EP1997358B1 - Device for plasma treatment at atmospheric pressure - Google Patents
Device for plasma treatment at atmospheric pressure Download PDFInfo
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- EP1997358B1 EP1997358B1 EP07723189.2A EP07723189A EP1997358B1 EP 1997358 B1 EP1997358 B1 EP 1997358B1 EP 07723189 A EP07723189 A EP 07723189A EP 1997358 B1 EP1997358 B1 EP 1997358B1
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- European Patent Office
- Prior art keywords
- high voltage
- electrode
- voltage source
- less
- dielectric barrier
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- 229910000906 Bronze Inorganic materials 0.000 description 5
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- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 5
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Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
Definitions
- the invention relates to a device for plasma treatment under atmospheric pressure having the features of the preamble of independent claim 1.
- the WO 2004/105810 A1 It is known to treat biological cells containing living cells with plasma.
- the gas discharge between the electrode provided with the dielectric shield and the biological material is ignited by the alternating high voltage applied to the electrode, the biological material serving as a capacitive counter electrode to the electrode with the dielectric shield.
- the electrode, including the dielectric shielding covering it, is tapered.
- the from the WO 2004/105810 A1 known device is provided as a battery or Akkumumulator-powered handset, with its AC high voltage source based on semiconductor technology.
- an apparatus for treating objects using high voltage electrical discharge in a gaseous medium is known.
- a rectified AC high voltage is applied to an electrode having a series of needle-shaped extensions that are parallel to each other and embedded with their tips in a dielectric. Channels pass through the dielectric parallel to the needle-shaped extensions, through which a spark discharge, ie no dielectrically impeded gas discharge, propagates as far as the electrode itself.
- the electrode is placed opposite the objects to be treated, which are electrically contacted to form a counter electrode to the electrode.
- an apparatus for plasma treatment at atmospheric pressure having two opposing electrodes.
- One of the two electrodes is earthed and provided with a full-surface dielectric shield.
- a dielectric in front of the other electrode which is connected to an AC high voltage source to apply AC high voltage, has discharge gaps into which lead electrodes protrude from the other electrode, which are provided with tips facing the grounded electrode. Due to the concentration of the field strength of the electric field between the two electrodes at the tips of the conductor electrons, a gas discharge is ignited in a gas located between the two electrodes.
- This gas discharge is dielectrically impeded only by the dielectric in front of the grounded electrode, since the dielectric has the discharge gap in front of the electrode connected to the AC high voltage source.
- the known device is provided only for introducing gas into the space between the two electrodes. With the plasma formed in the space between the electrodes, surfaces arranged outside of this space can be treated.
- a device for cleaning or activating electrical traces and board surfaces comprises a pair of opposed electrodes, at least one of which has a full-area dielectric shield.
- emission peaks are formed on the outer surface of one of the electrodes or their dielectric shield, the ignition of a gas discharge facilitate between the electrodes and homogenize the gas discharge.
- the objects to be treated are introduced in the known device between the electrodes, wherein they can rest on one of the electrodes or their dielectric shield.
- Preferably, only the opposite electrode has the emission peaks.
- the emission peaks may be formed, for example, by etching the corresponding surface of a dielectric material. It will be achieved radii of curvature of the tips of about 1 micron.
- the radii of curvature of the emission peaks are between 10 nm and 0.5 mm. Needle or nail-shaped emission peaks may be present in a surface density between 1 and 100 per cm 2 . Moving the objects to be treated into the space between the electrodes involves the risk of contact between the objects and the sharp-edged emission peaks directed into this space. As a result of this contact, the objects to be treated and / or the emission spikes may be damaged.
- the devices described above are very poor or not at all suitable because these materials are not effective as a counter electrode to the electrode can serve with the dielectric shield.
- a plasma jet which is also referred to as a plasma jet, plasma beam or plasma blaster
- Such devices are based on a different operation than that of a dielectrically impeded discharge. As a rule, you need a mains connection, or at least a gas connection. To which such systems are very expensive.
- an apparatus for treating impurities in gases with a plasma chamber wherein the plasma chamber through which the gases pass has sawtooth electrodes to which a high voltage generator applies high voltage pulses of short duration, high repetition rate and fast rise time to pulsed gas discharges between the electrodes to ignite.
- the sawtooth electrodes distribute the gas discharge channels over the entire plasma chamber.
- the invention has for its object to provide an apparatus for plasma treatment at atmospheric pressure with the features of the preamble of claim 1, which is inexpensive to provide, has no sharp-edged tips on an outer surface and yet a plasma treatment itself of only very weak or not electrically conductive Materials allowed.
- the object is achieved by a device for plasma treatment at atmospheric pressure with the features of claim 1.
- Preferred embodiments of the new device are described in the dependent claims 2 to 10.
- a dielectrically impeded discharge can also be caused without a counterelectrode. Accordingly, in the new plasma pressure treatment apparatus at atmospheric pressure, the AC high voltage applied to the electrode from the AC high voltage source can ignite the plasma over any object to be treated without relying on its electrical characteristics. Thus, with the new device it is possible that the alternating high voltage applied to the electrode by the alternating high voltage source ignites the plasma even in a volume limited only by gas in relation to the dielectric shield. That is, with the new device, a dielectrically impeded gas discharge is also caused in a clean gas environment, the gas itself serving as a counter electrode, if one wants to speak in this context at all of a counter electrode. At least, even in a clean gas environment, a dark discharge occurs on the surface of the dielectric shield from which, when the new device is brought to any surface, it becomes a self-sustaining plasma providing the surface, for example, to improve adhesion prior to coating to treat.
- the electrode of the new device is a surface electrode, wherein the alternating high voltage applied to the electrode by the AC high voltage source maintains the plasma across the surface of the surface electrode.
- the corresponding area of the surface electrode can be at least 2 cm 2 .
