307B1 (en) | 2016-07-06 |
JP2015530694A (en) | 2015-10-15 |
CN104782235B (en) | 2017-03-08 |
JP6263175B2 (en) | 2018-01-17 |
FR2993428B1 (en) | 2014-08-08 |
CN104782235A (en) | 2015-07-15 |
WO2014009412A1 (en) | 2014-01-16 |
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