EP1934578A1 - Verfahren zum untersuchen eines messobjektes und vorrichtung - Google Patents
Verfahren zum untersuchen eines messobjektes und vorrichtungInfo
- Publication number
- EP1934578A1 EP1934578A1 EP06761735A EP06761735A EP1934578A1 EP 1934578 A1 EP1934578 A1 EP 1934578A1 EP 06761735 A EP06761735 A EP 06761735A EP 06761735 A EP06761735 A EP 06761735A EP 1934578 A1 EP1934578 A1 EP 1934578A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- scanning probe
- data signals
- microscopic examination
- measuring
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
- G01Q10/06—Circuits or algorithms therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
- G01Q30/025—Optical microscopes coupled with SPM
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/04—Display or data processing devices
- G01Q30/06—Display or data processing devices for error compensation
Definitions
- Scanning Probe Microscopy is a technique in which a probe is scanned over a sample, which may also be referred to as a DUT or object of interest, and a distance-dependent interaction between the probe and the sample.
- AFM Atomic Force Microscope
- STM Scanning Tunneling Microscope
- SPhM Scanning Photon Force Microscope
- distance spectroscopy is another important method of investigation in all of these techniques.
- the probe is moved relative to the sample, in particular in the vertical direction or any direction in space or a plane, and measured the interaction.
- this technique is used to measure the forces between molecules by attaching one molecule to the probe and another molecule to the sample. But it can also be measured intramolecular forces, for example, by lowering the probe to the sample and waiting for a bond. Thereafter, the probe can be removed from the pad on which the sample is placed and the force recorded.
- further measurements may be provided, and such measurements may also be performed in part, in which an interaction correlated to the distance of two or more points is measured.
- Optical methods such as fluorescence microscopy are able to provide information about the composition of the sample under investigation, for example by marking particles with specific fluorescent labels.
- FRET Fluorescence Resonance Energy Transfer
- FRET Fluorescence Resonance Energy Transfer
- an observation area of an optical measuring system which is used for the optical examination of the sample, preferably the focus, must spatially overlap with the optically examined portion of the test object.
- the measurement object must also be so close to the optical axis that it can be detected by the optical measuring system, for example by means of a measuring objective.
- the support for the sample is moved by means of a piezoelectric arrangement, for example, in order to vary the distance between the sample and the measuring probe. Now, if the object to be optically examined, in particular a portion of the sample, firmly connected to the sample, so it comes to a defocusing. - The probe is moved by means of a piezoelectric arrangement to vary the distance between the sample and the probe. If the object to be optically examined is firmly connected to the measuring probe, defocusing occurs.
- a preferred development of the invention provides that the at least one partial section of the test object is caused by the scanning probe microscopic examination Verlagerang from the observation area is shifted in at least one of the following ways: spatial displacement and displacement in a two-dimensional plane.
- a preferred development of the invention provides that the data signals characterizing the displacement are derived using data signals from the scanning probe microscopic examination.
- An advantageous embodiment of the invention provides that the data signals of the scanning probe microscopic examination comprising data signals for a displacement of a probe recording in the scanning probe microscopic examination are formed.
- a preferred development of the invention provides that the data signals of the scanning probe microscopic examination are formed comprehensively data signals for a displacement of a support of the test object in the scanning probe microscopic examination.
- the data signals of the scanning probe microscopic examination data signals for an external change in shape of the measurement object in the scanning probe microscopic examination are formed comprehensive.
- An advantageous embodiment of the invention provides that the data signals of the scanning probe microscopic examination are formed comprehensively in distance spectroscopy data signals.
- a preferred further development of the invention provides that the data signals of the scanning probe microscopic examination are formed by atomic force data signals in a comprehensive manner.
- a preferred development of the invention provides that, in the scanning probe microscopic examination with the scanning probe measuring device, at least one of the following methods is carried out: atomic force microscopy, scanning tunneling microscopy, scanning photon microscopy and scanning near-field microscopy.
- the optical examination with the optical measuring system at least one of the following methods is carried out: light microscopic examination, fluorescence measuring method and absorption measuring method.
- An advantageous embodiment of the invention provides that during the optical examination of the at least one subsection of the test object as the observation area, a focus area of the optical measuring system is used and the at least one displaced subsection of the test object is again arranged in the focus area of the optical measuring system with the aid of the readjustment device becomes.
- the adjusting device has an adjusting device of the optical measuring system for displacing at least one displaceable part of the optical measuring system.
