EP2745399B1 - Composite piezoelectric laterally vibrating resonator - Google Patents

Composite piezoelectric laterally vibrating resonator Download PDF

Info

Publication number
EP2745399B1
EP2745399B1 EP12753636.5A EP12753636A EP2745399B1 EP 2745399 B1 EP2745399 B1 EP 2745399B1 EP 12753636 A EP12753636 A EP 12753636A EP 2745399 B1 EP2745399 B1 EP 2745399B1
Authority
EP
European Patent Office
Prior art keywords
piezoelectric material
layer
composite
resonator
mems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP12753636.5A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2745399A2 (en
Inventor
Chengjie Zuo
Changhan Yun
Jonghae Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qualcomm Inc
Original Assignee
Qualcomm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Inc filed Critical Qualcomm Inc
Publication of EP2745399A2 publication Critical patent/EP2745399A2/en
Application granted granted Critical
Publication of EP2745399B1 publication Critical patent/EP2745399B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/85Piezoelectric or electrostrictive active materials
    • H10N30/852Composite materials, e.g. having 1-3 or 2-2 type connectivity
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02007Details of bulk acoustic wave devices
    • H03H9/02015Characteristics of piezoelectric layers, e.g. cutting angles
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02228Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/05Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes
    • H10N30/057Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes by stacking bulk piezoelectric or electrostrictive bodies and electrodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/42Piezoelectric device making