- it is at least 4 cm 2 , more preferably at least 8 cm 2 in size. Nevertheless, the energy consumption of the device is kept within reasonable limits due to the dielectric hindrance of the gas discharge.
- the electrode of the new device is preferably a surface electrode is not inconsistent with having the peaks that precede the dielectric of the gas Shield facing. Rather, these tips, ie small areas of the surface electrode with a small radius of curvature, used to ignite or maintain the plasma without counter electrode.
- tips of the surface electrode having a radius of curvature of less than 100 microns, preferably less than 10.0 microns.
- the height of the tips can be comparatively small and less than 2 mm, preferably less than 1 mm or even less than 0.5 mm. That is, the tips may be formed as a sharp-edged roughened surface of the electrode.
- the tips in a two-dimensional distribution are thus not only provided as a single row of juxtaposed needles.
- the areal density of the peaks may be on the order of 1 to 100,000 per cm 2 .
- the electrode It is particularly simple to form the electrode from an electrically conductive powder which is arranged in a ceramic solid which forms the dielectric shield.
- the powder provides a large number of suitable tips.
- the AC high voltage applied to the electrode by the AC high voltage source causes a steep voltage rise of at least 5,000 volts / ⁇ s, preferably at least 10,000 volts / ⁇ s has. Good results are obtained with a voltage increase of about 12,000 V / ⁇ s.
- the alternating high voltage applied to the electrode by the AC high voltage source comprises voltage pulses having a rise time of up to 5 ⁇ s, preferably less than 3 ⁇ s, a pulse duration of less than 10 ⁇ s, preferably less than 6 ⁇ s, and an amplitude of 5,000 V to 60,000 V, preferably from 5,000 to about 40,000 V, on.
- These voltage pulses can have alternating signs, ie be bipolar. This is very beneficial, but not mandatory.
- the repetition frequency of the voltage pulses of the AC high voltage source may be less than 10,000 Hz. Preferably, it is even less than 5,000 Hz, more preferably in the range of 500 to 2,000 Hz. That is, the repetition frequency of the voltage pulses is much lower than the reciprocal of the duration of the voltage pulses. In other words, the voltage pulses or at least bipolar pulse pairs or groups of voltage pulse pairs are spaced apart by pauses.
- An alternating high voltage source which can generate the alternating high voltage sketched here can be produced on the basis of semiconductor technology with standard components in compact dimensions.
- the entire new device may even be battery or accumulator operated.
- the new device may have the size of a commercial cordless screwdriver. This provides a very compact and mobile handheld device.
- the load capacity in the new device may vary greatly with different objects placed in front of the dielectric shield
- regulation of the AC high voltage source is preferred which prevents an uncontrolled increase in the output power of the device associated therewith such that the device, for example, will not be misused as a "stun gun" can be.
- Such a control can measure a retroactive effect of an output-side load of an ignition transformer of the alternating high-voltage source connected to the electrode on its input side and use this information as an input variable for regulating the output power of the alternating high-voltage source.
- the regulation of the alternating high voltage source can keep the output power of the alternating high voltage source constant by varying the output voltage of the alternating high voltage source and / or the pulse repetition rate of the voltage pulses of the alternating high voltage.
- a high voltage supply leads 4 with a transition into the dielectric shield 3 electrical insulation 5.
- a high voltage alternating current source 6 a high voltage alternating.
- the AC high voltage source 6 is based on semiconductor components and is supplied from a power supply 7 with electrical energy, which may be one or more batteries or one or more accumulators or a power supply unit.
- the gas discharge 9 is dielectrically impeded by the dielectric shield 3, whereby the energy output of the device 1 is limited by the gas discharge in a meaningful way.
- the gas discharge 9 results in a plasma 11 of reactive components, such as radicals of the gas 10, with which a surface can be activated, for example, for a subsequent coating in order to improve its adhesion properties. Since the gas discharge 9 can be ignited with the device 1 even when there is no counter electrode in the electrically relevant environment of the electrode 2, the plasma 11 can be generated with the device 1 quite independently of the electrical conductivity of a surface to be treated and for treatment the surface can be used.
- Fig. 2 outlines the treatment of a surface 12 of a body 13 with the plasma 11, wherein the gas discharge due to the presence of the surface 12 in the vicinity of the electrode 2 even with only low electrical conductivity of the material of the body 13th to the effect that the gas discharge 9 and accordingly the plasma 11 concentrates on the gap between the electrode 2 and the surface 12.
- Fig. 3 illustrates a practical embodiment of the electrode 2 and its microscopically pointed surface 14.
- the material of the electrode 2 is here powdered sintered bronze 21, which is also referred to as bronze powder.
- the sintered bronze is simply poured into the ceramic shield 23 formed as a dielectric shield 3, wherein at the same time the high voltage supply 4 forming metal pin 24 is pressed in the middle. To the rear, the area of the sintered bronze 21 is closed with a sealant 22 to the rear. It is important in the new device to generate high field strengths, so that a gas discharge ignites on the dielectric shield 3.
- the sintered bronze provides enough suitable tips for this purpose.
- the electrical conductivity of a powder forming the electrode 2 with the tips on the surface 14 need not be particularly high.
- the new device 1 can be provided as a mobile handset 16 as shown in FIG Fig. 4 outlined.
- the power supply 7 is an accumulator block
- the AC high voltage power source 6 is disposed within a housing 17 with a trigger-like operation switch 18.
- the AC high voltage is applied to the electrode 2 and regardless of whether a counter electrode is present or not, ignited a plasma in front of the outer surface 15 of the dielectric shield 3 of the electrode 2 and maintained as long as the operation switch 18 remains actuated.
- a sufficiently steep voltage rise occurs in the alternating high voltage applied to the electrode 2.
