EP2711441B1 - Dispositif et procédé destinés à la production d'un système de couches - Google Patents

Dispositif et procédé destinés à la production d'un système de couches Download PDF

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Publication number
EP2711441B1
EP2711441B1 EP13184028.2A EP13184028A EP2711441B1 EP 2711441 B1 EP2711441 B1 EP 2711441B1 EP 13184028 A EP13184028 A EP 13184028A EP 2711441 B1 EP2711441 B1 EP 2711441B1
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EP
European Patent Office
Prior art keywords
particle
particles
coating
reservoir
particle reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
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EP13184028.2A
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German (de)
English (en)
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EP2711441A1 (fr
Inventor
Stefan Nettesheim
Klaus Forster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maschinenfabrik Reinhausen GmbH
Original Assignee
Maschinenfabrik Reinhausen GmbH
Maschinenfabrik Reinhausen Gebrueder Scheubeck GmbH and Co KG
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Application filed by Maschinenfabrik Reinhausen GmbH, Maschinenfabrik Reinhausen Gebrueder Scheubeck GmbH and Co KG filed Critical Maschinenfabrik Reinhausen GmbH
Publication of EP2711441A1 publication Critical patent/EP2711441A1/fr
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Publication of EP2711441B1 publication Critical patent/EP2711441B1/fr
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/01—Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/14—Arrangements for controlling delivery; Arrangements for controlling the spray area for supplying a selected one of a plurality of liquids or other fluent materials or several in selected proportions to a spray apparatus, e.g. to a single spray outlet
    • B05B12/1418—Arrangements for controlling delivery; Arrangements for controlling the spray area for supplying a selected one of a plurality of liquids or other fluent materials or several in selected proportions to a spray apparatus, e.g. to a single spray outlet for supplying several liquids or other fluent materials in selected proportions to a single spray outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/226—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying

Definitions

  • the invention relates to a coating device for coating a substrate with a plasma generating device according to the preamble of claim 1. Furthermore, the invention relates to a method for coating a substrate according to the preamble of claim 11.
  • the layers are deposited either on the molten phase (thermal spraying) or on the vapor (PVD) or gas phase (CVD) on a compact substrate or as compact parts by means of an auxiliary material (soldering) or by simultaneous application of pressure and temperature ( Diffusion welding) directly connected to a compact substrate material.
  • a powder which consists of a mixture of several classes of materials.
  • a variety of material combinations can be applied to complex shaped substrates with appropriate nozzle guide.
  • a very wear-resistant but brittle material can be integrated into an elastic matrix.
  • sinter powders consisting of a mixture of several fine-grained metallic components.
  • a method and a device are known in which a multilayer structure is applied to a substrate by means of a plasma process.
  • the properties of the individual layers can be selected within a wide range.
  • precursor materials in the form of powders, gases or liquids
  • a disadvantage of this procedure when applying layers to substrates is that the property of the layer to be applied is determined in the process.
  • German patent DE 10 2008 053 640 B3 discloses a coating process in which a layer is sprayed onto an object.
  • the material to be sprayed is melted by an arc of wires.
  • a filler can be introduced via an injector in the spray jet.
  • the U.S. Patent 3,912,235 describes a device for producing a coating of variable composition. From three powder reservoirs, a powder is passed to a mixing element where the powders are mixed. From there, the resulting powder mixture ultimately reaches a thermal spray gun, for example on a plasma basis.
  • the mixing ratio of the powders from the individual reservoirs is controlled by controlling the individual reservoirs, in particular, a respective gas pressure, with which the individual reservoirs are acted upon, are controlled.
  • the European patent application EP 0 139 396 A1 relates to a coated turbine blade and describes a device for producing the coating.
  • a powder is taken from two powder reservoirs and fed to a mixing container, from where it is ultimately fed to a plasma jet, which applies it to the turbine blade.
  • the mixing ratio of the two powders in the coating is varied.
  • the U.S. Patent 4,391,860 shows a coating apparatus in which a powder mixture is fed to a spraying device.
  • the composition of the powder mixture is controlled by controlling the feed systems for the individual powders.
  • the object of the present invention is to propose a device with which a coating of a substrate becomes possible, wherein the properties of the layer to be applied can also be changed during the coating process.
  • Another object of the invention is to propose a method with which the possibilities for coating substrates can be made more variable.
  • this object is achieved by a coating device for coating a substrate with a plasma generating device having the features according to claim 1.
  • the object is achieved by a method for coating a substrate having the features according to claim 11.
  • a coating device for coating a substrate is proposed. This has a plasma generating device for generating a plasma jet, wherein from a coating head of the plasma generating device the plasma jet emerges. Particles from a first particle reservoir can be supplied to the plasma jet via a transport line. A second particle reservoir is provided, from which particles can likewise be supplied to the plasma jet via the transport line. With a metering device in the transport line, the amount of particles from the first particle reservoir can be adjusted relative to the amount of particles from the second particle reservoir. It is advantageous that this quantitative ratio can also be varied during the coating process. This can also produce a changing coating profile on the surface of the substrate.
  • a regulator is provided for regulating the quantity of the particle mixture fed to the plasma jet.
  • the controller may be designed so that the amount of particles supplied can be varied within wide ranges, even during the coating process.
  • a plurality of particle reservoirs is provided.
  • the particle reservoirs can be mixed with one another in their proportions by means of a common metering device or can be applied to the surface of the substrate with separate coating heads assigned to them.
  • At least one separate process is provided for each particle reservoir, with the aid of which a fluidized powder can be generated from the particle reservoirs.
  • the particle reservoir and the associated process gas each form a particle conveying unit.
  • the particle delivery unit may include a process gas control unit for controlling the mixing ratio of particles and process gas.
  • the coating device can have at least one second coating head and a further particle conveying unit assigned to the second coating head.
  • the particle conveying unit has while another particle reservoir, a process gas and a process gas control unit.
  • the coating in a first embodiment is carried out with a coating device which has a plasma generation device for generating a plasma jet and a coating head from which the plasma jet emerges.
  • particles are supplied from a first particle reservoir to the plasma jet via a transport line.
  • particles from a second particle reservoir are mixed with those from the first particle reservoir via a metering device and then introduced together into the transport line and fed as a particle mixture to the plasma jet.
  • the plasma jet is then directed along with the particle mixture onto the surface of the substrate to form the coating.
  • the particles from the first particle reservoir can be fluidized with a first process gas and the particles from the second particle reservoir can be fluidized with a second process gas.
  • the proportion of the mixture of particles from the first particle reservoir can be between 10% and 90% and the proportion of particles from the second particle reservoir can be adjusted between 10% and 90%.
  • the coating is carried out with a coating device which has a plasma generation device for producing a plasma jet and a coating head from which the plasma jet emerges.
  • the substrate is coated by passing particles from a first particle reservoir via a transport line to the plasma jet at a first feed point and particles from a second particle reservoir are fed to the plasma jet at a second feed point such that a first layer with particles is deposited on the substrate the first
  • the first and the second feed point can also be selected such that a gradient layer or a composite layer is formed on the substrate.
  • the second layer or the gradient layer or the composite layer can be covered with a further layer, wherein particles from a third particle reservoir are fed to a further transport line and then fed to the second plasma jet of a second coating head and then onto the second layer Particles are applied from the second particle reservoir or on the gradient layer or on the composite layer.
  • the properties of the layer to be applied can thus be varied within a wide range.
  • functional composite layers can be applied.
  • the thickness and composition of the composite layer can be controlled so that the desired electrical, mechanical and chemical properties can be tailored.
  • multiple layers can also be produced with different properties as well as gradient layers on the substrate.
  • Fig. 1 schematically shows a coating apparatus 10 for coating a substrate 12.
  • the coating apparatus 10 comprises a plasma module comprising a coating head 26, a source of a plasma process gas 56 and a power supply 58.
  • the coating head 26 consists of a combustion chamber 60 in which an arc 20 is ignited between two electrodes 62 and 64.
  • This electric arc 20 is supplied from the power supply unit 58 for maintaining electrical energy, so that, depending on the modulation of the power supply 58, a continuous plasma jet 22 or pulsed plasma jet 22 forms, which emerges on the outlet side 26A of the coating head 26.
  • a plasma process gas 56 can be supplied, so that the combustion chamber 60 is flowed through in a controlled manner by the plasma process gas 56.
  • the plasma jet 22 can be supplied via an injector 66, which is shown here as an external injector, a mixture of process gas 30, 32 and particles.
