EP2755819A4 - Articles revêtus, bains d'électrodéposition et systèmes associés - Google Patents

Articles revêtus, bains d'électrodéposition et systèmes associés

Info

Publication number
EP2755819A4
EP2755819A4 EP20120831829 EP12831829A EP2755819A4 EP 2755819 A4 EP2755819 A4 EP 2755819A4 EP 20120831829 EP20120831829 EP 20120831829 EP 12831829 A EP12831829 A EP 12831829A EP 2755819 A4 EP2755819 A4 EP 2755819A4
Authority
EP
European Patent Office
Prior art keywords
related systems
coated articles
electrodeposition baths
electrodeposition
baths
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20120831829
Other languages
German (de)
English (en)
Other versions
EP2755819B1 (fr
EP2755819A1 (fr
Inventor
Nazila Dadvand
Urso John D
Jonathan C Trenkle
Alan C Lund
John Cahalen
Christopher A Schuh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xtalic Corp
Original Assignee
Xtalic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/232,291 external-priority patent/US20120121925A1/en
Priority claimed from US13/232,261 external-priority patent/US20120118755A1/en
Application filed by Xtalic Corp filed Critical Xtalic Corp
Publication of EP2755819A1 publication Critical patent/EP2755819A1/fr
Publication of EP2755819A4 publication Critical patent/EP2755819A4/fr
Application granted granted Critical
Publication of EP2755819B1 publication Critical patent/EP2755819B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/64—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of silver
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
EP12831829.2A 2011-09-14 2012-09-14 Articles revêtus d'un alliage d'argent Active EP2755819B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/232,291 US20120121925A1 (en) 2010-03-12 2011-09-14 Coated articles, electrodeposition baths, and related systems
US13/232,261 US20120118755A1 (en) 2010-03-12 2011-09-14 Coated articles, electrodeposition baths, and related systems
PCT/US2012/055495 WO2013040400A1 (fr) 2011-09-14 2012-09-14 Articles revêtus, bains d'électrodéposition et systèmes associés

Publications (3)

Publication Number Publication Date
EP2755819A1 EP2755819A1 (fr) 2014-07-23
EP2755819A4 true EP2755819A4 (fr) 2015-04-15
EP2755819B1 EP2755819B1 (fr) 2016-09-14

Family

ID=47883783

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12831829.2A Active EP2755819B1 (fr) 2011-09-14 2012-09-14 Articles revêtus d'un alliage d'argent

Country Status (4)

Country Link
EP (1) EP2755819B1 (fr)
JP (1) JP6159726B2 (fr)
CN (2) CN106947986B (fr)
WO (1) WO2013040400A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013040400A1 (fr) * 2011-09-14 2013-03-21 Xtalic Corporation Articles revêtus, bains d'électrodéposition et systèmes associés
JP2015014019A (ja) * 2013-07-03 2015-01-22 パナソニック株式会社 電気接点の表面処理方法、電気接点部材、コネクタ並びに接点処理剤
EP3417089B1 (fr) * 2016-02-16 2023-12-13 Xtalic Corporation Articles comprenant un revêtement multicouche et procédés associés
CN106521284A (zh) * 2016-11-24 2017-03-22 苏州华意铭铄激光科技有限公司 一种高性能电气设备用复合电阻应变材料
KR101913568B1 (ko) * 2017-04-26 2018-10-31 재단법인대구경북과학기술원 귀금속 나노입자가 도금된 다공성 수지침 및 이의 제조방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225253A (en) * 1992-04-17 1993-07-06 General Motors Corporation Method of forming silver/molybdenum surface coating material
US20110014488A1 (en) * 2004-12-17 2011-01-20 Integran Technologies, Inc. Fine-Grained Metallic Coatings Having the Coeficient of Thermal Expansion Matched to the One of the Substrate

