EP2766192A1 - Sicherheitselement - Google Patents
SicherheitselementInfo
- Publication number
- EP2766192A1 EP2766192A1 EP12773222.0A EP12773222A EP2766192A1 EP 2766192 A1 EP2766192 A1 EP 2766192A1 EP 12773222 A EP12773222 A EP 12773222A EP 2766192 A1 EP2766192 A1 EP 2766192A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- grid
- security element
- line
- webs
- bars
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
- B42D25/29—Securities; Bank notes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
- B42D25/373—Metallic materials
-
- B42D2035/16—
-
- B42D2035/24—
-
- B42D2035/36—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
- B42D25/378—Special inks
- B42D25/391—Special inks absorbing or reflecting polarised light
Definitions
- the invention relates to a security element for the production of value documents, such as banknotes, checks or the like, which has a line grid structure.
- Security elements of value documents with periodic line gratings are known, for example from DE 102009012299 AI, DE 102009012300 AI or DE 102009056933 AI.
- Such color filter properties are known for both reflective and transmitting subwavelength structures. These structures have a strong polarizing influence on the reflection or the transmission of an incident light beam. The color is relatively strongly dependent on the angle in reflection or transmission of such subwavelength gratings. However, the color saturation for these gratings weakens significantly when the incident light is unpolarized.
- a line grating with subwavelength structures which has angle-dependent, color-filtering properties.
- the line grid has a rectangular profile made of a dielectric material.
- the horizontal surfaces are covered with a high refractive dielectric.
- this structure is also a dielectric material, wherein preferably the refractive indices of the grating substrate and the cover material are identical.
- an optically active structure is formed, which consists of two gratings of the high refractive index material, which are spaced apart by the height of the original rectangular profile.
- the lattice webs forming the line lattice are made of ZnS, for example.
- a security element for the production of documents of value comprising: a dielectric substrate, embedded in the substrate first line grid structure of a plurality of longitudinally extending and arranged in a plane first grid bars made of metal or A semiconductor and a second line grid structure embedded in the substrate of longitudinally extending second metal or semiconductor grid bars located above the first grid line structure with respect to the plane, wherein the first grid bars each have a width and are juxtaposed such that therebetween the first grid bars along the longitudinal direction extending first grid column are formed with the distance corresponding width, the second line grid structure is inverted to the first line grid structure, wherein in plan view of the plane, the second G Itterstege over the first grid columns and second grid column, which exist between the second grid bars over are the first grid bars, and the width of the first grid bars and the second grid column and the width of the
- phase shift corresponds to half a period.
- a double-line grid is used, which consists of two superimposed complementary to one another, i. consists of mutually displaced line grid structures.
- a phase shift of 90 ° is the ideal value, which of course can be seen in the context of manufacturing accuracy. By manufacturing tolerances here deviations from the complementarity, so 90 ° phase shift arise, since usually a rectangular profile is not perfect, but can be approximated only by a trapezoidal profile whose upper parallel edge is shorter than the lower parallel edge.
- the line grid structures are made of metal or semiconductor material.
- the layer thickness of the lattice webs is less than the modulation depth, that is, the spacing of the lattice planes of the line lattice structures.
- the security element according to the invention can simply by a
- Layer structure are prepared by first a base layer is provided, on which the first line grid structure is formed. Thereon a dielectric intermediate layer is applied that covers the first line grid structure and is preferably thicker than the grid webs of the first line grid structure. The displaced second line grating structure can then be formed thereon, and a dielectric cover layer forms the end of the substrate embedding the line grating structure.
- a sub-waveguide having a rectangular profile in cross-section can first be formed in the dielectric substrate as well. If this metallic is vaporized vertically, a metal layer is formed on the plateaus and in the trenches which form the first and second lattice webs.
- the desired non-contiguous metal film of the first and second lattice webs is therefore provided in different planes if the layer thickness of the lattice webs is less than the modulation depth of the rectangular profile of the previously structured dielectric substrate.
- a particularly good color effect is obtained when the distance between the first and the second lattice webs, ie the modulation depth of the structure, is between 50 nm and 500 nm, preferably between 100 nm and 300 nm.
- the distance is to be dimensioned by respectively equivalent surfaces of the first and second line grid structure, ie, for example, from the bottom of the first grid bars to the bottom of the second grid bars or from the top of the first grid bars to the top of the second grid bars.