Definitions

  • the present disclosure relates generally to wireless communication systems. More specifically, the present disclosure relates to systems and methods for a composite piezoelectric laterally vibrating resonator.
  • Electronic devices have become a part of everyday life. Small computing devices are now placed in everything from automobiles to housing locks. The complexity of electronic devices has increased dramatically in the last few years. For example, many electronic devices have one or more processors that help control the device, as well as a number of digital circuits to support the processor and other parts of the device.
  • Various electronic circuit components can be implemented at the electromechanical systems level, such as resonators.
  • Some conventional resonator structures provide less than desirable electrical and mechanical energy conversion. These less than desirable attributes may render such conventional resonators unfit for use in circuits, such as wideband filters.
  • electromechanical systems level resonators with improved electrical and mechanical energy conversion.
  • the document WO 2010/144728 A1 discloses a piezoelectric resonator device comprising five layers.
  • a first layer and a fifth layer include one or more metal electrodes.
  • a second layer and a fourth layer comprise a piezoelectric material.
  • a third layer comprises a metal layer.
  • the first layer metal electrodes include a first layer periodic structure along one dimension comprising one of the one or more first layer metal electrodes and a space with no first layer metal electrodes.
  • the fifth layer metal electrodes include a fifth layer periodic structure along the one dimension comprising one of the one or more fifth layer metal electrodes and a space with no fifth layer metal electrodes.
  • the document US 2008/252178 discloses a contour mode resonator comprising a first piezoelectric substrate and a second piezoelectric substrate bonded together, a first electrode provided on the top of the first piezoelectric substrate, a second electrode provided on the bottom of the second piezoelectric substrate, and a common electrode provided at an interface between the first and the second piezoelectric substrates.
  • the first and the second piezoelectric substrates have different crystallographic orientations.
  • the resonator includes multiple electrodes.
  • the resonator also includes a composite piezoelectric material that includes at least one layer of a first piezoelectric material and at least one layer of a second piezoelectric material. At least one electrode is coupled to a bottom of the composite piezoelectric material. At least one electrode is coupled to a top of the composite piezoelectric material.
  • the composite piezoelectric material includes a first layer of the first piezoelectric material and a first layer of the second piezoelectric material.
  • the first layer of the first piezoelectric material is arranged side by side with the first layer of the second piezoelectric material.
  • a first electrode is coupled to the top of both the first layer of the first piezoelectric material and the first layer of the second piezoelectric material.
  • a second electrode is coupled to the bottom of both the first layer of the first piezoelectric material and the first layer of the second piezoelectric material.
  • the resonator may be a laterally vibrating microelectromechanical system composite resonator.
  • the first piezoelectric material may have a first quality factor and a first electromechanical coupling.
  • the second piezoelectric material may have a second quality factor and a second electromechanical coupling.
  • the composite piezoelectric material may have a composite quality factor and a composite electromechanical coupling.
  • the composite quality factor and the composite electromechanical coupling may depend on a volume ratio in the composite piezoelectric material between the first piezoelectric material and the second piezoelectric material.
  • the composite quality factor and the composite electromechanical coupling may instead depend on a thickness ratio in the composite piezoelectric material between a first thickness of a first layer of the first piezoelectric material and a second thickness of a first layer of the second piezoelectric material.
  • the first layer of the first piezoelectric material may be stacked on top of the first layer of the second piezoelectric material but such a resonator is not a subject of the present invention.
  • the composite piezoelectric material may also include a second layer of the first piezoelectric material.
  • the first layer of the second piezoelectric material may be stacked on top of the second layer of the first piezoelectric material but such a resonator is not a subject of the present invention.
  • the composite piezoelectric material may further include a second layer of the second piezoelectric material.
  • the second layer of the first piezoelectric material may be stacked on top of the second layer of the second piezoelectric material but such a resonator is not a subject of the present invention.
  • the first layer of the second piezoelectric material may be sandwiched between the first layer of the first piezoelectric material and the second layer of the first piezoelectric material.
  • the second layer of the first piezoelectric material may be sandwiched between the first layer of the second piezoelectric material and the second layer of the second piezoelectric material.
  • the composite piezoelectric material may translate input signals from one or more input electrodes into mechanical vibrations.
  • the mechanical vibrations may be translated to an output signal from one or more output electrodes.
  • the first piezoelectric material may be aluminum nitride and the second piezoelectric material may be zinc oxide.
  • the first piezoelectric material may be aluminum nitride and the second piezoelectric material may be lead zirconate titanate.
  • the composite piezoelectric material may have a high enough composite quality factor and composite electromechanical coupling for use in wideband filter applications.
  • a method for generating a resonator which is not a subject of the present invention is also described.
  • a desired quality factor for the resonator is determined.
  • a desired electromechanical coupling for the resonator is also determined.
  • a first piezoelectric material and a second piezoelectric material are selected for use in the resonator.
  • a volume ratio between the first piezoelectric material and the second piezoelectric material is adjusted to obtain a composite piezoelectric material with the desired quality factor and the desired electromechanical coupling.
  • the resonator is generated using the composite piezoelectric material.
  • the apparatus includes means for determining a desired quality factor for the resonator.
  • the apparatus also includes means for determining a desired electromechanical coupling for the resonator.
  • the apparatus further includes means for selecting a first piezoelectric material and a second piezoelectric material for use in the resonator.
  • the apparatus also includes means for adjusting a volume ratio between the first piezoelectric material and the second piezoelectric material to obtain a composite piezoelectric material with the desired quality factor and the desired electromechanical coupling.
  • the apparatus further includes means for generating the resonator using the composite piezoelectric material.
  • a computer-program product for generating a resonator which is not a subject of the present invention includes a non-transitory computer-readable medium having instructions thereon.
  • the instructions include code for causing an apparatus to determine a desired quality factor for the resonator.
