EP2785896B1 - Method for producing electrically conductive structures on non-conductive substrates and structures made in this manner - Google Patents

Description

The present invention relates to the technical field of producing electrically conductive structures.

In particular, the invention relates to a method for producing electrically conductive structures on electrically non-conductive substrates, in particular a method for the electrochemical deposition of metals on substrates. The method according to the invention is suitable for producing conductive structures, in particular conductive metallic structures and / or galvanoplastics.

Furthermore, the present invention relates to the conductive structures obtainable by the process according to the invention, in particular conductive metallic structures, as well as their use.

In the production of conductive structures, such as, for example, conductive coatings, and miniaturized objects or workpieces, in particular electro-technical and precision mechanical components, the skilled person is primarily provided with material-removing and material-applying processes. The material-removing methods include, for example, etching, milling, grinding, etc., while examples of material-applying methods include printing, casting, sputtering, etc.

In the material-removing process initially larger amounts of material are submitted, as needed for the production of the products. By removing the excess material then the desired shape or the desired product is obtained. The eroded part of the material must then be recovered in complex processes or reshaped. This creates unnecessary process and material costs, which is disadvantageous in particular due to constantly rising raw material and energy prices and environmental aspects. In addition, in the case of complex geometries, the process costs increase in such a way that industrial production can not be carried out economically in a meaningful manner.

In the material-applying method, however, material is applied to a substrate or introduced into a mold, wherein, if possible, only the amount of material is used, which is also necessary for the production of the desired article or the desired structure. Material applying processes thus allow efficient use of resources and starting materials to produce coatings and microstructures. For example, fine printed conductors can be produced by printing of silver pastes, but due to the size of the silver particles and the high viscosity of the pastes most printing processes, especially the sophisticated and inexpensive ink jet printing process can not be performed. If, on the other hand, inks containing silver nanoparticles are used, the printed conductor must first be sintered before sufficient conductivity is achieved. However, the sintering process severely restricts the choices in the selection of the substrate material on which the printed conductor is printed, since the substrates based on plastics, which are preferably used in particular in electrical engineering, are destroyed by the action of higher temperatures. The practiced production of printed conductors by chemical deposition via the gas phase, in particular by means of CVD method ( C hemical V apour D eposition), is usually very complicated and costly.

The production of microstructured objects and components by conventional material applying methods, such as casting techniques, also designed difficult. In particular, casting processes are only of limited use for the production of uniform coatings and microstructured articles, since the surface tension of the casting compound often precludes even wetting of the casting mold, in particular in the case of very fine structures.

In particular, the electrolytic or galvanic deposition of metals onto substrates for the production of electrically conductive coatings is also used as the material-applying process. The galvanization is used in particular as a reproducing method or for the production of electroforming. In the manufacture of electroplating machines, first a non-conductive form of the object to be imaged, which is in the Generally later destroyed, and then coated with an electrically conductive layer. To produce the electrically conductive layer, techniques such as graphitization are used, for example, in which the finest graphitic dust is scattered onto the mold and then distributed with brushes or brushes, so that a coherent conductive layer is formed. In addition, in analogy to graphitization, the application of metal powders is used.

Other methods for producing electroconductive coatings for electroplating are, for example, the application of silver solutions with subsequent reduction of the dissolved silver to elemental silver and the coating with elemental metals. However, all of the abovementioned methods have the disadvantage that the adhesion of the conductive medium to the non-conductive form is often insufficient, relatively high layer thicknesses are required in order to achieve adequate conductivities, or the processes can only be carried out with considerable equipment complexity and cost-intensive ,

• So offenbaren die EP 0 698 132 B1 bzw. die US 5,389,270 A ein Verfahren bzw. eine Zusammensetzung zur elektrochemischen Beschichtung des Substrates einer Leiterplatte mit einer leitenden Metallschicht, wobei eine Dispersion von elektrisch leitendem Graphit auf die leitenden und nichtleitenden Oberflächenbereiche der Leiterplatte aufgebracht werden, die Leiterplatte geätzt wird und anschließend das Substrat elektrochemisch beschichtet wird.

There has therefore been no lack of attempts in the prior art to improve the efficiency of electroplating processes:

• This is what the EP 0 698 132 B1 or the US 5,389,270 A a method and composition for electrochemically coating the substrate of a circuit board with a conductive metal layer, wherein a dispersion of electrically conductive graphite are applied to the conductive and non-conductive surface areas of the circuit board, the circuit board is etched and then the substrate is electrochemically coated.

Furthermore, the concerns EP 0 200 398 B1 a method of electroplating a conductive metal layer onto the surface of a nonconductive material, wherein a carbon black dispersion is applied to the nonconductive material, and then the surface of the substrate is electroplated or electroplated.

The DE 198 06 360 A1 relates to a method for electrolytically depositing a smooth surface metal layer on a substrate using a graphite dispersion, wherein a substrate is contacted with a dispersion containing graphite particles, and then a metal layer is electrolytically deposited on the graphite layer.

The EP 0 799 911 A1 relates to a method and composition for electroplating a non-conductive substrate comprising forming a layer of conductive polymer on the surface of the non-conductive substrate and electrochemically depositing a metal thereon. The conductive layer is formed by the application of a conductive polymer to the surface, wherein the polymer is in the form of an aqueous suspension of the polymer comprising a polymeric stabilizer having repeating alkylene oxide units and a hydrophilic-lipophilic balance (HLB) of at least 12, is applied to the surface.

Furthermore, the concerns EP 1 897 975 A1 a method of metallizing the surface of a dielectric substrate by electroplating, the method comprising immersing the substrate in a composition comprising a precursor to form the electrically conductive polymer, a copper ion source, and an acid to form an electrically conductive polymer on the surface of the dielectric substrate and the provision of an external voltage source for the electrochemical deposition of copper on the electrically conductive polymer.

Finally, the concerns EP 0 616 558 B1 a method for coating surfaces with finely divided solid particles, wherein the substrate to be coated is pretreated in a bath with polyelectrolytes and then the substrate thus treated is immersed in a second bath with a solid dispersion. In this case, the solid particles remain adhering to the substrate surface by coagulation, which should in particular make conductive layers accessible.

However, all these methods have in common that they do not significantly improve the adhesion of the electrically conductive layer to the substrate or its abrasion resistance, and generally only a full-surface wetting allow the substrate. A regioselective or locally limited coating of non-conductive substrates is therefore difficult or impossible to access using these methods.

