EP2170764A4 - Verfahren zur herstellung von hierarchischen artikeln - Google Patents

Verfahren zur herstellung von hierarchischen artikeln

Info

Publication number
EP2170764A4
EP2170764A4 EP08769665A EP08769665A EP2170764A4 EP 2170764 A4 EP2170764 A4 EP 2170764A4 EP 08769665 A EP08769665 A EP 08769665A EP 08769665 A EP08769665 A EP 08769665A EP 2170764 A4 EP2170764 A4 EP 2170764A4
Authority
EP
European Patent Office
Prior art keywords
methods
making hierarchical
hierarchical articles
articles
making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08769665A
Other languages
English (en)
French (fr)
Other versions
EP2170764A2 (de
Inventor
Jun-Ying Zhang
Jerome C Porque
Jennifer J Sahlin
Terry L Smith
Ding Wang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of EP2170764A2 publication Critical patent/EP2170764A2/de
Publication of EP2170764A4 publication Critical patent/EP2170764A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0361—Tips, pillars

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Micromachines (AREA)
  • Drying Of Semiconductors (AREA)
EP08769665A 2007-06-21 2008-05-23 Verfahren zur herstellung von hierarchischen artikeln Withdrawn EP2170764A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US99975207P 2007-06-21 2007-06-21
US99975307P 2007-06-21 2007-06-21
PCT/US2008/064631 WO2009002644A2 (en) 2007-06-21 2008-05-23 Methods of making hierarchical articles

Publications (2)

Publication Number Publication Date
EP2170764A2 EP2170764A2 (de) 2010-04-07
EP2170764A4 true EP2170764A4 (de) 2011-06-22

Family

ID=40186234

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08769665A Withdrawn EP2170764A4 (de) 2007-06-21 2008-05-23 Verfahren zur herstellung von hierarchischen artikeln

Country Status (3)

Country Link
EP (1) EP2170764A4 (de)
CN (1) CN101827783A (de)
WO (1) WO2009002644A2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR9610557A (pt) * 1995-09-20 1999-12-21 Uponor Bv Produtos poliméricos orientados
US9061892B2 (en) 2008-03-17 2015-06-23 Avery Dennison Corporation Functional micro- and/or nano-structure bearing constructions and/or methods for fabricating same
DE102010023490A1 (de) * 2010-06-11 2011-12-15 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Dreidimensionale metallbedeckte Nanostrukturen auf Substratoberflächen,Verfahren zu deren Erzeugung sowie deren Verwendung
DE102010026490A1 (de) 2010-07-07 2012-01-12 Basf Se Verfahren zur Herstellung von feinstrukturierten Oberflächen
JP6345935B2 (ja) * 2010-10-28 2018-06-20 スリーエム イノベイティブ プロパティズ カンパニー 細菌付着を低減するための加工表面
US9085019B2 (en) 2010-10-28 2015-07-21 3M Innovative Properties Company Superhydrophobic films
CN102480001B (zh) * 2011-03-25 2013-07-03 深圳光启高等理工研究院 一种超材料制备方法
CN102810504A (zh) * 2011-05-31 2012-12-05 无锡华润上华半导体有限公司 厚铝生长工艺方法
US8877072B2 (en) 2011-10-10 2014-11-04 Ranjana Sahai Three-dimensional fractal graduated-branching hierarchical structures and fabrication method thereof
CN102381679A (zh) * 2011-10-28 2012-03-21 华中科技大学 一种仿壁虎毛的干性粘合剂制作方法
CA2787584A1 (en) 2012-08-22 2014-02-22 Hy-Power Nano Inc. Method for continuous preparation of indium-tin coprecipitates and indium-tin-oxide nanopowders with substantially homogeneous indium/tin composition, controllable shape and particle size
CN103204460B (zh) * 2013-03-21 2016-03-02 北京工业大学 基于激光干涉诱导交联反应的金属微纳结构的制备方法
CN105374907B (zh) * 2014-08-29 2018-08-14 展晶科技(深圳)有限公司 发光二极管芯片的衬底及其制造方法
US10384432B2 (en) 2016-02-19 2019-08-20 Palo Alto Research Center Incorporated Hierarchical laminates fabricated from micro-scale, digitally patterned films
KR101921670B1 (ko) 2016-04-08 2018-11-26 재단법인 멀티스케일 에너지시스템 연구단 계층적 미세구조물, 이를 제조하기 위한 몰드 및 이 몰드의 제조방법
CN108821229B (zh) * 2018-06-15 2023-05-02 西北工业大学 一种ZnS红外窗口减反微结构表面的制备方法
CN111830614A (zh) * 2020-05-13 2020-10-27 华南师范大学 利用激光偏振态实现纳米光栅刻印的解决方案

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050245094A1 (en) * 2004-05-03 2005-11-03 International Business Machines Corporation Method to reduce photoresist pattern collapse by controlled surface microroughening

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10282635A (ja) * 1997-04-09 1998-10-23 Sony Corp パターンデータ補正方法、電子線描画方法、フォトマスク及びその作製方法、露光方法、半導体装置及びその製造方法、並びにパターンデータ補正装置
KR100480772B1 (ko) * 2000-01-05 2005-04-06 삼성에스디아이 주식회사 나노 스케일의 표면 거칠기를 가지는 마이크로 구조물의형성방법
US6960327B2 (en) * 2003-01-30 2005-11-01 The Regents Of The University Of California Methods for removing organic compounds from nano-composite materials
US20050129844A1 (en) * 2003-06-06 2005-06-16 Colleen Legzdins Method of deposition of nano-particles onto micro and nano-structured materials

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050245094A1 (en) * 2004-05-03 2005-11-03 International Business Machines Corporation Method to reduce photoresist pattern collapse by controlled surface microroughening

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
RABAROT M ET AL: "THICK SU-8 PHOTOLITHOGRAPHY FOR BIOMEMS", PROCEEDINGS OF SPIE, SPIE, USA, vol. 4979, 27 January 2003 (2003-01-27), pages 382 - 393, XP009026373, ISSN: 0277-786X, DOI: 10.1117/12.478244 *
TORMEN MASSIMO ET AL: "Fabrication of three-dimensional stamps for embossing techniques by lithographically controlled isotropic wet etching", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 23, no. 6, 2 December 2005 (2005-12-02), pages 2920 - 2924, XP012080280, ISSN: 1071-1023, DOI: 10.1116/1.2130348 *

Also Published As

Publication number Publication date
WO2009002644A3 (en) 2009-02-19
EP2170764A2 (de) 2010-04-07
WO2009002644A8 (en) 2011-12-22
CN101827783A (zh) 2010-09-08
WO2009002644A2 (en) 2008-12-31

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