EP2603455A1 - Utilisation d'un réacteur avec échangeur de chaleur intégré dans un procédé d'hydrodéchloration de tétrachlorure de silicium - Google Patents
Utilisation d'un réacteur avec échangeur de chaleur intégré dans un procédé d'hydrodéchloration de tétrachlorure de siliciumInfo
- Publication number
- EP2603455A1 EP2603455A1 EP11739019.5A EP11739019A EP2603455A1 EP 2603455 A1 EP2603455 A1 EP 2603455A1 EP 11739019 A EP11739019 A EP 11739019A EP 2603455 A1 EP2603455 A1 EP 2603455A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- reaction chamber
- silicon tetrachloride
- hydrogen
- stream
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/04—Pressure vessels, e.g. autoclaves
- B01J3/042—Pressure vessels, e.g. autoclaves in the form of a tube
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/2415—Tubular reactors
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
- C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/0009—Coils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/00094—Jackets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00132—Controlling the temperature using electric heating or cooling elements
- B01J2219/00135—Electric resistance heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00157—Controlling the temperature by means of a burner
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
- Y02P20/129—Energy recovery, e.g. by cogeneration, H2recovery or pressure recovery turbines
Definitions
- the invention relates to a process for the conversion of silicon tetrachloride with hydrogen to trichlorosilane in a modified Hydrodechlor mecanical dressing.
- the invention further relates to the use of such a modified
- Hydrodechlorination reactor as an integral part of a plant for the production of trichlorosilane from metallurgical silicon.
- SiCI 4 and HS1CI3 are formed together. It is therefore necessary to merge these two products into each other and thus meet the respective demand for one of the products.
- high-purity H S1CI3 is an important feedstock in the production of solar silicon.
- Reactor wall which can lead to silicon deposits, as possible to
- Hydrogen can be passed through a pressure-operated reaction chamber, preferably a tubular reactor, preferably with a
- a catalytic Wall coating may be equipped, it being preferred if a catalytic Wall coating is provided and a fixed bed catalyst is used only optional.
- Hydrogen to STC can be a method in which high space / time yields of TCS are obtained with a high selectivity.
- Heat exchanger certain ceramic materials can be used because they are sufficiently inert and even at high temperatures such. B. 1 .000 ° C ensure the compressive strength of the reactor, without the ceramic material, for example, undergoes a phase transformation, which would damage the microstructure and thus adversely affect the mechanical strength. It is necessary to use a gas-tight reaction chamber. The gas tightness and inertness can be achieved by high temperature resistant ceramics, which are specified below.
- the reaction chamber material and the heat exchanger material can be provided with a catalytically active inner coating. On an inert bulk material to improve the flow dynamics can be dispensed with. The dimensioning of the reaction chamber with integrated heat exchanger and the design of the complete Hydrodechlor mecanicsreaktors be through the
- the reaction chamber can be both a single reaction tube with the associated periphery and a combination of many reactor tubes.
- the arrangement of many reactor tubes in a heated chamber may be useful, in which the amount of heat is introduced, for example by natural gas burners.
- the burners should not be aimed directly at the tubes. They can, for example, be aligned indirectly from above into the reactor space and distributed over the reactor space.
- the reactor system is connected to a heat recovery system through the integrated heat exchanger.
- the invention now provides a process in which a silicon tetrachloride-containing educt stream and a hydrogen-containing reactant stream are reacted in a hydrodechlorination reactor by supplying heat to form a trichlorosilane-containing and HCI-containing product mixture, characterized in that the process has the following further features comprising: the educt current containing silicon tetrachloride and / or the hydrogen-containing reactant stream are passed under pressure into the pressure-operated hydrodechlorination reactor; the reactor comprises at least one flow tube projecting into a reaction chamber through which one or both educt streams are conducted into the reaction chamber; the product mixture is called a pressurized stream led out of the reaction chamber; the reaction chamber and, optionally, the flow tube are made of a ceramic material; that in the
- Reaction chamber formed product mixture is led out of the reaction chamber, that the Edukt- / product flow in the interior of the reaction chamber is at least partially outwardly along the projecting into the reaction chamber flow tube; the supply of heat takes place through a
- Reaction chamber at least partially enclosing heating jacket or boiler room; and the reaction chamber comprises, downstream of the region of the reaction chamber heated by the heating jacket or heating chamber, an integrated heat exchanger which cools the heated product mixture, the heat removed being used to preheat the silicon tetrachloride-containing educt stream and / or the
- the equilibrium reaction in the hydrodechlorination reactor is typically at 700 ° C to 1, 000 ° C, preferably 850 ° C to 950 ° C, and at a pressure in the range between 1 and 10 bar, preferably between 3 and 8 bar, more preferably between 4 and 6 bar, performed.