In particular, the abovementioned starting materials and processes generally can not be combined with cost-effective printing processes and are limited in their applicability to special process parameters and materials and consequently can not be used flexibly.

The present invention is therefore based on the object to provide a method for producing conductive structures on non-conductive substrates, wherein the previously described, occurring in connection with the prior art problems and disadvantages should be at least largely avoided or at least mitigated.

In particular, it is an object of the present invention to apply solubilizates or dispersions of non-metallic conductive materials to non-conductive substrates in such a way that highly conductive layers of extremely small layer thickness are obtained. In particular, the order should be regioselective or site-specific and local by simple methods.

Furthermore, it is an object of the present invention to provide by electrochemical deposition of metals on non-metallic substrates in a simple and efficient manner two- and three-dimensional structures and objects, in particular microstructured or miniaturized components and workpieces.

The above-described task is inventively achieved by a method according to claim 1; Further, advantageous developments and refinements of the method according to the invention are the subject of the relevant subclaims.

Another object of the present invention are electrically conductive metallic structures according to claim 16 or 17.

Yet another subject of the present invention is the use of the electrically conductive structures according to claim 18 or 19.

Finally, another object of the present invention are products or articles according to claim 20, which contain the electrically conductive structures according to the invention.

It goes without saying that embodiments, embodiments, advantages or the like, which are subsequently carried out for the purpose of avoiding unnecessary repetition only for one aspect of the invention, naturally also apply correspondingly with regard to the other aspects of the invention.

Furthermore, it goes without saying that in the case of subsequent statements of values, numbers and ranges, the values, numbers and ranges given in this context are not to be understood as limiting; it goes without saying for the person skilled in the art that it is possible to deviate from the specified ranges or details on a case-by-case basis or application-related basis without departing from the scope of the present invention.

In addition, it is true that all the values or parameter information or the like mentioned below can in principle be determined or determined using standardized or explicitly stated determination methods or determination methods which are familiar per se to the person skilled in the art.

Furthermore, in the percentage indication of quantities of ingredients used, the quantitative proportions are to be combined in such a way that a total of 100% or 100% by weight results.

Having said that, the present invention will be described in more detail below.

1. (a) wobei in einem ersten Verfahrensschritt mindestens ein Solubilisat und/oder eine Dispersion auf Basis elektrisch leitfähiger Materialien, ausgewählt aus der Gruppe von elektrisch leitfähigen Kohlenstoffallotropen, elektrisch leitfähigen Polymeren und elektrisch leitfähigen anorganischen Oxiden, auf ein elektrisch nichtleitendes Substrat aufgebracht wird, wobei der Auftrag des Solubilisats und/oder der Dispersion lokal begrenzt und/oder ortsspezifisch mittels Druckverfahren, durchgeführt wird, wobei das Solubilisat und/oder die Dispersion mit einer Schichtdicke von 0,5 bis 30 µm auf das Substrat aufgetragen wird,
2. (b) wobei gegebenenfalls ein nachfolgender Verfahrensschritt der Trocknung oder Härtung des Solubilisats und/oder der Dispersion durchgeführt wird und
3. (c) wobei in einem nachfolgenden Verfahrensschritt mindestens ein Metall elektrochemisch auf dem gegebenenfalls getrockneten oder gehärteten Solubilisat und/oder auf der gegebenenfalls getrockneten oder gehärteten Dispersion abgeschieden wird.

The subject of the present invention, according to a first aspect of the present invention, is thus a process for the electrochemical deposition of metals on substrates for the production of metallic structures and / or galvanoplastics,

1. (A) wherein in a first process step at least one solubilizate and / or a dispersion based on electrically conductive materials selected from the group of electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides is applied to an electrically non-conductive substrate, wherein the Application of the solubilizate and / or the dispersion locally limited and / or site-specific by means of printing process is carried out, wherein the solubilizate and / or the dispersion is applied to the substrate with a layer thickness of 0.5 to 30 microns,
2. (b) optionally carrying out a subsequent process step of drying or curing the solubilisate and / or the dispersion, and
3. (C) wherein in a subsequent process step at least one metal is deposited electrochemically on the optionally dried or cured solubilizate and / or on the optionally dried or cured dispersion.

As described above, in a process step (a) at least one solubilizate or a dispersion based on electrically conductive materials which are selected from the group of electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides is applied to an electrically non-conductive substrate.

In this context, it has proven to be advantageous if the application of the solubilizate and / or the dispersion locally limited or site-specific or regioselectively by printing (ie by means of printing) is performed.

Optionally, following process step (a), a subsequent process step (b) of drying and / or curing of the solubilizate applied in this manner or the dispersion applied in this way is carried out.

Under electrical conductivity is in the context of the present invention, in particular the ability to conduct electrical current to understand. The electrical conductivity of the conductive structures obtainable by the process according to the invention are generally within the values for typical conductors and semiconductors, ie generally in the range from 10 ^-7 to 10 ⁷ S / m.

For the purposes of the present invention, the term solubilizate is to be understood in the broadest sense as meaning solutions of substances or compounds, in particular of macromolecules, which are generally not soluble in the solvent concerned without the addition of auxiliaries or additives. To dissolve or solubilize these substances, it is particularly advantageous to use a solubilizer which influences the dissolving properties of the solvent and / or, for example, increases the solubility of the relevant chemical substance or of the relevant chemical compound, as in the case of micelle formation by surfactants.

For the purposes of the present invention, a dispersion is to be understood as meaning a mixture of at least two clearly delimited phases which do not dissolve or at least substantially do not dissolve with one another. In particular, in dispersions at least one phase, namely the dispersed or discontinuous phase, is dispersed as finely as possible in another phase, ie the continuous phase or the dispersing agent. Dispersions can be mixtures of solid phases (solid / solid), solid and liquid phases (solid / liquid and liquid / solid) and mixtures of gaseous phases with solid or liquid phases (liquid / gaseous, gaseous / liquid or solid / gaseous), be educated. In the context of the present invention, solid / liquid systems are generally used, wherein a solid phase is dispersed in a liquid dispersion medium; however, the use of solid / solid dispersions, such as powder coatings, is also possible.

The method according to the invention is distinguished, in particular, by the fact that the application of the solubilizate or the dispersion to the electrically nonconductive substrate is locally limited and / or site-specific or regioselective. A locally limited and / or site-specific or regioselective order is to be understood in particular as meaning that the solubilizate or the dispersion is applied to the substrate only at very specific, preferably desired or defined points, so that only a partial or incomplete one or partial coating of the substrate or the carrier takes place.

