EP1969160A1 - Electrolyte and process for depositing a matt metal layer - Google Patents
Electrolyte and process for depositing a matt metal layerInfo
- Publication number
- EP1969160A1 EP1969160A1 EP06701821A EP06701821A EP1969160A1 EP 1969160 A1 EP1969160 A1 EP 1969160A1 EP 06701821 A EP06701821 A EP 06701821A EP 06701821 A EP06701821 A EP 06701821A EP 1969160 A1 EP1969160 A1 EP 1969160A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrolyte
- mol
- wetting agent
- emulsion
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 35
- 239000002184 metal Substances 0.000 title claims abstract description 35
- 239000003792 electrolyte Substances 0.000 title claims description 42
- 238000000151 deposition Methods 0.000 title claims description 12
- 238000000034 method Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000000080 wetting agent Substances 0.000 claims abstract description 16
- 239000006185 dispersion Substances 0.000 claims abstract description 13
- 239000000839 emulsion Substances 0.000 claims abstract description 13
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 9
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims abstract description 8
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 239000004530 micro-emulsion Substances 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 3
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 3
- 229910052802 copper Inorganic materials 0.000 claims abstract description 3
- 229910052738 indium Inorganic materials 0.000 claims abstract description 3
- 229910052742 iron Inorganic materials 0.000 claims abstract description 3
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 3
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 3
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 3
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 3
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 3
- 229910052709 silver Inorganic materials 0.000 claims abstract description 3
- 229910052718 tin Inorganic materials 0.000 claims abstract description 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 3
- -1 C 6 carboxylic acid Chemical class 0.000 claims description 11
- 150000002739 metals Chemical class 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 8
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 4
- 229920001451 polypropylene glycol Polymers 0.000 claims description 4
- 229920001281 polyalkylene Polymers 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- 229910052793 cadmium Inorganic materials 0.000 claims description 2
- 150000004820 halides Chemical class 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229940058401 polytetrafluoroethylene Drugs 0.000 claims 2
- 229920001400 block copolymer Polymers 0.000 claims 1
- 230000008021 deposition Effects 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 2
- 238000005137 deposition process Methods 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 8
- 238000000576 coating method Methods 0.000 description 5
- 229920001515 polyalkylene glycol Polymers 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- LMPMFQXUJXPWSL-UHFFFAOYSA-N 3-(3-sulfopropyldisulfanyl)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCSSCCCS(O)(=O)=O LMPMFQXUJXPWSL-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 230000007815 allergy Effects 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- XJMWHXZUIGHOBA-UHFFFAOYSA-N azane;propanoic acid Chemical compound N.CCC(O)=O XJMWHXZUIGHOBA-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Definitions
- the present invention relates to an electrolyte and to a method for depositing a matt metal layer on a substrate from an electrolyte comprising an emulsion and / or dispersion former or a wetting agent.
- the goal in the production of metallic layers on substrates is to obtain as smooth and high-gloss coatings as possible.
- Fields of application for matt-deposited metal layers on substrates are, for example, the jewelery industry, the valve industry, the automotive industry, but also the optical or precision mechanical industry, in which the glare-free nature of these coatings in particular has to be borne. Matt-deposited nickel or nickel alloy layers and cobalt layers are known from the prior art.
- the object of the present invention is to provide an electrolyte and a method for depositing matte metal layers on substrates, with the aid of which a multiplicity of metals in different degrees of matting can be deposited on a wide variety of substrates.
- an electrolyte for depositing a matt metal layer on a substrate from an electrolyte comprising an emulsion and / or dispersion former or a wetting agent which is characterized in that the electrolyte as the metal to be deposited is a metal of the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, As, Se, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, W, Re, Pt, Au, Tl, Pb, Bi or an alloy of these metals, the emulsion and / or dispersion former is a substituted or unsubstituted polyalkylene oxide or its derivative, the surfactant has fluorinated or perfluorinated hydrophobic chains or is a polyalkylene oxide substituted quaternary ammonium compound, and electrolyte, Emulsion and / or dispersion former or wetting agent form a microemulsion and
- the object is achieved by a method for the electrolytic deposition of a matt metal layer on a substrate, wherein the substrate is connected to a voltage source in a plating bath comprising an electrolyte according to the invention and a counterelectrode and a voltage is applied between substrate and counterelectrode, which is suitable for depositing a metal layer on the substrate.
- microemulsions in electrolytes are suitable for matt deposition of a wide variety of metals from the corresponding electrolytes. It has also been found that to form these microemulsions in electrolytes of various metals to be deposited both polyalkylene glycols or their derivatives, wetting agents with fluorinated or perfluorinated hydrophobic chains, as well as polyalkylene oxide substituted quaternary ammonium compounds are suitable. These compounds have a wide range of uses for the production of emulsions in electrolytes of various metals and can be used individually.
