EP1967616B8 - Mikrostruktur und Herstellungsverfahren dafür - Google Patents

Mikrostruktur und Herstellungsverfahren dafür Download PDF

Info

Publication number
EP1967616B8
EP1967616B8 EP20070023950 EP07023950A EP1967616B8 EP 1967616 B8 EP1967616 B8 EP 1967616B8 EP 20070023950 EP20070023950 EP 20070023950 EP 07023950 A EP07023950 A EP 07023950A EP 1967616 B8 EP1967616 B8 EP 1967616B8
Authority
EP
European Patent Office
Prior art keywords
microstructure
manufacturing
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP20070023950
Other languages
English (en)
French (fr)
Other versions
EP1967616B1 (de
EP1967616A1 (de
Inventor
Yusuke Hatanaka
Yoshinori Hotta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of EP1967616A1 publication Critical patent/EP1967616A1/de
Publication of EP1967616B1 publication Critical patent/EP1967616B1/de
Application granted granted Critical
Publication of EP1967616B8 publication Critical patent/EP1967616B8/de
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/18—Polishing of light metals
    • C25F3/20—Polishing of light metals of aluminium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/20—Electrolytic after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
EP20070023950 2007-02-21 2007-12-11 Mikrostruktur und Herstellungsverfahren dafür Not-in-force EP1967616B8 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007040811A JP2008202112A (ja) 2007-02-21 2007-02-21 微細構造体および製造方法

Publications (3)

Publication Number Publication Date
EP1967616A1 EP1967616A1 (de) 2008-09-10
EP1967616B1 EP1967616B1 (de) 2013-08-28
EP1967616B8 true EP1967616B8 (de) 2013-10-02

Family

ID=39446458

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20070023950 Not-in-force EP1967616B8 (de) 2007-02-21 2007-12-11 Mikrostruktur und Herstellungsverfahren dafür

Country Status (3)

Country Link
EP (1) EP1967616B8 (de)
JP (1) JP2008202112A (de)
CN (1) CN101275264A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012241224A (ja) * 2011-05-18 2012-12-10 Kogakuin Univ 多孔質材料及びその製造方法
JP5992208B2 (ja) * 2012-05-30 2016-09-14 富士フイルム株式会社 熱電変換素子の製造方法
JP5986308B2 (ja) * 2012-06-22 2016-09-06 アップル インコーポレイテッド 白色様陽極酸化膜及びその形成方法
US9839974B2 (en) 2013-11-13 2017-12-12 Apple Inc. Forming white metal oxide films by oxide structure modification or subsurface cracking
JP6585759B1 (ja) * 2018-03-28 2019-10-02 株式会社Uacj アルミニウム部材及びその製造方法
US11312107B2 (en) * 2018-09-27 2022-04-26 Apple Inc. Plugging anodic oxides for increased corrosion resistance
US11447887B2 (en) 2020-12-10 2022-09-20 Saudi Arabian Oil Company Surface smoothing of copper by electropolishing
US11512400B2 (en) * 2020-12-10 2022-11-29 Saudi Arabian Oil Company Electrochemical reduction of carbon dioxide
US11617981B1 (en) 2022-01-03 2023-04-04 Saudi Arabian Oil Company Method for capturing CO2 with assisted vapor compression
CN117558560A (zh) * 2024-01-12 2024-02-13 中国科学院合肥物质科学研究院 高能束流辅助制备有序多孔钽箔的方法及其产品和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2708655A (en) 1955-05-17 Electrolytic polishing of aluminum
US3488262A (en) * 1966-07-13 1970-01-06 Clarence W Forestek Method of heat treating hard anodized surfaces
JPS605897A (ja) * 1983-06-22 1985-01-12 Fujitsu Ltd 高耐蝕アルマイト基板の製造法
JPS60231921A (ja) * 1984-05-01 1985-11-18 Kobe Steel Ltd 磁気デイスク用基盤の表面処理方法
JPS61101946A (ja) * 1984-10-23 1986-05-20 Kao Corp メツシユの製造方法
JPS62149029A (ja) * 1985-09-04 1987-07-03 Furukawa Alum Co Ltd アルマイト磁気デイスク基板とその製造方法
GB8823417D0 (en) * 1988-10-05 1988-11-09 Alcan Int Ltd Treating porous anodic aluminium oxide membrane
JP3714507B2 (ja) * 1996-08-26 2005-11-09 日本電信電話株式会社 多孔性陽極酸化アルミナ膜の作製方法
JP4530197B2 (ja) * 2003-11-21 2010-08-25 株式会社資生堂 フィルター材料
TWI285225B (en) * 2004-09-07 2007-08-11 Univ Nat Chiao Tung Method of manufacturing aluminum oxide film with arrayed nanometric pores
EP1715085B1 (de) * 2005-04-18 2013-04-03 FUJIFILM Corporation Verfahren zur Herstellung einer anodisierten Struktur

Also Published As

Publication number Publication date
CN101275264A (zh) 2008-10-01
JP2008202112A (ja) 2008-09-04
EP1967616B1 (de) 2013-08-28
EP1967616A1 (de) 2008-09-10

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