EP1941554A2 - Nanofils emettant de la lumiere destines a la macroelectronique - Google Patents
Nanofils emettant de la lumiere destines a la macroelectroniqueInfo
- Publication number
- EP1941554A2 EP1941554A2 EP06760165A EP06760165A EP1941554A2 EP 1941554 A2 EP1941554 A2 EP 1941554A2 EP 06760165 A EP06760165 A EP 06760165A EP 06760165 A EP06760165 A EP 06760165A EP 1941554 A2 EP1941554 A2 EP 1941554A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- nanowires
- nanowire
- substrate
- light emitting
- shell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- FIG. IA is a diagram of a single crystal semiconductor nanowire.
- nanowires can be fabricated from all of the industrially important semiconductor materials, such as silicon, GaN, GaAs, InP and InAs, as well as those discussed above.
- the nanowires can have diameters that can be precisely defined anywhere between 2 and 100 run with lengths up to 100 ⁇ m. They are each a near-perfect single crystal. They also can be easily processed in solution for integration into device architectures.
- nanowires of these materials Because of the extremely small diameter of nanowires and the nature of their growth method, single crystal nanowires of these materials with virtually no defects can be readily prepared. Thus, these nanowires can be a much more efficient light emission source. Since the nanowires have a high surface-area, surface states and traps can present a potentially greater issue for nanowires than that for bulk materials. This can be resolved by the growth a core shell nanowire structure, whereby the shell material passivates surface defects. For example, single crystal quality transistors using a core shell structure of silicon nanowires have been developed.
Abstract
La présente invention concerne des systèmes et des procédés de fabrication de dispositifs luminescents macroélectroniques au moyen de nanofils orientés de manière dense. Dans une forme de réalisation, des nanofils d'âme sont synthétisés et une enveloppe isolante est fabriquée autour des nanofils. Les structures âme-enveloppe des nanofils sont ensuite déposées sur un substrat pour créer un film mince de nanofil à orientation dense. Une fois créé ce film mince de nanofil à orientation dense, une structure de nanofil métal-isolant est fabriquée par dépôt d'un métal sur le film mince de nanofil. Des contacts ohmiques sont ensuite créés sur la structure de nanofil métal-isolant en vue de son fonctionnement. L'application de signaux électriques sur les contacts ohmiques provoque l'émission de lumière par la structure de nanofil métal-isolant. Des dispositifs luminescents comportant des films minces de nanofil à orientation dense sont également présentés. Dans une forme de réalisation, le dispositif luminescent est par exemple, une DEL. Les nanofils peuvent comprendre par exemple des nanofils du type GaN, InP et CdS ou une combinaison de ces types et d'autres nanofils. Différentes couleurs de lumière peuvent être produites en fonction du type de nanofil, de la combinaison des types de nanofil et des caractéristiques physiques de ces nanofils.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68641705P | 2005-06-02 | 2005-06-02 | |
PCT/US2006/019402 WO2006130359A2 (fr) | 2005-06-02 | 2006-05-18 | Nanofils emettant de la lumiere destines a la macroelectronique |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1941554A2 true EP1941554A2 (fr) | 2008-07-09 |
Family
ID=37482137
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06760165A Withdrawn EP1941554A2 (fr) | 2005-06-02 | 2006-05-18 | Nanofils emettant de la lumiere destines a la macroelectronique |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060273328A1 (fr) |
EP (1) | EP1941554A2 (fr) |
AU (1) | AU2006252815A1 (fr) |
CA (1) | CA2609042A1 (fr) |
WO (1) | WO2006130359A2 (fr) |
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CA2563331A1 (fr) * | 2004-04-12 | 2005-12-15 | Ledeep, Llc | Systemes et procedes de phototherapie |
US8137759B2 (en) * | 2006-04-07 | 2012-03-20 | The Regents Of The University Of California | Gold nanostructures and methods of use |
US8188494B2 (en) * | 2006-06-28 | 2012-05-29 | Hewlett-Packard Development Company, L.P. | Utilizing nanowire for generating white light |
WO2008073529A2 (fr) * | 2006-07-31 | 2008-06-19 | Drexel University | Nanostructures à semi-conducteur intégré et à oxydes métalliques de transition et leurs procédés de préparation |
WO2008079076A1 (fr) * | 2006-12-22 | 2008-07-03 | Qunano Ab | Diode électroluminescente avec structure de nanofil verticale et procédé de fabrication de celle-ci |
