EP2711441B1 - Device and method for creating a coating system - Google Patents
Device and method for creating a coating system Download PDFInfo
- Publication number
- EP2711441B1 EP2711441B1 EP13184028.2A EP13184028A EP2711441B1 EP 2711441 B1 EP2711441 B1 EP 2711441B1 EP 13184028 A EP13184028 A EP 13184028A EP 2711441 B1 EP2711441 B1 EP 2711441B1
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- Prior art keywords
- particle
- particles
- coating
- reservoir
- particle reservoir
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- 238000000576 coating method Methods 0.000 title claims description 107
- 239000011248 coating agent Substances 0.000 title claims description 99
- 238000000034 method Methods 0.000 title claims description 64
- 239000002245 particle Substances 0.000 claims description 172
- 239000000758 substrate Substances 0.000 claims description 53
- 239000000203 mixture Substances 0.000 claims description 34
- 239000000843 powder Substances 0.000 claims description 19
- 238000002156 mixing Methods 0.000 claims description 18
- 239000010410 layer Substances 0.000 description 89
- 239000007789 gas Substances 0.000 description 29
- 239000000463 material Substances 0.000 description 29
- 239000002131 composite material Substances 0.000 description 14
- 230000007704 transition Effects 0.000 description 5
- 230000001276 controlling effect Effects 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007734 materials engineering Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/01—Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/14—Arrangements for controlling delivery; Arrangements for controlling the spray area for supplying a selected one of a plurality of liquids or other fluent materials or several in selected proportions to a spray apparatus, e.g. to a single spray outlet
- B05B12/1418—Arrangements for controlling delivery; Arrangements for controlling the spray area for supplying a selected one of a plurality of liquids or other fluent materials or several in selected proportions to a spray apparatus, e.g. to a single spray outlet for supplying several liquids or other fluent materials in selected proportions to a single spray outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
- B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
- B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
- B05B7/226—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
Definitions
- the invention relates to a coating device for coating a substrate with a plasma generating device according to the preamble of claim 1. Furthermore, the invention relates to a method for coating a substrate according to the preamble of claim 11.
- the layers are deposited either on the molten phase (thermal spraying) or on the vapor (PVD) or gas phase (CVD) on a compact substrate or as compact parts by means of an auxiliary material (soldering) or by simultaneous application of pressure and temperature ( Diffusion welding) directly connected to a compact substrate material.
- a powder which consists of a mixture of several classes of materials.
- a variety of material combinations can be applied to complex shaped substrates with appropriate nozzle guide.
- a very wear-resistant but brittle material can be integrated into an elastic matrix.
- sinter powders consisting of a mixture of several fine-grained metallic components.
- a method and a device are known in which a multilayer structure is applied to a substrate by means of a plasma process.
- the properties of the individual layers can be selected within a wide range.
- precursor materials in the form of powders, gases or liquids
- a disadvantage of this procedure when applying layers to substrates is that the property of the layer to be applied is determined in the process.
- German patent DE 10 2008 053 640 B3 discloses a coating process in which a layer is sprayed onto an object.
- the material to be sprayed is melted by an arc of wires.
- a filler can be introduced via an injector in the spray jet.
- the U.S. Patent 3,912,235 describes a device for producing a coating of variable composition. From three powder reservoirs, a powder is passed to a mixing element where the powders are mixed. From there, the resulting powder mixture ultimately reaches a thermal spray gun, for example on a plasma basis.
- the mixing ratio of the powders from the individual reservoirs is controlled by controlling the individual reservoirs, in particular, a respective gas pressure, with which the individual reservoirs are acted upon, are controlled.
- the European patent application EP 0 139 396 A1 relates to a coated turbine blade and describes a device for producing the coating.
- a powder is taken from two powder reservoirs and fed to a mixing container, from where it is ultimately fed to a plasma jet, which applies it to the turbine blade.
- the mixing ratio of the two powders in the coating is varied.
- the U.S. Patent 4,391,860 shows a coating apparatus in which a powder mixture is fed to a spraying device.
- the composition of the powder mixture is controlled by controlling the feed systems for the individual powders.
- the object of the present invention is to propose a device with which a coating of a substrate becomes possible, wherein the properties of the layer to be applied can also be changed during the coating process.
- Another object of the invention is to propose a method with which the possibilities for coating substrates can be made more variable.
- this object is achieved by a coating device for coating a substrate with a plasma generating device having the features according to claim 1.
- the object is achieved by a method for coating a substrate having the features according to claim 11.
- a coating device for coating a substrate is proposed. This has a plasma generating device for generating a plasma jet, wherein from a coating head of the plasma generating device the plasma jet emerges. Particles from a first particle reservoir can be supplied to the plasma jet via a transport line. A second particle reservoir is provided, from which particles can likewise be supplied to the plasma jet via the transport line. With a metering device in the transport line, the amount of particles from the first particle reservoir can be adjusted relative to the amount of particles from the second particle reservoir. It is advantageous that this quantitative ratio can also be varied during the coating process. This can also produce a changing coating profile on the surface of the substrate.
- a regulator is provided for regulating the quantity of the particle mixture fed to the plasma jet.
- the controller may be designed so that the amount of particles supplied can be varied within wide ranges, even during the coating process.
- a plurality of particle reservoirs is provided.
- the particle reservoirs can be mixed with one another in their proportions by means of a common metering device or can be applied to the surface of the substrate with separate coating heads assigned to them.
- At least one separate process is provided for each particle reservoir, with the aid of which a fluidized powder can be generated from the particle reservoirs.
- the particle reservoir and the associated process gas each form a particle conveying unit.
- the particle delivery unit may include a process gas control unit for controlling the mixing ratio of particles and process gas.
- the coating device can have at least one second coating head and a further particle conveying unit assigned to the second coating head.