- the hydrodechlorination reactor may comprise a single flow tube through which both educt streams are passed in common or the reactor may more than one
- the ceramic material for the reaction chamber, the integrated heat exchanger tubes and, optionally, the flow tube is preferably selected from Al 2 O 3, AlN, S 13 N 4, SiCN or SiC, more preferably selected from Si-infiltrated SiC, isostatically pressed SiC, hot isostatically pressed SiC or pressureless sintered SiC (SSiC).
- SiC-containing reaction chamber eg one or more reactor tubes
- riser (s) and just such integrated heat exchanger tubes are preferred because they have a particularly good thermal conductivity, which allow a uniform heat distribution and a good heat input for the reaction and a good thermal shock resistance. It is particularly preferred if the reaction chamber, the riser (s) and the integrated heat exchanger tubes consist of non-pressure sintered SiC (SSiC).
- the silicon tetrachloride-containing educt stream and / or the hydrogen-containing educt stream is preferably at a pressure in the range from 1 to 10 bar, preferably in the range from 3 to 8 bar, particularly preferably in the range from 4 to 6 bar, and at a temperature in Range of 150 ° C to 900 ° C, preferably in the range of 300 ° C to 800 ° C, more preferably in the range of 500 ° C to 700 ° C, is conducted into the Hydrodechlor mecanicsreaktor.
- the hydrogen-containing reactant stream is usually gaseous.
- the liquid silicon tetrachloride-containing educt stream can also initially be converted into the gas phase, preferably by means of a heat exchanger, in particular using the available waste heat, and via a flow tube into the reactor chamber.
- the hydrogen-containing educt stream to a starting material stream containing silicon tetrachloride, which is preferably already present in gaseous form, and to pass the mixture into the reactor chamber via a flow tube.
- the common reactant stream is preferably gaseous.
- the heat input for the reaction in the Hydrodechlor michsreaktor can be done via a heating jacket, which is heated by an electrical resistance heater or a boiler room.
- the boiler room can also be a combustion chamber, which is operated with fuel gas and combustion air.
- Reactor tubes and / or catalyzed by a reaction catalyzing the coating of a fixed bed arranged in the reactor chamber.
- the reactor inner wall and / or the optionally used fixed bed can be provided with the catalytically active coating as follows:
- a suspension hereinafter also referred to as a paint, containing a) at least one active component selected from the metals Ti, Zr, Hf, Ni, Pd, Pt, Mo, W, Nb, Ta, Ba, Sr, Ca , Mg, Ru, Rh, Ir or combinations thereof or their silicide compounds, b) at least one active component selected from the metals Ti, Zr, Hf, Ni, Pd, Pt, Mo, W, Nb, Ta, Ba, Sr, Ca , Mg, Ru, Rh, Ir or combinations thereof or their silicide compounds, b) at least one active component selected from the metals Ti, Zr, Hf, Ni, Pd, Pt, Mo, W, Nb, Ta, Ba, Sr, Ca , Mg, Ru, Rh, Ir or combinations thereof or their silicide compounds, b) at least one active component selected from the metals Ti, Zr, Hf, Ni, Pd, Pt, Mo, W, Nb, Ta, Ba, Sr
- Suspending agent and optionally c) at least one auxiliary component, in particular for stabilizing the suspension, for improving the storage stability of
- Suspension on the surface to be coated by applying the suspension to the inner wall of the one or more reactor tubes and, optionally, by applying the suspension to the surface of random packings of the optionally provided fixed bed; by drying the applied suspension; and by annealing the coated and dried suspension at a Temperature in the range of 500 ° C to 1, 500 ° C under inert gas or hydrogen.
- the tempered fillers may then be in the one or more
- Reactor tubes are filled.
- the tempering and optionally also the previous drying can also be done with already filled in packing.
- thermoplastic polymeric acrylate resins such as those used in the paint and coatings industry. These include, for example, polymethyl acrylate, polyethyl acrylate, polypropyl methacrylate or polybutyl acrylate. These are commercially available systems, for example those available under the brand name Degalan® from Evonik Industries.
- one or more auxiliaries or auxiliary components are used as further components, i. H. in the sense of component c).
- auxiliary component c) optional solvent or diluent optional solvent or diluent.