- An adjustment of the entire optical measuring system with the aid of the adjusting device can also be provided, namely a spatial displacement of the optical measuring system. This can be provided, for example, when the measuring probe and the subsection of the test object also still move together relative to the observation area in the scanning probe microscopic examination.
- the adjusting device has an adjusting device of the measuring probe of the scanning probe measuring device for displacing the measuring probe.
- the adjusting device has an adjusting device of a support for the measurement object for displacing the measurement object.
- An advantageous embodiment of the invention provides that the adjusting device is associated with a measuring device for measuring a bending of the probe in the rastersondenmikroskopi- examination of the DUT.
- a preferred development of the invention provides that the adjusting device is assigned a measuring device for measuring a displacement of the receptacle for the test object in the scanning probe microscopic examination of the test object.
- a preferred embodiment of the invention provides that the adjusting device is associated with a measuring device for measuring a displacement of the probe of the Rastersondenmeßeinrich- device in the scanning probe microscopic examination of the test object.
- An advantageous embodiment of the invention provides that with the Rastersondenmeß acquired at least one of the following Rastersondenmeß restoreden is implemented: atomic force microscope, scanning tunneling microscope, scanning photon microscope and Rasterternfeldfeldmik- roskop.
- a preferred development of the invention provides that at least one of the following optical measuring devices is implemented with the optical measuring system: light microscope, fluorescence measuring device and absorption measuring device.
- the measurement objective can be moved in the same direction and length, for example, with a piezo-driven phaser parallel to the axis.
- both components preferably have sensors and a corresponding regulation, so that the planned movement actually corresponds to the planned movement and both movements take place uniformly.
- the control of the optical system it may become necessary to control the control of the optical system to switch the output of the sample movement sensors as their input.
- this also applies to the adjustment of the optical system.
- an alternative method performs a known movement to the input signal, can be dispensed with the above proposed sensors.
- the adjustment of the focal plane can also take place via the movement of a lens in front of the measuring objective. This has the particular advantage that a method such as SPhM works with another upstream lens.
- the measuring probe is moved, a focusing problem occurs, for example, when the object to be measured is connected to the measuring probe. In this case, the suggestions made above for refocusing apply accordingly.
- Such a correction may, for example, take place in the cantilever so that the measured deflection of the cantilever depends on the movement of the base. is dragged or added.
- the prerequisite for this is the calibration of the sensitivity of the structure for bending, which is known as such.
- the cantilever has been chosen here as an example, as it is a prominent representative of the scanning probes. For other probes with a similar property, the same possibilities exist.
- the object to be measured will be between the base and the probe and will be moved by the mechanical process. This movement will be dependent on the one hand on the relative movement of the base and the probe to each other, or the part of the probe to which the sample is bound. On the other hand, the movement will also depend on the nature of the entire sample, in which the DUT, for example a fluorophore, is integrated.
- the movement of the focal plane is then controlled by a method that is analog or preferably digital. This method assumes a model for the sample and can then, for example, from the initial position of the measurement object or other information that are known about the sample, in conjunction with the already mentioned control options, a course of the object to be measured in the vertical Determine direction.
- a digital solution is preferable to an analog solution because it allows greater flexibility.
- the invention is therefore able to check models, but in particular to have the DUT at the appropriate moment of the experiment in the focal plane.
- FIG. 1 a shows a schematic representation of a tensile experiment with a measuring probe on a test object in an initial state
- FIG. 1b shows a schematic representation of the tensile test with the measuring probe on the test object from FIG. 1a in a drawn state
- 2a is a schematic representation of a tensile experiment with a measuring probe on a test object in an initial state
- FIG. 2b is a schematic representation of the tensile experiment with the probe to the test object of Fig. 2a in a pulled state
- 3a shows a schematic representation of a tensile experiment with a measuring probe on a test object in an initial state
- FIG. 3b is a schematic representation of the tensile test with the probe to the test object of Fig. 3a in a pulled state, wherein an adjustment has been made
- FIG. 4b shows a schematic representation of the tensile test with the measuring probe on the test object from FIG. 4a in a drawn state, wherein an adjustment has been made
- 5a shows a schematic representation of a tensile experiment with a measuring probe on a test object in an initial state
- FIG. 1a shows a schematic representation of a tensile experiment with a measuring probe 10 on a test object 1 in an initial state.
- FIG. 1b shows a schematic representation of the tensile experiment from FIG. 1a with the measuring probe 10 on the test object 1 in a pulled state.
- the object to be observed 1 is a section of a cell 2, which is mounted on a base 3, which is also referred to as a support.