- the distance is of course to measure perpendicular to the plane, so called the height difference between the rectified surfaces of the grid bars.
- the first lattice webs of the first line lattice structure and / or the second lattice webs of the second line lattice structure can be constructed with a multilayer coating, eg as a trilayer of two superimposed metal or semiconductor coatings with an intervening dielectric layer.
- the security element can be configured approximately color-neutral in the reflection even at approximately vertical angle of incidence. This has the advantage that the transmitted hue is not changed by the reflection.
- a filling factor of 0.5 ie the same width for the grid webs as for the grid gaps, is preferred for the grid structures of the security element. Such a fill factor is not mandatory. With a deviation from this, one can make the hue of the reflection for reflection from the front different for a reflection hue, which occurs in the reflection at the back of the security element.
- the security element with the double-line grid shows angle-dependent color filtering for reflection and transmission. This angle dependence is particularly striking when the grid lines are perpendicular to the light incidence plane.
- Color filtering can be used to make motifs multicolored so that they change color when tilted or twisted. It is therefore preferred that, in plan view of the plane, at least two regions are provided whose longitudinal directions of the line grid structures are oblique to one another, in particular at right angles. When viewed vertically, such a motif can be designed so that it has a uniform color in transmission and no further structure. If you rotate this motif around the vertical axis, the color of one area, for example of the background, changes differently than the color of the other area, for example a motif.
- the lattice structure has polarizing properties in transmission. This makes it possible to machine-check the security element, which is otherwise not possible with optical security elements with existing standard sensors. Neither holograms nor moiré magnifier designs etc. can be easily checked by machine.
- the review requires only a brightfield camera and a polarizing filter.
- the security element shows different polarization properties depending on the orientation of the grating structures. It is therefore preferable to provide a security element which has at least two regions whose line grid structures extend along differently extending longitudinal directions. When viewed with polarized light, these areas show large differences in contrast, which facilitates machine reading.
- a machine readout for example with a bright field camera and a polarizing filter, provides a contrast between these two areas, which serves to authenticate the security element.
- a further development which has a plurality of regions in the security element, wherein the regions differ from one another with regard to the longitudinal direction along which the line grid structures extend.
- This allows you to create motifs with multiple colors in transmission.
- the longitudinal direction is gradually varied from one area to the next in certain angular steps, for example in 5 °, 10 ° or 15 ° increments, between a plurality of such areas which lie next to one another. If one twists such a structure of adjacent areas in front of a pulverized light source, the colors interchange almost continuously as the angle of rotation of the structure increases.
- the line grids in the individual areas may also have different geometry parameters in terms of width and spacing. In this case, however, the subject does not disappear when viewed vertically.
- FIG. 1 is a sectional view of a security element with a
- Double-line grid, 2a-c the spectral dependence of the transmission, reflection and absorption of the security element of FIG. 1 in a first embodiment
- FIG. 3 color values in the LCh color space for reflection and transmission for the security element of FIG. 2 with variation of a modulation depth
- FIG. 4 color values in the LCh color space for reflection and transmission for the security element of FIG. 2 with variation of a layer thickness
- FIG. 5 color values in the LCh color space for reflection and transmission for a security element of FIG. 1 in a second embodiment with variation of a layer thickness
- FIG. 6 shows a sectional representation similar to FIG. 1 for a double-line grid whose grid webs are provided with a trilayer coating
- FIG. 7 shows color values in the LCh color space for reflection and transmission for the security element of FIG. 6 with variation of a layer thickness
- 8a-b are two plan views of a motif that is formed with the security element of FIG. 1,
- FIG. 11 color values in the LCh color space for reflection and transmission for the security element of FIG. 2, FIG. wherein the plot corresponds to that of FIG. 10, but with variation of a layer thickness,
- FIGs. 12 and 13 representations similar to Fig. 11, but for different
- FIG. 14 color values in the LCh color space for reflection and transmission for a security element according to the prior art
- FIG. 15 color values in the LCh color space for reflection and transmission of a security element with different polarization of the illuminating radiation
- FIG. 15 color values in the LCh color space for reflection and transmission of a security element with different polarization of the illuminating radiation
- FIG. 16 shows a representation similar to FIG. 15 for a further embodiment of the security element, FIG.