In this way it is possible, for example, to apply printed conductors made of non-metallic conductive materials directly to non-conductive substrates, in particular by means of printing processes, as will be explained in detail below. The conductive structures obtainable by the process according to the invention are distinguished from the prior art by a small layer thickness with simultaneously good electrical conductivity and outstanding mechanical strength and abrasion resistance.

Likewise, it is possible with the inventive method to provide non-conductive substrates in a manner with conductive non-metallic structures, so that in a subsequent process steps metals electrolytically, in particular by galvanization, in particular according to a predetermined or defined pattern, can be deposited on the substrate. Thus, with the method according to the invention, it is also possible in a simple and efficient manner to produce metallic conductor tracks on electrically nonconducting substrates without procedurally complicated steps, such as, for example, etching or sintering processes.

In addition, it is equally possible with the method according to the invention to obtain three-dimensional objects, such as precision mechanical or electrotechnical components, by electroforming or in the form of electroforming. In the electroforming is a so-called primary molding process, which can be used primarily for the production of metallic coatings or self-supporting metallic objects or workpieces.

Due to the small layer thickness and the good conductivity of the conductive structures according to the invention microstructured or miniaturized three-dimensional objects and workpieces are accessible in the process of the invention with a wealth of detail or resolution, which are not yet known in the art.

The basis for the electrically conductive structures which are accessible in accordance with the method according to the invention are solubilizates or dispersions based on electrically conductive materials, in particular non-metallic electrically conductive materials. The term "solubilizate and / or dispersion based on electrically conductive materials" is to be understood in the context of the present invention such that the solubilizate or the dispersion contains at least one electrically conductive material.

In the context of the present invention, as described above, in a subsequent process step (c) following process step (a) or optional process step (b), at least one metal is electrochemically deposited on the electrically conductive structure, in particular on the optionally dried or cured one Solubilisat and / or on the optionally dried or cured dispersion deposited.

In the context of the present invention, metal-conductive structures and miniaturized or microstructured three-dimensional objects and workpieces made of metal are accessible in the context of electroforming or as electroforming by electrolytic deposition of metals or electroplating in the context of process step (c).

In the electrolytic deposition of the metals or in electroplating, the electrically conductive structures applied to the electrically nonconducting substrate are used as cathodes, at which the reduction of metal ions and thus a deposition of the elemental metals takes place.

In the context of the present invention, it may moreover be provided for the structure or the three-dimensional metallic object or workpiece obtained by electrochemical deposition of metals to be detached again from the substrate. The method according to the invention is thus also suitable for the efficient and time-saving production of, for example, prototypes and can therefore also be used in the context of rapid prototyping methods.

The inventive method can thus be used for the production of conductive structures, wherein in carrying out the method according to the invention with the method steps (a), (b) and (c) or with the method steps (a) and (c) result in metallically conductive structures.

As described above, solubilizates or dispersions based on electrically conductive materials are used as the starting material in the process according to the invention, wherein the electrically conductive materials can be selected from the group of electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides.

If electrically conductive carbon allotropes are used as electrically conductive materials in the context of the process according to the invention, graphite, fullerenes and / or carbon nanotubes (CNTs), in particular carbon nanotubes (CNTs), are generally used in the context of the present invention as electrically conductive carbon allotropes.

By using electrically conductive carbon allotropes in the solubilisates or dispersions used according to the invention, thinner layer thicknesses with simultaneously good conductivity and increased abrasion resistance of the optionally dried or cured solubilisates and dispersion can be obtained in comparison with the prior art.

Particularly good results are obtained for the use of carbon nanotubes (CNTs), both single-walled and multi-walled carbon nanotubes (S ingle- W all C arbon N anotubes (SWCNTs) or M ulti W all carbon nanotubes (MWCNTs)) can be used. Carbon nanotubes have in comparison to the other carbon allotropes again a significantly increased electrical conductivity and mechanical strength, which is why the use of carbon nanotubes particularly thin-layer and at the same time conductive, abrasion-resistant and mechanically strong structures are obtained.

Dispersions of carbon nanotubes, which are preferably used in the context of the present invention, can, for example, according to the in the DE 10 2006 055 106 A1 , of the WO 2008/058589 A2 , of the US 2010/0059720 A1 and the CA 2,668,489 A1 obtained, the respective disclosure of which is incorporated by reference in its entirety. The above-mentioned documents relate to a process for dispersing carbon nanotubes (CNTs) in a continuous phase, in particular in at least one dispersant, wherein the carbon nanotubes (CNTs), in particular without prior pre-treatment, in a continuous phase, in particular in at least one dispersant, in the presence at least a dispersant (dispersant) are dispersed while introducing an energy input sufficient for the dispersion. The amount of energy introduced during the dispersing process, calculated as the registered energy per amount of carbon nanotubes (CNTs) to be dispersed, can be in particular 15,000 to 100,000 kJ / kg; Dispersants which can be used are, in particular, polymeric dispersants, preferably based on functionalized polymers, in particular with number-average molecular masses of at least 500 g / mol. With this dispersion method, stable dispersions of carbon nanotubes (CNTs) with a weight fraction of up to 30% by weight of carbon nanotubes (CNTs) can be obtained.

Furthermore, it can be provided that electrically conductive polymers, in particular polyacetylenes, polyanilines, polyparaphenylenes, polypyrroles and / or polythiophenes, can be used as electrically conductive materials. The electrically conductive polymers can be used alternatively or in combination with the electrically conductive carbon allotropes and / or with the electrically conductive inorganic oxides described below.

In the context of the present invention, good results are likewise obtained if electrically conductive inorganic oxides, in particular indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), antimony tin oxide (ATO) and / or fluorotinc oxide (FTO) are used as electrically conductive materials become.

The electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides described above can each be used individually or in combination with one another in the solubilizates or dispersions used according to the invention. The respective use of the materials, in particular in combinations, the expert can thereby on the basis of external conditions, such as deposition condition of the metal, substrate materials, intended use of the product, etc., select, with the use of carbon nanotubes, especially as the sole electrically conductive material is preferred ,

In general, the solubilizate and / or the dispersion is water-based and / or solvent-based in the context of the present invention. It may be provided that the solvent of the solubilizate and / or the continuous phase of the dispersion is an aqueous-based, organically based or organic-aqueous-based solvent and / or Dipersionsmedium.