- the pad is fixed to the frame on a frame 20 which is drawn schematically.
- the test object 1 may lie in another embodiment between the cell 2 and the pad 3 and provide a contact.
- the cell 2 is then brought into contact with another cell 12, which is fastened to a measuring probe 10 designed as a canver.
- the cantilever 10 is attached for handling a component 11, which is for example a silicon component, which in turn is connected to a frame 20 via a piezo-component 40. There are usually other components between the component 11 and the piezo-component 40, which are omitted here for the sake of clarity.
- a measuring objective 30 attached to another frame 20a and optics not further outlined here, for example a commercial inversion sen microscope, designed as a focal plane 31 observation area is set so that the measurement object 1 can be sharply imaged.
- the measuring objective 30 is part of an optical measuring system, with which the measuring object 1 is optically examined.
- the piezo-component 40 is shortened such that there is still contact between the two cells 2, 12, then a force acts on the cantilever 10. This bends from the original position, which in FIG Since both cells 2, 12 change their shape, a shape-changed cell 5 and another shape-changed cell 15 are formed.
- the stroke caused by the piezo-component 40 is defined by the distance from two auxiliary lines 18, 19 marked. These align themselves at the base of the cantilever 10.
- the measuring object 1 is coupled to the base 3 and thus to another frame 20b, the position of the measuring object 1 does not change. Since the measuring objective 30 is connected to the further frame 20 a, the movement of the cantilever 10 has no consequences for the imaging during the optical examination of the test object 1 with the measuring objective 30.
- FIG. 2a shows a schematic representation of a tensile experiment with a measuring probe 10 on a test object 1 in an initial state.
- Fig. 2b shows a schematic representation of the tensile experiment of Fig. 2a with the probe 10 to the measuring object 1 in a pulled state.
- FIG. 3a shows a schematic representation of a tensile experiment with a measuring probe 10 on a measuring object 1 in an initial state.
- FIG. 3b shows a schematic representation of the tensile experiment from FIG. 3a with the measuring probe 10 on the test object 1 in a pulled state, wherein an adjustment has been made.
- the initial position in Fig. 3 a substantially corresponds to the situation in Fig. 2a.
- the measuring lens 30 is mounted for optical measurement on a vertical adjustment device 50, which can be moved via a controller 51.
- a sensor 52 is provided, with which the deflection of the other piezo-component 40b or preferably also the cell 2 can be measured.
- FIG. 4a shows a schematic representation of a tensile experiment with a measuring probe 10 on a test object 1 in an initial state.
- Fig. 4b shows a schematic representation of the tensile experiment of Fig. 4a with the probe 10 to the test object 1 in a pulled state, with an adjustment has been made.
- a cantilever bending triggered by the scanning probe microscopic examination is additionally taken into account in this embodiment.
- Fig. 4a shows the initial situation, which is very similar to the situation in Fig. Ia. Differences exist in the position of the measured object 1 and the focal plane 31 and in the adjusting device with the adjusting device 50, the controller 51, a sensor unit 152nd and a laser 60 and another sensor 61, which is, for example, a 2-segment photodiode.
- the piezo component 40 is shortened, resulting in a new position for the measurement object 1, which necessitates the changed focal plane 33 (observation region). Due to the bending of the cantilever 10, however, the distance between the focal plane 31 and the modified focal plane 33 is less than the stroke mediated by the piezo-component 40, namely the distance between the two auxiliary lines 18, 19. This circumstance is taken into account by In addition to a data signal from the sensor unit 152, a data signal from the further sensor 61 and thus a measure of the bending of the cantilever 10 is made available.
- the bending is measured in this exemplary embodiment via a light pointer, in which with the aid of the laser 60, a laser measuring beam 65 is focused on the cantilever 10 and a reflected beam 66 is recorded and evaluated with the other sensor 61.
- a light pointer in which with the aid of the laser 60, a laser measuring beam 65 is focused on the cantilever 10 and a reflected beam 66 is recorded and evaluated with the other sensor 61.
- Such a way of measuring the bending of the cantilever 10 is known to those skilled in the art, so that a further detailed illustration is omitted here.
- other methods for measuring the bending are known and can also be used, for example, the measurement of a deflection with an interferometer.
- FIG. 5a shows a schematic representation of a tensile test with a measuring probe 10 on a test object 1 in an initial state.
- Fig. 5b shows a schematic representation of the tensile experiment of Fig. 5a with the probe 10 to the measuring object 1 in a pulled state, with an adjustment has been made.