- the particle conveying unit has while another particle reservoir, a process gas and a process gas control unit.
- the coating in a first embodiment is carried out with a coating device which has a plasma generation device for generating a plasma jet and a coating head from which the plasma jet emerges.
- particles are supplied from a first particle reservoir to the plasma jet via a transport line.
- particles from a second particle reservoir are mixed with those from the first particle reservoir via a metering device and then introduced together into the transport line and fed as a particle mixture to the plasma jet.
- the plasma jet is then directed along with the particle mixture onto the surface of the substrate to form the coating.
- the particles from the first particle reservoir can be fluidized with a first process gas and the particles from the second particle reservoir can be fluidized with a second process gas.
- the proportion of the mixture of particles from the first particle reservoir can be between 10% and 90% and the proportion of particles from the second particle reservoir can be adjusted between 10% and 90%.
- the coating is carried out with a coating device which has a plasma generation device for producing a plasma jet and a coating head from which the plasma jet emerges.
- the substrate is coated by passing particles from a first particle reservoir via a transport line to the plasma jet at a first feed point and particles from a second particle reservoir are fed to the plasma jet at a second feed point such that a first layer with particles is deposited on the substrate the first
- the first and the second feed point can also be selected such that a gradient layer or a composite layer is formed on the substrate.
- the second layer or the gradient layer or the composite layer can be covered with a further layer, wherein particles from a third particle reservoir are fed to a further transport line and then fed to the second plasma jet of a second coating head and then onto the second layer Particles are applied from the second particle reservoir or on the gradient layer or on the composite layer.
- the properties of the layer to be applied can thus be varied within a wide range.
- functional composite layers can be applied.
- the thickness and composition of the composite layer can be controlled so that the desired electrical, mechanical and chemical properties can be tailored.
- multiple layers can also be produced with different properties as well as gradient layers on the substrate.
- Fig. 1 schematically shows a coating apparatus 10 for coating a substrate 12.
- the coating apparatus 10 comprises a plasma module comprising a coating head 26, a source of a plasma process gas 56 and a power supply 58.
- the coating head 26 consists of a combustion chamber 60 in which an arc 20 is ignited between two electrodes 62 and 64.
- This electric arc 20 is supplied from the power supply unit 58 for maintaining electrical energy, so that, depending on the modulation of the power supply 58, a continuous plasma jet 22 or pulsed plasma jet 22 forms, which emerges on the outlet side 26A of the coating head 26.
- a plasma process gas 56 can be supplied, so that the combustion chamber 60 is flowed through in a controlled manner by the plasma process gas 56.
- the plasma jet 22 can be supplied via an injector 66, which is shown here as an external injector, a mixture of process gas 30, 32 and particles.
- the particles Due to the high energy density in the plasma jet 22, the particles can be partially melted. Thus, they can be deposited on the surface 12 a of the substrate 12 as a first layer 50. Since the substrate 12 and the coating head 26 are movable relative to each other, a continuous layer 50 can be produced on the substrate 12 in this way.
- the guided to the injector 66 particle mixture comes in the in FIG. 1 illustrated embodiment of the invention from a first particle conveying unit 34 and a second particle conveying unit 36.
- a respective process gas control unit 38, 42 is provided in the particle conveying units 34, 36 .
- each particle conveying unit 34, 36 each with different process gases 30, 32 are worked, which are then matched to the particles used in the particle reservoirs. From the mixture of the particles with the process gases 30, 32 so fluids are generated, which can be mixed by means of a metering device 18 in different proportions to each other.
- the mixture depends on the desired on the substrate 12 layer 50 from.
- the mixing ratio of the particles to each other is designed so that the proportion of the particle mixture of particles from the first particle reservoir 14 is set between 10% and 90% and the proportion of particles from the second particle reservoir 16 between 10% and 90%.
- the metering device 18 is designed so that it can be used to set a time-definite ratio between the proportion of the particle mixture of particles from the first particle reservoir 14 and the proportion of particles from the second particle reservoir 16. Furthermore, it is also possible to use metering devices 18 with which, beyond or exclusively, a time-varying mixing ratio can be set. When dosing, it is also possible, at least temporarily limited, to set the proportion of one of the particles to 0, so that for a certain area on the surface of the substrate 12, the applied first layer 50 consists exclusively of particles from a particle reservoir.
- the metering device 18 can be designed, for example, as a media adder.
- two fluids can be introduced as two or more partial streams into one or more mixing chambers in the media adder, where then the mixture takes place.
- the mixing reaction can be monitored, whereby a time-varying mixing ratio can be adjusted.
- the mixture is then usually discharged from an opening in the bottom or in the lid of the mixing chamber and fed to the transport line 24, which may be designed, for example, as a hose system.
- the transport conduit 24 materials other than tubes, such as metal conduits, may also be used, depending on which particles are to be used to coat the substrate 12.
- the injector 66 may be preceded by a regulator 28, with the aid of which it is possible to regulate the amount of the particle mixture fed to the injector 66 via the transport line 24.
- the regulation by throttling the Particle stream or by a dynamic switching operation, ie by a controlled interruption and enabling the path to the transport line 24 in the controller 28 done.
- Layer thickness and material composition can be set dynamically via the delivery rates of the particle transport units 34, 36 and the controller 28.
- the layer composition can also be changed dynamically during a running coating process.
- Fig. 2 schematically shows a device not according to the invention for coating a substrate 12.
- the particles from the particle transport units 34, 36 are fluidized in the desired proportions.
- the particles originating from the particle conveying unit 34 are supplied separately to a first injector 66 and reach the plasma jet 22 at a first feed point 46.
- the particles from the particle conveying unit 36 are supplied to a second injector 68 and arrive at the plasma jet 22 at a second feed point 48
- the injectors 66, 68 may in each case in turn be preceded by metering devices 18 whose mode of operation is already associated with Fig. 1 has been described. With this arrangement, it is now possible to produce two separate, independent layers 50, 52 (double layer) on the surface 12a of the substrate 12, whose properties may be different (see Fig. 6 ).