- the alternating high voltage from the in Fig. 5 sketched voltage pulses 19 and 20, wherein a positive voltage pulse 19, which rises in a few microseconds to a voltage of 40,000 to 50,000 V, directly followed by a negative voltage pulse 20, which has approximately the same time waveform as the voltage pulse 19, but a different sign. This is followed by a pause until a next pair of voltage pulses 19 and 20 is applied to the electrode 2.
- the rapid increase in voltage makes it possible to ignite the gas discharge 9 independently of a counter electrode, and then very quickly allows reversed polarity of the voltage a subsequent reignition of the gas discharge, wherein the previously separate charges of the gas quasi serve as a counter electrode.
- the spacings of the bipolar voltage pulse pairs 19, 20 can reach on the order of 1 millisecond, without all the free electrons of the plasma recombining in the meantime, until the plasma is reconstructed by the following voltage pulse pair from this Restionisation.
- Fig. 6 gives the basic structure of a presently preferred scheme for the at the electrode of the handset 16 according to Fig. 4 applied alternating high voltage again.
- an output-side load of an ignition transformer 25 is registered retroactively on its input side, ie measured. This information is used as an input to control the output voltage.
- the mutual inductance of the secondary winding of the ignition transformer 25 is opposite to the self-induction of the primary winding.
- the mutual induction from the secondary winding to the primary winding increases with the load of the secondary circuit.
- the amount of voltage across the primary winding of the ignition transformer 25 thus decreases with increasing load on the output. This voltage across the primary winding thus behaves exactly opposite to the output side load. This is used for the control of the ignition voltage.
- the voltage amplitude is adjusted by a potentiometer.
- the potentiometer can now be replaced by a transistor, ie a current-controlled resistor in the power supply circuit 26.
- a concrete embodiment of the designed as a handset 16 new device 1 may have the following technical data:
- the output voltage is controlled as a function of the load of the output between 5 and 35 kV.
- the load depends on an object disposed opposite to the surface 15 of the dielectric shield.
- the pulse repetition rate changes opposite to the height of the pulse amplitude; It lies in the range of 500 to 2000 Hz.
- the pulse repetition rate has the minimum value of approximately 500 Hz.
- the maximum value of the pulse repetition rate of approximately 2000 Hz is achieved at the smallest output amplitude of approximately 5 kV.
- a much lower ignition voltage is required than, for example, over wood.
- the ignition voltage can be treated as in devices 1 without regulation only objects from a material to which the device 1 is set.
- the ignition voltage is automatically adapted to the material of the object to be treated.
- the ignition voltage can z. B. using an LED on the back of the housing 17 are read. If the LED is lit, the output voltage is approx. 20 to 35 kV, which corresponds approximately to the voltage required for the treatment of wood surfaces. If the LED is off or another LED is lit, the output voltage is approximately 5 to 20 kV, which is the voltage required to treat metallic surfaces.
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Description
Die Erfindung bezieht sich auf eine Vorrichtung zur Plasmabehandlung unter Atmosphärendruck mit den Merkmalen des Oberbegriffs des unabhängigen Patentanspruchs 1.The invention relates to a device for plasma treatment under atmospheric pressure having the features of the preamble of
Es ist bekannt, dass eine Plasmabehandlung von Oberflächen die Haftfähigkeit verschiedenster Materialien bei einer anschließenden Beschichtung, wie beispielsweise einer Lackierung, erhöht.It is known that a plasma treatment of surfaces increases the adhesion of various materials in a subsequent coating, such as a paint job.
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Wenn bislang ein Plasma für eine Oberflächenbehandlung durch eine dielektrisch behinderte Entladung bei Atmosphärendruck erzeugt wird, erfolgt dies immer zwischen einer Elektrode mit einer dielektrischen Abschirmung und einer Gegenelektrode.When a plasma for a surface treatment by a dielectrically hindered discharge at atmospheric pressure is generated so far, this is always done between an electrode with a dielectric shield and a counter electrode.
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Für die Behandlung von nur sehr schlecht oder gar nicht elektrisch leitenden Materialien, wie beispielsweise von Kunststoffen, Gläsern und Steinen oder auch trockenem Holz, sind die voranstehend beschriebenen Vorrichtungen nur sehr schlecht oder gar nicht geeignet, weil diese Materialien nicht effektiv als Gegenelektrode zu der Elektrode mit der dielektrischen Abschirmung dienen können.For the treatment of only poorly or not electrically conductive materials, such as plastics, glasses and stones or dry wood, the devices described above are very poor or not at all suitable because these materials are not effective as a counter electrode to the electrode can serve with the dielectric shield.
Vorrichtungen zur Erzeugung von potentialfreien Plasmen in Form eines Plasmastrahls, der auch als Plasma-Jet, Plasma-Beam oder Plasma-Blaster bezeichnet wird, werden kommerziell angeboten. Solche Geräte beruhen auf einer anderen Funktionsweise als diejenige einer dielektrisch behinderten Entladung. Sie benötigen in aller Regel einen Netzanschluss, zumindest aber einen Gasanschluss. Zu dem sind derartige Anlagen sehr kostspielig.Devices for generating potential-free plasmas in the form of a plasma jet, which is also referred to as a plasma jet, plasma beam or plasma blaster, are commercially available. Such devices are based on a different operation than that of a dielectrically impeded discharge. As a rule, you need a mains connection, or at least a gas connection. To which such systems are very expensive.