Solubilisates or dispersions of solids in liquid dispersion media are therefore preferably used in the context of the present invention. Commercially available organic solvents, if appropriate in mixtures, and / or water are used in particular as dispersion media or solvents. Likewise, however, it is also possible for liquid polymers to be used as the dispersion medium under application conditions.

The solvent or the dispersing agent can be removed after the order has been applied (for example by drying according to process step (b)), as a result of which the conductive materials and any additives present in the solubilizate or in the dispersion remain on the substrate. If the solubilizate or the dispersion has sufficiently high viscosities or is at least partially curable, removal of the solvent or dispersion medium may optionally be omitted; In this case, the solvent or the dispersion medium influences the mechanical and electrical properties of the conductive structures.

Alternatively, however, it is also possible that the dispersion used in the context of the present invention is a mixture of solids, which is not liquid under the process conditions of application to the substrate. Such conditions are present, for example, when the dispersion according to the invention is used in the form of a powder coating.

According to a preferred embodiment of the present invention, it is provided that the solubilizate and / or the dispersion is curable, in particular radiation-curable and / or thermally curable, preferably radiation-curable. The hardenability of the dispersion or of the solubilizate used according to the invention means that the dispersion or the solubilizate is cured immediately after application under controlled and determinable or defined conditions and the electrically conductive structure is thus spatially fixed on the substrate and prevented from "bleeding "can be secured. In the context of the present invention, the term radiation-curable is to be understood in particular as meaning that the solubilizate or the dispersion cures by irradiation with actinic radiation, in particular UV radiation, ie. H. from the liquid to the solid state, in particular, a uniform closed layer is obtained. An exception here are solid dispersions, such as powder coatings, which crosslink by irradiation and form a closed layer, in particular a film or coating.

In order to obtain a hardenability of the solubilizate or dispersion used according to the invention, the solubilizate or the dispersion may generally have at least one curable, in particular radiation-curable and / or thermally curable, preferably radiation-curable, component in the context of the present invention. Particularly good results are obtained in particular when the solubilizate or the dispersion has a reactive diluent as the curable component. Under a reactive diluent is in the context of the present invention, in particular a substance or a compound to understand, which is added to the solubilizate or the dispersion in addition to the actual solvent or the dispersion medium and having chemical functionalities which under the conditions of curing with other reactive diluent molecules and / or components of the solubilizate or the dispersion chemically react. The chemical reaction in particular builds up a three-dimensional network which leads to a hardening of the dispersion or of the solvent. Suitable reactive diluents are, for example, acrylates, polyurethane prepolymers, phenol / formaldehyde resins, unsaturated polyesters, etc.

Furthermore, it can be provided in the context of the present invention according to a preferred embodiment that the solvent of the solubilizate or the continuous phase of the dispersion curable, in particular radiation-curable and / or thermally curable, preferably radiation-curable, is formed. In this case, the curable component is the solvent of the solubilizate or the continuous phase of the dispersion, which are synonymously also referred to as binders. As radiation-curable binders, for example, acrylates and / or methacrylates, polyurethane prepolymers, phenol / formaldehyde resins, melamine / formaldehyde resins or unsaturated polyesters can be used, whereas as thermally curable binders or components, for example, preferably film-forming polyurethanes or polyvinylidene chloride (PVDC) can be used.

The solubilizate or the dispersion may contain the electrically conductive materials in amounts of from 0.001 to 90% by weight, in particular from 0.005 to 80% by weight, preferably from 0.01 to 50% by weight, preferably from 0.01 to 30% by weight. -%, particularly preferably 0.01 to 20 wt .-%, based on the solubilizate and / or the dispersion. The amount of electrically conductive materials each contained in the dispersions is dependent on the particular application, the application conditions and the materials used.

Furthermore, in the context of the present invention, the solubilizate and / or the dispersion may comprise at least one additive. It has proven to be advantageous if the solubilizate and / or the dispersion, the at least one additive in amounts of 0.01 to 60 wt .-%, in particular 0.05 to 50 wt .-%, preferably 0.01 to 40 Wt .-%, preferably 0.05 to 30 wt .-%, most preferably 0.1 to 20 wt .-%, based on the solubilizate and / or the dispersion having.

The additive or additives may be selected in particular from the group of dispersing agents (dispersants), surfactants or surface-active substances, defoamers, rheology modifiers, binders, film formers, biocides, marker substances, pigments, fillers, adhesion promoters, flow control additives, co-solvents, skin formation inhibiting agents , UV absorbers, anticlogging agents and / or stabilizers.

Particularly good results are obtained in the context of the present invention if the solubilizate or the dispersion has at least one wetting and / or dispersing agent. The use of wetting or dispersing agents considerably increases the compatibility of the substance to be solubilized or the dispersing agent and the solvent or dispersion medium, and thus makes it possible to use dispersions having a significantly higher content of dissolved or dispersed substances.

Moreover, good results are obtained in the context of the present invention if the solubilizate or the dispersion has at least one surface-active additive. It has proven useful if the surfactant additive from the group of lubricants and / or slip additives; Leveling agents; Surface additives, in particular crosslinkable surface additives; Adhesion promoters and / or substrate wetting additives; Hydrophobizing agents and antiblocking agents is selected. On the one hand, the surface-active additives increase the compatibility of the dispersion or of the solubilizate with the substrate and thus lead to improved adhesion of the dispersion or of the solubilizate to the substrate and to improved abrasion resistance; on the other hand, the surface-active additives further increase the compatibility of solvent / dispersion medium and dissolved or dispersed substance.

Furthermore, it can be provided that the solubilizate and / or the dispersion has at least one rheology-controlling additive. In particular, the rheology-controlling additives influence the consistency and viscosity of the solubilizate or of the dispersion and thus likewise ensure that the solubilizate or the dispersion can be optimally adapted to the particular application method and that the solubilisate or dispersion applied to the substrate is leveled is prevented. Particularly good results are obtained when the rheology controlling additive from the group of rheology additives, in particular thickeners and / or thixotropic agents; defoamers; Dehydrators; Structuring agents and plasticizers and / or plasticizers is selected.

Finally, it may also be provided that the solubilizate and / or the dispersion contains at least one additive which may be selected from the group of corrosion inhibitors; Light stabilizers, in particular UV absorbers, radical scavengers, quenchers and / or hydroperoxide decomposers; Driers; Skinning prevention means; catalysts; accelerators; biocides; Preservatives; Scratch resistance additives; antistatic agents; Driers; To grow; Fillers and pigments. These further additives or adjuvants optionally round off the properties of the solubilizate or of the dispersion with regard to the application and the further use.