  • the instructions also include code for causing the apparatus to determine a desired electromechanical coupling for the resonator.
  • the instructions further include code for causing the apparatus to select a first piezoelectric material and a second piezoelectric material for use in the resonator.
  • the instructions also include code for causing the apparatus to adjust a volume ratio between the first piezoelectric material and the second piezoelectric material to obtain a composite piezoelectric material with the desired quality factor and the desired electromechanical coupling.
  • the instructions further include code for causing the apparatus to generate the resonator using the composite piezoelectric material.
  • FIG 1 is a block diagram illustrating a laterally vibrating microelectromechanical system (MEMS) composite resonator 104.
  • MEMS microelectromechanical system
  • An electromechanical systems resonator device is a contour mode resonator (CMR).
  • a contour mode resonator (CMR) has substantially lateral and in-plane modes of vibration.
  • a laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may thus be one configuration of a contour mode resonator (CMR).
  • a laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may include multiple conductive electrodes 106 with a composite piezoelectric material 108 sandwiched between the electrodes 106.
  • the electrodes 106 may include one or more input electrodes 106 coupled to an input port and one or more output electrodes 106 coupled to an output port.
  • Ground electrodes 106 may be interdigitated among the input and output electrodes 106.
  • laterally vibrating refers to single-chip multi-frequency operation, in contrast with conventional quartz crystal and film bulk acoustic wave resonator (FBAR) technologies for which only one center frequency is allowed per wafer.
  • FBAR quartz crystal and film bulk acoustic wave resonator
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 structure may be suspended in a cavity that includes specially designed tethers coupling the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 structure to a supporting structure. These tethers may be fabricated in the layer stack of the resonator 104 structure.
  • the resonator 104 structure can be acoustically isolated from the surrounding structural support and other components by virtue of the cavity.
  • MEMS microelectromechanical system
  • wireless communication device refers to an electronic device that may be used for voice and/or data communication over a wireless communication network. Examples of wireless communication devices include cellular phones, handheld wireless devices, wireless modems, laptop computers, personal computers, etc.
  • a wireless communication device may alternatively be referred to as an access terminal, a mobile terminal, a subscriber station, a remote station, a user terminal, a terminal, a subscriber unit, user equipment, a mobile station, etc.
  • a wireless communication network may provide communication for a number of wireless communication devices, each of which may be serviced by a base station.
  • a base station may alternatively be referred to as an access point, a Node B, or some other terminology.
  • Base stations and wireless communication devices may make use of laterally vibrating microelectromechanical system (MEMS) composite resonators 104.
  • MEMS microelectromechanical system
  • many different kinds of electronic devices in addition to the wireless devices mentioned, may make use of laterally vibrating microelectromechanical system (MEMS) composite resonators 104.
  • the resonant frequency of a contour mode resonator such as the laterally vibrating microelectromechanical system (MEMS) composite resonator 104, may be substantially controlled by engineering the lateral dimensions of the composite piezoelectric material 108 and the electrodes 106.
  • CMR contour mode resonator
  • MEMS microelectromechanical system
  • One benefit of such a construction is that multi-frequency RF filters, clock oscillators, transducers or other devices that each include one or more contour mode resonators (CMRs) can be fabricated on the same substrate. This may be advantageous in terms of cost and size by enabling compact, multi-band filter solutions for RF front-end applications on a single chip.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may provide the advantages of compact size (e.g., 100 micrometers ( ⁇ m) in length and/or width), low power consumption and compatibility with high-yield mass-producible components.
  • a single piezoelectric material is used in a resonator.
  • a single piezoelectric material may be used in a single-port or two-port laterally vibrating resonator.
  • a single piezoelectric material may be used in a one-port piezoelectric-on-substrate laterally vibrating resonator (for all types of electrode 106 configurations).
  • Different piezoelectric materials may be used as the single piezoelectric material.
  • the single piezoelectric material may be aluminum nitride (AlN).
  • AlN may have a high quality factor (Q) 112, resulting in low motional resistance and low filter insertion loss.
  • Q quality factor
  • AlN may have a limited transverse piezoelectric coefficient (d 31 ) 114, resulting in limited electromechanical coupling (kt 2 ) 116.
  • MEMS microelectromechanical systems
  • the single piezoelectric material may be zinc oxide (ZnO) or lead zirconate titanate (PZT).
  • ZnO and PZT have a relatively larger transverse piezoelectric coefficient (d 31 ) 114 and electromechanical coupling (kt 2 ) 116 (especially for PZT) than AlN, making their use in wideband filter applications more ideal.
  • d 31 transverse piezoelectric coefficient
  • kt 2 electromechanical coupling
  • ZnO and PZT have a low quality factor (Q) 112 and therefore have a large motional resistance and a large filter insertion loss.
  • the single piezoelectric material may be ZnO, AlN, PZT or other piezoelectric material and the substrate may be silicon, diamond or other non-piezoelectric material.
  • the resonator body may mainly be the non-piezoelectric substrate. Therefore, the effective composite electromechanical coupling (kt 2 ) 116 is small and unfavorable for wideband filter applications.
  • a one-port piezoelectric-on-substrate laterally vibrating resonator may have a high quality factor (Q) 112 and low insertion loss for narrowband filters (e.g., a fractional filter bandwidth ⁇ 1%).
  • the composite piezoelectric material 108 may include a first piezoelectric material 110a and a second piezoelectric material 110b.
  • the first piezoelectric material 110a and the second piezoelectric material 110b may each form one or more layers.
  • the layers may be coupled to each other or separated by an electrode 106 (such as a ground electrode 106).
  • an electrode 106 such as a ground electrode 106.
  • Different configurations for the layers of the first piezoelectric material 110a and the second piezoelectric material 110b may be used (along with the corresponding electrode 106 layers as needed for different electrode 106 configurations).
  • a layer of the first piezoelectric material 110a may be placed directly on top of a layer of the second piezoelectric material 110b.
  • the main resonator body may be only the composite piezoelectric material 108.
  • the first piezoelectric material 110a may be AlN and the second piezoelectric material 110b may be PZT or ZnO.
  • additional piezoelectric materials not mentioned herein may also be used as either the first piezoelectric material 110a or the second piezoelectric material 110b.
  • the first piezoelectric material 110a may have a quality factor (Q) 112a, a transverse piezoelectric coefficient (d 31 ) 114a and an electromechanical coupling (kt 2 ) 116a.
  • the second piezoelectric material 110b may have a quality factor (Q) 112b, a transverse piezoelectric coefficient (d 31 ) 114b and an electromechanical coupling (kt 2 ) 116b.