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Der Erfindung liegt die Aufgabe zugrunde, eine Vorrichtung zur Plasmabehandlung bei Atmosphärendruck mit den Merkmalen des Oberbegriffs des Patentanspruchs 1 aufzuzeigen, die kostengünstig bereitstellbar ist, keine scharfkantigen Spitzen an einer äußeren Oberfläche aufweist und dennoch eine Plasmabehandlung selbst von nur sehr schwach oder gar nicht elektrisch leitenden Materialien ermöglicht.The invention has for its object to provide an apparatus for plasma treatment at atmospheric pressure with the features of the preamble of
Erfindungsgemäß wird die Aufgabe durch eine Vorrichtung zur Plasmabehandlung bei Atmosphärendruck mit den Merkmalen des Patentanspruchs 1 gelöst. Bevorzugte Ausführungsformen der neuen Vorrichtung sind in den abhängigen Patentansprüchen 2 bis 10 beschrieben.According to the invention the object is achieved by a device for plasma treatment at atmospheric pressure with the features of
Ganz überraschend hat sich herausgestellt, dass eine dielektrisch behinderte Entladung auch ohne eine Gegenelektrode hervorgerufen werden kann. Entsprechend kann bei der neuen Vorrichtung zur Plasmabehandlung bei Atmosphärendruck die von der Wechselhochspannungsquelle an die Elektrode angelegte Wechselhochspannung das Plasma über jedem beliebigen zu behandelnden Objekt zünden, ohne das es auf dessen elektrische Eigenschaften ankommt. So ist es bei der neuen Vorrichtung möglich, dass die von der Wechselhochspannungsquelle an die Elektrode angelegte Wechselhochspannung das Plasma selbst in einem gegenüber der dielektrischen Abschirmung nur durch Gas begrenzten Volumen zündet. Das heißt, mit der neuen Vorrichtung wird eine dielektrisch behinderte Gasentladung auch in einer reinen Gasumgebung hervorgerufen, wobei das Gas selbst als Gegenelektrode dient, wenn man in diesem Zusammenhang überhaupt von einer Gegenelektrode sprechen will. Zumindest erfolgt auch in einer reinen Gasumgebung eine Dunkelentladung an der Oberfläche der dielektrischen Abschirmung, aus der, wenn die neue Vorrichtung an eine beliebige Oberfläche herangeführt wird, eine selbstständige Entladung wird, welche das Plasma bereitstellt, um die Oberfläche beispielsweise zur Haftungsverbesserung vor einer Beschichtung zu behandeln.Quite surprisingly, it has been found that a dielectrically impeded discharge can also be caused without a counterelectrode. Accordingly, in the new plasma pressure treatment apparatus at atmospheric pressure, the AC high voltage applied to the electrode from the AC high voltage source can ignite the plasma over any object to be treated without relying on its electrical characteristics. Thus, with the new device it is possible that the alternating high voltage applied to the electrode by the alternating high voltage source ignites the plasma even in a volume limited only by gas in relation to the dielectric shield. That is, with the new device, a dielectrically impeded gas discharge is also caused in a clean gas environment, the gas itself serving as a counter electrode, if one wants to speak in this context at all of a counter electrode. At least, even in a clean gas environment, a dark discharge occurs on the surface of the dielectric shield from which, when the new device is brought to any surface, it becomes a self-sustaining plasma providing the surface, for example, to improve adhesion prior to coating to treat.
Die Elektrode der neuen Vorrichtung ist eine Flächenelektrode, wobei die von der Wechselhochspannungsquelle an die Elektrode angelegte Wechselhochspannung das Plasma über die Fläche der Flächenelektrode hinweg aufrechterhält. Konkret kann die entsprechende Fläche der Flächenelektrode mindestens 2 cm2 groß sein. Vorzugsweise ist sie mindestens 4 cm2, noch mehr bevorzugt mindestens 8 cm2 groß. Dennoch wird der Energieverbrauch der Vorrichtung durch die dielektrische Behinderung der Gasentladung in vertretbaren Grenzen gehalten.The electrode of the new device is a surface electrode, wherein the alternating high voltage applied to the electrode by the AC high voltage source maintains the plasma across the surface of the surface electrode. Specifically, the corresponding area of the surface electrode can be at least 2 cm 2 . Preferably, it is at least 4 cm 2 , more preferably at least 8 cm 2 in size. Nevertheless, the energy consumption of the device is kept within reasonable limits due to the dielectric hindrance of the gas discharge.
Dass die Elektrode der neuen Vorrichtung vorzugsweise eine Flächenelektrode ist, steht nicht dazu im Widerspruch, dass sie die Spitzen aufweist, die dem Gas vor der dielektrischen Abschirmung zugewandt sind. Vielmehr werden diese Spitzen, d. h. kleine Bereiche der Flächenelektrode mit kleinem Krümmungsradius, dazu genutzt, das Plasma auch ohne Gegenelektrode zu zünden bzw. aufrechtzuerhalten.The fact that the electrode of the new device is preferably a surface electrode is not inconsistent with having the peaks that precede the dielectric of the gas Shield facing. Rather, these tips, ie small areas of the surface electrode with a small radius of curvature, used to ignite or maintain the plasma without counter electrode.
An der äußeren Oberfläche der neuen Vorrichtung stehen dennoch keine Spitzen vor; die äußere Oberfläche der dielektrischen Abschirmung der mit den Spitzen versehenen Elektrode ist vielmehr glatt. So entfällt sowohl die Gefahr einer Beschädigung von zu behandelnden Oberflächen als auch die Gefahr einer Veränderung von elektrischen Eigenschaften der Vorrichtung aufgrund einer Beschädigung der Spitzen selbst.Nevertheless, there are no tips on the outer surface of the new device; the outer surface of the dielectric shield of the spiked electrode is rather smooth. Thus, both the risk of damage to surfaces to be treated as well as the risk of changing electrical properties of the device due to damage to the tips themselves eliminated.