- Fig. 5 a shows again the initial situation, which differs from that in Fig. 4a only by some features.
- the measurement object 1 is now arranged in the middle of the cell 2.
- the controller 51 is still connected to a model component 70, for example an electronic memory, the electronically evaluable information for a model of the vertical course of the test object 1 as a function of the acting force and the total deflection in the scanning probe microscopic examination includes. From this information, the position of the measurement object 1 can be determined as a result of the scanning probe microscopic measurement, so that then the focus can be adjusted.
- the model component 70 and preferably also the controller 51 are preferably implemented with a computer. Further parameters, for example the temperature or the pH of cell 2, are also included; they are not shown here for clarity. A support by an evaluation of the optical signal measured with the optical measuring system can also be provided.
- Fig. 5b the operation is shown.
- the measuring object 1 has moved upwards, and the changed focal plane 33 could be successfully adjusted, although the distance of the focal plane 31 at the beginning of the experiment to the new position of the focal plane 33 can deviate greatly from the lifting movement, which by means of the two auxiliary lines 18, 19 is shown. This can now also succeed without involving an evaluation unit of the microscope.
- An advantage of the invention is that the optical measurement can be made at a specific time, for example, tearing of a contact in the scanning probe microscopic examination, and in the remaining time a shutter prevents, for example, fluorescent molecules from fading.
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005049562 | 2005-10-13 | ||
PCT/DE2006/001131 WO2007041976A1 (de) | 2005-10-13 | 2006-06-30 | Verfahren zum untersuchen eines messobjektes und vorrichtung |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1934578A1 true EP1934578A1 (de) | 2008-06-25 |
Family
ID=36972960
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06761735A Withdrawn EP1934578A1 (de) | 2005-10-13 | 2006-06-30 | Verfahren zum untersuchen eines messobjektes und vorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US8769711B2 (ja) |
EP (1) | EP1934578A1 (ja) |
JP (1) | JP2009511882A (ja) |
CN (1) | CN101326433A (ja) |
WO (1) | WO2007041976A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7977636B2 (en) * | 2008-08-12 | 2011-07-12 | Anasys Instruments, Inc. | Infrared imaging using thermal radiation from a scanning probe tip |
JP2010198153A (ja) * | 2009-02-24 | 2010-09-09 | Nec System Technologies Ltd | 冗長システム、冗長化方法及びプログラム |
JP5814855B2 (ja) * | 2012-04-27 | 2015-11-17 | 株式会社日立ハイテクノロジーズ | 荷電粒子線調整支援装置および方法 |
CN104946523B (zh) * | 2015-05-28 | 2017-09-15 | 三捷生物科技(北京)有限公司 | 一种细胞力学的测量装置及测量方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4233399C2 (de) * | 1992-10-05 | 2002-09-19 | Zeiss Carl | Kraftmikroskop |
JP2968915B2 (ja) * | 1993-08-23 | 1999-11-02 | 日立建機株式会社 | プローブ顕微鏡装置の位置決め方法 |
US5952562A (en) * | 1995-11-22 | 1999-09-14 | Olympus Optical Co., Ltd. | Scanning probe microscope incorporating an optical microscope |
US20020104963A1 (en) * | 1998-09-26 | 2002-08-08 | Vladimir Mancevski | Multidimensional sensing system for atomic force microscopy |
JP2002107283A (ja) * | 2000-03-28 | 2002-04-10 | Seiko Instruments Inc | 走査型プローブ顕微鏡 |
US6452161B1 (en) * | 2000-03-28 | 2002-09-17 | Advanced Micro Devices, Inc. | Scanning probe microscope having optical fiber spaced from point of hp |
-
2006
- 2006-06-30 WO PCT/DE2006/001131 patent/WO2007041976A1/de active Application Filing
- 2006-06-30 EP EP06761735A patent/EP1934578A1/de not_active Withdrawn
- 2006-06-30 US US12/083,303 patent/US8769711B2/en active Active
- 2006-06-30 JP JP2008534858A patent/JP2009511882A/ja active Pending
- 2006-06-30 CN CNA2006800463238A patent/CN101326433A/zh active Pending
Non-Patent Citations (1)
Title |
---|
See references of WO2007041976A1 * |
Also Published As
Publication number | Publication date |
---|---|
JP2009511882A (ja) | 2009-03-19 |
CN101326433A (zh) | 2008-12-17 |
US8769711B2 (en) | 2014-07-01 |
WO2007041976A1 (de) | 2007-04-19 |
US20090205089A1 (en) | 2009-08-13 |
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