- organic solvents in particular aromatic solvents or diluents, such as toluene, xylenes, and ketones, aldehydes, esters, alcohols or mixtures of at least two of the aforementioned solvents or diluents are suitable.
- stabilization of the suspension can advantageously be achieved by inorganic or organic rheological additives.
- preferred inorganic rheology additives as component c) include, for example, kieselguhr, bentonites, smectites and attapulgites, synthetic
- organic rheology additives or auxiliary components c) preferably include castor oil and its derivatives, such as polyamide-modified castor oil, polyolefin or polyolefin-modified polyamide, as well as polyamide and derivatives thereof, such as those sold under the brand name Luvotix®, and mixed systems of inorganic and organic rheology.
- suitable adhesion promoters from the group of silanes or siloxanes can also be used as auxiliary components c).
- Examples of these include, but are not limited to, dimethyl, diethyl, dipropyl, dibutyl, diphenylpolysiloxane or mixed systems thereof, such as phenylethyl or phenylbutylsiloxanes or other mixed systems, as well as mixtures thereof.
- the lacquer or paste according to the invention can be produced in a comparatively simple and economical manner, for example by mixing, stirring or kneading the starting materials, cf. Components a), b) and optionally c), in corresponding, known to those skilled per se, common apparatuses are obtained. Furthermore, reference is made to the present inventive examples.
- Another object of the invention is the use of a Hydrodechlo- ration reactor as an integral part of a plant for the production of
- Tnchlorsilan of metallurgical silicon characterized in that the reactor is operated under pressure; the reactor at least one in one
- Reaction chamber protruding flow tube for the incoming educt streams comprises; the reaction chamber and, optionally, the flow tube made of a ceramic material; the educt / product stream inside the
- Reaction chamber is guided so that the educt / product stream at least partially outside along the projecting into the reaction chamber
- Reaction chamber is at least partially enclosing heating jacket or boiler room; and the reaction chamber has an integrated downstream of the region of the reaction chamber heated by the heating jacket or heating chamber
- Heat exchanger for cooling the heated product mixture comprises.
- the hydrodechlorination reactor to be used according to the invention can be of the type described above.
- the plant for the production of tochlorosilane in which the hydrodechlorination reactor can preferably be used, comprises: a unit for reacting silicon tetrachloride with hydrogen to form trichlorosilane comprising:
- a hydrodechlorination reactor (3) comprising a reaction chamber (21);
- reaction chamber (21) At least one in the reaction chamber (21) projecting flow tube (22) through which a silicon tetrachloride Eduktstrom (1) and / or a hydrogen-containing Eduktstrom (2) into the reaction chamber (21) can be performed, wherein the reaction chamber (21) and, optionally , the
- Flow tube (22) made of a ceramic material
- Reaction chamber (21) is arranged;
- Subsystems (7a, 7b, 7c) for separating one or more products comprising silicon tetrachloride, trichlorosilane, hydrogen and HCl;
- a line (8), the separated silicon tetrachloride in the line (1) for the silicon tetrachloride-containing reactant stream leads, preferably upstream of the heat exchanger (5);
- a substation for reacting metallurgical silicon with HCl to form silicon tetrachloride comprising:
- Hydrochlorination (12) comes, said hydrogen via the line (2) for the hydrogen-containing Eduktstrom in the
- Silicon tetrachloride and trichlorosilane from the remaining product mixture which originates from the reaction in the Hydrochlor mecanicsstrom (12), wherein the silicon tetrachloride via the line (1) for the silicon tetrachloride-containing reactant stream in the Hydrodechlor mecanicsreaktor (3) is guided;
- FIG. 1 shows, by way of example and schematically, a hydrodechlorination reactor which according to the invention is used in a process for reacting silicon tetrachloride with hydrogen to form trichlorosilane or as an integral part of a plant for
- Figure 2 shows an example and schematically a plant for the production of
- Hydrodechlorination reactor can be used.
- FIG. 3 shows a graphic representation of the amount of TCS in the product (in% by mass) as a function of the feed stream STC (in ml / min) and of the STC conversion (in%) as a function of the feed stream STC (in ml / min) in each case according to the invention (with integrated heat exchanger) and not according to the invention (without integrated heat exchanger).
- the hydrodechlorination reactor 3 shown in FIG. 1 comprises one in one
- Boiler chamber 15 arranged reaction chamber 21 and a projecting into the reaction chamber 21 flow tube 22 can be performed by the educt streams 1 and / or 2 in the reaction chamber 21. Downstream of the through
- the plant shown in FIG. 2 comprises a hydrodechlorination reactor 3
- Eduktströme 1 and / or 2 can be performed in the reaction chamber 21, a led out of the Hydrodechlorierungsreaktor 3 line 4 for a
- Product mixture line 4 in the silicon tetrachloride line 1 and in the hydrogen line 2 is possible.