- a so-called gradient layer 54 (see Fig. 3c ).
- both the double layer and the gradient layer 54 can be applied to the substrate 12 in one process step.
- the injectors 66, 68 and thus depending on the position of the feed points 46, 48 to the plasma jet 22 as varied effects can be achieved. These are based on the fact that the injection takes place in different areas of the plasma jet 22. These ranges are differentiated by flow rate, temperature, and plasma composition. Depending on the fluid mechanic Mixing of material flows creates multiple layers or mixed layers ( Fig. 3 ).
- FIG. 2 is further shown schematically that the process performed with the coating head 26 process can be extended.
- the coating apparatus 10 can be expanded by a further coating head 27.
- a plasma process gas 56 and a power supply 58 are assigned to this coating head 27 on its inflow side 27E.
- a third particle conveying unit 37 which in turn has a particle reservoir 15 and a process gas 33.
- the process gas control unit 44 in turn, the ratio of process gas 33 to particles from the particle reservoir 15 can be adjusted.
- the amount of particles from the particle reservoir 15 can be controlled.
- a third layer 53 can be deposited on the second layer 52.
- the coating device 10 In order to be able to produce a layer structure with more than three layers or a layer structure with two or more gradient layers, it is possible to equip the coating device 10 with a further coating head 26 and two injectors 66, 68 instead of a simply operated coating head 27 as described above.
- a layer structure is shown as it with a coating apparatus 10 according to Fig. 2 can be produced.
- a first layer 50, a second layer 52 and a third layer 53 are applied to the substrate 12.
- a so-called composite layer 55 is shown, which with a coating apparatus 10 according to Fig. 1 or 2 can be produced.
- the particles originating from the particle reservoirs 14, 16 are mixed in the mixing process ( Fig. 1 ) or by a suitable choice of the feed points 46, 48 mixed together so that a very homogeneous distribution of particle types in the volume of the applied composite layer 55 is formed.
- Fig. 3c schematically shows a gradient layer 54, which with the coating apparatus 10 according to Fig. 2 can be produced.
- the feed points 46, 48 are selected such that the number of particles decreases or increases in the y-direction in each case.
- Fig. 4 schematically shows that it is possible to provide different transitions in the layer sequence to be applied to the substrate 12.
- the illustrated layer sequence is produced with a suitably selected configuration of the coating apparatus 10 in a coating pass.
- segment A three different materials with the particles r, s, t are deposited in a fixed ratio as a layer on the substrate 12.
- segment B ie later in the same coating process, the layer thickness of the composite layer 55 is steadily reduced and a cover layer of the phase u is applied to the composite layer 55.
- segment C the layer thickness of the entire multilayer is reduced until in segment D the layer is completely interrupted and thus the substrate 12 is not covered by a layer at this point.
- segment E the layer thickness of the phase u is steadily increased and merges in the region F into a gradient layer 54, in which the material r is embedded in the highest concentration on the surface of this phase u.
- Fig. 5 schematically shows the principle of the design of a gradient layer based on a depth profile.
- the material composition is based on a layer material S1 which has the highest concentration directly at the transition point to the substrate 12.
- the layer material S1 steadily decreases until it substantially reaches the value 0 on the surface.
- the layer material S2 at the transition point to the substrate 12 has essentially the value 0 and steadily increases in the direction of the surface.
- Fig. 6 1 shows a specific application for the coating device 10 according to the invention and the method according to the invention for coating a substrate 12 using the example of a conductive layer 74 and an insulation layer 72. Both layers are applied to a substrate 12 with the coating device 10.
- the conductive layer 74 is applied to the substrate 12 in a web-like structure.
- the thus formed conductor track should be protected in the region K0 to the outside by an insulating layer 72.
- the insulation layer may be interrupted in the areas K1 and K2 for the purpose of easy contacting.
Description
Die Erfindung betrifft eine Beschichtungsvorrichtung zur Beschichtung eines Substrates mit einer Plasmaerzeugungsvorrichtung nach dem Oberbegriff von Anspruch 1. Weiterhin betrifft die Erfindung ein Verfahren zum Beschichten eines Substrates nach dem Oberbegriff von Anspruch 11.The invention relates to a coating device for coating a substrate with a plasma generating device according to the preamble of
Das komplexe Anforderungsprofil moderner ingenieur- und werkstofftechnischer Aufgabenstellungen bedingt in zunehmendem Maße den Einsatz von Werkstoffkombinationen auch in Form von Verbundmaterialien oder Schichtsystemen. Derartige Schichtsysteme können beispielsweise als Schutz- oder Funktionsschichten auf Körpern gegen korrosive, thermische, chemische oder biologische Beanspruchungen in vielfältiger Weise eingesetzt werden. Zur Herstellung solcher Werkstoff- oder Schichtverbunde werden gegenwärtig verschiedene Technologien eingesetzt. Dabei kommen oft die chemische Gasabscheidung (chemical vapor deposition CVD) oder die physikalische Gasabscheidung (physical vapor deposition PVD) zum Einsatz. Auch das Löten, das Diffusionsschweißen oder das pulvermetallurgische Verbundpressen mit möglicher nachfolgender Schmiedeoperation sind etablierte Verfahren. Die Schichten werden dabei entweder über die schmelzflüssige Phase (thermisches Spritzen) oder über die Dampf- (PVD) oder Gasphase (CVD) auf einem kompakten Substrat aufgebracht oder als kompakte Teile mittels eines Hilfswerkstoffs (Löten) oder durch gleichzeitige Anwendung von Druck und Temperatur (Diffusionsschweißen) direkt mit einem kompakten Substratwerkstoff verbunden.The complex requirement profile of modern engineering and materials engineering tasks increasingly requires the use of material combinations also in the form of composite materials or layer systems. Such layer systems can be used for example as protective or functional layers on bodies against corrosive, thermal, chemical or biological stresses in a variety of ways. Various technologies are currently used to produce such material or layer composites. Often, chemical vapor deposition (CVD) or physical vapor deposition (PVD) are used. Also, brazing, diffusion bonding or powder metallurgical composite pressing with possible subsequent forging operation are established methods. The layers are deposited either on the molten phase (thermal spraying) or on the vapor (PVD) or gas phase (CVD) on a compact substrate or as compact parts by means of an auxiliary material (soldering) or by simultaneous application of pressure and temperature ( Diffusion welding) directly connected to a compact substrate material.
