EP2835269A1 - Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci - Google Patents

Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci Download PDF

Info

Publication number
EP2835269A1
EP2835269A1 EP20130179785 EP13179785A EP2835269A1 EP 2835269 A1 EP2835269 A1 EP 2835269A1 EP 20130179785 EP20130179785 EP 20130179785 EP 13179785 A EP13179785 A EP 13179785A EP 2835269 A1 EP2835269 A1 EP 2835269A1
Authority
EP
European Patent Office
Prior art keywords
coating
plate
precursor plate
precursor
anyone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP20130179785
Other languages
German (de)
English (en)
Inventor
Marco Viticoli
Giorgio Maria Paesano
Fabrizio Pitacco
Gerardo Coletta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
European Central Bank
Original Assignee
European Central Bank
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by European Central Bank filed Critical European Central Bank
Priority to EP20130179785 priority Critical patent/EP2835269A1/fr
Publication of EP2835269A1 publication Critical patent/EP2835269A1/fr
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/003—Preparing for use and conserving printing surfaces of intaglio formes, e.g. application of a wear-resistant coating, such as chrome, on the already-engraved plate or cylinder; Preparing for reuse, e.g. removing of the Ballard shell; Correction of the engraving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/16—Curved printing plates, especially cylinders
    • B41N1/20—Curved printing plates, especially cylinders made of metal or similar inorganic compounds, e.g. plasma coated ceramics, carbides