  • the particles Due to the high energy density in the plasma jet 22, the particles can be partially melted. Thus, they can be deposited on the surface 12 a of the substrate 12 as a first layer 50. Since the substrate 12 and the coating head 26 are movable relative to each other, a continuous layer 50 can be produced on the substrate 12 in this way.
  • the guided to the injector 66 particle mixture comes in the in FIG. 1 illustrated embodiment of the invention from a first particle conveying unit 34 and a second particle conveying unit 36.
  • a respective process gas control unit 38, 42 is provided in the particle conveying units 34, 36 .
  • each particle conveying unit 34, 36 each with different process gases 30, 32 are worked, which are then matched to the particles used in the particle reservoirs. From the mixture of the particles with the process gases 30, 32 so fluids are generated, which can be mixed by means of a metering device 18 in different proportions to each other.
  • the mixture depends on the desired on the substrate 12 layer 50 from.
  • the mixing ratio of the particles to each other is designed so that the proportion of the particle mixture of particles from the first particle reservoir 14 is set between 10% and 90% and the proportion of particles from the second particle reservoir 16 between 10% and 90%.
  • the metering device 18 is designed so that it can be used to set a time-definite ratio between the proportion of the particle mixture of particles from the first particle reservoir 14 and the proportion of particles from the second particle reservoir 16. Furthermore, it is also possible to use metering devices 18 with which, beyond or exclusively, a time-varying mixing ratio can be set. When dosing, it is also possible, at least temporarily limited, to set the proportion of one of the particles to 0, so that for a certain area on the surface of the substrate 12, the applied first layer 50 consists exclusively of particles from a particle reservoir.
  • the metering device 18 can be designed, for example, as a media adder.
  • two fluids can be introduced as two or more partial streams into one or more mixing chambers in the media adder, where then the mixture takes place.
  • the mixing reaction can be monitored, whereby a time-varying mixing ratio can be adjusted.
  • the mixture is then usually discharged from an opening in the bottom or in the lid of the mixing chamber and fed to the transport line 24, which may be designed, for example, as a hose system.
  • the transport conduit 24 materials other than tubes, such as metal conduits, may also be used, depending on which particles are to be used to coat the substrate 12.
  • the injector 66 may be preceded by a regulator 28, with the aid of which it is possible to regulate the amount of the particle mixture fed to the injector 66 via the transport line 24.
  • the regulation by throttling the Particle stream or by a dynamic switching operation, ie by a controlled interruption and enabling the path to the transport line 24 in the controller 28 done.
  • Layer thickness and material composition can be set dynamically via the delivery rates of the particle transport units 34, 36 and the controller 28.
  • the layer composition can also be changed dynamically during a running coating process.
  • Fig. 2 schematically shows a device not according to the invention for coating a substrate 12.
  • the particles from the particle transport units 34, 36 are fluidized in the desired proportions.
  • the particles originating from the particle conveying unit 34 are supplied separately to a first injector 66 and reach the plasma jet 22 at a first feed point 46.
  • the particles from the particle conveying unit 36 are supplied to a second injector 68 and arrive at the plasma jet 22 at a second feed point 48
  • the injectors 66, 68 may in each case in turn be preceded by metering devices 18 whose mode of operation is already associated with Fig. 1 has been described. With this arrangement, it is now possible to produce two separate, independent layers 50, 52 (double layer) on the surface 12a of the substrate 12, whose properties may be different (see Fig. 6 ).
  • a so-called gradient layer 54 (see Fig. 3c ).
  • both the double layer and the gradient layer 54 can be applied to the substrate 12 in one process step.
  • the injectors 66, 68 and thus depending on the position of the feed points 46, 48 to the plasma jet 22 as varied effects can be achieved. These are based on the fact that the injection takes place in different areas of the plasma jet 22. These ranges are differentiated by flow rate, temperature, and plasma composition. Depending on the fluid mechanic Mixing of material flows creates multiple layers or mixed layers ( Fig. 3 ).
  • FIG. 2 is further shown schematically that the process performed with the coating head 26 process can be extended.
  • the coating apparatus 10 can be expanded by a further coating head 27.
  • a plasma process gas 56 and a power supply 58 are assigned to this coating head 27 on its inflow side 27E.
  • a third particle conveying unit 37 which in turn has a particle reservoir 15 and a process gas 33.
  • the process gas control unit 44 in turn, the ratio of process gas 33 to particles from the particle reservoir 15 can be adjusted.
  • the amount of particles from the particle reservoir 15 can be controlled.
  • a third layer 53 can be deposited on the second layer 52.
  • the coating device 10 In order to be able to produce a layer structure with more than three layers or a layer structure with two or more gradient layers, it is possible to equip the coating device 10 with a further coating head 26 and two injectors 66, 68 instead of a simply operated coating head 27 as described above.
  • a layer structure is shown as it with a coating apparatus 10 according to Fig. 2 can be produced.
  • a first layer 50, a second layer 52 and a third layer 53 are applied to the substrate 12.
  • a so-called composite layer 55 is shown, which with a coating apparatus 10 according to Fig. 1 or 2 can be produced.
  • the particles originating from the particle reservoirs 14, 16 are mixed in the mixing process ( Fig. 1 ) or by a suitable choice of the feed points 46, 48 mixed together so that a very homogeneous distribution of particle types in the volume of the applied composite layer 55 is formed.
  • Fig. 3c schematically shows a gradient layer 54, which with the coating apparatus 10 according to Fig. 2 can be produced.
  • the feed points 46, 48 are selected such that the number of particles decreases or increases in the y-direction in each case.
  • Fig. 4 schematically shows that it is possible to provide different transitions in the layer sequence to be applied to the substrate 12.
  • the illustrated layer sequence is produced with a suitably selected configuration of the coating apparatus 10 in a coating pass.
  • segment A three different materials with the particles r, s, t are deposited in a fixed ratio as a layer on the substrate 12.
  • segment B ie later in the same coating process, the layer thickness of the composite layer 55 is steadily reduced and a cover layer of the phase u is applied to the composite layer 55.
  • segment C the layer thickness of the entire multilayer is reduced until in segment D the layer is completely interrupted and thus the substrate 12 is not covered by a layer at this point.
  • segment E the layer thickness of the phase u is steadily increased and merges in the region F into a gradient layer 54, in which the material r is embedded in the highest concentration on the surface of this phase u.
  • Fig. 5 schematically shows the principle of the design of a gradient layer based on a depth profile.
  • the material composition is based on a layer material S1 which has the highest concentration directly at the transition point to the substrate 12.
  • the layer material S1 steadily decreases until it substantially reaches the value 0 on the surface.
  • the layer material S2 at the transition point to the substrate 12 has essentially the value 0 and steadily increases in the direction of the surface.
  • Fig. 6 1 shows a specific application for the coating device 10 according to the invention and the method according to the invention for coating a substrate 12 using the example of a conductive layer 74 and an insulation layer 72. Both layers are applied to a substrate 12 with the coating device 10.
  • the conductive layer 74 is applied to the substrate 12 in a web-like structure.
  • the thus formed conductor track should be protected in the region K0 to the outside by an insulating layer 72.
  • the insulation layer may be interrupted in the areas K1 and K2 for the purpose of easy contacting.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Nozzles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Plasma Technology (AREA)