Diese bekannten Technologien weisen allerdings verfahrensspezifische Grenzen auf. So vermindern auftretende ungünstige Schichteigenschaften, wie z. B. offene Porosität und Risse in der Schicht die Schutzwirkung gegenüber reaktiven Medien. Auch können aufgrund von Temperaturgradienten zwischen den Werkstoffen bei der Herstellung der Schichtverbunde oftmals Restspannungen in der thermisch beeinflussten Zone der Bauteile zurückbleiben. Damit sind oftmals aufwändige Nachbehandlungen erforderlich.However, these known technologies have process-specific limits. To reduce occurring unfavorable layer properties, such. B. open porosity and cracks in the layer the protective effect against reactive media. Also, due to temperature gradients between the materials in the manufacture of the laminations often residual stresses in the thermally affected zone of the Components remain behind. This often requires time-consuming post-treatment.
Diese Nachteile können durch das direkte Aufbringen von Schichten mit Hilfe eines Plasmajets, in den Pulver eingebracht wird, oftmals reduziert oder ganz verhindert werden. Ein derartiges Verfahren ist beispielsweise aus der
Aus der
Ein Nachteil dieser Vorgehensweise beim Aufbringen von Schichten auf Substrate besteht darin, dass die Eigenschaft der aufzubringenden Schicht im Prozess festgelegt ist.A disadvantage of this procedure when applying layers to substrates is that the property of the layer to be applied is determined in the process.
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Die Aufgabe der vorliegenden Erfindung besteht darin, eine Vorrichtung vorzuschlagen, mit der eine Beschichtung eines Substrats möglich wird, wobei die Eigenschaften der aufzubringenden Schicht auch während des Beschichtungsprozesses veränderbar sind. Eine weitere Aufgabe der Erfindung besteht darin, ein Verfahren vorzuschlagen, mit dem die Möglichkeiten bei der Beschichtung von Substraten variabler gestaltet werden können.The object of the present invention is to propose a device with which a coating of a substrate becomes possible, wherein the properties of the layer to be applied can also be changed during the coating process. Another object of the invention is to propose a method with which the possibilities for coating substrates can be made more variable.
Erfindungsgemäß wird diese Aufgabe durch eine Beschichtungsvorrichtung zur Beschichtung eines Substrates mit einer Plasmaerzeugungsvorrichtung mit den Merkmalen gemäß Anspruch 1 gelöst. Im Hinblick auf das Verfahren wird die Aufgabe durch ein Verfahren zur Beschichtung eines Substrats mit den Merkmalen gemäß Anspruch 11 gelöst.
Es wird also eine Beschichtungsvorrichtung zur Beschichtung eines Substrates vorgeschlagen. Diese weist eine Plasmaerzeugungsvorrichtung zur Erzeugung eines Plasmastrahls auf, wobei aus einem Beschichtungskopf der Plasmaerzeugungsvorrichtung der Plasmastrahl austritt. Partikel aus einem ersten Partikelreservoir können dem Plasmastrahl über eine Transportleitung zugeführt werden. Ein zweites Partikelreservoir ist vorgesehen, aus dem Partikel ebenfalls über die Transportleitung dem Plasmastrahl zugeführt werden können. Mit einer Dosiervorrichtung in der Transportleitung kann die Menge der Partikel aus dem ersten Partikelreservoir relativ zur Menge der Partikel aus dem zweiten Partikelreservoir eingestellt werden. Vorteilhaft ist dabei, dass dieses Mengenverhältnis auch während des Beschichtungsprozesses variiert werden kann. Damit kann auch ein sich änderndes Beschichtungsprofil auf der Oberfläche des Substrats erzeugt werden.According to the invention, this object is achieved by a coating device for coating a substrate with a plasma generating device having the features according to
Thus, a coating device for coating a substrate is proposed. This has a plasma generating device for generating a plasma jet, wherein from a coating head of the plasma generating device the plasma jet emerges. Particles from a first particle reservoir can be supplied to the plasma jet via a transport line. A second particle reservoir is provided, from which particles can likewise be supplied to the plasma jet via the transport line. With a metering device in the transport line, the amount of particles from the first particle reservoir can be adjusted relative to the amount of particles from the second particle reservoir. It is advantageous that this quantitative ratio can also be varied during the coating process. This can also produce a changing coating profile on the surface of the substrate.
In einer bevorzugten Ausführungsform der Beschichtungsvorrichtung ist ein Regler zum Regeln der dem Plasmastrahl zugeführten Menge des Partikelgemisches vorgesehen. Dabei kann der Regler so ausgestaltet sein, dass die Menge der zugeführten Partikel in weiten Bereichen, auch während des Beschichtungsprozesses variiert werden kann. Darüber hinaus ist es möglich, den Regler als Schalter auszugestalten, oder den Regler so auszuführen, dass er eine Schalterfunktion aufweist, so dass mit diesem Schalter ein Freischalten und Unterbrechen der Zufuhr des Partikelgemisches zum Plasmastrahl möglich wird.In a preferred embodiment of the coating device, a regulator is provided for regulating the quantity of the particle mixture fed to the plasma jet. In this case, the controller may be designed so that the amount of particles supplied can be varied within wide ranges, even during the coating process. In addition, it is possible to design the controller as a switch, or to perform the controller so that it has a switch function, so that this switch is an enabling and interrupting the supply of the particle mixture to the plasma jet is possible.