- 17a-b show the transmission and reflection for a security element at different polarization directions of the illumination as a function of the illumination wavelength in the near infrared range
- FIG. 18 shows the transmission of the grating of FIG. 17 at different polarizations in the visible spectral range
- FIG. 19a-b show transmission and reflection of a further embodiment of a security element for two polarization directions as a function of the wavelength in the visible spectral range for two embodiments of the security element
- FIGS. 19a-b show transmission and reflection of a further embodiment of a security element for two polarization directions as a function of the wavelength in the visible spectral range for two embodiments of the security element
- Fig. 20 is a schematic representation of a security element in which the longitudinal extent of the line grid structure in adjacent areas gradually changes to cause a movement effect when tilting the security element.
- FIG. 1 shows a sectional view of a security element S which has a double-line grid embedded in a substrate 1.
- a first line grid structure 2 is incorporated, which is arranged in a plane L.
- the first line grid structure consists of first grid bars 9 with the width a, which extend along a longitudinal direction perpendicular to the plane of the drawing. Between the first grid bars 3 there are first grid gaps 4, which have a width b.
- the thickness of the first grid bars 3 is indicated by t.
- the second line grid structure 6 is phase-shifted with respect to the first line grid structure 2 in such a way that the second grid bars 7 come to lie as exactly as possible (within the manufacturing accuracy) over the first grid columns 4.
- second grid gaps 8, which exist between the second grid bars 7, lie over the first grid bars 3.
- the thickness t is smaller than the height h, so that no continuous film of the grid bars 3 and 7 is formed.
- the width a of the first grid webs 3 is equal to the width b of the second grid webs 7.
- the fill factor is thus 50% in each line grid structure.
- this is not mandatory.
- any variation can be made.
- the thickness t of the first grid bars 2 is equal to the thickness t of the second grid bars 7. This is a simpler production benefit, but is not mandatory. However, it is essential that the modulation depth h, i. the height difference between the first line grid structure 2 and the second line grid structure 6 is greater than the sum of the thicknesses of the first grid bars 3 and the second grid bars 7, since otherwise there would be no separation between the two line grid structures 2 and 6.
- the security element S of FIG. 1 reflects incident radiation E as reflected radiation R. Furthermore, a radiation component is transmitted as transmitted radiation T.
- the reflection and transmission properties depend on the angle of incidence ⁇ , as will be explained below.
- the production of the security element S can take place, for example, by first applying the first line grid structure 2 and then an intermediate layer 5 to a base layer 9.
- the second line grid structure with the second grid webs 7 can then be introduced into the grid column 4 depicted at the top.
- a cover layer 10 covers the security element.
- the refractive indices of the layers 9, 5 and 10 are substantially the same and may be, for example, about 1.5, in particular 1.56.
- the dimensions b, a and t are in the sub-wavelength range, ie smaller than 300 nm.
- the modulation depth is preferably between 50 nm and 500 nm.
- a production method is also possible in which first a rectangular grid is produced on an upper side of the substrate 1.
- the substrate 1 is thus structured such that trenches of the width a alternate with webs of the width b.
- the patterned substrate is then vapor-deposited with the desired coating to form the first and second line grids and the first and second line grating structures. After evaporation, the structure is finally covered with a cover layer. This gives a layer structure in which the top and bottom have substantially the same refractive index.
- the structured substrate can be obtained in various ways.
- One option is the reproduction with a master.
- the master form may e.g. now in UV varnish on foil, e.g. PET film to be replicated.
- One then has the substrate 1 as a dielectric material which, for example, has a refractive index of 1.56.
- hot stamping methods are also suitable.
- the master or even the substrate itself, can be fabricated using an e-beam, focused ion beam or interference lithography, writing the structure into a photoresist and then developing it.
- the structure of a photolithographically produced master can be etched in a subsequent step into a quartz substrate in order to form as vertical as possible edges of the profile.
- the quartz wafer then serves as a preform and can be copied eg in Ormocer or by galvanic molding be multiplied.
- a direct impression of the photolithographically produced original in Ormocer or in nickel in a galvanic process is possible.
- a motif with different lattice structures can be assembled in a nanoimprint process starting from a homogeneous lattice master.