It may be provided in particular that the solubilizate or the dispersion fillers, such as barium sulfate or talc, and / or conductive pigments, which also increase the conductivity of the solubilizate or the dispersion.

In general, the substrate is an inorganic and / or organic substrate. In this case, particularly good results are obtained when the substrate is selected from the group of glass, ceramics, silicones, clays, waxes, plastics and composite materials. The solubilizate or the dispersion is applied to the substrates used according to the invention on the basis of electrically conductive materials, and subsequently (if appropriate after a Intermediate drying or curing step) optional metals can be electrochemically deposited on the conductive structures. After deposition of the metals, it may be provided that the substrate is separated from the objects obtained by electroforming, in particular the galvanoplastics. The substrates can be either sustainably separated or, as in the case of classical Galvanoplastik, destroyed, for example by dissolution in solvents or melting of wax-based substrates.

The substrate used according to the invention may be a two-dimensional, in particular planar, substrate or a three-dimensional substrate. Two-dimensional substrates are used, for example, in the production of printed conductors, whereas three-dimensional substrates are used to produce fine-mechanical components or workpieces.

In the context of the present invention, the solubilizate and / or the dispersion is applied to the substrate by means of printing processes. The use of printing processes allows a high throughput and excellent precision in the production of the electrically conductive structures according to the invention and a simple and flexibly applicable application of the solubilizate or dispersion in a locally limited or regioselective manner. For the application of the solubilizate or the dispersion, according to the invention, a classical printing process, such as, for example, intaglio printing, flexographic printing or offset printing, can be used, which ensures a very high throughput in the printing of preferably two-dimensional substrates. In addition, however, electronic printing methods, such as, for example, ink-jet printing methods and toner-based printing methods (for example by means of laser printers) can also be used. Particularly preferred in this case is the ink-jet printing method, as well as three-dimensional substrates can be printed reproducibly with this method in a simple and flexible manner.

The particular printing method used depends on the type of substrate and the particular application. However, common to all printing processes is that the solubilizate or the dispersion at least during the application or order passes through the liquid state of matter, d. H. even with the use of tough pastes and toners they are as it were melted during the printing process and applied in liquid form to the substrate.

As regards the temperature at which the solubilizate or the dispersion is applied in the context of the present invention, this can vary within wide ranges. In general, the solubilizate or dispersion is applied at temperatures in the range from 0 to 300.degree. C., in particular 0 to 200.degree. C., preferably 5 to 200.degree. C., preferably 10 to 100.degree. C., particularly preferably 15 to 80.degree , The specific application temperature depends in particular on the temperature sensitivity of the substrate, the applied application method, in particular printing method, as well as the properties of the solubilizate or dispersion, in particular pasty and solid dispersions should generally go through the liquid state to a uniform and thin Order to ensure.

As far as the viscosity of the solubilizate or the dispersion is concerned, this may likewise vary within wide ranges. The dynamic viscosity determined according to DIN EN ISO 2431 can be in the range of 5 to 1100,000 mPas, in particular in the range of 5 to 100,000 mPas, preferably in the range of 5 to 50,000 mPas, preferably in the range of 7 to 1,000 mPas, particularly preferred in the range of 7 to 500 mPas, very particularly preferably in the range of 7 to 300 mPas. The exact value for the viscosity of the solubilizate or the dispersion depends primarily on the application method used, in particular printing method: Thus, for example, for the offset printing process dynamic viscosities in the range of about 1,000,000 mPas for the dispersion or the Solubilisate needed, whereas solubilisates and dispersions, as can be used for ink jet printing process, dynamic densities of 10 mPas or less may have.

In the context of the present invention, the solubilizates or dispersions having a layer thickness of 0.5 to 30 .mu.m, preferably 1 to 20 .mu.m, particularly preferably 2 to 15 .mu.m, are applied to the substrate.

Similarly, it can be provided according to the invention that in the context of the present invention, the electrically conductive structure after carrying out the process step (a) and / or (b) has a layer thickness of 0.01 to 100 .mu.m, in particular 0.05 to 50 .mu.m, preferably 0 , 1 to 30 μm, preferably 0.2 to 20 μm, more preferably 0.3 to 10 μm, most preferably 0.4 to 5 μm, even more preferably 0.5 to 3 μm, even more preferably 0.6 to 2 μm. In the context of the present invention, it is thus possible to realize extremely thin layers of conductive materials on substrates, which nevertheless have excellent mechanical strength, in particular abrasion resistance, as well as excellent electrical conductivity.

As regards the mechanical strength of the electrically conductive structures obtainable by the process according to the invention, they are distinguished, in particular, by a high abrasion resistance. Thus, after carrying out process step (a) and / or (b) and / or (c), the electrically conductive structure may have an abrasion resistance according to Taber according to DIN EN ISO 438 of at least the characteristic number 2, in particular at least the characteristic number 3, preferably at least the characteristic number 4 , exhibit.

Similarly, it may be provided that the electrically conductive structure after carrying out the method step (a) and / or (b) a wet abrasion resistance according to EN 13300 at least Class 4, in particular at least Class 3, preferably Class 1 or 2, has.

The electrically conductive structures according to the invention can thus have abrasion resistance, as they occur, for example, in highly resistant and resistant paints.

The electrical conductivity of the electrically conductive structures can also vary within the scope of the present invention in a wide range, in particular between the conductivities of the structures based on Non-metal-based solubilizates or dispersions on the one hand and the electrical conductivities of the structures after the electrochemical deposition of metals must be distinguished.

All values given below for the specific resistance relate in particular to a measurement or determination temperature of 20 ° C. The determination can be carried out, for example, according to the so-called four-pole method or four-point method and / or according to DIN EN ISO 3915.

Thus, in the context of the present invention, the electrically conductive structures after carrying out process step (a) and / or (b) have a specific resistance p in the range from 10 ^-7 Ωm to 10 ¹⁰ Ωm, in particular in the range from 10 ^-6 Ωm to 10 ⁵ Ωm, preferably in the range of 10 ^-5 Ωm to 10 ³ Ωm.

On the other hand, after the optionally performed process step (c) of the electrochemical deposition of metals, the electrically conductive structure can have a resistivity p in the range from 10 ^-9 Ωm to 10 ^-1 Ωm, in particular in the range from 10 ^-8 Ωm to 10 ^-2 Ωm, preferably in the range of 10 ^-7 Ωm to 10 ^-3 Ωm.