In einer weiteren Ausgestaltung der Erfindung ist eine Mehrzahl von Partikelreservoirs vorgesehen. Die Partikelreservoirs können dabei über eine gemeinsame Dosiervorrichtung in ihren Verhältnissen zueinander gemischt werden oder mit ihnen zugeordneten, separaten Beschichtungsköpfen auf die Oberfläche des Substrats aufgebracht werden.In a further embodiment of the invention, a plurality of particle reservoirs is provided. In this case, the particle reservoirs can be mixed with one another in their proportions by means of a common metering device or can be applied to the surface of the substrate with separate coating heads assigned to them.
Bevorzugt ist für jedes Partikelreservoir jeweils wenigstens ein separater Prozess vorgesehen, mit deren Hilfe sich aus den Partikelreservoirs ein fluidisiertes Pulver erzeugen lässt. Das Partikelreservoir und das zugeordnete Prozessgas bilden jeweils eine Partikelfördereinheit. Die Partikelfördereinheit kann eine Prozessgasregeleinheit zum Regeln des Mischungsverhältnisses aus Partikeln und Prozessgas aufweisen.Preferably, at least one separate process is provided for each particle reservoir, with the aid of which a fluidized powder can be generated from the particle reservoirs. The particle reservoir and the associated process gas each form a particle conveying unit. The particle delivery unit may include a process gas control unit for controlling the mixing ratio of particles and process gas.
In einer weiteren Ausführungsform der Erfindung kann die Beschichtungsvorrichtung wenigstens einen zweiten Beschichtungskopf und eine weitere, dem zweiten Beschichtungskopf zugeordnete Partikelfördereinheit aufweisen. Die Partikelfördereinheit weist dabei ein weiteres Partikelreservoir, ein Prozessgas und eine Prozessgasregeleinheit auf. Bei dieser Ausgestaltung der Erfindung ist es auch möglich, eine Mehrzahl von Beschichtungsköpfen und jeweils zugeordneten Partikelfördereinheiten vorzusehen.In a further embodiment of the invention, the coating device can have at least one second coating head and a further particle conveying unit assigned to the second coating head. The particle conveying unit has while another particle reservoir, a process gas and a process gas control unit. In this embodiment of the invention, it is also possible to provide a plurality of coating heads and respectively associated particle conveyor units.
Im Hinblick auf das Verfahren zum Beschichten eines Substrates erfolgt die Beschichtung in einer ersten Ausgestaltung mit einer Beschichtungsvorrichtung, die eine Plasmaerzeugungsvorrichtung zur Erzeugung eines Plasmastrahls und einen Beschichtungskopf aufweist, aus dem der Plasmastrahl austritt. Zur Beschichtung des Substrates werden aus einem ersten Partikelreservoir Partikel über eine Transportleitung dem Plasmastrahl zugeführt. Weiterhin werden Partikel aus einem zweiten Partikelreservoir mit denen aus dem ersten Partikelreservoir über eine Dosiervorrichtung gemischt und dann gemeinsam in die Transportleitung eingebracht und als Partikelgemisch dem Plasmastrahl zugeführt. Der Plasmastrahl wird dann zusammen mit dem Partikelgemisch auf die Oberfläche des Substrats zur Bildung der Beschichtung gerichtet. Dabei können die Partikel aus dem ersten Partikelreservoir mit einem ersten Prozessgas fluidisiert und die Partikel aus dem zweiten Partikelreservoir mit einem zweiten Prozessgas fluidisiert werden. Der Anteil am Gemisch von Partikeln aus dem ersten Partikelreservoir kann zwischen 10% und 90% und der Anteil von Partikeln aus dem zweiten Partikelreservoir kann zwischen 10% und 90% eingestellt werden. Außerdem ist es möglich, den Anteil von Partikeln aus dem ersten Partikelreservoir relativ zum Anteil von Partikeln aus dem zweiten Partikelreservoir während der Beschichtung des Substrats zu variieren, indem das Mischungsverhältnis zwischen den ersten und zweiten Partikeln während des Auftragens verändert wird.With regard to the method for coating a substrate, the coating in a first embodiment is carried out with a coating device which has a plasma generation device for generating a plasma jet and a coating head from which the plasma jet emerges. For coating the substrate, particles are supplied from a first particle reservoir to the plasma jet via a transport line. Furthermore, particles from a second particle reservoir are mixed with those from the first particle reservoir via a metering device and then introduced together into the transport line and fed as a particle mixture to the plasma jet. The plasma jet is then directed along with the particle mixture onto the surface of the substrate to form the coating. In this case, the particles from the first particle reservoir can be fluidized with a first process gas and the particles from the second particle reservoir can be fluidized with a second process gas. The proportion of the mixture of particles from the first particle reservoir can be between 10% and 90% and the proportion of particles from the second particle reservoir can be adjusted between 10% and 90%. In addition, it is possible to vary the proportion of particles from the first particle reservoir relative to the proportion of particles from the second particle reservoir during the coating of the substrate by changing the mixing ratio between the first and second particles during application.