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
US3762882A (en) * 1971-06-23 1973-10-02 Di Coat Corp Wear resistant diamond coating and method of application
GB1418108A (en) * 1972-09-12 1975-12-17 Siemens Ag Preparation of a catalytic material
SU1035655A1 (ru) * 1980-12-12 1983-08-15 Предприятие П/Я А-1955 Электрохимический управл емый резистор
JPS61248314A (ja) * 1985-04-24 1986-11-05 松下電工株式会社 接点材料の製法
US5525206A (en) * 1995-02-01 1996-06-11 Enthone-Omi, Inc. Brightening additive for tungsten alloy electroplate
JPH10302866A (ja) * 1997-04-28 1998-11-13 Harness Sogo Gijutsu Kenkyusho:Kk 嵌合型接続端子
JP2003183882A (ja) * 2001-12-11 2003-07-03 Kobe Steel Ltd 錫めっき付き電子材料
SG121757A1 (en) * 2003-02-11 2006-05-26 Agency Science Tech & Res Thin film magnetic recording media
JP2005062624A (ja) * 2003-08-18 2005-03-10 Seiko Epson Corp 反射膜及びその製造方法、カラーフィルタ及びその製造方法並びに電気光学装置用基板、電気光学装置及び電子機器
JP4176081B2 (ja) * 2005-01-19 2008-11-05 日本航空電子工業株式会社 コンタクトの製造方法
JP4823214B2 (ja) * 2005-03-22 2011-11-24 田中貴金属工業株式会社 発光素子用のリフレクター及びその製造方法、並びに該リフレクターを備える発光デバイス
US7695808B2 (en) * 2005-11-07 2010-04-13 3M Innovative Properties Company Thermal transfer coating
JP5144302B2 (ja) * 2007-02-20 2013-02-13 株式会社神戸製鋼所 反射膜積層体
US9005420B2 (en) * 2007-12-20 2015-04-14 Integran Technologies Inc. Variable property electrodepositing of metallic structures
CA2742934A1 (fr) * 2008-11-07 2010-05-14 Xtalic Corporation Bains, systemes et procedes de depot electrolytique
US8652649B2 (en) * 2009-07-10 2014-02-18 Xtalic Corporation Coated articles and methods
JP5719179B2 (ja) * 2010-01-25 2015-05-13 株式会社神戸製鋼所 反射膜積層体
US9694562B2 (en) * 2010-03-12 2017-07-04 Xtalic Corporation Coated articles and methods
JP5872492B2 (ja) * 2010-03-12 2016-03-01 エクスタリック コーポレイションＸｔａｌｉｃ Ｃｏｒｐｏｒａｔｉｏｎ 被覆物および方法
WO2013040400A1 (fr) * 2011-09-14 2013-03-21 Xtalic Corporation Articles revêtus, bains d'électrodéposition et systèmes associés

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5225253A (en) * 1992-04-17 1993-07-06 General Motors Corporation Method of forming silver/molybdenum surface coating material
US20110014488A1 (en) * 2004-12-17 2011-01-20 Integran Technologies, Inc. Fine-Grained Metallic Coatings Having the Coeficient of Thermal Expansion Matched to the One of the Substrate

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BOGUSH V ET AL: "Electroless deposition of novel Ag-W thin films", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 70, no. 2-4, November 2003 (2003-11-01), pages 489 - 494, XP004467966, ISSN: 0167-9317, DOI: 10.1016/S0167-9317(03)00414-3 *
NIKOLA RADIC ET AL: "Thin films of completely immiscible Ag-W system", CROATIAN SCIENTIFIC BIBLIOGRAPHY (CROSBI), 8 January 2008 (2008-01-08), XP055173398, Retrieved from the Internet <URL:https://bib.irb.hr/prikazi-rad?rad=316918&table=zbornik&lang=en&print=true> [retrieved on 20150303] *
See also references of WO2013040400A1 *

Also Published As

Publication number Publication date
EP2755819B1 (fr) 2016-09-14
WO2013040400A1 (fr) 2013-03-21
JP6159726B2 (ja) 2017-07-05
JP2014526615A (ja) 2014-10-06
CN106947986A (zh) 2017-07-14
CN106947986B (zh) 2019-07-19
CN104080606B (zh) 2016-12-07
EP2755819A1 (fr) 2014-07-23
CN104080606A (zh) 2014-10-01

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