Definitions

  • the invention relates to a precursor plate for the manufacture of an intaglio printing plate. Furthermore, the invention relates to a method of manufacturing the precursor plate and to the use of this precursor plate.
  • Intaglio printing plates are frequently used for the production of banknotes and like printed securities.
  • a polymer plate or a polymer layer which is supported by a base plate, is engraved.
  • a polyimide material containing dispensed carbon black material can be engraved by a laser engraving technique.
  • the polymer plate is subsequently used as a precursor material for the manufacture of the intaglio printing plate.
  • the polyimide material is usually silvered and used as the master die for the production of the so called (nickel) alto plate. This is performed by processing the engraved polymer plate in an electroforming process, in which the silvered polymer plates are put in a nickel galvanic bath.
  • the polymeric precursor material and the nickel alto plate are separated.
  • the alto plate is therefore a mirror image basically showing the relief of the engraved precursor plate.
  • the surface quality of the nickel alto plate is significantly affected by the quality of the silvered polymeric plate.
  • the silvering the polymer precursor plate is carried out by the electroforming chemical process, which consists in the use of chemical solutions containing silver salts and reducing agents.
  • the dissolved silver irons are reduced at the surface of the polymeric plate forming the silver layer.
  • This chemical process requires the use of various hazardous substances, mainly formaldehyde and ammonia solution.
  • the chemical solutions are typically applied on the polymeric surface by a spray technique or by using an oscillating tube. The repeatability of this process is relatively low, since the main operations are carried out manually. This implies that in some cases the process of chemical deposition should be repeated as the result of the presence of defects on the silver layer. In the very worst case, a new polymer plate should be engraved and coated.
  • a precursor plate for the manufacture of an intaglio printing plate comprises an engraved surface, which is covered by a coating.
  • the coating is formed by physical vapour deposition (PVD) of a coating material.
  • the invention provides an alternative process for coating of a precursor plate, based on physical vapour deposition.
  • This thin film technique operating under vacuum is able to overcome the drawbacks of the traditional chemical processes.
  • the PVD process does not require the use of any hazardous chemicals and it can ensure both, a higher repeatability of the process and a better quality of the coating layer. This advantageously results in a (nickel) alto plate having an enhanced surface quality.
  • the coating material comprises Silver (Ag), Gold (Au), Aluminium (Al), Palladium (Pd), Titanium (Ti), Chrome (Cr) and / or any other conductive material.
  • the coating comprises any other electrically conductive metal.
  • the coating material comprises a composition or an alloy of at least two of the named materials.
  • the coating material comprises nitrides and / or carbonitrides of any of the named materials and / or alloys.
  • the coating is a multilayer.
  • the mentioned materials, alloys and / or compositions can form at least the main component of the coating. This applies to a single layer and to a multilayer coating.
  • the coating is a multilayer, at least some of the individual layers can comprise the mentioned materials, alloys and / or compositions, wherein in particular, subsequent or directly adjacent layers can have different compositions. This advantageously applies to all embodiments of the invention.
  • other alloying elements can be added to the coating to achieve the desired properties of the material, in particular a desired hardness, wear resistance, etc.
  • the coating is a thin layer having a thickness, which can be between 100 nm and 1000 nm.
  • the coating of the precursor plate is performed by sputter deposition of the coating material.
  • magneton sputtering is applied.
  • a working atmosphere during sputter deposition having a pressure which is substantially equal to 0,1 Pa and 1 Pa (0,7*10 -2 mbar to 7*10 -1 mbar) turned out to be advantageous. In particular, this applies to a silver coating.
  • the precursor plate is made of a polymer material.
  • the polymer material is a polyimide material, for example Kapton.
  • Kapton is a polymer, it keeps stable in a wide range of temperatures and can therefore resist the thermal load during coating. Furthermore, Kapton exhibits low degassing properties under vacuum.
  • the polymer material comprises laser light absorbing particles or additives, which are dispensed in the polymer material.
  • the particles or additives can be manufactured from carbon black material.
  • the particles or additives enhance the absorption of laser light in the polymer material and therefore support the laser engraving process.
  • This renderers the precursor plate particularly suitable for laser engraving of its surface. This entails that the engraved surface of the precursor plate can be advantageously a laser engraved surface.
  • the engraved surface of the precursor plate is pre-treated prior to deposition of the coating.
  • This pre-treatment can include a step of surface cleaning and an activation step.
  • the precursor plate can be first manually cleaned using isooctane or petrol. Residual dust can be removed using a water jet. Subsequently, oil skimming with calcium carbonate and vinegar can be performed. The surface of the precursor plate is then cleaned using deionized and ultra-deionized water. Finally, the precursor plate is dried in a forced air circulation oven. Subsequent to these steps of cleaning and surface activation, the precursor plate is transferred into the deposition chamber of the PVD unit. The deposition chamber is evacuated using a suitable vacuum system until the residual pressure in the deposition chamber is lower than 10 -2 Pa (10 -4 mbar).
  • a method of manufacturing a precursor plate for the manufacture of an intaglio printing plate is provided.
  • a coating is deposited on an engraved surface of the precursor plate by physical vapour deposition (PVD) of a coating material.
  • PVD physical vapour deposition
  • the coating material can comprise Silver (Ag), Gold (Au), Aluminium (Al), Palladium (Pd), Titanium (Ti), Chrome (Cr) and / or any other conductive material.
  • the coating comprises any other electrically conductive metal.
  • the coating material comprises a composition or an alloy of at least two of the named materials.
  • the coating material comprises nitrides and / or carbonitrides of any of the named materials and / or alloys.
  • the method comprises the step of depositing anyone of the mentioned materials.
  • a coating is deposited, which comprises anyone of the mentioned materials as the main component.
  • a thin film having a thickness, which is between 100 nm and 1000 nm, can be deposited. This can be a single layer or a multilayer.
  • the coating is advantageously deposited by sputter deposition, in particular by magneton sputter deposition. This can be performed in a working atmosphere having a pressure, which is substantially between 0,7 Pa and 1 Pa (0,7*10 -2 mbar to 7*10 -1 mbar).