In einem nicht erfindungsgemäßen Verfahren erfolgt die Beschichtung mit einer Beschichtungsvorrichtung, die eine Plasmaerzeugungsvorrichtung zur Erzeugung eines Plasmastrahls und einem Beschichtungskopf aufweist, aus dem der Plasmastrahl austritt. Dabei wird das Substrat dadurch beschichtet, dass Partikel aus einem ersten Partikelreservoir über eine Transportleitung dem Plasmastrahl an einer ersten Zuführstelle zugeführt werden und Partikel aus einem zweiten Partikelreservoir dem Plasmastrahl an einer zweiten Zuführstelle so zugeführt werden, dass auf dem Substrat eine erste Schicht mit Partikeln aus dem erstenIn a method not according to the invention, the coating is carried out with a coating device which has a plasma generation device for producing a plasma jet and a coating head from which the plasma jet emerges. In this case, the substrate is coated by passing particles from a first particle reservoir via a transport line to the plasma jet at a first feed point and particles from a second particle reservoir are fed to the plasma jet at a second feed point such that a first layer with particles is deposited on the substrate the first
Partikelreservoir und eine zweite Schicht mit Partikeln aus dem zweiten Partikelreservoir entsteht. Alternativ können die erste und die zweite Zuführstelle auch so gewählt werden, dass auf dem Substrat eine Gradientenschicht oder eine Verbundschicht entsteht.Particle reservoir and a second layer with particles from the second particle reservoir is formed. alternative For example, the first and the second feed point can also be selected such that a gradient layer or a composite layer is formed on the substrate.
Die zweite Schicht oder die Gradientenschicht oder die Verbundschicht kann in einer weiteren Ausgestaltung dieses Verfahrens mit einer weiteren Schicht abgedeckt werden, wobei Partikel aus einem dritten Partikelreservoir einer weiteren Transportleitung zugeführt werden und dann dem zweiten Plasmastrahl eines zweiten Beschichtungskopfes zugeführt und dann auf die zweite Schicht mit Partikeln aus dem zweiten Partikelreservoir oder auf die Gradientenschicht oder auf die Verbundschicht aufgebracht werden.In a further embodiment of this method, the second layer or the gradient layer or the composite layer can be covered with a further layer, wherein particles from a third particle reservoir are fed to a further transport line and then fed to the second plasma jet of a second coating head and then onto the second layer Particles are applied from the second particle reservoir or on the gradient layer or on the composite layer.
Mit dem erfindungsgemäßen Verfahren und der erfindungsgemäßen Vorrichtung können so die Eigenschaften der aufzubringenden Schicht in einem weiten Bereich variiert werden. Durch gezielte und geregelte Einbringung der Beschichtungsmaterialien in den Plasmabeschichtungsprozess können funktionale Verbundschichten aufgebracht werden. Die Dicke und Zusammensetzung der Verbundschicht kann dabei so geregelt werden, dass die gewünschten elektrischen, mechanischen und chemischen Eigenschaften maßgeschneidert werden können. Auch können mehrere Schichten auch mit unterschiedlichen Eigenschaften sowie Gradientenschichten auf dem Substrat erzeugt werden.With the method according to the invention and the device according to the invention, the properties of the layer to be applied can thus be varied within a wide range. By targeted and controlled introduction of the coating materials in the plasma coating process functional composite layers can be applied. The thickness and composition of the composite layer can be controlled so that the desired electrical, mechanical and chemical properties can be tailored. Also, multiple layers can also be produced with different properties as well as gradient layers on the substrate.
Weitere Vorteile und vorteilhafte Ausgestaltungen der Erfindung sind Gegenstand der nachfolgenden Figuren sowie deren Beschreibungsteile.Further advantages and advantageous embodiments of the invention are the subject of the following figures and their parts description.
Es zeigen im Einzelnen:
- Fig. 1:
- schematisch eine Beschichtungsvorrichtung mit einem Plasmamodul;
- Fig. 2:
- schematisch eine nicht erfindungsgemäße Beschichtungsvorrichtung mit einem Plasmamodul;
- Fig. 3a - c:
- Beispiele in schematischer Darstellung für die mit der Beschichtungsvorrichtung herstellbaren Schichten;
- Fig. 4:
- eine schematische Darstellung für eine mögliche Schichtenabfolge auf einem Substrat nach einer Beschichtung;
- Fig. 5:
- eine schematische Darstellung des Prinzips einer Gradientenschicht durch ein Tiefenprofil; und
- Fig. 6:
- eine schematische Darstellung eines Beispiels für eine mit der Beschichtungsvorrichtung hergestellte leitfähige Beschichtung.
- Fig. 1:
- schematically a coating device with a plasma module;
- Fig. 2:
- schematically a non-inventive coating device with a plasma module;
- Fig. 3a - c:
- Examples in a schematic representation for the layers producible with the coating device;
- 4:
- a schematic representation of a possible layer sequence on a substrate after a coating;
- Fig. 5:
- a schematic representation of the principle of a gradient layer through a depth profile; and
- Fig. 6:
- a schematic representation of an example of a conductive coating produced by the coating device.