- polyalkylene glycols as emulsion and / or dispersion formers, in addition to polymers of homogeneous structure, in particular polymers having different percentage fractions of hydrophilic and hydrophobic structures, preferably consisting of polyethylene glycols and polypropylene glycols, have been found.
- the percentage of hydrophilic and hydrophobic structures as a function of the average molar mass decides the degree of dullness of the deposited metal layer, wherein generally average molecular weights> 200 g / mol, for polymers with a high percentage of hydrophobic structures preferably 200 to 2000 g / mol and even more preferably for polymers with a high percentage of hydrophilic structures> 4000 g / mol are suitable.
- the average molecular weight of the fluorinated or perfluorinated wetting agents according to the invention is between about 550 and about 1000 g / mol, preferably between about 700 and about 1000 g / mol. Again, the average molecular weight influence the matte degree.
- wetting agents for depositing matt metal layers from electrolytes according to the invention are polyalkylene oxide-substituted quaternary ammonium compounds, which preferably have the general formula
- the average molecular weight of the quaternary ammonium compounds added to the electrolyte in the present invention is from about 200 to about 1000 g / mol, preferably from about 400 to about 500 g / mol, and more preferably from about 450 to about 460 g / mol.
- the addition of polytetrafluoroethylene particles to the electrolyte according to the invention exerts an influence on the properties of the deposited matt metal layers.
- the additional polytetrafluoroethylene particles contain a tactile much softer surface which also compared to matte metal layers, which were deposited from electrolytes according to the invention without the addition of polytetrafluoroethylene particles, even a much lower Sensitivity to finger marks (touch free) shows.
- the average particle diameter of the added polytetrafluoroethylene particles should be in the range of about 10 to about 1000 nm, preferably about 100 to about 300 nm.
- the polytetrafluoroethylene particles may be added in a concentration between about 0.1 and 1000 mg / l, preferably between about 0.5 and 5 mg / l.
- the following examples show embodiments of the electrolyte according to the invention and the method according to the invention, but without the invention being limited to these embodiments.
- Example 2 When using the parameters described in Example 1, a stable uniform pearlescent effect is achieved at 26 ° C. and addition of 300 mg / l of a polyalkylene glycol of the following block polymer structure instead of the polypropylene glycol described in Example 1:
- the average molecular weight is 1700 g / mol, wherein the polyethylene oxide content (x + z) makes up 20% of the molecular weight.
- Example 2 is with 5 mg / l polyalkylene glycol of the block polymer structure given in Example 2 with a molecular weight of 5000 g / mol and a proportion of 20% polyethylene oxide at a current density of 2 A / dm 2 , 25 ° C and a cathode movement of 1 m / min also achieved a uniform pearlescent effect.
- F- (CF 2 -CF 2 ) ⁇ - (CH 2 -CH 2 -O) y -H produces a uniform matt effect.
- a uniform matting effect becomes the effect, the structure of which is different from Example 4.
- a pearlescent brass sheet can be produced by adding 8 mg / l of didecylmethylpoly (oxyethyl) ammonium propionate to a Watts electrolyte analogously to Example 4.
- Example 5 To the emulsion of polyethyleneglycol-substituted ammonium salt produced in Example 5 was added 1 ml / l PTFE suspension (Zonyl TE3667-N, Dupont). As a result, other structures and layer properties were achieved.
- the resulting surface has a strongly hydrophobic dirt-repellent effect.