  • the composite piezoelectric material 108 may have a composite quality factor (Q) 118, a composite transverse piezoelectric coefficient (d 31 ) 120 and a composite electromechanical coupling (kt 2 ) 122.
  • the composite quality factor (Q) 118, composite transverse piezoelectric coefficient (d 31 ) 120 and composite electromechanical coupling (kt 2 ) 122 may be designed based on the volume ratio 126 and/or the thickness ratio 124 of the first piezoelectric material 110a and the second piezoelectric material 110b.
  • the first piezoelectric material 110a may be AlN (with a high quality factor (Q) 112) and the second piezoelectric material 110b may be ZnO (with a high electromechanical coupling (kt 2 ) 116).
  • the composite piezoelectric material 108 may then have a composite quality factor (Q) 118 that is sufficient for wideband filter applications and a composite electromechanical coupling (kt 2 ) 122 that is sufficient for wideband filter applications.
  • the composite piezoelectric material 108 may translate input signal(s) from one or more electrodes 106 into mechanical vibration, which can then be translated to the output signal(s). These mechanical vibrations may be the resonant frequency of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104. Based on finger widths of the electrodes 106, the resonant frequencies of the structure may be controlled.
  • the fundamental frequency for the displacement of the composite piezoelectric material 108 can be set in part lithographically by the planar dimensions of the electrodes 106 and/or the layer of the composite piezoelectric material 108.
  • An AC electric field applied across the electrodes 106 may induce mechanical deformations in one or more planes of the composite piezoelectric material 108 via the composite transverse piezoelectric coefficient (d 31 ) 120 or composite longitudinal piezoelectric coefficient (d 33 ) 127.
  • the electrical signal across the device is reinforced and the device behaves as an electronic resonator circuit.
  • the total width multiplied by the total length of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may be set to control the impedance of the resonator structure.
  • a suitable thickness of the composite piezoelectric material 108 may be 0.01 to 10 micrometers ( ⁇ m) thick.
  • a composite piezoelectric material 108 may apply to all different electrode 106 configurations that have been demonstrated for single-piezoelectric or piezoelectric-on-substrate resonators. With more layers of piezoelectric materials 110 and metal layers, other new electrode 106 configurations may also be developed.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may be used to synthesize wideband (with a fractional bandwidth > 3%) filters at various center frequencies (from 10 megahertz (MHz) up to microwave frequencies) on the same chip for multi-band/multi-mode wireless communications, which is not achievable using existing technology.
  • Multiple laterally vibrating microelectromechanical system (MEMS) composite resonators 104 may be electrically (e.g., in a ladder, lattice or self-coupling topology) and/or mechanically coupled to synthesize high-order bandpass filters with different center frequencies and bandwidths (narrow or wide) on a single chip.
  • excitation schemes e.g., thickness field excitation and lateral field excitation
  • vibration modes width-extensional, length-extensional, thickness-extensional, Lamb wave, shear mode, etc.
  • MEMS microelectromechanical system
  • the piezoelectric materials 110 used in a composite piezoelectric material 108 may be fabricated on top of one another or side by side.
  • separate single-piezoelectric resonators with different piezoelectric materials 110 may be fabricated next to each other (or even side by side) on the same chip to obtain the composite piezoelectric material 108 for the laterally vibrating microelectromechanical system (MEMS) composite resonator 104.
  • MEMS microelectromechanical system
  • multiple resonators may be electrically connected in parallel or mechanically coupled to realize the laterally vibrating microelectromechanical system (MEMS) composite resonator 104.
  • single-device multi-frequency operation can also be designed in a laterally vibrating microelectromechanical system (MEMS) composite resonator 104 that includes a composite piezoelectric material 108.
  • MEMS microelectromechanical system
  • FIG 2 illustrates an exemplary laterally vibrating microelectromechanical system (MEMS) composite resonator 204 which is not a subject of the present invention.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 204 of Figure 2 may be one configuration of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 of Figure 1 .
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 204 may include a composite piezoelectric material 208 that includes a layer 210a of a first piezoelectric material 110a and a layer 210b of a second piezoelectric material 110b.
  • the layer 210a of the first piezoelectric material 110a may be directly on top of the layer 210b of the second piezoelectric material 110b.
  • a first electrode 206a may be coupled to the layer 210a of the first piezoelectric material 110a and a second electrode 206b may be coupled to the layer 210b of the second piezoelectric material 110b.
  • Figure 3 illustrates graphs 328a-c of simulation results for three different resonators.
  • the first graph 328a illustrates simulation results for a resonator with AlN used as the single piezoelectric material 110.
  • the second graph 328b illustrates simulation results for a resonator with ZnO used as the single piezoelectric material 110.
  • the third graph 328c illustrates simulation results for a laterally vibrating microelectromechanical system (MEMS) composite resonator 104 with AlN used as the first piezoelectric material 110a and ZnO as the second piezoelectric material 110b.
  • MEMS microelectromechanical system
  • the resonant frequency fs is 2 GHz
  • the quality factor (Q) 112 is 2000
  • the electromechanical coupling (kt 2 ) 116 is 3%
  • the resonant frequency fs is 2 GHz
  • the quality factor (Q) 112 is 500
  • the electromechanical coupling (kt 2 ) 116 is 8%.
  • the resonator with AlN used as the single piezoelectric material 110 has a high quality factor (Q) 112 and a low electromechanical coupling (kt 2 ) 116 while the resonator with ZnO used as the single piezoelectric material 110 has a low quality factor (Q) 112 and a high electromechanical coupling (kt 2 ) 116.
  • MEMS microelectromechanical system
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 has the advantage of the AlN resonator in terms of high composite quality factor (Q) 118 and the advantage of the ZnO resonator in terms of high composite electromechanical coupling (kt 2 ) 122.
  • FIG 4 is a flow diagram of a method 400 for generating a laterally vibrating microelectromechanical system (MEMS) composite resonator 104.
  • the method 400 may be performed by an engineer, a technician or a computer. In one configuration, the method 400 may be performed by a fabrication machine.
  • MEMS microelectromechanical system
  • a desired quality factor (Q) (i.e., a composite quality factor (Q) 118) for a laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may be determined 402.
  • a desired electromechanical coupling (kt 2 ) (composite electromechanical coupling (kt 2 ) 122) for the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may also be determined 404.
  • a first piezoelectric material 110a and a second piezoelectric material 110b may be selected 406 for the laterally vibrating microelectromechanical system (MEMS) composite resonator 104.
  • a thickness ratio 124 (or volume ratio 126) between the first piezoelectric material 110a and the second piezoelectric material 110b may be adjusted 408 to obtain a composite piezoelectric material 108 with the desired quality factor (Q) and the desired electromechanical coupling (kt 2 ).
