EP2507403A4 - LINEAR DEPOSIT SOURCE - Google Patents
LINEAR DEPOSIT SOURCEInfo
- Publication number
- EP2507403A4 EP2507403A4 EP10833708.0A EP10833708A EP2507403A4 EP 2507403 A4 EP2507403 A4 EP 2507403A4 EP 10833708 A EP10833708 A EP 10833708A EP 2507403 A4 EP2507403 A4 EP 2507403A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- deposition source
- linear deposition
- linear
- source
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L59/00—Thermal insulation in general
- F16L59/02—Shape or form of insulating materials, with or without coverings integral with the insulating materials
- F16L59/029—Shape or form of insulating materials, with or without coverings integral with the insulating materials layered
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/628,189 US20100159132A1 (en) | 2008-12-18 | 2009-11-30 | Linear Deposition Source |
PCT/US2010/039093 WO2011065999A1 (en) | 2008-12-18 | 2010-06-17 | Linear deposition source |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2507403A1 EP2507403A1 (en) | 2012-10-10 |
EP2507403A4 true EP2507403A4 (en) | 2013-10-23 |
Family
ID=44935927
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP10833708.0A Withdrawn EP2507403A4 (en) | 2009-11-30 | 2010-06-17 | LINEAR DEPOSIT SOURCE |
EP10833707.2A Withdrawn EP2507402A4 (en) | 2009-11-30 | 2010-06-17 | LINEAR DEPOSIT SOURCE |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP10833707.2A Withdrawn EP2507402A4 (en) | 2009-11-30 | 2010-06-17 | LINEAR DEPOSIT SOURCE |
Country Status (4)
Country | Link |
---|---|
EP (2) | EP2507403A4 (ko) |
KR (2) | KR20120101425A (ko) |
CN (2) | CN102712993A (ko) |
TW (2) | TW201118961A (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102150436B1 (ko) * | 2013-12-20 | 2020-09-01 | 엘지디스플레이 주식회사 | 증발원 및 이를 포함하는 증착 장치 |
DE102014007522A1 (de) * | 2014-05-23 | 2015-11-26 | Manz Ag | Trägeranordnung für eine Verdampferquelle |
KR102260572B1 (ko) * | 2014-07-07 | 2021-06-07 | (주)선익시스템 | 복수의 증발원을 갖는 박막 증착장치 |
WO2016006740A1 (ko) * | 2014-07-07 | 2016-01-14 | 주식회사 선익시스템 | 복수의 도가니를 갖는 박막 증착장치 |
KR102260575B1 (ko) * | 2014-07-07 | 2021-06-07 | (주)선익시스템 | 복수의 증발원을 갖는 박막 증착장치 |
KR102260617B1 (ko) * | 2014-07-07 | 2021-06-07 | (주)선익시스템 | 복수의 도가니가 장착된 증발원을 갖는 박막 증착장치 |
WO2017008838A1 (en) * | 2015-07-13 | 2017-01-19 | Applied Materials, Inc. | Evaporation source. |
KR102369676B1 (ko) | 2017-04-10 | 2022-03-04 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치 및 표시 장치의 제조방법 |
EP4172377A1 (en) * | 2020-06-29 | 2023-05-03 | Applied Materials, Inc. | Nozzle assembly, evaporation source, deposition system and method for depositing an evaporated material onto a substrate |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030054100A1 (en) * | 2001-09-14 | 2003-03-20 | Erten Eser | Multiple-nozzle thermal evaporation source |
EP1342808A1 (en) * | 2002-03-08 | 2003-09-10 | Eastman Kodak Company | Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device |
US20040255857A1 (en) * | 2003-05-16 | 2004-12-23 | Chow Peter P. | Thin-film deposition evaporator |
EP1632586A2 (en) * | 2004-08-24 | 2006-03-08 | Tohoku Pioneer Corporation | Film formation source, vacuum film formation apparatus, and method of manufacturing organic EL panel |
JP2007146219A (ja) * | 2005-11-28 | 2007-06-14 | Hitachi Zosen Corp | 真空蒸着装置 |
US20090229524A1 (en) * | 2006-07-03 | 2009-09-17 | Yas Co., Ltd. | Multiple Nozzle Evaporator for Vacuum Thermal Evaporation |
WO2009134041A2 (en) * | 2008-04-29 | 2009-11-05 | Sunic System. Ltd. | Evaporator and vacuum deposition apparatus having the same |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4401052A (en) * | 1979-05-29 | 1983-08-30 | The University Of Delaware | Apparatus for continuous deposition by vacuum evaporation |