- FIG. 2a shows on the y-axis the transmission as a function of the wavelength recorded on the x-axis for different angles of incidence, namely 0 °, 15 °, 30 ° and 45 °.
- Fig. 2b shows the reflection analogously and Fig. 2c shows the absorption of the security element.
- the angle of incidence ⁇ is defined in FIG.
- FIG. 14 shows a representation similar to FIG. 3 for a known security element.
- the structure of the security element on which it is based essentially corresponds to that of FIG. 1, but the first and the second line grid structure are not made of metal but of ZnS with a layer thickness of 70 nm.
- no spectrally selective absorptions occur.
- the color properties in transmission are significantly worse.
- the chroma is only about a quarter and the brightness is also modulated with respect to the angle of incidence. Therefore, the color contrast in transmission is drastically deteriorated with a variation of the incident angle.
- Such a grating can at best be used in reflective operation, ie on a black background layer.
- FIGS. 3 and 4 show how the modulation depth (FIG. 3) or the layer thickness (FIG. 4) has an effect on the color properties of the security element of FIGS. 1 and 2.
- the representation takes place in the LCh color space.
- the top line shows the brightness L *, the middle line the chroma C *, and the bottom line the hue h °.
- the material for the line lattice structure is aluminum, the substrate and the regions 4 and 5 of Fig. 1 have a refractive index of 1.56. This value corresponds approximately to the refractive index of PET films and UV varnishes.
- the brightness and the chroma in transmission increase with increasing modulation depth h.
- a well-perceived color contrast is given in transmission when the transmitted brightness and chroma are higher than the reflected brightness and chroma. This is included Modulation depths between 150 nm and 280 nm of the case. It shows a much improved color property in transmission over the security element with ZnS grid bars.
- the material is again aluminum, and the geometric parameters d, b, h correspond to those of FIG. 2. It can be seen that a layer thickness in the range of 20 nm and 30 nm brings about favorable color properties in transmission.
- the brightness of the transmission is in the same order of magnitude of the brightness in reflection. In contrast, the chroma in transmission is significantly higher.
- the angle-dependent color effect in transmission is not limited only to a line grid structure, which is a single metal layer or Semiconductor layer in the grid webs has.
- the effects described are also obtained for double-line gratings whose lattice webs consist of several layers.
- the total thickness of the layers is always smaller than the modulation depth h.
- At least one of the layers is made of a metal or a semiconductor.
- Trilayers are particularly preferred for the layer structure.
- a larger number of layers hardly improves the angle-dependent color effect, but increases the manufacturing cost.
- 6 shows by way of example a security element in which the first and second lattice webs 3 and 7 are each realized by a trilayer coating. They have a metallic layer 11, a dielectric intermediate layer 12 and a further metallic layer 13.
- the thickness of the two metal layers is identical.
- FIG. 7 shows the color values in the LCh color space for the security element S with the layer structure according to FIG. 6, wherein the metal layers 11 and 13 are each 10 nm thick aluminum layers and the dielectric layer 12 is a silicon dioxide layer.
- Fig. 7 shows the color effect as a function of the thickness of the silicon dioxide layer.
- the substrate 1 and the regions 4 and 5, as in all other embodiments, also have a refractive index of 1.56.
- the security element shows a slightly lower brightness in transmission, but a higher chroma than in reflection. Silicon dioxide layer thicknesses above 60 nm cause a strong hue in transmission when tilted. In reflection, the security element appears green. At 70 nm layer thickness of silicon dioxide, the security element is approximately neutral in reflection at approximately vertical angles of incidence. This has the Advantage that the transmitted hue is not changed by the reflection.
- the simple embodiment of a multi-colored motif with double-line grating is an arrangement in which different regions are formed whose longitudinal direction of the line grid structures is rotated relative to one another, preferably by 90 °.
- the spectral transmission or reflection characteristics hardly changes.
- FIGS. 8a and 8b show a security element in which regions of a background 14 of a motif 15 with a vertically extending longitudinal direction and the motif 15 with a horizontally extending longitudinal direction are formed. In the illustration of FIG. 8b, these line directions are indicated schematically.
- the motif 15 shows a butterfly and two numerical values.
- Fig. 8a shows the motif 15 schematically in white on a black background.