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 may then be generated 410 using the composite piezoelectric material 108.
  • MEMS microelectromechanical system
  • FIG 5 illustrates another exemplary laterally vibrating microelectromechanical system (MEMS) composite resonator 504 which is not a subject of the present invention.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 504 of Figure 5 may be one configuration of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 of Figure 1 .
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 504 may include a composite piezoelectric material 508 that includes a layer 510a of a first piezoelectric material 110a (ZnO or PZT) and a layer 510b of a second piezoelectric material 110b (AlN).
  • the layer 510a of the first piezoelectric material 110a may be coupled to the layer 510b of the second piezoelectric material 110b via a ground (GND) layer.
  • Multiple input and output electrodes 506a-d may be coupled to the layer 510a of the first piezoelectric material 110a.
  • Multiple input and output electrodes 506e-h may also be coupled to the layer 510b of the second piezoelectric material 110b.
  • the layer 510a of the first piezoelectric material 110a may have a thickness of T1 530a and the layer 510b of the second piezoelectric material 110b may have a thickness of T2 530b.
  • the composite quality factor (Q) 118 and the composite electromechanical coupling (kt 2 ) 122 of the composite piezoelectric material 508 may be adjusted.
  • the thickness T1 530a may be increased relative to the thickness T2 530b.
  • FIG 6 illustrates yet another exemplary laterally vibrating microelectromechanical system (MEMS) composite resonator 604 which is not a subject of the present invention.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 604 of Figure 6 may be one configuration of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 of Figure 1 .
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 604 may include a composite piezoelectric material 608 that includes a layer 610a of a first piezoelectric material 110a (AlN) and a layer 610b of a second piezoelectric material 110b (ZnO or PZT).
  • the layer 610a of the first piezoelectric material 110a may be coupled to the layer 610b of the second piezoelectric material 110b.
  • a first electrode 606a may be coupled to the layer 610a of the first piezoelectric material 110a and a second electrode 606b may be coupled to the layer 610b of the second piezoelectric material 110b.
  • the first piezoelectric material 110a may have a first volume and the second piezoelectric material 110b may have a second volume.
  • the composite quality factor (Q) 118 and the composite electromechanical coupling (kt 2 ) 122 of the composite piezoelectric material 608 may be adjusted.
  • the first piezoelectric material 110a has a high quality factor (Q) 112a but a low electromechanical coupling (kt 2 ) 116a and a higher composite quality factor (Q) 118 is desired (at the expense of composite electromechanical coupling (kt 2 ) 122)
  • the first volume may be increased relative to the second volume.
  • FIG. 7 is a block diagram illustrating a laterally vibrating microelectromechanical system (MEMS) composite resonator 704 with three vertical layers 710a-c of piezoelectric material 110.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 704 of Figure 7 may be one configuration of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 of Figure 1 .
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 704 may include a composite piezoelectric material 708 that includes a first layer 710a of a first piezoelectric material 110a, a layer 710b of a second piezoelectric material 110b and a second layer 710c of the first piezoelectric material 110a.
  • MEMS microelectromechanical system
  • the layer 710b of the second piezoelectric material 110b may be sandwiched between the first layer 710a of the first piezoelectric material 110a and the second layer 710c of the first piezoelectric material 110a (i.e., the first layer 710a of the first piezoelectric material 110a may be directly above the layer 710b of the second piezoelectric material 110b and the second layer 710c of the first piezoelectric material 110a may be directly below the layer 710b of the second piezoelectric material 110b).
  • a first electrode 706a may be coupled to the first layer 710a of the first piezoelectric material 110a.
  • a second electrode 706b may be coupled to the second layer 710c of the first piezoelectric material 110a.
  • the first piezoelectric material 110a may have a first volume (from both the first layer 710a of the first piezoelectric material 110a and the second layer 710c of the first piezoelectric material 110a) and the second piezoelectric material 110b may have a second volume (from the layer 710b of the second piezoelectric material 110b).
  • the composite quality factor (Q) 118 and the composite electromechanical coupling (kt 2 ) 122 of the composite piezoelectric material 708 may be adjusted.
  • the first volume may be increased relative to the second volume.
  • FIG 8 is a block diagram illustrating a laterally vibrating microelectromechanical system (MEMS) composite resonator 804 according to embodiments of the present invention, with four horizontal layers 810a-d of piezoelectric material 110.
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 804 of Figure 8 may be one configuration of the laterally vibrating microelectromechanical system (MEMS) composite resonator 104 of Figure 1 .
  • the laterally vibrating microelectromechanical system (MEMS) composite resonator 804 includes a composite piezoelectric material 808 that includes a first piezoelectric material 110a and a second piezoelectric material 110b.
  • the composite piezoelectric material 808 includes a first piezoelectric material first layer 810a and a second piezoelectric material first layer 810b, and may also include a first piezoelectric material second layer 810c and a second piezoelectric material second layer 810d.
  • the second piezoelectric material first layer 810b may be sandwiched between the first piezoelectric material first layer 810a and the first piezoelectric material second layer 810c.
  • the first piezoelectric material second layer 810c may be sandwiched between the second piezoelectric material first layer 810b and the second piezoelectric material second layer 810d.
  • a first electrode 806a is coupled to the top of the first piezoelectric material first layer 810a and the second piezoelectric material first layer 810b, and may also be coupled to the top of the first piezoelectric material second layer 810c and the second piezoelectric material second layer 810d.
  • a second electrode 806b is coupled to the bottom of the first piezoelectric material first layer 810a and the second piezoelectric material first layer 810b, and may also be coupled to the bottom of the first piezoelectric material second layer 810c and the second piezoelectric material second layer 810d.
  • the first piezoelectric material 110a may have a first volume (from both the first piezoelectric material first layer 810a and the first piezoelectric material second layer 810c) and the second piezoelectric material 110b may have a second volume (from both the second piezoelectric material first layer 810c and the second piezoelectric material second layer 810d).
  • the composite quality factor (Q) 118 and the composite electromechanical coupling (kt 2 ) 122 of the composite piezoelectric material 808 may be adjusted.
  • the first volume may be increased relative to the second volume.
  • FIG. 9 illustrates certain components that may be included within an electronic device/wireless device 902.
  • the electronic device/wireless device 902 may be an access terminal, a mobile station, a wireless communication device, a base station, a Node B, a handheld electronic device, etc.
  • the electronic device/wireless device 902 includes a processor 903.