  • Other deposition technologies can be suitable, for example cathiodic arc deposition.
  • the method can include the step of depositing the coating on a precursor plate, which is manufactured from a polymer material.
  • the polymer material can be a polyimide material, in particular Kapton.
  • the polymer material can comprise laser light absorbing particles or additives, which can be dispensed in the polymer material. Carbon black can be applied for manufacturing the light absorbing particles or additives.
  • the method of manufacturing the precursor plate can further include a pre-treatment of at least the engraved surface of the precursor plate.
  • This pre-treatment is performed prior to deposition of the coating material, in particular prior to transfer of the precursor plate into the deposition chamber.
  • This step of pre-treating can comprise the steps of cleaning and activating at least the engraved surface of the precursor plate.
  • the precursor plate can be used for the manufacture of a (nickel) alto plate, which is further designated for manufacturing an intaglio printing plate for the production of banknotes or other printed securities.
  • the enhanced quality of the coating of the precursor plate advantageously results in a (nickel) alto plate having a superb surface quality. This renders the alto plate particularly suitable for manufacturing of high precision intaglio printing plates being necessary for the production of banknotes and other printed securities.
  • FIG. 1 is a simplified cross-section of a precursor plate 2.
  • the precursor plate 2 comprises various engravings 4, which reside in an engraved surface 6 thereof.
  • the engravings 4 are manufactured by laser engraving of the precursor plate 2.
  • the surface 6 can alternatively be engraved chemically, by means of a rotating chisel or by other suitable engraving tools.
  • the engravings 4 in the precursor plate 2 according to the embodiment in FIG. 1 are manufactured by laser engraving.
  • laser light absorbing particles or additives are dispensed in the precursor plate 2.
  • Optimal engraving quality can be achieved when the absorber is manufactured using a carbon black material.
  • a particularly convenient polymer material to be used within the context of the embodiments is a polyimide material.
  • a Kapton material can be applied.
  • At least the engraved surface 6 of the precursor plate 2 can undergo a pre-treatment.
  • This pre-treatment can include surface cleaning and surface activation.
  • the surface cleaning and activation which is preferably performed outside the PVD unit, comprises the following stages:
  • the precursor plate 2 is mounted on a suitable sample holder and directly transferred into the deposition chamber of the PVD unit.
  • the PVD unit is a sputter unit, in particular a magneton sputter unit.
  • suitable PVD units for example a cathodic arc unit, can be used.
  • the deposition or coating process starts by evacuating the deposition chamber until a residual pressure of less than 10 -2 Pa (10 -4 mbar) is reached.
  • the deposition process is performed using for example the process parameters, which are summarized in table 1 below. These process parameters are optimized for deposition of a silver coating on a Kapton precursor plate 2 using a magneton sputter unit.
  • any other conductive material for example: Gold (Au), Aluminium (Al), Palladium (Pd), Titanium (Ti), Chrome (Cr) and / or any other conductive material, in particular any other electrically conductive metal can be suitable.
  • a composition or an alloy of at least two of the mentioned materials can be applied.
  • the coating material can also comprise nitrides and / or carbonitrides of any of the named materials and / or alloys.
  • the mentioned materials, alloys or compositions can form at least the main component of the coating. This advantageously applies to all the mentioned materials.
  • the composition and the ratio of the components can be adjusted to the particular requirements of the coating, in particular with respect to its hardness, in particular its surface hardness.
  • Deposition of the coating is furthermore not limited to magneton sputtering.
  • Other PVD-techniques can be applied.
  • the coating can be deposited using cathodic arc deposition.
  • the bias voltage (BIAS) between the sputter target, i. e. a silver target, and the substrate, which is the precursor plate 2 is set to 0 V. It can be, however set to any value, which is between 0 V and 100 V.
  • the magneton sputter current (MS Power) is adjusted to at least approximately 3000 W. Other suitable values are between 1000 W and 5000 W.
  • the residual pressure of the working atmosphere is at least approximately 0,7 Pa (0,7*10 -2 mbar) using argon (Ar) as a sputter gas. Further suitable pressures of the working atmosphere are between 0,1 Pa and 1 Pa.
  • the deposition run takes at least approximately between 5 minutes and 15 minutes, until a desired thickness of the coating is achieved.
  • the engraved surface 6 of the Kapton precursor plate 2 is now homogenously covered by a silver coating 8.
  • FIG. 2 there is a simplified cross-section of the coated precursor plate 2 having a coating 8, which resides on the engraved surface 6.
  • the second line below refers to a sample of a precursor plate 2, which was coated with 800 nm of silver in a traditional electroforming process.
  • the last and second last line of table 2 comprises surface roughness values of precursor plates 2 according to two embodiments of the invention.
  • the first sample in the second last line is coated with 200 nm of silver in a magneton sputter process.
  • the second sample in the last line comprises a silver coating 8 having a thickness of 500 nm.
  • Ra refers to an arithmetic average roughness.
  • Rz the values of the average depth of roughness are given.
  • Rq values of the cubic average roughness are summarized.
  • the surface roughness of the silver coated precursor plate 2 is very low, a high quality nickel alto plate can be manufactured.
  • the PVD silvered precursor plate 2 can be subsequently transferred into a nickel bath, wherein the nickel alto plate is manufactured using the conventional electroforming parameters.
  • FIG. 3 illustrates and summarizes the method of manufacturing a precursor plate 2 by application of physical vapour deposition (PVD).
  • PVD physical vapour deposition
  • the engraved precursor plate 2 is cleaned and activated (step S1). It is subsequently transferred to the vacuum chamber of the PVD unit (step S2).
  • the coating 8 is deposited on the engraved surface 6 by the PV-deposition technology, in particular by magneton sputtering (step S3). Further in particular, the process parameters, which are summarized in table 1, can be applied.
  • the coated precursor plate 2 is transferred from the vacuum chamber of the PVD unit (step S4).
  • the coated precursor plate 2 can be subsequently used in an electroforming process.
  • the process, which is illustrated in FIG. 3 advantageously applies to all materials, alloys, compounds and compositions, which are mentioned within the context of this specification.