- the motif 15 as the background 14 are exemplified with the parameters of the embodiment of FIG. 1 configured.
- FIGS. 9a and 9b show different illumination states when the security element S of FIG. 8 is viewed against a backlight 16 in transmitted light. When viewed vertically (upper part of FIG. 9a), the security element appears uniformly yellow in transmission.
- the security element S also has polarization-filtering properties in transmission. 10 shows the color behavior of a security element S with a line grid structure whose grating bars consist of aluminum as a function of the modulation depth h in reflection (left column) and in transmission (right column) for TE and TM polarization at a normal angle of incidence. The plot otherwise corresponds to that of FIG. 3.
- the security element has a good brightness contrast for the two polarization directions in transmission at a modulation depth above 150 nm. Furthermore, the change in the sparklingness is for Modulation depths between 200 nm and 260 nm are particularly large. The color change has a maximum at a modulation depth of 270 nm.
- FIG. 11 shows the influence of the layer thickness t for the grating of FIG. 10 at a modulation depth of 250 nm.
- the security element has good polarization filter properties in transmission at layer thicknesses above 20 nm.
- the chroma and the color contrast are particularly high at layer thicknesses between 20 nm and 30 nm.
- a color change from blue to yellow is observed as the polarization of the illumination changes from TM polarization to TE polarization.
- d 360 nm
- b 180 nm
- h 300 nm
- Fig. 13 shows the color behavior when crystalline silicon is used instead of amorphous silicon. Otherwise, the parameters correspond to those of FIG. 12.
- This security element already shows clear brightness differences for layer thicknesses above 40 nm.
- the layer thickness of 100 nm is particularly well suited as a polarizing filter.
- the orange / blue color contrast is strongest for a silicon layer thickness of 120 nm.
- the line grid structure of the security element has polarization-filtering (so-called polarizing) properties in transmission.
- 15 shows the color values in the LCh color space of an aluminum-evaporated grating as a function of the modulation depth h in reflection and in transmission for TM and TE polarization at a normal angle of incidence.
- polarization-filtering so-called polarizing
- the color values are shown in reflection, in the right column in transmission.
- the structure of the grid corresponds to that of FIG. 1.
- Fig. 16 shows a view similar to Fig. 3 for a grid in which the grating webs 3, 7 consist of a 40 nm copper layer. Otherwise, the parameters correspond to those of the security element of FIG. 15. Here too, a clear color difference results at a modulation depth of 260 nm, which corresponds approximately to that described with reference to FIG. If the layer thickness of the copper of the lattice webs 3, 7 is varied, the recognizable colors can be adjusted slightly differently.
- the plot is made here as a function of the illumination wavelength in the near infrared.
- the solid line shows the TM polarization, the dashed line the TE polarization of the illumination radiation. It can clearly be seen that for certain wavelengths there is a clear difference in transmission and reflection between the two polarization directions.
- FIG. 18 shows the transmission of the grating of Fig. 17a, b as a function of the wavelength in the visible spectral range. Again, there is a significant difference for the two polarization directions.
- FIG. 19a shows the transmission and FIG. 19b the reflection of a grating with the parameters of the security element of FIG. 15, although the grating webs 3, 7 are formed here by a silicon layer 100 nm thick.
- the solid and long dashed lines represent the TM polarization of the incident radiation, the short-dashed line and the dot-dash line the TE polarization. Clearly visible is the different transmission and reflection behavior for the different polarizations.
- the polarization filter properties of the security element allow authenticity checking by considering the transmission in linearly polarized illumination.
- illumination is provided, for example, by LCD screens.
- Even the blue sky is partly linear pola (as opposed to the cloudy sky) and may be suitable as a radiation source for the investigation of the security element.
- the polarization filter properties of the security element also allow a machine authenticity check by examining the contrast, for example in a specific spectral range. Contrast is to be understood as meaning the different transmission and / or reflection in mutually orthogonal polarization directions.
- the checking device thus illuminates the security element successively in two different polarization directions and detects the contrast between the two images obtained thereby. This procedure allows a simple machine check of the security element, which is much more expensive or not possible with other security elements.
- the arrangement of the longitudinal direction of the security element is not limited to a mutually perpendicular position in different areas, as has been explained with reference to FIGS. 8a, b. It is also a configuration possible in which the longitudinal direction between areas changes in steps.