As far as the deposition of the metal in process step (c) is concerned, the metal to be deposited generally comprises at least one transition metal, in particular a noble metal or a metal from the lanthanide group. In the context of the present invention, co-deposition of two or more metals can expressly also take place, as a result of which alloys with specific properties are accessible.

In the context of the present invention, particularly good results are obtained when the metal or metals are selected from subgroups I, V, VI and VIII of the Periodic Table of the Elements. It is preferred if one or more metals from the group of Cu, Ag, Au, Pd, Pt, Rh, Co, Ni, Cr, V and Nb are electrochemically deposited on the substrate.

In general, especially in process step (c), the metal is deposited from a solution of the metal. The solutions of the metals are usually in particular aqueous solutions of metal salts, but also solutions containing metal ions based on aqueous-organic or organic solvents or salt melts, such as ionic liquids, can be used.

Furthermore, in the context of the present invention, the metal is generally deposited by applying an external electrical voltage, in particular by electrolysis, in particular galvanically deposited.

In the deposition of the metal, it has also proven to be advantageous if the metal with current densities in the range of 1 to 10 mA / cm ² , in particular 2 to 8 mA / cm ² , preferably 3 to 6 mA / cm ² , deposited ,

The inventive method, it is possible, the metal flexible and adapted to the particular application with a layer thickness of 1 nm to 8,000 .mu.m, in particular 2 nm to 4,000 .mu.m, preferably 5 nm to 2,500 microns, preferably 10 nm to 2,000 microns, more preferably 50 nm to 1,000 microns, to be deposited. In this way, on the one hand extremely thin strip conductors and microstructures are accessible; On the other hand, however, fine mechanical components can be obtained with sufficient stability.

Furthermore, it is possible within the scope of the present invention that the metallic structure obtained by electrochemical deposition, in particular in process step (c), is subjected to a final treatment, in particular in a process step (d). Particularly good results are obtained when the final treatment by etching, polishing, sputtering, potting, filling or coating takes place. The final treatment, in particular in process step (d), has the purpose of optimizing the resulting metallic structures in terms of their property profile or to prepare for any subsequent operations. In particular, for example, smaller irregularities that occur during electroplating at the connection points of the electrodes, balanced or, for example, electrical components to protect against mechanical stress and environmental influences in a resin, such as an epoxy resin, are cast.

The conductive structures obtainable by the process according to the invention, in particular metallic structures, are distinguished from the structures and objects or workpieces obtainable hitherto by the prior art by a particular regularity of the layer application. This applies in particular both with regard to the non-metallic conductive structures according to the invention and with regard to the metallic conductive structures according to the invention.

In addition, the conductive structures obtainable by the process according to the invention have an increased abrasion resistance compared to the conductive structures hitherto known in the prior art, which is due in particular to an improved adhesion or adhesion of the solubilizate used according to the invention or the dispersion used according to the invention.

Likewise, the conductive structures obtainable according to the present invention are not only more stable, d. H. more abrasion-resistant and scratch-resistant, than the structures known in the prior art, but also characterized by an increased elasticity, which is reflected in significantly improved flexural strengths.

Owing to the thin-layer application of the solubilizate or the dispersion, particularly finely structured, in particular microstructured, and miniaturized structures and objects or workpieces can be manufactured or reproduced with high detail by electroforming with the method according to the invention. This applies in particular to the use of carbon nanotubes (CNTs) as electrically conductive starting materials which, owing to their high conductivity and the large aspect ratio (ie the ratio of length to diameter), need only be applied in extremely low concentrations and layer thicknesses, so that percolation and thus a continuous conductivity is achieved.

Another object of the present invention - according to a second aspect of the present invention - are consequently electrically conductive (ie electrically conductive metallic) structures, which are obtainable by the method described above.

In general, the electrically conductive metallic structures comprise a non-conductive substrate to which at least partially an electrically conductive material, which is selected from the group of electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides, is applied by means of printing processes electrically conductive material in turn, at least one metal is electrochemically deposited.

As already stated above, the conductive metallic structures according to the invention are distinguished by particularly low layer thicknesses and high regularity combined with excellent conductivity and excellent mechanical properties.

For further details of this aspect of the invention, reference may be made to the statements on the method according to the invention, which apply accordingly in this regard.

Yet another object of the present invention is - according to a third aspect of the present invention - the use of the previously described electrically conductive structures in electronics or electrical engineering.

In general, the conductive structures according to the invention can be used in the computer and semiconductor industry as well as in metrology.

Particularly good results are obtained when the conductive structures of the invention are used for the production of printed conductors, microstructured components, precision mechanical components and electronic or electrical components.

For further details of this aspect of the present invention, reference may be made to the above remarks on the remaining aspects of the invention, which shall apply mutatis mutandis with respect to this inventive use.

Yet another object of the present invention - according to a fourth aspect of the present invention - is the use of the previously described conductive structures for the production of metallic structures.

The conductive structures according to the invention are particularly suitable for the production of two-dimensional and / or three-dimensional metallic structures, in particular for electroforming.

In addition, the conductive structures according to the invention can be used especially for the production of electroforming and / or for the production of decorative elements.

For further details of this aspect of the invention, reference may be made to the above remarks on the other aspects of the invention, which apply accordingly in this respect.

Finally, another object of the present invention - according to a fifth aspect of the present invention - printed conductors, microstructured components, precision mechanical components, electronic or electrical components, microstructures, decorative elements or electroplating, comprising an electrically conductive structure according to the invention.

For further details of this aspect of the invention, reference may be made to the above remarks on the other aspects of the invention, which apply accordingly in this respect.

Other embodiments, modifications, variations of the present invention will be readily apparent to those skilled in the art upon reading the description recognizable and realizable, without departing from the scope of the present invention.

The present invention will be illustrated by the following embodiments.

WORKING EXAMPLES Example 1: Using a CNT dispersion for the manufacture of electroplating

A wax positive of a key fob was coated thinly with a wet film thickness of about 30 to 40 microns with a CNT dispersion (2 wt .-% CNTs in methoxypropyl acetate (PMA)) and subsequently dried. The contacting of the specimen to the power source was carried out by an insulated copper cable, which was inserted into the wax body and had contact with the conductive CNT dispersion. The thus prepared specimen was completely immersed in a copper sulfate solution. The anode was a piece of pure copper. Even at a low current (0.5 A, constant voltage), a thin layer of copper formed on the specimen after a short time, which increased in weight as a function of time and current. After completion of the plating process, the specimen was placed in the oven at about 100 ° C to remove the wax. By carefully removing the oxide layer, the underlying shiny metallic copper could be made visible. With this technique it is possible to image even fine three-dimensional structures.