- the plant further comprises a sub-unit 7 for separating silicon tetrachloride 8, trichlorosilane 9, hydrogen 10 and HCl 11.
- the separated silicon tetrachloride is passed through the line 8 in the
- Silicon tetrachloride line 1 led, fed the separated trichlorosilane through the line 9 of a final product removal, the separated hydrogen passed through the line 10 in the hydrogen line 2 and fed the separated HCl through line 11 to a plant 12 for hydrochlorination of silicon.
- the system further comprises a capacitor 13 for separating the
- Hydrochlorination plant 12 is derived, this hydrogen over the
- Hydrogen line 2 is guided via the heat exchanger 5 in the Hydrodechlor mecanical.
- the plant also comprises a recuperator 16, which preheats the combustion air 19 provided for the heating chamber 15 with the flue gas 20 flowing out of the heating chamber 15 and a plant 17 for generating steam with the aid of the flue gas flowing out of the recuperator 16.
- reaction tube a tube made of SSiC having a length of 1, 400 mm and an inner diameter of 16 mm was used.
- the reaction tube was from equipped with an electric heating jacket on the outside. The temperature measurement showed a constant temperature of 900 ° C over a pipe length of 400 mm. This area was rated as a reaction zone.
- the reaction tube was covered with a Pt-containing catalyst layer.
- the reaction tube was filled with rings of SSiC having a diameter of 9 mm and a height of 9 mm. To form the catalyst, the reactor tube was placed on a
- reaction with integrated heat exchanger As a reaction tube, a tube of SSiC having a length of 1 .400 mm and an inner diameter of 16 mm was used. The reaction tube was equipped from the outside with an electric heating jacket. The temperature measurement showed a constant temperature of 900 ° C over a pipe length of 400 mm. This area was rated as a reaction zone. The reaction tube was covered with a Pt-containing catalyst layer. In the reaction tube, a second tube made of SSiC that an outer diameter of 5 mm and a
- Wall thickness of 1, 5 mm had. This tube was not coated.
- the STC and the hydrogen were introduced from below.
- the educt mixture flowed upwards inside the inner tube and was heated up. It then flowed into the reaction zone via the opening of the inner tube.
- the product mixture was led down out of the reaction tube.
- the reactor tube was brought to 900 ° C, with nitrogen at 3 bar was passed through the reaction tube absolute. To two hours, the nitrogen was replaced by hydrogen. After another hour in a stream of hydrogen, also below 4 bar absolute, was
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
L'invention concerne un procédé de conversion de tétrachlorure de silicium en trichlorosilane au moyen d'hydrogène dans un réacteur d'hydrodéchloration modifié. Elle concerne en outre l'utilisation d'un tel réacteur d'hydrodéchloration modifié en tant que partie intégrante d'une installation de production de trichlorosilane à partir de silicium métallurgique.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010039267A DE102010039267A1 (de) | 2010-08-12 | 2010-08-12 | Verwendung eines Reaktors mit integriertem Wärmetauscher in einem Verfahren zur Hydrodechlorierung von Siliziumtetrachlorid |
PCT/EP2011/061911 WO2012019856A1 (fr) | 2010-08-12 | 2011-07-13 | Utilisation d'un réacteur avec échangeur de chaleur intégré dans un procédé d'hydrodéchloration de tétrachlorure de silicium |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2603455A1 true EP2603455A1 (fr) | 2013-06-19 |
Family
ID=44532788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP11739019.5A Withdrawn EP2603455A1 (fr) | 2010-08-12 | 2011-07-13 | Utilisation d'un réacteur avec échangeur de chaleur intégré dans un procédé d'hydrodéchloration de tétrachlorure de silicium |
Country Status (9)
Country | Link |
---|---|
US (1) | US20130224098A1 (fr) |
EP (1) | EP2603455A1 (fr) |
JP (1) | JP2013533203A (fr) |
KR (1) | KR20130097182A (fr) |
CN (1) | CN103153857A (fr) |
CA (1) | CA2806810A1 (fr) |
