EP1831915A2 - Compositions exemptes de mercure et de sodium et sources de rayonnement les comprenant - Google Patents

Compositions exemptes de mercure et de sodium et sources de rayonnement les comprenant

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Publication number
EP1831915A2
EP1831915A2 EP05853897A EP05853897A EP1831915A2 EP 1831915 A2 EP1831915 A2 EP 1831915A2 EP 05853897 A EP05853897 A EP 05853897A EP 05853897 A EP05853897 A EP 05853897A EP 1831915 A2 EP1831915 A2 EP 1831915A2
Authority
EP
European Patent Office
Prior art keywords
radiation source
free
metal
sodium
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05853897A
Other languages
German (de)
English (en)
Inventor
David John Smith
Timothy John Sommerer
Joseph Darryl Michael
Vikas Midha
George Michael Cotzas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of EP1831915A2 publication Critical patent/EP1831915A2/fr
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/18—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/125—Selection of substances for gas fillings; Specified operating pressure or temperature having an halogenide as principal component
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/32—Special longitudinal shape, e.g. for advertising purposes
    • H01J61/327—"Compact"-lamps, i.e. lamps having a folded discharge path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/70—Lamps with low-pressure unconstricted discharge having a cold pressure < 400 Torr
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field

Definitions

  • the present invention relates generally to a mercury-free and sodium-free composition capable of emitting radiation if excited.
  • the invention relates to a radiation source comprising an ionizable mercury-free and sodium free composition being capable of emitting radiation if excited.
  • Ionizable compositions are used in discharge sources.
  • radiation is produced by an electric discharge in a medium.
  • the discharge medium is usually in the gas or vapor phase and is preferably contained in a housing capable of transmitting the radiation generated out of the housing.
  • the discharge medium is usually ionized by applying an electric field created by applying a voltage across a pair of electrodes placed across the medium.
  • Radiation generation occurs in gaseous discharges when energetic charged particles, such as electrons and ions, collide with gas atoms or molecules in the discharge medium, causing atoms and molecules to be ionized or excited. A significant part of the excitation energy is converted to radiation when these atoms and molecules relax to a lower energy state, and in the process emit the radiation.
  • Gas discharge radiation sources are available and operate in a range of internal pressures. At one end of the pressure range, the chemical species responsible for the emission is present in very small quantities, generating a pressure during operation of a few hundreds pascals or less. The radiating chemical species may sometimes constitute as little as 0 .1 % of the total pressure.
  • Gas discharge radiation sources having a total operating pressure at the low end of the pressure range and radiating at least partly in the UV spectrum range can convert UV radiation to visible radiation, and are often referred to as fluorescent sources.
  • Phosphors also help determine the color properties of fluorescent sources.
  • a mixture of phosphors is usually used to produce a desired color appearance.
  • gas discharge sources including high intensity discharge sources, operate at relatively higher pressures (from about 0.05 MPa to about 20 MPa) and relatively high temperatures (higher than about 600 0 C). These discharge sources usually contain an inner arc tube enclosed within an outer envelope.
  • mercury-free discharge compositions capable of emitting radiation, which can be used in radiation sources.
  • the present invention provides ionizable mercury-free and sodium-free compositions that are capable of emitting radiation when excited and radiation sources that incorporate one of such compositions.
  • the ionizable mercury-free and sodium-free composition comprises an inert buffer gas and at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the composition excluding the inert buffer gas produces a total vapor pressure less than about 1x10 3 Pa if excited.
  • the ionizable mercury- free and sodium-free composition comprises an inert buffer gas and at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that In, Bi, Pb, and Ga are absent when a tin halide is present.
  • an ionizable mercury- free and sodium- free composition comprises an inert buffer gas and at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof, and at least a compound of a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that Ge is absent when Se is present and the proviso that In, Bi, Pb and Ga and halides thereof are absent when a tin halide is present.
  • the metal compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic
  • an ionizable mercury-free and sodium-free composition comprises an inert buffer gas and at least a compound of a metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the metal compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds, and combinations thereof.
  • the present invention provides a radiation source that includes an ionizable mercury-free and sodium-free composition that comprises at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the vapor pressure of the metal in the radiation source during its operation is less than about IxIO 3 Pa.
  • the present invention provides a radiation source that includes an ionizable mercury-free and sodium-free composition that comprises at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that In, Bi, Pb, and Ga are absent when a tin halide is present.
  • a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that In, Bi, Pb, and Ga are absent when a tin halide is present.