Landscapes

  • Physical Vapour Deposition (AREA)
EP20130179785 2013-08-08 2013-08-08 Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci Withdrawn EP2835269A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP20130179785 EP2835269A1 (fr) 2013-08-08 2013-08-08 Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20130179785 EP2835269A1 (fr) 2013-08-08 2013-08-08 Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci

Publications (1)

Publication Number Publication Date
EP2835269A1 true EP2835269A1 (fr) 2015-02-11

Family

ID=48979571

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20130179785 Withdrawn EP2835269A1 (fr) 2013-08-08 2013-08-08 Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci

Country Status (1)

Country Link
EP (1) EP2835269A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITUB20155663A1 (it) * 2015-11-17 2017-05-17 Protec Surface Tech Srl Processo di realizzazione di una lastra calcografica
JP2017136719A (ja) * 2016-02-02 2017-08-10 凸版印刷株式会社 印刷版およびその製造方法ならびにこれを用いた印刷物製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19516883A1 (de) * 1994-05-13 1995-11-16 Merck Patent Gmbh Tiefdruckform
EP1369230A1 (fr) * 2002-06-05 2003-12-10 Kba-Giori S.A. Procédé de fabrication d'une plaque gravée
EP2514594A1 (fr) * 2011-04-18 2012-10-24 KBA-NotaSys SA Plaque d'impression en creux, son procédé de fabrication et utilisation correspondante

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19516883A1 (de) * 1994-05-13 1995-11-16 Merck Patent Gmbh Tiefdruckform
EP1369230A1 (fr) * 2002-06-05 2003-12-10 Kba-Giori S.A. Procédé de fabrication d'une plaque gravée
EP2514594A1 (fr) * 2011-04-18 2012-10-24 KBA-NotaSys SA Plaque d'impression en creux, son procédé de fabrication et utilisation correspondante

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITUB20155663A1 (it) * 2015-11-17 2017-05-17 Protec Surface Tech Srl Processo di realizzazione di una lastra calcografica
JP2017136719A (ja) * 2016-02-02 2017-08-10 凸版印刷株式会社 印刷版およびその製造方法ならびにこれを用いた印刷物製造方法

Similar Documents

Publication Publication Date Title
JP5237125B2 (ja) 金属基材上のコーティングおよびコーティングした製品
EP2262919B1 (fr) Traitement de composants métalliques
EP2103707B1 (fr) Composant de palier aérospatial
EP3256620B1 (fr) Procédé de réalisation de motifs métalliques sur un substrat a des fins décoratives et/ou fonctionnelles, fabrication d'objets intégrant cette réalisation et ensemble de consommables utilises
WO2022241952A1 (fr) Revêtement de nitrure de métal de transition ayant une structure multicouche nanométrique, son procédé de préparation et son utilisation
EP2835269A1 (fr) Plaque de précurseur pour la fabrication d'une plaque d'impression en taille-douce, procédé de fabrication de ladite plaque et utilisation de celle-ci
GB2328692A (en) Metal deposition using plasma treatment
WO2008007180A1 (fr) Verre comprenant un revêtement résistant aux rayures
JP2014515708A (ja) 凹版印刷用の印刷版、その製造方法および使用方法
CN111302833A (zh) 改善铝对氧化铝陶瓷润湿性的方法
CN102534514A (zh) 一种多弧离子镀镀膜的方法
EP1616974B1 (fr) Procede de preparation d'un film d'alumine de type alpha
JP5082113B2 (ja) 被研磨物保持用キャリアおよびその製造方法
CN110438461A (zh) 一种TiBx/Cr（x=1.9~3.5）抗氧化多层涂层的制备方法
JPH05221171A (ja) グラビア印刷シリンダー製造用金属プレート、該金属プレートの製造方法、及び図柄を造形されたロール
JP2005082844A (ja) 基材のコーティング方法およびコーティング構造
KR102237027B1 (ko) 반도체 제조공정의 스퍼터링 장치용 코팅방법 및 이에 의한 코팅층을 갖는 반도체 제조공정의 스퍼터링 장치
CN113913747A (zh) 涂层及其制备方法和器具
KR101245324B1 (ko) 알루미늄 코팅 강판 및 그 제조 방법
CN112708859A (zh) 一种具有减摩抗磨的CrAlVN涂层的刀具及其制备方法
CN101649481A (zh) 微弧氧化膜封孔方法
CN110938803A (zh) 一种制备Ti-Mo-N润滑涂层的镀膜处理方法
CN115161590B (zh) 一种真空镀膜磁控溅射成膜方法
KR101224191B1 (ko) 불용성 전극의 제조 방법 및 불용성 전극 제조용 중간층 코팅 장치
JP4084678B2 (ja) 表面被覆切削工具およびその製造方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20130808

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20150812