Bevorzugt sind Spitzen der Flächenelektrode mit einem Krümmungsradius von kleiner 100 µm, vorzugsweise von kleiner als 10,0 µm. Die Höhe der Spitzen kann dabei vergleichsweise klein sein und weniger als 2 mm, vorzugsweise weniger als 1 mm oder sogar weniger als 0,5 mm betragen. Das heißt, die Spitzen können als scharfkantig angeraute Oberfläche der Elektrode ausgebildet sein. Dabei sind die Spitzen in einer flächigen Verteilung also nicht nur als eine einzelne Reihe nebeneinander geordneter Nadeln vorgesehen. Die Flächendichte der Spitzen kann eine Größenordnung von 1 bis 100.000 pro cm2 aufweisen.Preferably, tips of the surface electrode having a radius of curvature of less than 100 microns, preferably less than 10.0 microns. The height of the tips can be comparatively small and less than 2 mm, preferably less than 1 mm or even less than 0.5 mm. That is, the tips may be formed as a sharp-edged roughened surface of the electrode. The tips in a two-dimensional distribution are thus not only provided as a single row of juxtaposed needles. The areal density of the peaks may be on the order of 1 to 100,000 per cm 2 .
Besonders einfach ist es, die Elektrode aus einem elektrisch leitfähigen Pulver auszubilden, das in einem die dielektrische Abschirmung bildenden keramischen Festkörper angeordnet ist. Das Pulver stellt eine große Anzahl geeigneter Spitzen bereit.It is particularly simple to form the electrode from an electrically conductive powder which is arranged in a ceramic solid which forms the dielectric shield. The powder provides a large number of suitable tips.
Eine weitere bedeutende Maßnahme, um die neue Vorrichtung bereitzustellen, die ein Plasma ohne eine Gegenelektrode zündet bzw. aufrechterhält, ist es, dass die von der Wechselhochspannungsquelle an die Elektrode angelegte Wechselhochspannung einen steilen Spannungsanstieg von mindestens 5.000 Volt/µs, vorzugsweise von mindestens 10.000 V/µs aufweist. Gute Ergebnisse ergeben sich bei einem Spannungsanstieg von etwa 12.000 V/µs.Another important measure to provide the new device which ignites a plasma without a counter electrode is that the AC high voltage applied to the electrode by the AC high voltage source causes a steep voltage rise of at least 5,000 volts / μs, preferably at least 10,000 volts / μs has. Good results are obtained with a voltage increase of about 12,000 V / μs.
Typischer Weise weist die von der Wechselhochspannungsquelle an die Elektrode angelegte Wechselhochspannung Spannungspulse mit einer Anstiegszeit von bis zu 5 µs, vorzugsweise von weniger als 3 µs, einer Pulsdauer von unter 10 µs, vorzugsweise von weniger als 6 µs, und einer Amplitude von 5.000 V bis 60.000 V, vorzugsweise von 5.000 bis etwa 40.000 V, auf. Diese Spannungspulse können wechselnde Vorzeichen haben, also bipolar sein. Dies ist zwar sehr vorteilhaft, aber nicht zwingend erforderlich.Typically, the alternating high voltage applied to the electrode by the AC high voltage source comprises voltage pulses having a rise time of up to 5 μs, preferably less than 3 μs, a pulse duration of less than 10 μs, preferably less than 6 μs, and an amplitude of 5,000 V to 60,000 V, preferably from 5,000 to about 40,000 V, on. These voltage pulses can have alternating signs, ie be bipolar. This is very beneficial, but not mandatory.
Die Wiederholungsfrequenz der Spannungspulse der Wechselhochspannungsquelle kann kleiner als 10.000 Hz sein. Vorzugsweise ist sie sogar kleiner als 5.000 Hz, besonders bevorzugt liegt sie im Bereich von 500 bis 2.000 Hz. Das heißt, die Wiederholungsfrequenz der Spannungspulse ist viel niedriger als der Kehrwert der Dauer der Spannungspulse. Mit anderen Worten sind die Spannungspulse oder zumindest bipolare Pulspaare oder Gruppen von Spannungspulspaaren durch Pausen von einander beabstandet.The repetition frequency of the voltage pulses of the AC high voltage source may be less than 10,000 Hz. Preferably, it is even less than 5,000 Hz, more preferably in the range of 500 to 2,000 Hz. That is, the repetition frequency of the voltage pulses is much lower than the reciprocal of the duration of the voltage pulses. In other words, the voltage pulses or at least bipolar pulse pairs or groups of voltage pulse pairs are spaced apart by pauses.
Eine Wechselhochspannungsquelle, die die hier skizzierte Wechselhochspannung erzeugen kann, ist auf Basis von Halbleitertechnologie mit Standardbauteilen in kompakten Abmessungen herstellbar. So ist es möglich, die gesamte neue Vorrichtung als Handgerät auszubilden, das sogar batterie- oder akkumulatorbetrieben sein kann. Konkret kann die neue Vorrichtung die Größe eines handelsüblichen Akkuschraubers aufweisen. Damit wird ein sehr kompaktes und mobil einsetzbares Handgerät bereitgestellt.An alternating high voltage source which can generate the alternating high voltage sketched here can be produced on the basis of semiconductor technology with standard components in compact dimensions. Thus, it is possible to design the entire new device as a handheld device, which may even be battery or accumulator operated. Specifically, the new device may have the size of a commercial cordless screwdriver. This provides a very compact and mobile handheld device.
Da sich die Lastkapazität bei der neuen Vorrichtung mit unterschiedlichen vor der dielektrischen Abschirmung angeordneten Objekten stark ändern kann, ist eine Regelung der Wechselhochspannungsquelle bevorzugt, die eine damit verbundenen unkontrollierte Steigerung der Ausgangsleistung der Vorrichtung unterbindet, so dass die Vorrichtung beispielsweise nicht als "Elektroschocker" missbraucht werden kann. Eine solche Regelung kann eine Rückwirkung einer ausgangseitigen Belastung eines an die Elektrode angeschlossenen Zündtransformators der Wechselhochspannungsquelle auf dessen Eingangsseite messen und diese Information als Eingangsgröße zum Regeln der Ausgangsleistung der Wechselhochspannungsquelle nutzen.Since the load capacity in the new device may vary greatly with different objects placed in front of the dielectric shield, regulation of the AC high voltage source is preferred which prevents an uncontrolled increase in the output power of the device associated therewith such that the device, for example, will not be misused as a "stun gun" can be. Such a control can measure a retroactive effect of an output-side load of an ignition transformer of the alternating high-voltage source connected to the electrode on its input side and use this information as an input variable for regulating the output power of the alternating high-voltage source.