Claims (14)

  1. Dispositif de revêtement (10) pour le revêtement d'un substrat (12) avec un dispositif de génération de plasma (20) pour la génération d'un faisceau de plasma (22) qui sort d'une tête de revêtement (26) du dispositif de génération de plasma (20),
    avec un premier réservoir de particules (14), un deuxième réservoir de particules (16) et une conduite de transport (24) par laquelle des particules contenues dans le premier réservoir de particules (14) peuvent être amenées en même temps que des particules contenues dans le deuxième réservoir de particules (16) jusqu'au faisceau de plasma (22),
    caractérisé en ce qu'il comprend
    un dispositif de dosage (18) auquel les particules provenant du premier réservoir de particules (14) peuvent être amenées séparément des particules provenant du deuxième réservoir de particules (16), à partir duquel les particules provenant du premier réservoir de particules (14) et les particules provenant du deuxième réservoir de particules (16) peuvent être amenées en mélange à la conduite de transport (24), le dispositif de dosage (18) pouvant doser la quantité des particules amenées du premier réservoir de particules (14) dans la conduite de transport (24) par rapport à la quantité des particules amenées du deuxième réservoir de particules (16) dans la conduite de transport (24).
  2. Dispositif de revêtement (10) selon la revendication 1, dans lequel le dispositif de dosage (18) est réalisé de manière à permettre une composition variable dans le temps du mélange de particules.
  3. Dispositif de revêtement (10) selon la revendication 1 ou 2, dans lequel est prévu un régulateur (28) pour réguler la quantité du mélange de particules amené au faisceau de plasma (22).
  4. Dispositif de revêtement (10) selon la revendication 3, dans lequel le régulateur (28) est conçu comme un commutateur pour débloquer et/ou interrompre l'arrivée du mélange de particules au faisceau de plasma (22).
  5. Dispositif de revêtement (10) selon l'une des revendications 1 à 4, dans lequel sont prévus plusieurs réservoirs de particules (14, 16).
  6. Dispositif de revêtement (10) selon l'une des revendications 1 à 5, dans lequel au moins un gaz de process (30) séparé est prévu de telle manière que les particules provenant de l'un des réservoirs de particules (14, 16) puissent être mélangées au gaz de process (30) et former une poudre fluidisée.
  7. Dispositif de revêtement (10) selon la revendication 6, dans lequel chaque réservoir de particules (14, 16) est associé à un gaz de process (30, 32) séparé.
  8. Dispositif de revêtement (10) selon la revendication 6 ou 7, dans lequel le réservoir de particules (14, 16) et le gaz de process (30, 32) qui lui est associé forment une unité d'acheminement de particules (34, 36) et l'unité d'acheminement de particules (34, 36) comprend une unité de régulation du gaz de process (38, 42) pour réguler le rapport de mélange des particules et du gaz de process (30, 36).
  9. Dispositif de revêtement (10) selon l'une des revendications 1 à 8, lequel dispositif de revêtement (10) comprend au moins une deuxième tête de revêtement (27) et au moins une autre unité d'acheminement de particules (37) associée à la deuxième tête de revêtement (27) avec un réservoir de particules (15), un gaz de process (33) correspondant et une unité de régulation du gaz de process (44).
  10. Dispositif de revêtement (10) selon la revendication 9, lequel dispositif de revêtement comprend plusieurs têtes de revêtement (26, 27) et des unités d'acheminement de particules (34, 36, 37) correspondantes.
  11. Procédé de revêtement d'un substrat (12), caractérisé en ce qu'il comprend les étapes suivantes :
    - au moins un dispositif de génération de plasma (20) comportant une tête de revêtement (26, 27) génère un faisceau de plasma (22) qui sort de la tête de revêtement (26, 27) correspondante ;
    - des particules sont amenées d'un premier réservoir de particules (14) à un dispositif de dosage (18) ;
    - des particules sont amenées d'un deuxième réservoir de particules (16) au dispositif de dosage (18) séparément des particules provenant du premier réservoir de particules (14) ;
    - dans le dispositif de dosage (18), les particules provenant du premier réservoir de particules (14) et du deuxième réservoir de particules (16) sont mélangées pour former un mélange de particules, le dispositif de dosage (18) déterminant un rapport de mélange entre les particules provenant du premier réservoir de particules (14) et celles provenant du deuxième réservoir de particules (16) ;
    - le mélange de particules est amené par une conduite de transport (24) du dispositif de dosage (18) au faisceau de plasma (22) ; et
    - le faisceau de plasma (22) est dirigé avec le mélange de particules vers une surface (12a) du substrat (12) pour former le revêtement (50).
  12. Procédé selon la revendication 11, dans lequel des particules provenant d'un troisième réservoir de particules (15) sont amenées à un dispositif de dosage (18) et mélangées dans celui-ci et amenées par une conduite de transport (24) du dispositif de dosage (18) au faisceau de plasma (23).
  13. Procédé de revêtement d'un substrat (12) selon la revendication 12, dans lequel les particules provenant du premier réservoir de particules (14) sont fluidisées avec un premier gaz de process (30), les particules provenant du deuxième réservoir de particules (16) avec un deuxième gaz de process (32) et les particules provenant du troisième réservoir de particules (15) avec un troisième gaz de process (33).
  14. Procédé de revêtement d'un substrat (12) selon la revendication 11, dans lequel la part de particules provenant du premier réservoir de particules (14) est modifiée par rapport à la part de particules du deuxième réservoir de particules (16) pendant le revêtement du substrat (12).
EP13184028.2A 2012-09-21 2013-09-12 Dispositif et procédé destinés à la production d'un système de couches Not-in-force EP2711441B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102012108919.1A DE102012108919A1 (de) 2012-09-21 2012-09-21 Vorrichtung und Verfahren zur Erzeugung eines Schichtsystems