  • the processor 903 may be a general purpose single- or multichip microprocessor (e.g., an ARM), a special purpose microprocessor (e.g., a digital signal processor (DSP)), a microcontroller, a programmable gate array, etc.
  • the processor 903 may be referred to as a central processing unit (CPU).
  • CPU central processing unit
  • the electronic device/wireless device 902 also includes memory 905.
  • the memory 905 may be any electronic component capable of storing electronic information.
  • the memory 905 may be embodied as random access memory (RAM), read-only memory (ROM), magnetic disk storage media, optical storage media, flash memory devices in RAM, on-board memory included with the processor, EPROM memory, EEPROM memory, registers, and so forth, including combinations thereof.
  • Data 909a and instructions 907a may be stored in the memory 905.
  • the instructions 907a may be executable by the processor 903 to implement the methods disclosed herein. Executing the instructions 907a may involve the use of the data 909a that is stored in the memory 905.
  • various portions of the instructions 907b may be loaded onto the processor 903, and various pieces of data 909b may be loaded onto the processor 903.
  • the electronic device/wireless device 902 may also include a transmitter 911 and a receiver 913 to allow transmission and reception of signals to and from the electronic device/wireless device 902.
  • the transmitter 911 and receiver 913 may be collectively referred to as a transceiver 915.
  • An antenna 917 may be electrically coupled to the transceiver 915.
  • the electronic device/wireless device 902 may also include (not shown) multiple transmitters, multiple receivers, multiple transceivers and/or multiple antennas.
  • the electronic device/wireless device 902 may include a digital signal processor (DSP) 921.
  • the electronic device/wireless device 902 may also include a communications interface 923.
  • the communications interface 923 may allow a user to interact with the electronic device/wireless device 902.
  • the various components of the electronic device/wireless device 902 may be coupled together by one or more buses, which may include a power bus, a control signal bus, a status signal bus, a data bus, etc.
  • buses may include a power bus, a control signal bus, a status signal bus, a data bus, etc.
  • the various buses are illustrated in Figure 9 as a bus system 919.
  • OFDMA Orthogonal Frequency Division Multiple Access
  • SC-FDMA Single-Carrier Frequency Division Multiple Access
  • An OFDMA system utilizes orthogonal frequency division multiplexing (OFDM), which is a modulation technique that partitions the overall system bandwidth into multiple orthogonal sub-carriers. These sub-carriers may also be called tones, bins, etc. With OFDM, each sub-carrier may be independently modulated with data.
  • OFDM orthogonal frequency division multiplexing
  • An SC-FDMA system may utilize interleaved FDMA (IFDMA) to transmit on sub-carriers that are distributed across the system bandwidth, localized FDMA (LFDMA) to transmit on a block of adjacent sub-carriers, or enhanced FDMA (EFDMA) to transmit on multiple blocks of adjacent sub-carriers.
  • IFDMA interleaved FDMA
  • LFDMA localized FDMA
  • EFDMA enhanced FDMA
  • modulation symbols are sent in the frequency domain with OFDM and in the time domain with SC-FDMA.
  • determining encompasses a wide variety of actions and, therefore, “determining” can include calculating, computing, processing, deriving, investigating, looking up (e.g., looking up in a table, a database or another data structure), ascertaining and the like. Also, “determining” can include receiving (e.g., receiving information), accessing (e.g., accessing data in a memory) and the like. Also, “determining” can include resolving, selecting, choosing, establishing and the like.
  • processor should be interpreted broadly to encompass a general purpose processor, a central processing unit (CPU), a microprocessor, a digital signal processor (DSP), a controller, a microcontroller, a state machine, and so forth. Under some circumstances, a “processor” may refer to an application specific integrated circuit (ASIC), a programmable logic device (PLD), a field programmable gate array (FPGA), etc.
  • ASIC application specific integrated circuit
  • PLD programmable logic device
  • FPGA field programmable gate array
  • processor may refer to a combination of processing devices, e.g., a combination of a DSP and a microprocessor, a plurality of microprocessors, one or more microprocessors in conjunction with a DSP core, or any other such configuration.
  • memory should be interpreted broadly to encompass any electronic component capable of storing electronic information.
  • the term memory may refer to various types of processor-readable media such as random access memory (RAM), read-only memory (ROM), non-volatile random access memory (NVRAM), programmable read-only memory (PROM), erasable programmable read-only memory (EPROM), electrically erasable PROM (EEPROM), flash memory, magnetic or optical data storage, registers, etc.
  • RAM random access memory
  • ROM read-only memory
  • NVRAM non-volatile random access memory
  • PROM programmable read-only memory
  • EPROM erasable programmable read-only memory
  • EEPROM electrically erasable PROM
  • flash memory magnetic or optical data storage, registers, etc.
  • instructions and “code” should be interpreted broadly to include any type of computer-readable statement(s).
  • the terms “instructions” and “code” may refer to one or more programs, routines, sub-routines, functions, procedures, etc.
  • “Instructions” and “code” may comprise a single computer-readable statement or many computer-readable statements.
  • a computer-readable medium or “computer-program product” refers to any tangible storage medium that can be accessed by a computer or a processor.
  • a computer-readable medium may include RAM, ROM, EEPROM, CD-ROM or other optical disk storage, magnetic disk storage or other magnetic storage devices, or any other medium that can be used to carry or store desired program code in the form of instructions or data structures and that can be accessed by a computer.
  • Disk and disc includes compact disc (CD), laser disc, optical disc, digital versatile disc (DVD), floppy disk and Blu-ray® disc where disks usually reproduce data magnetically, while discs reproduce data optically with lasers.
  • a computer-readable medium may be tangible and non-transitory.
  • the term "computer-program product” refers to a computing device or processor in combination with code or instructions (e.g., a "program”) that may be executed, processed or computed by the computing device or processor.
  • code may refer to software, instructions, code or data that is/are executable by a computing device or processor.
  • the methods disclosed herein comprise one or more steps or actions for achieving the described method.
  • the method steps and/or actions may be interchanged with one another without departing from the scope of the claims.
  • the order and/or use of specific steps and/or actions may be modified without departing from the scope of the claims.
  • modules and/or other appropriate means for performing the methods and techniques described herein can be downloaded and/or otherwise obtained by a device.
  • a device may be coupled to a server to facilitate the transfer of means for performing the methods described herein.
  • various methods described herein can be provided via a storage means (e.g., random access memory (RAM), read-only memory (ROM), a physical storage medium such as a compact disc (CD) or floppy disk, etc.), such that a device may obtain the various methods upon coupling or providing the storage means to the device.
  • RAM random access memory
  • ROM read-only memory
  • CD compact disc
  • floppy disk floppy disk