Auf diese Weise kann die Regelung der Wechselhochspannungsquelle die Ausgangsleistung der Wechselhochspannungsquelle durch Variation der Ausgangsspannung der Wechselhochspannungsquelle und/oder der Pulswiederholrate der Spannungspulse der Wechselhochspannung konstant halten.In this way, the regulation of the alternating high voltage source can keep the output power of the alternating high voltage source constant by varying the output voltage of the alternating high voltage source and / or the pulse repetition rate of the voltage pulses of the alternating high voltage.
Vorteilhafte Weiterbildungen der Erfindung ergeben sich aus den Patentansprüchen, der Beschreibung und den Zeichnungen. Die in der Beschreibungseinleitung genannten Vorteile von Merkmalen und von Kombinationen mehrerer Merkmale sind lediglich beispielhaft und können alternativ oder kumulativ zur Wirkung kommen, ohne dass die Vorteile zwingend von erfindungsgemäßen Ausführungsformen erzielt werden müssen. Weitere Merkmale sind den Zeichnungen - insbesondere den dargestellten Geometrien und den relativen Abmessungen mehrerer Bauteile zueinander sowie deren relativer Anordnung und Wirkverbindung - zu entnehmen. Die Kombination von Merkmalen unterschiedlicher Ausführungsformen der Erfindung oder von Merkmalen unterschiedlicher Patentansprüche ist ebenfalls abweichend von den gewählten Rückbeziehungen der Patentansprüche möglich und wird hiermit angeregt. Dies betrifft auch solche Merkmale, die in separaten Zeichnungen dargestellt sind oder bei deren Beschreibung genannt werden. Diese Merkmale können auch mit Merkmalen unterschiedlicher Patentansprüche kombiniert werden. Ebenso können in den Patentansprüchen aufgeführte Merkmale für weitere Ausführungsformen der Erfindung entfallen.Advantageous developments of the invention will become apparent from the claims, the description and the drawings. The advantages of features and of combinations of several features mentioned in the introduction to the description are merely exemplary and can come into effect alternatively or cumulatively, without the advantages having to be achieved by embodiments according to the invention. Further features are the drawings - in particular the illustrated geometries and the relative dimensions several components to each other and their relative arrangement and operative connection - refer. The combination of features of different embodiments of the invention or of features of different claims is also possible deviating from the chosen relationships of the claims and is hereby stimulated. This also applies to those features which are shown in separate drawings or are mentioned in their description. These features can also be combined with features of different claims. Likewise, in the claims listed features for further embodiments of the invention can be omitted.
Im Folgenden wird die Erfindung anhand in den Figuren dargestellter bevorzugter Ausführungsbeispiele weiter erläutert und beschrieben.
- Fig. 1
- zeigt schematisch den Aufbau einer ersten Ausführungsform der neuen Vorrichtung zur Plasmabehandlung bei Atmosphärendruck mit deren Elektrode im Querschnitt.
- Fig. 2
- zeigt die Anwendung eines mit der Vorrichtung gemäß
Fig. 1 gezündeten Plasmas auf eine schlecht elektrisch leitende Oberfläche. - Fig. 3
- zeigt einen Querschnitt durch den vorderen Bereich einer Elektrode einer abgewandelten Ausführungsform der Vorrichtung.
- Fig. 4
- skizziert die Ausbildung der neuen Vorrichtung als akkumulatorbetriebenes Handgerät.
- Fig. 5
- zeigt den Spannungsverlauf einer bei der neuen Vorrichtung an deren Elektrode angelegten Wechselhochspannung bestehend aus bipolaren Spannungspulspaaren; und
- Fig. 6
- zeigt den prinzipiellen Aufbau einer Regelung für die an der Elektrode des Handgeräts gemäß
Fig. 4 anliegende Wechselhochspannung.
- Fig. 1
- schematically shows the structure of a first embodiment of the new device for plasma treatment at atmospheric pressure with the electrode in cross section.
- Fig. 2
- shows the application of a device according to the
Fig. 1 ignited plasma on a poorly electrically conductive surface. - Fig. 3
- shows a cross section through the front portion of an electrode of a modified embodiment of the device.
- Fig. 4
- outlines the design of the new device as accumulator-powered handset.
- Fig. 5
- shows the voltage curve of an applied in the new device at the electrode alternating high voltage consisting of bipolar voltage pulse pairs; and
- Fig. 6
- shows the basic structure of a control for the at the electrode of the handset according to
Fig. 4 applied alternating high voltage.
Die in
Die neue Vorrichtung 1 kann als mobiles Handgerät 16 bereitgestellt werden, wie es in
Für das Zünden des Plasmas 11 auch ohne Gegenelektrode kommt es neben der Strukturierung der Oberfläche der Elektrode 2 und/oder ihrer dielektrischen Abschirmung 3 auf einen hinreichend steilen Spannungsanstieg bei der an die Elektrode 2 angelegten Wechselhochspannung an. Um diesen zu erreichen, kann die Wechselhochspannung aus den in
Das heißt kleine Änderungen der Ausgangsspannung haben große Auswirkungen auf die Ausgangsleistung. Durch eine gleichzeitige Anpassung der Pulswiederholrate, kann jedoch der Einfluss einer Ausgangsspannungsänderung gedämpft werden. Hierzu wird bei einer Verringerung der Ausgangsspannung die Pulswiederholrate erhöht. Je nachdem wie groß diese Erhöhung im Verhältnis zur Spannungsänderung ist, so kann die Ausgangsspannung über einen großen Bereich variieren.That is, small changes in the output voltage have a large impact on the output power. By simultaneously adjusting the pulse repetition rate, however, the influence of an output voltage change can be damped. This is at a Reduction of the output voltage increases the pulse repetition rate. Depending on how large this increase is in relation to the voltage change, the output voltage can vary over a wide range.