US5141564A (en) * | 1988-05-03 | 1992-08-25 | The Boeing Company | Mixed ternary heterojunction solar cell |
DE69215930T2 (de) * | 1991-03-06 | 1997-04-03 | Oowada Carbon Kogyo Kk | Mit Kohlefaser und anorganischer Faser armierter Kohlenstoffverbundwerkstoff |
DE19848177A1 (de) * | 1998-10-20 | 2000-04-27 | Leybold Systems Gmbh | Bedampfungsvorrichtung |
US7194197B1 (en) * | 2000-03-16 | 2007-03-20 | Global Solar Energy, Inc. | Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer |
DE10025628A1 (de) * | 2000-05-24 | 2001-11-29 | Sgl Carbon Ag | Abwickelbare Bauteile aus Faserverbundwerkstoffen, Verfahren zu deren Herstellung und deren Verwendung |
US20040076810A1 (en) * | 2002-10-17 | 2004-04-22 | Ucar Carbon Company Inc. | Composite high temperature insulator |
KR20060060994A (ko) * | 2004-12-01 | 2006-06-07 | 삼성에스디아이 주식회사 | 증착 소스 및 이를 구비한 증착 장치 |
KR100671673B1 (ko) * | 2005-03-09 | 2007-01-19 | 삼성에스디아이 주식회사 | 다중 진공증착장치 및 제어방법 |
JP4474324B2 (ja) * | 2005-04-28 | 2010-06-02 | パナソニック株式会社 | 成膜装置 |
JP4894193B2 (ja) * | 2005-08-09 | 2012-03-14 | ソニー株式会社 | 蒸着装置、および表示装置の製造システム |
JP2007066564A (ja) * | 2005-08-29 | 2007-03-15 | Toshiba Matsushita Display Technology Co Ltd | 有機el表示装置の製造方法及び製造装置 |
-
2010
- 2010-06-17 KR KR1020127014038A patent/KR20120101425A/ko not_active Application Discontinuation
- 2010-06-17 TW TW099119643A patent/TW201118961A/zh unknown
- 2010-06-17 EP EP10833708.0A patent/EP2507403A4/en not_active Withdrawn
- 2010-06-17 EP EP10833707.2A patent/EP2507402A4/en not_active Withdrawn
- 2010-06-17 CN CN2010800599183A patent/CN102712993A/zh active Pending
- 2010-06-17 KR KR1020127014037A patent/KR20120104559A/ko not_active Application Discontinuation
- 2010-06-17 CN CN2010800599075A patent/CN102686765A/zh active Pending
- 2010-06-17 TW TW099119640A patent/TW201142055A/zh unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030054100A1 (en) * | 2001-09-14 | 2003-03-20 | Erten Eser | Multiple-nozzle thermal evaporation source |
EP1342808A1 (en) * | 2002-03-08 | 2003-09-10 | Eastman Kodak Company | Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device |
US20040255857A1 (en) * | 2003-05-16 | 2004-12-23 | Chow Peter P. | Thin-film deposition evaporator |
EP1632586A2 (en) * | 2004-08-24 | 2006-03-08 | Tohoku Pioneer Corporation | Film formation source, vacuum film formation apparatus, and method of manufacturing organic EL panel |
JP2007146219A (ja) * | 2005-11-28 | 2007-06-14 | Hitachi Zosen Corp | 真空蒸着装置 |
US20090229524A1 (en) * | 2006-07-03 | 2009-09-17 | Yas Co., Ltd. | Multiple Nozzle Evaporator for Vacuum Thermal Evaporation |
WO2009134041A2 (en) * | 2008-04-29 | 2009-11-05 | Sunic System. Ltd. | Evaporator and vacuum deposition apparatus having the same |
Non-Patent Citations (1)
Title |
---|
See also references of WO2011065999A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP2507403A1 (en) | 2012-10-10 |
TW201142055A (en) | 2011-12-01 |
EP2507402A1 (en) | 2012-10-10 |
KR20120101425A (ko) | 2012-09-13 |
KR20120104559A (ko) | 2012-09-21 |
TW201118961A (en) | 2011-06-01 |
CN102686765A (zh) | 2012-09-19 |
CN102712993A (zh) | 2012-10-03 |
EP2507402A4 (en) | 2013-10-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20120529 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR |
|
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20130924 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: F16L 59/02 20060101ALI20130918BHEP Ipc: C23C 14/26 20060101ALI20130918BHEP Ipc: C23C 14/24 20060101AFI20130918BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20140423 |