Example 2: Use of an aqueous stoving lacquer for producing metallically conductive layers and conductor tracks

An aqueous stoving lacquer of the type Bayhydrol ^® E 155 has been functionalized with a dispersion of 8 wt .-% CNTs in methoxypropyl acetate (PMA) and made electrically conductive. An electrical circuit diagram was applied with the functionalized Bayhydrol E 155 to a thin PET film by means of an ink-jet process. Analogously to Example 1, a thin layer of copper was deposited on the coated areas of the film. On the uncoated areas, no copper separated and remained electrically insulating.

Example 3: Use of a solvent-based CNT dispersion for producing metallic shaped bodies (including detachment of the shaped bodies from the foil / glass)

A dispersion of 2 parts by weight of CNTs in 98 parts by weight of methoxypropyl acetate (PMA) was used to image a tensile test specimen on a polyethylene (PE) substrate.

The adhesion to the PE substrate is in the pure dispersion worse than z. As the liability of the functionalized stoving. This circumstance can be used so that the sample body can be easily detached from the substrate after the deposition of the copper on the coated areas.

Example 4: Comparison of abrasion resistance and resistivity of conductive non-metallic structures

To compare the abrasion resistance and resistivity of various non-metallic conductive materials, 2 parts by weight of graphite or carbon nanotubes (MWCNTs) and indium-tin oxide (ITO) and polyaniline, respectively, were dissolved in 97 parts by weight of methoxypropyl acetate (PMA) in the presence of 1 part by weight polymeric wetting and dispersing aid having a molecular weight of about 2,000 g / mol dispersed.

The dispersions were applied to a glass plate by means of ink-jet processes with a layer thickness of 25 to 30 μm, and the dispersion medium was then removed. For comparison, another glass plate was dusted with elemental powdered graphite. Subsequently, the resistivity of the coating as well as the abrasion resistance according to Taber according to DIN EN ISO 438 were determined on all samples. The results are summarized in Table 1 below.

The results in Table 1 show that although the application of elemental powdered graphite to a substrate results in comparable conductivities as the application of a graphite dispersion, the graphite dispersion according to the invention has a significantly higher abrasion resistance. In addition, the values in Table 1 show that with carbon nanotubes significantly lower values for the resistivity and thus significantly higher specific conductivities at the same time significantly improved Abrasion resistance - which is comparable to that of mechanically resistant paints - can be obtained. <b> Table 1: </ b> Conductive material Specific resistance [Ω m] Abrasion resistance according to DIN EN ISO 438 Graphite _powder (comparative) 7.0 x 10 ^-4 1 Graphite _dispersion (according to the invention) 6.5x10 ^-5 3 CNTs _dispersion (according to the invention) 3.2x10 ^-6 5 Indium tin oxide _dispersion (according to the invention) 1.2 x 10 ^-2 3 Polyaniline _dispersion (according to the invention) 2 x 10 ^-2 4

Claims (20)

1. Method for electrochemical deposition of metals on substrates for the production of metallic structures and/or of galvanoplastics,

   (a) whereby in a first method step at least a solubilizate and/or a dispersion selected on the basis of electrically conductive materials from the group of electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides is applied to an electrically non-conductive substrate, whereby the application of the solubilizate and/or the dispersion is locally limited and/or carried out by means of location-specific printing process, whereby the solubilizate and/or the dispersion is applied to the substrate with a layer thickness of 0.5 to 30 µm,

   (b) where appropriate, a subsequent method step of drying or curing of the solubilizate and/or the dispersion is carried out, and

   (c) whereby in a subsequent method step, at least a metal is electro-chemically deposited on the optionally dried or cured solubilizate and/or on the optionally dried or cured dispersion.
2. Method according to claim 1, characterised in that as electrically conductive carbon allotropes, graphite, graphene, fullerenes and/or carbon nanotubes (CNTs), especially carbon nanotubes (CNTs), are used.
3. Method of claim 1 or 2, characterised in that as electrically conductive polymers, polyacetylene, polyaniline, polyparaphenylene polypyrrole and/or polythiophene are used.
4. Method according to any one of the preceding claims, characterised in that as the electrically conductive inorganic oxides, indium tin oxide (ITO), indium zinc oxide (IZO), aluminium zinc oxide (AZO), antimony tin oxide (ATO) and/or fluorine tin oxide (FTO) are used.
5. Method according to any one of the preceding claims, characterised in that the solubilizate and/or the dispersion is water-based and/or solvent-based, in particular whereby the solvent of the solubilizate and/or the continuous phase of the dispersion, is an aqueous-based, organic-based or organic-aqueous-based solvent and/or dispersion medium, or that the dispersion is a mixture of solids, in particular a powder coating.
6. Method according to any one of the preceding claims, characterised in that

   - the solubilizate and/or the dispersion is curable, in particular radiation-curable and/or thermally-curable, preferably radiation-curable, and/or

   - the solubilizate and/or dispersion has at least one curable, in particular radiation-curable and/or thermally-curable, preferably radiation-curable, component, in particular at least one reactive diluent, and/or

   - the solvent of the solubilizate and/or the continuous phase of the dispersion is curable, in particular radiation-curable and/or thermally-curable, preferably radiation-curable.
7. Method according to any one of the preceding claims, characterised in that the solubilizate and/or the dispersion contain the electrically conductive materials in amounts of from 0.001 to 90 wt.-%, in particular from 0.005 to 80 wt.-%, preferably 0.01 to 50 wt.%, more preferably 0.01 to 30 wt.-%, particularly preferably 0.01 to 20 wt.-%, with respect to the solubilizate and/or the dispersion.
8. Method according to any one of the preceding claims, characterised in that

   - the solubilizate and/or the dispersion comprises at least one additive, in particular in amounts of from 0.001 to 60 wt.-%, in particular 0.005 to 50 wt.-%, preferably 0.01 to 40 wt.-%, more preferably 0.05 to 30 wt.-%, most preferably from 0.1 to 20 wt.-%, with respect to the solubilizate and/or the dispersion, and/or