US8183587B2 (en) * | 2006-12-22 | 2012-05-22 | Qunano Ab | LED with upstanding nanowire structure and method of producing such |
US7948050B2 (en) | 2007-01-11 | 2011-05-24 | International Business Machines Corporation | Core-shell nanowire transistor |
WO2008085129A1 (fr) | 2007-01-12 | 2008-07-17 | Qunano Ab | Nanofils de nitrure et leur procédé de fabrication |
US8148800B2 (en) * | 2008-01-11 | 2012-04-03 | Hewlett-Packard Development Company, L.P. | Nanowire-based semiconductor device and method employing removal of residual carriers |
SE533090C2 (sv) * | 2008-07-09 | 2010-06-22 | Qunano Ab | Nanostrukturerad ljusdiod |
US8198706B2 (en) * | 2008-07-25 | 2012-06-12 | Hewlett-Packard Development Company, L.P. | Multi-level nanowire structure and method of making the same |
US8247325B2 (en) * | 2008-10-10 | 2012-08-21 | Uchicago Argonne, Llc | Direct growth of metal nanoplates on semiconductor substrates |
KR20110041401A (ko) * | 2009-10-15 | 2011-04-21 | 샤프 가부시키가이샤 | 발광 장치 및 그 제조 방법 |
US8872214B2 (en) * | 2009-10-19 | 2014-10-28 | Sharp Kabushiki Kaisha | Rod-like light-emitting device, method of manufacturing rod-like light-emitting device, backlight, illuminating device, and display device |
KR101178468B1 (ko) * | 2009-10-19 | 2012-09-06 | 샤프 가부시키가이샤 | 봉형상 구조 발광 소자, 봉형상 구조 발광 소자의 제조 방법, 백라이트, 조명 장치 및 표시 장치 |
US9112085B2 (en) * | 2009-11-30 | 2015-08-18 | The Royal Institution For The Advancement Of Learning/Mcgill University | High efficiency broadband semiconductor nanowire devices |
JP5492822B2 (ja) * | 2010-03-05 | 2014-05-14 | シャープ株式会社 | 発光装置、照明装置およびバックライト |
JP4814394B2 (ja) * | 2010-03-05 | 2011-11-16 | シャープ株式会社 | 発光装置の製造方法 |
JP2012004535A (ja) * | 2010-05-17 | 2012-01-05 | Sharp Corp | 発光装置の製造方法 |
JP2011211047A (ja) * | 2010-03-30 | 2011-10-20 | Sharp Corp | 表示装置、表示装置の製造方法および表示装置の駆動方法 |
KR20120138805A (ko) | 2010-03-12 | 2012-12-26 | 샤프 가부시키가이샤 | 발광 장치의 제조 방법, 발광 장치, 조명 장치, 백라이트, 액정 패널, 표시 장치, 표시 장치의 제조 방법, 표시 장치의 구동 방법 및 액정 표시 장치 |
KR20150098246A (ko) | 2010-09-01 | 2015-08-27 | 샤프 가부시키가이샤 | 발광 소자 및 그 제조 방법, 발광 장치의 제조 방법, 조명 장치, 백라이트, 표시 장치 및 다이오드 |
JP4927223B2 (ja) * | 2010-09-01 | 2012-05-09 | シャープ株式会社 | 発光素子およびその製造方法、発光装置の製造方法、照明装置、バックライト並びに表示装置 |
WO2012029381A1 (fr) * | 2010-09-01 | 2012-03-08 | シャープ株式会社 | Élément électroluminescent et son procédé de production, procédé de production d'un dispositif électroluminescent, dispositif d'éclairage, rétroéclairage, dispositif d'affichage et diode |
US8648328B2 (en) * | 2011-12-27 | 2014-02-11 | Sharp Laboratories Of America, Inc. | Light emitting diode (LED) using three-dimensional gallium nitride (GaN) pillar structures with planar surfaces |
US8685774B2 (en) | 2011-12-27 | 2014-04-01 | Sharp Laboratories Of America, Inc. | Method for fabricating three-dimensional gallium nitride structures with planar surfaces |
WO2015017478A2 (fr) * | 2013-07-29 | 2015-02-05 | US Nano LLC | Synthèse de nanofils semi-conducteur cœur/enveloppe cdse/zns |
EP3028296A4 (fr) * | 2013-07-31 | 2017-01-25 | US Nano LLC | Appareils et procédés pour synthèse à flux continu de nanofils semi-conducteurs |
US9818826B2 (en) | 2013-10-21 | 2017-11-14 | Sensor Electronic Technology, Inc. | Heterostructure including a composite semiconductor layer |
CN103882514B (zh) * | 2014-02-28 | 2016-08-24 | 湖南大学 | 一种半导体CdS/CdSSe异质结纳米线及其制备方法 |
CN105883903A (zh) * | 2014-09-12 | 2016-08-24 | 中南大学 | 一种一维ii-vi族半导体核壳纳米结构的制备方法 |
JP2019149389A (ja) * | 2016-07-11 | 2019-09-05 | シャープ株式会社 | 発光素子、発光装置、照明装置、バックライト、及び表示装置 |
US11011571B2 (en) | 2018-08-24 | 2021-05-18 | Innovation Semiconductor | Nanowire light emitting switch devices and methods thereof |
CN111261792B (zh) * | 2020-01-13 | 2023-03-14 | 采埃孚汽车科技(上海)有限公司 | 电致发光器件 |
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-
2006
- 2006-05-18 WO PCT/US2006/019402 patent/WO2006130359A2/fr active Application Filing
- 2006-05-18 CA CA002609042A patent/CA2609042A1/fr not_active Abandoned
- 2006-05-18 EP EP06760165A patent/EP1941554A2/fr not_active Withdrawn
- 2006-05-18 AU AU2006252815A patent/AU2006252815A1/en not_active Abandoned
- 2006-05-24 US US11/440,227 patent/US20060273328A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
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See references of WO2006130359A2 * |
Also Published As
Publication number | Publication date |
---|---|
CA2609042A1 (fr) | 2006-12-07 |
WO2006130359A3 (fr) | 2009-04-23 |
AU2006252815A1 (en) | 2006-12-07 |
US20060273328A1 (en) | 2006-12-07 |
WO2006130359A2 (fr) | 2006-12-07 |
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