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Micromachines (AREA)
EP12753636.5A 2011-08-19 2012-08-20 Composite piezoelectric laterally vibrating resonator Active EP2745399B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161525607P 2011-08-19 2011-08-19
US13/587,618 US9406865B2 (en) 2011-08-19 2012-08-16 Composite piezoelectric laterally vibrating resonator
PCT/US2012/051626 WO2013028638A2 (en) 2011-08-19 2012-08-20 Composite piezoelectric laterally vibrating resonator

Publications (2)

Publication Number Publication Date
EP2745399A2 EP2745399A2 (en) 2014-06-25
EP2745399B1 true EP2745399B1 (en) 2019-07-10

Family

ID=46763194

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12753636.5A Active EP2745399B1 (en) 2011-08-19 2012-08-20 Composite piezoelectric laterally vibrating resonator

Country Status (8)

Country Link
US (1) US9406865B2 (zh)
EP (1) EP2745399B1 (zh)
JP (3) JP5951774B2 (zh)
KR (1) KR101736446B1 (zh)
CN (1) CN104040886B (zh)
ES (1) ES2744447T3 (zh)
HU (1) HUE044983T2 (zh)
WO (1) WO2013028638A2 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9331666B2 (en) 2012-10-22 2016-05-03 Qualcomm Mems Technologies, Inc. Composite dilation mode resonators
US20160352307A1 (en) * 2015-05-27 2016-12-01 Murata Manufacturing Co., Ltd. Mems resonator with high quality factor
US10432162B2 (en) 2016-03-31 2019-10-01 Avago Technologies International Sales Pte. Limited Acoustic resonator including monolithic piezoelectric layer having opposite polarities
CN111490740B (zh) * 2019-01-29 2023-01-10 中国科学院半导体研究所 阵列化的分布式兰姆模态射频微机电谐振器
WO2021021719A1 (en) * 2019-07-31 2021-02-04 QXONIX Inc. Bulk acoustic wave (baw) resonator structures, devices and systems

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB865093A (en) * 1956-04-23 1961-04-12 Toyo Tsushinki Kabushiki Kaish Electro-mechanical filters
US4703287A (en) * 1985-08-22 1987-10-27 United Technologies Corporation Phase modulator for fiber-optic sensors
JPH02222584A (ja) * 1989-02-23 1990-09-05 Yokogawa Electric Corp バイモルフアクチュエータ
JPH07254836A (ja) * 1994-03-15 1995-10-03 Matsushita Electric Ind Co Ltd 圧電振動子
US5910756A (en) * 1997-05-21 1999-06-08 Nokia Mobile Phones Limited Filters and duplexers utilizing thin film stacked crystal filter structures and thin film bulk acoustic wave resonators
JPH118111A (ja) 1997-06-17 1999-01-12 Tdk Corp バルントランス用コア材料、バルントランス用コアおよびバルントランス
JP3531522B2 (ja) 1999-04-19 2004-05-31 株式会社村田製作所 圧電共振子
JP3514224B2 (ja) 1999-11-11 2004-03-31 株式会社村田製作所 圧電共振子、フィルタ及び電子機器
US6452310B1 (en) 2000-01-18 2002-09-17 Texas Instruments Incorporated Thin film resonator and method
JP3741027B2 (ja) * 2001-01-10 2006-02-01 株式会社村田製作所 振動子およびそれを用いた振動ジャイロおよびそれを用いた電子装置
JP2003051732A (ja) 2001-08-08 2003-02-21 Murata Mfg Co Ltd 圧電共振子、フィルタおよび電子通信機器
DE10149542A1 (de) 2001-10-08 2003-04-17 Infineon Technologies Ag BAW-Resonator
US6987348B2 (en) * 2002-12-13 2006-01-17 Palo Alto Research Center Inc. Piezoelectric transducers
DE102004049498A1 (de) 2004-10-11 2006-04-13 Epcos Ag Mit akustischen Wellen arbeitendes Bauelement und Verfahren zu dessen Herstellung
JP4691395B2 (ja) 2005-05-30 2011-06-01 株式会社日立メディアエレクトロニクス バルク弾性波共振器、バルク弾性波共振器を用いたフィルタ、それを用いた高周波モジュール、並びにバルク弾性波共振器を用いた発振器
JP4910390B2 (ja) 2005-12-26 2012-04-04 株式会社村田製作所 圧電セラミックおよびその製造方法ならびに圧電共振子およびその製造方法
JP2007312164A (ja) 2006-05-19 2007-11-29 Hitachi Ltd 圧電薄膜共振器並びにそれを用いた高周波フィルタ及び高周波モジュール
CN101501990B (zh) 2006-08-03 2012-03-14 松下电器产业株式会社 频率可变声音薄膜谐振器、滤波器以及使用滤波器的通信装置
US7687971B2 (en) 2006-08-15 2010-03-30 Northrop Grumman Corporation Electric field control of surface acoustic wave velocity
US7999442B2 (en) * 2006-12-22 2011-08-16 Seiko Instruments Inc. Piezoelectric actuator and electronics device using the same
JP2008172711A (ja) 2007-01-15 2008-07-24 Hitachi Media Electoronics Co Ltd 薄膜バルク弾性波共振器およびフィルタおよびそれを用いた高周波モジュール
JP2008210895A (ja) 2007-02-23 2008-09-11 Matsushita Electric Works Ltd 圧電体薄膜の製造方法、共振装置およびそれを用いたuwb用フィルタ
JP2008211392A (ja) * 2007-02-23 2008-09-11 Matsushita Electric Works Ltd 共振器及びその製造方法
US7834526B2 (en) 2007-04-10 2010-11-16 Seiko Epson Corporation Contour resonator
KR101289982B1 (ko) * 2009-01-09 2013-07-26 다이요 유덴 가부시키가이샤 필터 소자, 분파기 및 전자 장치
US8513863B2 (en) * 2009-06-11 2013-08-20 Qualcomm Mems Technologies, Inc. Piezoelectric resonator with two layers
US20110304412A1 (en) 2010-06-10 2011-12-15 Hao Zhang Acoustic Wave Resonators and Methods of Manufacturing Same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