Der Beschichtungskopf 26 besteht aus einer Brennkammer 60 in der zwischen zwei Elektroden 62 und 64 ein Lichtbogen 20 gezündet wird. Diesem Lichtbogen 20 wird aus dem Netzteil 58 zur Aufrechterhaltung elektrische Energie zugeführt, so dass sich je nach Modulation des Netzteils 58 ein kontinuierlicher Plasmastrahl 22 oder gepulster Plasmastrahl 22 ausbildet, der an der Auslassseite 26A des Beschichtungskopfes 26 austritt. An der Einströmseite 26E des Beschichtungskopfes 26 kann ein Plasmaprozessgas 56 zugeführt werden, so dass die Brennkammer 60 in geregelter Art von dem Plasmaprozessgas 56 durchströmt wird. In den Plasmastrahl 22 kann über einen Injektor 66, der hier als externer Injektor dargestellt ist, ein Gemisch aus Prozessgas 30, 32 und Partikeln zugeführt werden. Durch die hohe Energiedichte im Plasmastrahl 22 können die Partikel teilweise aufgeschmolzen werden. So können sie auf der Oberfläche 12a des Substrats 12 als erste Schicht 50 abgeschieden werden. Da das Substrat 12 und der Beschichtungskopf 26 relativ zueinander beweglich sind, kann auf diese Weise eine durchgehende Schicht 50 auf dem Substrat 12 erzeugt werden.The
Das zum Injektor 66 geführte Partikelgemisch stammt bei der in
Die Dosiervorrichtung 18 ist dabei so ausgeführt, dass mit ihr ein zeitlich festes Verhältnis zwischen dem Anteil am Partikelgemisch von Partikeln aus dem ersten Partikelreservoir 14 und dem Anteil von Partikeln aus dem zweiten Partikelreservoir 16 eingestellt werden kann. Weiterhin können auch Dosiervorrichtungen 18 eingesetzt werden, mit denen darüber hinaus oder ausschließlich ein sich zeitlich änderndes Mischungsverhältnis eingestellt werden kann. Bei der Dosierung ist es auch möglich, zumindest zeitlich befristet, den Anteil eines der Partikel auf 0 zu setzen, so dass für einen bestimmten Bereich auf der Oberfläche des Substrates 12 die aufgebrachte erste Schicht 50 ausschließlich aus Partikeln aus einem Partikelreservoir besteht.The
Die Dosiervorrichtung 18 kann hierzu beispielsweise als Medienaddierer ausgeführt sein. Dabei können in den Medienaddierer zwei Fluide als zwei oder mehr Teilströme in eine oder mehrere Mischkammern eingeleitet werden, wo dann die Mischung erfolgt. Die Mischreaktion kann überwacht werden, wobei auch ein sich zeitlich änderndes Mischungsverhältnis eingestellt werden kann. Die Mischung wird dann üblicherweise aus einer Öffnung im Boden oder im Deckel der Mischkammer abgelassen und der Transportleitung 24 zugeführt, die beispielsweise als Schlauchsystem ausgeführt sein kann. Für die Transportleitung 24 können auch andere Materialien als Schläuche, wie etwa Metallleitungen, verwendet werden, je nachdem, welche Partikel für die Beschichtung des Substrats 12 eingesetzt werden sollen. Über die Transportleitung 24 gelangt das Partikelgemisch zu dem Injektor 66. Dem Injektor 66 kann ein Regler 28 vorgeschaltet sein, mit dessen Hilfe es möglich ist, die dem Injektor 66 zugeführte Menge des Partikelgemisches zu regeln. Dabei kann die Regelung durch ein Drosseln des Partikelstroms oder durch einen dynamischen Schaltvorgang, d. h. durch ein kontrolliertes Unterbrechen und Freischalten des Weges zur Transportleitung 24 im Regler 28 erfolgen.For this purpose, the
Mit dieser Vorrichtung lassen sich dynamisch veränderbare Schichten 50 auftragen. Schichtdicke und Materialzusammensetzung lassen sich dynamisch über die Förderraten der Partikelfördereinheiten 34, 36 und den Regler 28 einstellen. Damit kann die Schichtzusammensetzung auch während eines laufenden Beschichtungsprozesses dynamisch verändert werden.With this device, dynamically
Weiterhin besteht auch die Möglichkeit, mit dieser Anordnung eine sogenannte Gradientenschicht 54 (siehe
In
Um einen Schichtaufbau mit mehr als drei Schichten oder einen Schichtaufbau mit zwei oder mehr Gradientenschichten herstellen zu können, ist es möglich, die Beschichtungsvorrichtung 10 statt mit einem beschriebenen einfach betriebenen Beschichtungskopf 27 mit einem weiteren Beschichtungskopf 26 und zwei Injektoren 66, 68 auszustatten, die dem oben beschriebenen entsprechen.In order to be able to produce a layer structure with more than three layers or a layer structure with two or more gradient layers, it is possible to equip the
In
In
Im Segment A werden drei verschieden Materialien mit den Partikeln r, s, t in einem festen Verhältnis als Schicht auf dem Substrat 12 abgeschieden. Im Segment B, also zeitlich später im selben Beschichtungsvorgang, wird die Schichtdicke der Verbundschicht 55 stetig verringert und eine Deckschicht der Phase u auf die Verbundschicht 55 aufgebracht. Im Segment C wird die Schichtdicke der gesamten Multilage verringert bis in Segment D die Schicht komplett unterbrochen wird und damit das Substrat 12 an dieser Stelle nicht von einer Schicht bedeckt wird. Im Segment E wird die Schichtdicke der Phase u stetig erhöht und geht im Bereich F in eine Gradientenschicht 54 über, bei dem an der Oberfläche dieser Phase u das Material r in höchster Konzentration eingebettet ist.In segment A, three different materials with the particles r, s, t are deposited in a fixed ratio as a layer on the
- 1010
- Beschichtungsvorrichtungcoater
- 1212
- Substratsubstratum
- 12a12a
- Oberfläche des SubstratsSurface of the substrate
- 1414
- Partikelreservoirparticle reservoir
- 1515
- Partikelreservoirparticle reservoir
- 1616
- Partikelreservoirparticle reservoir
- 1818
- Dosiervorrichtungmetering
- 2020
- LichtbogenElectric arc
- 2222
- Plasmastrahlplasma jet
- 2323
- zweiter Plasmastrahlsecond plasma jet
- 2424
- Transportleitungtransport line
- 2525
- zweite Transportleitungsecond transport line
- 2626
- Beschichtungskopfcoating head
- 26A26A
- Auslassseiteoutlet
- 26E26E
- Einströmseiteinflow
- 2727
- zweiter Beschichtungskopfsecond coating head
- 27E27E
- Einströmseiteinflow
- 2828
- Reglerregulator
- 3030
- Prozessgasprocess gas
- 3232
- Prozessgasprocess gas
- 3333
- Prozessgasprocess gas
- 3434
- erste Partikelfördereinheitfirst particle conveying unit
- 3636
- zweite Partikelfördereinheitsecond particle conveying unit
- 3737
- dritte Partikelfördereinheitthird particle conveying unit
- 3838
- ProzessgasregeleinheitProcess gas control unit
- 4040
- PartikelfördereinheitParticle delivery unit
- 4242
- ProzessgasregeleinheitProcess gas control unit