Publications (2)

Publication Number Publication Date
EP2711441A1 EP2711441A1 (fr) 2014-03-26
EP2711441B1 true EP2711441B1 (fr) 2017-08-02

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EP13184028.2A Not-in-force EP2711441B1 (fr) 2012-09-21 2013-09-12 Dispositif et procédé destinés à la production d'un système de couches

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Country Link
US (1) US20140087084A1 (fr)
EP (1) EP2711441B1 (fr)
DE (1) DE102012108919A1 (fr)
ES (1) ES2641835T3 (fr)

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WO2022161616A1 (fr) 2021-01-29 2022-08-04 Midnex Ag Procédé et dispositif d'application d'un revêtement métallique sur une surface

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JP5987150B2 (ja) * 2010-03-04 2016-09-07 イマジニアリング株式会社 被膜形成装置
DE102013109887A1 (de) * 2013-09-10 2015-03-12 Reinhausen Plasma Gmbh Handgerät und Verfahren zur Plasmabehandlung
CN107367962A (zh) * 2017-06-28 2017-11-21 安徽信陆电子科技有限公司 一种喷涂设备自动控制系统

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DE102012108919A1 (de) 2014-05-15
US20140087084A1 (en) 2014-03-27
ES2641835T3 (es) 2017-11-14
EP2711441A1 (fr) 2014-03-26

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