- FIG. 20 shows, by way of example, a rectangular area 16 which has ten subregions 16.1 to 16.10 which differ with respect to the longitudinal direction of their line grid structure in such a way that the longitudinal direction changes from the vertical orientation (subarea 16.1) into 10 ° in 10 ° increments horizontal alignment (subsection 16.10).
- this structure is rotated in front of a polarized light source, the colors which are recognizable in TE or TM polarization interchange approximately continuously with increasing rotation angle over the partial regions 16.1 to 16.10 due to the polarization-filtering properties of the line grid structure.
- the observer therefore perceives a kind of movement effect. This can of course find application in the design of subjects. Such an effect occurs even with unpolarized illumination when the security element is tilted about a horizontal axis with respect to FIG. Then, a color change in the areas with increasingly inclined grid lines occurs delayed with respect to the areas with horizontally extending grid lines.
- the security element can serve in particular as a see-through window of banknotes or other documents. It may also be partially overprinted color or the grid areas may be partially demetallized or configured without line grid, so that such an area is completely metallized. Combinations with diffractive grating structures, such as holograms, are also conceivable.
- the authenticity check of the security element can also be carried out without auxiliary means.
- additional authentication can be performed without additional devices.
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- Business, Economics & Management (AREA)
- Accounting & Taxation (AREA)
- Finance (AREA)
- Credit Cards Or The Like (AREA)
- Polarising Elements (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011115589A DE102011115589A1 (de) | 2011-10-11 | 2011-10-11 | Sicherheitselement |
| PCT/EP2012/004032 WO2013053435A1 (de) | 2011-10-11 | 2012-09-26 | Sicherheitselement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP2766192A1 true EP2766192A1 (de) | 2014-08-20 |
| EP2766192B1 EP2766192B1 (de) | 2017-12-13 |
Family
ID=47040636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP12773222.0A Active EP2766192B1 (de) | 2011-10-11 | 2012-09-26 | Sicherheitselement |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP2766192B1 (de) |
| CN (1) | CN103874585B (de) |
| DE (1) | DE102011115589A1 (de) |
| WO (1) | WO2013053435A1 (de) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2911760C (en) | 2013-05-10 | 2021-04-20 | Idit Technologies Corp. | Nanostructure array diffractive optics for rgb and cmyk color displays |
| DE102013105246B4 (de) | 2013-05-22 | 2017-03-23 | Leonhard Kurz Stiftung & Co. Kg | Optisch variables Element |
| DE102014010751A1 (de) | 2014-07-21 | 2016-01-21 | Giesecke & Devrient Gmbh | Sicherheitselement mit Subwellenlängengitter |
| DE102014011425A1 (de) | 2014-07-31 | 2016-02-04 | Giesecke & Devrient Gmbh | Sicherheitselement zur Herstellung von Wertdokumenten |
| DE102014018551A1 (de) | 2014-12-15 | 2016-06-16 | Giesecke & Devrient Gmbh | Wertdokument |
| US11143794B2 (en) | 2015-07-08 | 2021-10-12 | Shine Optoelectronics (Kunshan) Co., Ltd | Optical film |
| CN113204062A (zh) * | 2015-07-08 | 2021-08-03 | 昇印光电(昆山)股份有限公司 | 双面结构光学薄膜及其制作方法 |
| WO2017005206A1 (zh) * | 2015-07-08 | 2017-01-12 | 昇印光电(昆山)股份有限公司 | 光学薄膜 |
| DE102015009584A1 (de) | 2015-07-23 | 2017-02-09 | Giesecke & Devrient Gmbh | Sicherheitselement und Verfahren zu dessen Herstellung |
| DE102015010191A1 (de) | 2015-08-06 | 2017-02-09 | Giesecke & Devrient Gmbh | Sicherheitselement mit Subwellenlängengitter |