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL06701821T PL1969160T3 (en) | 2006-01-06 | 2006-01-06 | Electrolyte and process for depositing a matt metal layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2006/000076 WO2007076898A1 (en) | 2006-01-06 | 2006-01-06 | Electrolyte and process for depositing a matt metal layer |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1969160A1 true EP1969160A1 (en) | 2008-09-17 |
EP1969160B1 EP1969160B1 (en) | 2011-04-27 |
Family
ID=36956125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06701821A Active EP1969160B1 (en) | 2006-01-06 | 2006-01-06 | Electrolyte and process for depositing a matt metal layer |
Country Status (10)
Country | Link |
---|---|
US (2) | US8192607B2 (en) |
EP (1) | EP1969160B1 (en) |
JP (1) | JP4811880B2 (en) |
KR (1) | KR101234429B1 (en) |
CN (1) | CN101400830B (en) |
AT (1) | ATE507327T1 (en) |
DE (1) | DE502006009414D1 (en) |
ES (1) | ES2361500T3 (en) |
PL (1) | PL1969160T3 (en) |
WO (1) | WO2007076898A1 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
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EP2143828B1 (en) | 2008-07-08 | 2016-12-28 | Enthone, Inc. | Electrolyte and method for the deposition of a matt metal layer |
US7951600B2 (en) * | 2008-11-07 | 2011-05-31 | Xtalic Corporation | Electrodeposition baths, systems and methods |
EP2568063A1 (en) * | 2011-09-09 | 2013-03-13 | Rohm and Haas Electronic Materials LLC | Low internal stress copper electroplating method |
US20130220819A1 (en) * | 2012-02-27 | 2013-08-29 | Faraday Technology, Inc. | Electrodeposition of chromium from trivalent chromium using modulated electric fields |
CN105229204A (en) * | 2013-03-15 | 2016-01-06 | 恩索恩公司 | The galvanic deposit of silver and fluoropolymer nanoparticle |
CN103382564B (en) * | 2013-07-18 | 2016-10-05 | 华南理工大学 | Metal surface superhydrophobic cobalt coating and preparation method thereof |
KR101636361B1 (en) * | 2014-07-31 | 2016-07-06 | 주식회사 에이피씨티 | Tin Alloy Electroplating Solution Containing Perfluorinated Alkyl Surfactant for Solder Bump |
GB2534120A (en) * | 2014-11-28 | 2016-07-20 | Daido Ind Bearings Europe Ltd | Bismuth-based composite coating for overlay applications in plain bearings |
AT516876B1 (en) * | 2015-03-09 | 2016-11-15 | Ing W Garhöfer Ges M B H | Deposition of decorative palladium-iron alloy coatings on metallic substances |
JP6631349B2 (en) | 2015-03-26 | 2020-01-15 | 三菱マテリアル株式会社 | Plating solution using ammonium salt |
CN105648490B (en) * | 2016-01-07 | 2017-08-15 | 东南大学 | A kind of super hydrophobic surface being modified without low-surface energy substance and preparation method thereof |
CN105862093B (en) * | 2016-05-26 | 2018-03-06 | 安庆师范大学 | A kind of method of electroplated Ni Cr PTFE composite deposites in ionic liquid |
CN109652829B (en) * | 2019-01-04 | 2021-07-09 | 中国计量大学 | Rare earth-free Bi-based magnetic electroplating solution and preparation method thereof |
CN109680310B (en) * | 2019-01-04 | 2020-07-07 | 中国计量大学 | Nickel-antimony electroplating solution and preparation method thereof |
CN110714212B (en) * | 2019-10-12 | 2021-04-30 | 常州大学 | Method for preparing super-hydrophobic nickel film in aqueous solution system by nickel chloride one-step method |
AT523922B1 (en) * | 2020-09-08 | 2022-01-15 | Iwg Ing W Garhoefer Ges M B H | Electrolyte bath for palladium-ruthenium coatings |
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-
2006
- 2006-01-06 PL PL06701821T patent/PL1969160T3/en unknown
- 2006-01-06 DE DE502006009414T patent/DE502006009414D1/en active Active
- 2006-01-06 WO PCT/EP2006/000076 patent/WO2007076898A1/en active Application Filing
- 2006-01-06 EP EP06701821A patent/EP1969160B1/en active Active
- 2006-01-06 JP JP2008539264A patent/JP4811880B2/en active Active
- 2006-01-06 AT AT06701821T patent/ATE507327T1/en active
- 2006-01-06 CN CN2006800537299A patent/CN101400830B/en active Active
- 2006-01-06 KR KR1020087018950A patent/KR101234429B1/en active IP Right Grant
- 2006-01-06 ES ES06701821T patent/ES2361500T3/en active Active
-
2008
- 2008-07-07 US US12/168,680 patent/US8192607B2/en active Active
-
2012
- 2012-06-04 US US13/487,665 patent/US20120298519A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
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See references of WO2007076898A1 * |
Also Published As
Publication number | Publication date |
---|---|
US20120298519A1 (en) | 2012-11-29 |
CN101400830A (en) | 2009-04-01 |
KR20080092399A (en) | 2008-10-15 |
JP2009522441A (en) | 2009-06-11 |
ES2361500T3 (en) | 2011-06-17 |
US20080302668A1 (en) | 2008-12-11 |
KR101234429B1 (en) | 2013-02-18 |
DE502006009414D1 (en) | 2011-06-09 |
CN101400830B (en) | 2012-07-04 |
WO2007076898A1 (en) | 2007-07-12 |
US8192607B2 (en) | 2012-06-05 |
ATE507327T1 (en) | 2011-05-15 |
JP4811880B2 (en) | 2011-11-09 |
PL1969160T3 (en) | 2011-09-30 |
EP1969160B1 (en) | 2011-04-27 |
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