DE (1) | DE102010039267A1 (fr) |
TW (1) | TW201223866A (fr) |
WO (1) | WO2012019856A1 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012223784A1 (de) * | 2012-12-19 | 2014-06-26 | Wacker Chemie Ag | Verfahren zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan |
EP3053882B1 (fr) | 2013-09-30 | 2018-12-05 | LG Chem, Ltd. | Procédé de production de trichlorosilane |
WO2015047043A1 (fr) * | 2013-09-30 | 2015-04-02 | 주식회사 엘지화학 | Procédé de production de trichlorosilane |
EP3075707A1 (fr) * | 2015-04-02 | 2016-10-05 | Evonik Degussa GmbH | Procédé d'hydrogénation de tétrachlorure de silicium en trichlorosilane à l'aide d'un mélange gazeux d'hydrogène et de chlorure d'hydrogène |
EP3121149A1 (fr) | 2015-07-21 | 2017-01-25 | Evonik Degussa GmbH | Acceleration de l'echange thermique par formage adapte dans un tuyau de retour d'un systeme de materiau xsic |
WO2018095525A1 (fr) | 2016-11-23 | 2018-05-31 | Wacker Chemie Ag | Procédé d'hydrogénation de tétrachlorure de silicium |
CN113242838A (zh) * | 2018-12-19 | 2021-08-10 | 瓦克化学股份公司 | 制备有机氯硅烷的方法 |
EP3747537A1 (fr) * | 2019-06-06 | 2020-12-09 | CMI UVK GmbH | Réacteur pour le traitement d'une solution d'acide contenant du métal, en particulier une boue de décapage, et/ou pour la régénération d'un composant d'acide à partir d'une solution d'acide contenant du métal, dispositif de préchauffage, procédé |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040173597A1 (en) * | 2003-03-03 | 2004-09-09 | Manoj Agrawal | Apparatus for contacting gases at high temperature |
DE102004019760A1 (de) * | 2004-04-23 | 2005-11-17 | Degussa Ag | Verfahren zur Herstellung von HSiCI3 durch katalytische Hydrodehalogenierung von SiCI4 |
DE102005005044A1 (de) * | 2005-02-03 | 2006-08-10 | Consortium für elektrochemische Industrie GmbH | Verfahren zur Herstellung von Trichlorsilan mittels thermischer Hydrierung von Siliciumtetrachlorid |
JP5205910B2 (ja) * | 2006-10-31 | 2013-06-05 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
JP2008150277A (ja) * | 2006-11-21 | 2008-07-03 | Mitsubishi Materials Corp | 耐熱耐食性部材及びトリクロロシラン製造装置 |
WO2008062629A1 (fr) * | 2006-11-21 | 2008-05-29 | Mitsubishi Materials Corporation | Appareil pour la fabrication de trichlorosilane |
DE102010000979A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Verwendung eines druckbetriebenen keramischen Wärmetauschers als integraler Bestandteil einer Anlage zur Umsetzung von Siliciumtetrachlorid zu Trichlorsilan |
DE102010000981A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium |
DE102010000978A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Strömungsrohrreaktor zur Umsetzung von Siliciumtetrachlorid zu Trichlorsilan |
DE102010000980A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Katalytische Systeme zur kontinuierlichen Umsetzung von Siliciumtetrachlorid zu Trichlorsilan |
-
2010
- 2010-08-12 DE DE102010039267A patent/DE102010039267A1/de not_active Withdrawn
-
2011
- 2011-07-13 WO PCT/EP2011/061911 patent/WO2012019856A1/fr active Application Filing
- 2011-07-13 CN CN2011800494608A patent/CN103153857A/zh active Pending
- 2011-07-13 JP JP2013523549A patent/JP2013533203A/ja not_active Withdrawn
- 2011-07-13 US US13/816,569 patent/US20130224098A1/en not_active Abandoned
- 2011-07-13 CA CA2806810A patent/CA2806810A1/fr not_active Abandoned
- 2011-07-13 KR KR1020137006141A patent/KR20130097182A/ko not_active Application Discontinuation
- 2011-07-13 EP EP11739019.5A patent/EP2603455A1/fr not_active Withdrawn
- 2011-08-09 TW TW100128352A patent/TW201223866A/zh unknown
Non-Patent Citations (1)
Title |
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See references of WO2012019856A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2012019856A1 (fr) | 2012-02-16 |
JP2013533203A (ja) | 2013-08-22 |
DE102010039267A1 (de) | 2012-02-16 |
CN103153857A (zh) | 2013-06-12 |
CA2806810A1 (fr) | 2012-02-16 |
US20130224098A1 (en) | 2013-08-29 |
TW201223866A (en) | 2012-06-16 |
KR20130097182A (ko) | 2013-09-02 |
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