Ein konkretes Ausführungsbeispiel der als Handgerät 16 ausgebildeten neuen Vorrichtung 1 kann folgende technische Daten haben: Die Ausgangsspannung wird in Abhängigkeit der Belastung des Ausgangs zwischen 5 und 35 kV geregelt. Die Belastung hängt von einem gegenüber der Oberfläche 15 der dielektrischen Abschirmung angeordneten Objekt ab. Zudem ändert sich die Pulswiederholrate entgegengesetzt zur Höhe der Pulsamplitude; sie liegt im Bereich von 500 bis 2000 Hz. Bei maximaler Ausgangsamplitude von 35 kV hat die Pulswiederholrate den Minimalwert von ca. 500 Hz. Der Maximalwert der Pulswiederholrate von ca. 2000 Hz wird bei der kleinsten Ausgangsamplitude von ca. 5 kV erreicht. Für die Zündung eines Plasmas über metallischen Objekten wird eine sehr viel geringere Zündspannung als beispielsweise über Holz benötigt. Bei einer fest vorgegeben Zündspannung können wie bei Vorrichtungen 1 ohne Regelung nur Objekte aus einem Material behandelt werden, auf welches die Vorrichtung 1 eingestellt ist. Bei den bevorzugten Vorrichtungen 1 mit Regelung wird die Zündspannung automatisch an das Material des zu behandelnden Objekts angepasst. Die Zündspannung kann z. B. anhand einer LED auf der Rückseite des Gehäuses 17 abgelesen werden. Leuchtet die LED, beträgt die Ausgangsspannung ca. 20 bis 35 kV, dies entspricht etwa der benötigten Spannung zur Behandlung von Holzoberflächen. Leuchtet die LED nicht oder eine andere LED, beträgt die Ausgangsspannung etwa 5 bis 20 kV, dies entspricht der benötigten Spannung zu Behandlung von metallischen Oberflächen.A concrete embodiment of the designed as a
- 11
- Vorrichtungcontraption
- 22
- Elektrodeelectrode
- 33
- Dielektrische AbschirmungDielectric shielding
- 44
- HochspannungszuführungHigh voltage supply
- 55
- Isolierunginsulation
- 66
- WechselhochspannungsquelleAC high voltage source
- 77
- Energieversorgungpower supply
- 88th
- Kanteedge
- 99
- Gasentladunggas discharge
- 1010
- Gasgas
- 1111
- Plasmaplasma
- 1212
- Oberflächesurface
- 1313
- Körperbody
- 1414
- Oberflächesurface
- 1515
- Oberflächesurface
- 1616
- Handgeräthandset
- 1717
- Gehäusecasing
- 1818
- Schalterswitch
- 1919
- Spannungspulsvoltage pulse
- 2020
- Spannungspulsvoltage pulse
- 2121
- Sinterbronzesintered bronze
- 2222
- Dichtungsmassecaulk
- 2323
- Keramischer FestkörperCeramic solid
- 2424
- Metallstiftmetal pin
- 2525
- Zündtransformatorignition transformer
- 2626
- NetzteilschaltungPower supply circuit
- 2727
- Gleichrichterrectifier
- 2828
- Filterfilter
- 2929
- Reglerregulator
Claims (10)
- Device for plasma treating comprising an electrode in front of which a dielectric barrier is arranged, and comprising an AC high voltage source for applying an AC high voltage to the electrode to generate a dielectric barrier discharge in a gas arranged in front of the dielectric barrier and being at atmospheric pressure for producing a plasma, wherein the device (1) comprises no counter-electrode and wherein the dielectric barrier (3) of the electrode (2) as such has a smooth outer surface (15) facing the gas (10) disposed in front of the dielectric barrier (3), characterised in that the surface (14) of the electrode (2) comprises a two dimensional distribution of tips pointing towards the gas (10) in front of the dielectric barrier (3).
- Device according to claim 1, characterised in that the tips have a radius of curvature of less than 100 µm, preferably of less than 10,0 µm.
- Device according to claim 2, characterised in that the electrode (2) is made of an electrically conductive powder (21) which is arranged within a ceramic solid body (23) forming the dielectric barrier (3).
- Device according to any of the claims 1 to 3, characterised in that the AC high voltage source (6) is designed such that the AC high voltage provided by it comprises an increase in voltage of at least 5,000 V/µs, preferably of at least 10,000 V/µs.
- Device according to any of the claims 1 to 4, characterised in that the AC high voltage source (6) is designed such that the AC high voltage provided by it comprises voltage pulses (19, 20) with a rise time of not more than 5 µs, preferably of less than 3 µs, a pulse duration of less than 10 µs, preferably of less than 6 µs, and an amplitude of 5,000 V to 60,000 V, preferably of 5,000 V to 40,000 V.
- Device according to any of the claims 1 to 4, characterised in that the AC high voltage source (6) is designed such that the AC high voltage provided by it comprises voltage pulses (19, 20) of alternating signs succeeding to each other.
- Device according to claim 5 or 6, characterised in that the AC high voltage source (6) is designed such that the repetition frequency of the voltage pulses (19, 20) is less than 10,000 Hz, preferably less than 5,000 Hz.
- Device according to any of the claims 1 to 7, characterised in that the device is made as a battery or accumulator driven handheld apparatus.