   - the solubilizate and/or the dispersion comprises at least one additive, in particular selected from the group of dispersion agents (dispersants), tensides or surfactants, defoamers, rheology modifiers, binders, film formers, biocides, marker substances, pigments, fillers, adhesion promoters, flow additives, cosolvents, film formation prevention agents, UV absorbers, anticlogging agents and/or stabilisers, and/or

   - the solubilizate and/or the dispersion comprises at least one wetting and/or dispersing agent, and/or

   - the solubilizate and/or dispersion has at least one surfactant additive selected from the group of slide and/or slip additives: levelling agents; surface additives, especially crosslinkable surface additives; adhesion promoters and/or substrate wetting additives; hydrophobic agents and antiblocking agents, and/or

   - the solubilizate and/or the dispersion has at least one rheology control additive selected from the group consisting of rheology additives, in particular thickeners and/or thixotropic agents; defoamers; diuretics; structuring agents, as well as softening agents and/or plasticisers, and/or

   - the solubilizate and/or dispersion has at least one additive selected from the group of corrosion inhibitors; light stablisers, especially UV absorbers, radical scavengers, quenchers and/or hydrogen peroxide stabilisers; drying agents; film formation prevention agents; catalysts; accelerators; biocides; preservatives; scratch resistance additives; antistatic agents; waxes: fillers and pigments.
9. Method according to any one of the preceding claims, characterised in that

   - the substrate is an inorganic and/or organic substrate, in particular selected from the group of glass, ceramics, silicones, clays, waxes, plastics, and composite materials, and/or

   - the substrate is a two-dimensional, in particular sheet-like, substrate or a three-dimensional substrate.
10. Method according to any one of the preceding claims, characterised in that in that the solubilizate and/or the dispersion is applied by means of an ink-jet printing method, gravure printing method, flexographic printing method, offset printing method, toner-based printing process, preferably by means of an inkjet printing process.
11. Method according to any one of the preceding claims, characterised in that

    - the solubilizate and/or dispersion is applied at temperatures of 0 to 300°C, in particular 0 to 200°C, preferably 5 to 200°C, preferably 10 to 100°C, more preferably 15 to 80°C, and/or

    - in accordance with DIN EN ISO 2431, the dispersion has a dynamic viscosity in the range from 5 to 1,100,000 mPas, in particular in the range from 5 to 100,000 mPas, preferably in the range from 5 to 50,000 mPas, preferably in the range of 7 to 1,000 mPas, especially preferably in the range of 7 to 500 mPas, most preferably in the range from 7 to 300 mPas and/or

    - the dispersion is applied to the substrate with a layer thickness of 0.5 to 30 µm, preferably 1 to 20 µm, particularly preferably 2 to 15 µm.
12. Method according to any one of the preceding claims, characterised in that.

    - the electrically conductive structure according to the implementation according to method steps (a) and/or (b) has a layer thickness of 0.01 to 100 µm, in particular from 0.05 to 50 µm, preferably 0.1 to 30 µm, more preferably 0.2 to 20 µm, even more preferably 0.3 to 10 µm, very particularly preferably 0.4 to 5 µm, even more particularly preferably 0.5 to 3 µm, most preferably 0.6 to 2 µm, and/or

    - the electrically conductive structure after implementation of the method step (a) and/or (b) and/or (c) has a Taber abrasion resistance according to DIN EN ISO 438 of at least class 2, in particular at least class 3, preferably at least class 4, and/or

    - the electrically conductive structure according to the implementation according to method steps (a) and/or (b) has a wet abrasion resistance according to EN 13300 of at least class 4, in particular at least class 3, preferably class 1 or 2, and/or

    - the electrically conductive structure according to the implementation according to method steps (a) and/or (b) has a resistivity p in the range of 10^-7 Ωm to 10¹⁰ Ωm, especially in the range of 10^-6 Ωm to 10⁵ Ωm, preferably in the range of 10^-5 Ωm to 10³ Ωm, and/or

    - the electrically conductive structure according to the implementation according to method step (c) has a resistivity p in the range of 10^-9 Ωm to 10^-1 Ωm, in particular in the range of 10^-8 to 10^-2 Ωm, preferably in the range of 10^-7 Ωm to 10^-3 Ωm.
13. Method according to any one of the preceding claims, characterised in that

    - in method step (c), the metal to be deposited comprises at least one transition metal, in particular a noble metal or a metal from the group of the lanthanides, and/or

    - at least one metal selected from the group of Cu, Ag, Au, Pd, Pt, Rh, Co, Ni, Cr, V and Nb, is electrochemically deposited on the substrate.
14. Method according to any one of the preceding claims, characterised in that

    - the metal is deposited from a solution of the metal, and/or

    - the metal is deposited by applying an external electrical voltage, in particular by electrolysis, in particular galvanically deposited, and/or

    - the metal is deposited with current densities from 1 to 10 mA/cm², especially 2 to 8 mA/cm², preferably 3 to 6 mA/cm², and/or

    - the metal is deposited with a layer thickness from 1 nm to 8,000 µm, preferably from 2 nm to 4000 µm, more preferably from 5 nm to 2,500 µm, even more preferably from 10 nm to 2,000 µm, most preferably from 50 nm to 1,000 µm.
15. Method according to any one of the preceding claims, characterised in that the metallic structure obtained by electro-chemical deposition, in particular in method step (c), is subjected to a final treatment, in particular in a method step (d), in particular by etching, polishing, sputtering, casting, filling or coating.
16. Electrically conductive metal structures, obtainable by a method according to any one of the preceding claims.
17. Electrically conductive metal structures according to claim 16, comprising a non-conductive substrate to which is applied at least partially at least one electrically conductive material selected from the group of electrically conductive carbon allotropes, electrically conductive polymers and electrically conductive inorganic oxides, by means of printing processes, whereby at least one metal is in turn electro-chemically deposited on the electrically conductive material.
18. Use of conductive structures according to claim 16 or 17 in electronics and electrical engineering, particularly in the computer and semiconductor industries and metrology, in particular for the production of conductor tracks, microstructured components, precision mechanical components and electronic or electrical components.
19. Use of conductive structures according to claim 16 or 17 for the manufacture of metallic structures, in particular two-dimensional and/or three-dimensional metallic structures, preferably for electroforming, and/or for the preparation of galvanoplastics and/or for the production of decorative elements.
20. Conducting paths, microstructured components, precision mechanical components, electronic or electrical components, microstructures, decorative elements or galvanoplastics comprising an electrically conductive structure according to claim 16 or 17.