- 4444
- ProzessgasregeleinheitProcess gas control unit
- 4646
- erste Zuführstellefirst feed point
- 4848
- zweite Zuführstellesecond feed point
- 5050
- erste Schichtfirst shift
- 5252
- zweite Schichtsecond layer
- 5353
- dritte Schichtthird layer
- 5454
- Gradientenschichtgradient
- 5555
- Verbundschichtcomposite layer
- 5656
- PlasmaprozessgasPlasma process gas
- 5858
- Netzteilpower adapter
- 6060
- Brennkammercombustion chamber
- 6262
- Elektrodeelectrode
- 6464
- Elektrodeelectrode
- 6666
- erster Injektorfirst injector
- 6868
- zweiter Injektorsecond injector
- 7070
- dritter Injektorthird injector
- 7272
- Isolationsschichtinsulation layer
- 7474
- leitfähige Schichtconductive layer
- A, B, C, D, E, FA, B, C, D, E, F
- Segmente einer SchichtSegments of a layer
- r, s, tr, s, t
- Partikelparticle
- S1S1
- Schichtmateriallayer material
- S2S2
- Schichtmateriallayer material
- UU
- ÜbergangsbereichTransition area
- K1K1
- BereichArea
- K2K2
- BereichArea
- K3K3
- BereichArea
Claims (14)
- A coating device (10) for coating a substrate (12), comprising a plasma generating device (20) for generating a plasma jet (22) which exits from a coating head (26) of the plasma generating device (20), comprising a first particle reservoir (14), a second particle reservoir (16) and a transport line (24) by means of which particles stored in the first particle reservoir (14) jointly with particles stored in the second particle reservoir (16) can be supplied to the plasma jet (22),
characterized by
a metering device (18) to which the particles from the first particle reservoir (14) can be supplied separately from the particles from the second particle reservoir (16), from which the particles from the first particle reservoir (14) and the particles from the second particle reservoir (16) can be supplied as a particle mixture to the transport line (24), and
wherein the quantity of the particles introduced from the first particle reservoir (14) into the transport line (24) relative to the quantity of the particles introduced from the second particle reservoir (16) into the transport line (24) can be metered by the metering device (18). - The coating device (10) according to claim 1, wherein the metering device (18) is configured so that it allows a time-variable composition of the particle mixture.
- The coating device (10) according to claim 1 or 2, wherein a controller (28) is provided for controlling the amount of particle mixture supplied to the plasma jet (22).
- The coating device (10) according to claim 3, wherein the controller (28) is designed as a switch for releasing and/or interrupting the supply of the particle mixture to the plasma jet (22).
- The coating device (10) according to any one of claims 1 to 4, wherein a plurality of particle reservoirs (14, 16) is provided.
- The coating device (10) according to any one of claims 1-5, wherein at least one separate process gas (30) is provided so that the particles from one of the particle reservoirs (14, 16) can be mixed with the process gas (30) and form a fluidized powder.
- The coating device (10) according to claim 6, wherein a separate process gas (30, 32) is assigned to each particle reservoir (14, 16).
- The coating device (10) according to claim 6 or 7, wherein the particle reservoir (14, 16) and the process gas (30, 32) assigned to it form a particle supply unit (34, 36) and the particle supply unit (34, 36) has a process gas control unit (38, 42) for controlling the mixing ratio between particles and the process gas (30, 36).
- The coating device (10) according to any one of claims 1 to 8, wherein the coating device (10) has at least one second coating head (27) and at least one further particle supply unit (37) assigned to the second coating head (27), the further particle supply unit (37) comprising a particle reservoir (15), an assigned process gas (33) and a process gas control unit (44).
- The coating device (10) according to claim 9, wherein the coating device has a plurality of coating heads (26, 27) and respectively assigned particle supply units (34, 36, 37).
- Method for coating a substrate (12) characterized by the following steps:- generating a plasma jet (22) which exits from the respective coating head (26, 27) with at least one plasma generating device (20) each having a coating head (26, 27);- supplying particles from at least one first particle reservoir (14) to a metering device (18);- supplying particles from at least one second particle reservoir (16) to the metering device (18) separately from the particles from the first particle reservoir (14);- mixing the particles from the first particle reservoir (14) and from the second particle reservoir (16) to form a particle mixture in the metering device (18), wherein a mixing ratio of the particles from the first particle reservoir (14) to the particles from the second particle reservoir (16) is predefined by the metering device (18) ;- supplying the particle mixture from the metering device (18) via a transport line (24) to the plasma jet (22); and- directing the plasma jet (22) together with the particle mixture onto a surface (12a) of the substrate (12) to form the coating (50).
- The method according to claim 11, wherein particles from a third particle reservoir (15) are supplied to a metering device (18) and are mixed in this and are supplied via a transport line (24) from the metering device (18) to the plasma jet (23).
- The method for coating a substrate (12) according to claim 12, wherein the particles from the first particle reservoir (14) are fluidized with a first process gas (30), the particles from the second particle reservoir (16) are fluidized with a second process gas (32), and the particles from the third particle reservoir (15) are fluidized with a third process gas (33).
- The method for coating a substrate (12) according to claim 11, wherein the proportion of particles from the first particle reservoir (14) relative to the proportion of particles from the second particle reservoir (16) is varied during the coating of the substrate (12).
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ES2641835T3 (en) | 2017-11-14 |
US20140087084A1 (en) | 2014-03-27 |
EP2711441A1 (en) | 2014-03-26 |
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