- Device according to any of the claims 1 to 8, characterised in that a controller of the AC high voltage source (6) measures a feedback of an output side load to an ignition transformer (25) of the AC high voltage source (6) connected to the electrode (2) to the input side of the ignition transformer (25), and uses this information as an input value for controlling the output power of the AC high voltage source (6).
- Device according to claim 9, characterised in that the controller of the AC high voltage source (6) keeps the output power of the AC high voltage source (6) constant by varying the output voltage of the AC high voltage source (6) and/or the pulse repetition rate of voltage pulses (19, 20) of the AC high voltage.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006011312A DE102006011312B4 (en) | 2006-03-11 | 2006-03-11 | Apparatus for plasma treatment under atmospheric pressure |
PCT/EP2007/002143 WO2007104512A1 (en) | 2006-03-11 | 2007-03-12 | Device for plasma treatment at atmospheric pressure |
Publications (2)
Publication Number | Publication Date |
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EP1997358A1 EP1997358A1 (en) | 2008-12-03 |
EP1997358B1 true EP1997358B1 (en) | 2014-01-01 |
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EP07723189.2A Not-in-force EP1997358B1 (en) | 2006-03-11 | 2007-03-12 | Device for plasma treatment at atmospheric pressure |
Country Status (4)
Country | Link |
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US (1) | US8136481B2 (en) |
EP (1) | EP1997358B1 (en) |
DE (1) | DE102006011312B4 (en) |
WO (1) | WO2007104512A1 (en) |
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EP2324687B1 (en) | 2008-08-20 | 2016-01-27 | Vision Dynamics Holding B.V. | Device for generating a plasma discharge for patterning the surface of a substrate |
EP2180768A1 (en) * | 2008-10-23 | 2010-04-28 | TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek | Apparatus and method for treating an object |
DE102009020163B4 (en) * | 2009-05-07 | 2012-07-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for interlayer-free bonding of substrates, apparatus for carrying out a plasma treatment and their use |
GB0920124D0 (en) | 2009-11-17 | 2009-12-30 | Linde Ag | Device for generating gaseous species |
DE102009060627B4 (en) * | 2009-12-24 | 2014-06-05 | Cinogy Gmbh | Electrode arrangement for a dielectrically impeded plasma treatment |
US9078540B2 (en) * | 2010-08-24 | 2015-07-14 | Steve Hoffman | Process and device for forming a low adhesion cooking surface |
DE102011000261A1 (en) * | 2011-01-21 | 2012-07-26 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Dielectric coplanar discharge source for surface treatment under atmospheric pressure |
CN102573259A (en) * | 2012-01-13 | 2012-07-11 | 北京交通大学 | Method for suppressing filamentary discharge and electrode structure |
DE102012103470A1 (en) | 2012-04-20 | 2013-10-24 | Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen | plasma Roller |
DE102012015482A1 (en) * | 2012-08-07 | 2014-02-13 | Cinogy Gmbh | Electrode arrangement for a disabled plasma |
DE102013100617B4 (en) * | 2013-01-22 | 2016-08-25 | Epcos Ag | Device for generating a plasma and handheld device with the device |
DE102013107448B4 (en) * | 2013-07-15 | 2016-11-24 | Relyon Plasma Gmbh | Arrangement for germ reduction by means of plasma |
US9498637B2 (en) * | 2014-05-30 | 2016-11-22 | Plasmology4, Inc. | Wearable cold plasma system |
CN106796877B (en) | 2014-10-23 | 2021-03-09 | 住友电气工业株式会社 | Silicon carbide substrate and method for manufacturing the same |
US11574372B2 (en) * | 2017-02-08 | 2023-02-07 | Upstream Data Inc. | Blockchain mine at oil or gas facility |
CN107911931A (en) * | 2017-12-01 | 2018-04-13 | 南京苏曼等离子科技有限公司 | Atmospheric low-temperature plasma handles seed device and operating method |
WO2020064104A1 (en) * | 2018-09-26 | 2020-04-02 | L'oreal | Device for generating cold plasma comprising electrodes and dielectrics |
CN111298295B (en) * | 2020-04-01 | 2021-11-16 | 珠海格力电器股份有限公司 | Air plasma generating device and medical equipment with same |
DE102021124377A1 (en) | 2021-09-21 | 2023-03-23 | Cinogy Gmbh | Electrode arrangement for a plasma discharge |
DE102021128964B3 (en) | 2021-11-08 | 2023-03-09 | Hochschule für angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen, Körperschaft des öffentlichen Rechts | Process and device for generating plasmas with increased pulse energy by means of dielectrically impeded electrical discharges |
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US5603893A (en) | 1995-08-08 | 1997-02-18 | University Of Southern California | Pollution treatment cells energized by short pulses |
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US20020092616A1 (en) * | 1999-06-23 | 2002-07-18 | Seong I. Kim | Apparatus for plasma treatment using capillary electrode discharge plasma shower |
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DE19957775C1 (en) * | 1999-12-01 | 2000-07-13 | Wolfgang Vioel | Modification of wood surfaces uses an electrode fed with alternating high voltages which generates an electrical discharge under atmospheric pressure to cover the wood surface |
KR100464902B1 (en) * | 2001-02-12 | 2005-01-05 | (주)에스이 플라즈마 | Apparatus for generating low temperature plasama at atmospheric pressure |
JP3782708B2 (en) * | 2001-10-26 | 2006-06-07 | 積水化学工業株式会社 | Discharge plasma processing apparatus and discharge plasma processing method using the same |
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- 2006-03-11 DE DE102006011312A patent/DE102006011312B4/en not_active Expired - Fee Related
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2007
- 2007-03-12 WO PCT/EP2007/002143 patent/WO2007104512A1/en active Application Filing
- 2007-03-12 EP EP07723189.2A patent/EP1997358B1/en not_active Not-in-force
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US8136481B2 (en) | 2012-03-20 |
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US20090009090A1 (en) | 2009-01-08 |
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