Also Published As

Publication number Publication date
JP6189386B2 (ja) 2017-08-30
HUE044983T2 (hu) 2019-11-28
JP2016158268A (ja) 2016-09-01
WO2013028638A2 (en) 2013-02-28
JP2016028487A (ja) 2016-02-25
US20130214643A1 (en) 2013-08-22
JP5951774B2 (ja) 2016-07-13
WO2013028638A3 (en) 2013-04-18
KR20140049076A (ko) 2014-04-24
CN104040886B (zh) 2016-10-26
EP2745399A2 (en) 2014-06-25
CN104040886A (zh) 2014-09-10
ES2744447T3 (es) 2020-02-25
KR101736446B1 (ko) 2017-05-16
US9406865B2 (en) 2016-08-02
JP2014529241A (ja) 2014-10-30

Similar Documents

Publication Publication Date Title
Satoh et al. Development of piezoelectric thin film resonator and its impact on future wireless communication systems
US10469053B2 (en) Elastic wave device and manufacturing method for the same
EP2745399B1 (en) Composite piezoelectric laterally vibrating resonator
US11699988B2 (en) Resonator and method for manufacturing the same
US9093979B2 (en) Laterally-coupled acoustic resonators
CN102931942B (zh) 声波器件
CN102801400A (zh) 膜体声波谐振器、滤波器、双工器和模块
JP2013214954A (ja) 共振子、周波数フィルタ、デュプレクサ、電子機器及び共振子の製造方法
JP4468185B2 (ja) 等しい共振周波数を有する共振器フィルタ構造体
JP2008507869A (ja) 体積音波によって作動する共振器
CN111555733A (zh) 一种兰姆波谐振器结构及其制备方法
Gong et al. High electromechanical coupling MEMS resonators at 530 MHz using ion sliced X-cut LiNbO 3 thin film
JP2005538643A (ja) バルク弾性波フィルタにおける通過帯域リップルを抑制する手段を有するバルク弾性波共振器
JP2005277454A (ja) 圧電共振器およびそれを備えた電子部品
CN210273998U (zh) 一种空腔内设置缓冲支撑结构的薄膜体声波谐振器及通信器件
CN204810241U (zh) 声波谐振器
US20140055214A1 (en) Multi-mode bandpass filter
JP2009188939A (ja) 薄膜バルク波共振器
JP2022513852A (ja) 圧電材料および圧電デバイス
JP2021136613A (ja) 圧電薄膜共振器、フィルタおよびマルチプレクサ
Hashimoto BAW piezoelectric resonators
CN104917487B (zh) 共振滤波器
US20130120082A1 (en) Two-port resonators electrically coupled in parallel
CN116192074A (zh) 异质集成弹性波滤波器和射频芯片
Chu et al. Influence of different piezoelectric materials and thicknesses on the performance of stacked crystal film bulk acoustic wave filters

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20140317

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
RIC1 Information provided on ipc code assigned before grant

Ipc: H03H 9/02 20060101AFI20181219BHEP

Ipc: H01L 41/18 20060101ALI20181219BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20190131

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

Ref country code: AT

Ref legal event code: REF

Ref document number: 1154568

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190715

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602012061906

Country of ref document: DE

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: NL

Ref legal event code: FP

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: HU

Ref legal event code: AG4A

Ref document number: E044983

Country of ref document: HU

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1154568

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190710

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191111

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191010

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191010

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2744447

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20200225

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191110

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191011

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190820

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200224

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20190831

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602012061906

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG2D Information on lapse in contracting state deleted

Ref country code: IS

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190820

26N No opposition filed

Effective date: 20200603

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190710

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20230720

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20230810

Year of fee payment: 12

Ref country code: GB

Payment date: 20230712

Year of fee payment: 12

Ref country code: FI

Payment date: 20230727

Year of fee payment: 12

Ref country code: ES

Payment date: 20230906

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: HU

Payment date: 20230726

Year of fee payment: 12

Ref country code: FR

Payment date: 20230710

Year of fee payment: 12

Ref country code: DE

Payment date: 20230711

Year of fee payment: 12