| CN105618355A (zh) * | 2015-12-31 | 2016-06-01 | 深圳市天兴诚科技有限公司 | 一种防伪标识的制备方法及装置 |
| JP7024221B2 (ja) * | 2016-06-24 | 2022-02-24 | 凸版印刷株式会社 | 表示体、表示体付きデバイス、および、表示体の製造方法 |
| DE102016013683A1 (de) | 2016-11-16 | 2018-05-17 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement mit Subwellenlängengitter |
| DE102016013690A1 (de) * | 2016-11-16 | 2018-05-17 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement mit Subwellenlängengitter |
| DE102016015335A1 (de) | 2016-12-21 | 2018-06-21 | Giesecke+Devrient Currency Technology Gmbh | Holographisches Sicherheitselement und Verfahren zu dessen Herstellung |
| DE102017003281A1 (de) * | 2017-04-04 | 2018-10-04 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement mit Reliefstruktur und Herstellungsverfahren hierfür |
| DE102017003532A1 (de) | 2017-04-11 | 2018-10-11 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement und Herstellungsverfahren hierfür |
| CN109050055B (zh) * | 2017-08-26 | 2020-07-07 | 共青城厚荣科技开发有限公司 | 一种光学可变防伪元件 |
| CN109291685B (zh) * | 2017-09-09 | 2020-06-23 | 擎雷(上海)防伪科技有限公司 | 一种金融防伪票据 |
| DE102017130588A1 (de) | 2017-12-19 | 2019-06-19 | Giesecke+Devrient Currency Technology Gmbh | Wertdokument |
| DE102018005872A1 (de) | 2018-07-25 | 2020-01-30 | Giesecke+Devrient Currency Technology Gmbh | Verwendung einer durch Strahlung härtbaren Lackzusammensetzung, Verfahren zur Herstellung von mikrooptischen Strukturen, mikrooptische Struktur und Datenträger |
| DE102018132516A1 (de) * | 2018-12-17 | 2020-06-18 | Giesecke+Devrient Currency Technology Gmbh | Im THz-Bereich wirkendes Sicherheitselement und Verfahren zu dessen Herstellung |
| CN111221065A (zh) * | 2020-01-16 | 2020-06-02 | 集美大学 | 一种基于双层不对称金属微纳光栅的双波长滤波器 |
| AT523690B1 (de) * | 2020-03-16 | 2022-03-15 | Hueck Folien Gmbh | Flächiges Sicherheitselement mit optischen Sicherheitsmerkmalen |
| DE102023120686A1 (de) | 2023-08-03 | 2025-02-06 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement und Verfahren zur Herstellung eines Sicherheitselements |
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| DE102004003984A1 (de) * | 2004-01-26 | 2005-08-11 | Giesecke & Devrient Gmbh | Gitterbild mit einem oder mehreren Gitterfeldern |
| DE102005007749A1 (de) * | 2005-02-18 | 2006-08-31 | Giesecke & Devrient Gmbh | Sicherheitselement und Verfahren zu seiner Herstellung |
| DE102006052413A1 (de) * | 2006-11-07 | 2008-05-08 | Giesecke & Devrient Gmbh | Sicherheitsfolie |
| DE102007029203A1 (de) * | 2007-06-25 | 2009-01-08 | Giesecke & Devrient Gmbh | Sicherheitselement |
| DE102007061979A1 (de) * | 2007-12-21 | 2009-06-25 | Giesecke & Devrient Gmbh | Sicherheitselement |
| DE102009012299A1 (de) | 2009-03-11 | 2010-09-16 | Giesecke & Devrient Gmbh | Sicherheitselement |
| DE102009012300A1 (de) | 2009-03-11 | 2010-09-16 | Giesecke & Devrient Gmbh | Sicherheitselement mit mehrfarbigem Bild |
| DE102009056933A1 (de) | 2009-12-04 | 2011-06-09 | Giesecke & Devrient Gmbh | Sicherheitselement mit Farbfilter, Wertdokument mit so einem solchen Sicherheitselement sowie Herstellungsverfahren eines solchen Sicherheitselementes |
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- 2012-09-26 WO PCT/EP2012/004032 patent/WO2013053435A1/de not_active Ceased
- 2012-09-26 CN CN201280049587.4A patent/CN103874585B/zh active Active
Also Published As
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|---|---|
| WO2013053435A1 (de) | 2013-04-18 |
| DE102011115589A1 (de) | 2013-04-11 |
| CN103874585A (zh) | 2014-06-18 |
| CN103874585B (zh) | 2016-05-04 |
| EP2766192B1 (de) | 2017-12-13 |
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