  • a radiation source includes an ionizable mercury-free composition and sodium-free composition that comprises at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof, and at least a compound of a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that Ge is absent when Se is present and the proviso that In, Bi, Pb and Ga and halides thereof are absent when a tin halide is present
  • the metal compound is selected from the group consisting of halides, oxide, chalcogenides, hydroxide, hydride, organometallic compounds and
  • a radiation source includes an ionizable mercury-free and sodium-free composition comprises at least a compound of a metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the metal compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds, and combinations thereof.
  • FIG. 1 is a radiation source in one embodiment of the present invention.
  • FIG. 2 is a radiation source in a second embodiment of the present invention.
  • FIG. 3 is a radiation source in a third embodiment of the radiation source of the present invention.
  • FIG. 4 is an emission spectrum of a radiation source in an embodiment of the present invention.
  • Fig. 5 is an emission spectrum of a radiation source in another embodiment of the present invention.
  • an ionizable mercury- free composition of the present invention that comprises an inert buffer gas and at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof, in an amount such that a vapor pressure of the metal during an operation of a radiation source comprising such a composition is less than about 1x10 3 Pa.
  • the vapor pressure of the metal during operation is preferably less than about 100 Pa and, more preferably, less than about 10 Pa.
  • the metal is preferably selected from the group consisting of Ga, Mn, and combinations thereof, more preferably the metal is Ga.
  • the ionizable mercury-free and sodium-free composition further comprises at least a compound of at least a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds and combinations thereof.
  • the ionizable composition excluding the inert buffer gas producing a total vapor pressure less than about 1x10 Pa if excited, preferably less than about 100 Pa and, more preferably, less than about 10 Pa.
  • the second metal is preferably selected from the group consisting of Ga, Mn, and combinations thereof, more preferably the first and second metals are Ga. In one embodiment, the first and the second metals are the same. In another embodiment, the first metal and the second metal are different. In a further embodiment the metal compound is a halide. In one embodiment the halide is an iodide. In another embodiment the halide is a bromide.
  • an ionizable mercury-free and sodium-free composition comprises an inert buffer gas and at least a metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof, with the proviso that In, Bi, Pb, and Ga are absent when a tin halide is present.
  • the metal is preferably selected from the group consisting of Ga, Mn, and combinations thereof, more preferably the metal is Ga.
  • the ionizable mercury-free and sodium-free composition further comprises at least a compound of said at least a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, and Os.
  • the compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds and combinations thereof.
  • the metal compound is a halide.
  • the halide is an iodide.
  • the halide is a bromide.
  • an ionizable mercury-free and sodium-free composition comprises an inert buffer gas and at least a first metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof, and at least a compound of a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof, with the proviso that Ge is absent when Se is present; and the proviso that In, Bi, Pb and Ga and halides thereof are absent when a tin halide is present.
  • the metal compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds with the proviso that Ge is absent when Se is present, and combinations thereof.
  • the first and the second metals are the same.
  • the first metal and the second metal are different.
  • the metal compound is a halide.
  • the halide is an iodide.
  • the halide is a bromide.
  • an ionizable mercury-free and sodium-free composition comprises an inert buffer gas and at least a compound of a metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the metal compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds and combinations thereof.
  • the metal compound is gallium iodide.
  • the metal compound is bismuth iodide.
  • a radiation source comprises an ionizable mercury-free and sodium-free composition that comprises at least a metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os and combinations thereof.
  • the metal being present in an amount such that a vapor pressure of said least a metal during an operation of the radiation source is less than about 1x10 3 Pa, preferably, less than about 100 Pa, and more preferably, less than about 10 Pa.
  • the ionizable mercury-free and sodium-free composition of the radiation source further comprises at least a compound of at least a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds and combinations thereof.
  • the ionizable composition excluding the inert buffer gas producing a total vapor pressure less than about 1x10 Pa if excited, preferably less than about 100 Pa and, more preferably, less than about 10 Pa.
  • the second metal is preferably selected from the group consisting of Ga, Mn, and combinations thereof, more preferably the first and second metals are Ga. In one embodiment, the first and the second metals are the same. In another embodiment, the first metal and the second metal are different. In a further embodiment the metal compound is a halide. In one embodiment the halide is an iodide. In another embodiment the halide is a bromide.
  • a radiation source comprises an ionizable mercury-free and sodium-free composition that comprises a metal selected from the group consisting of at least a metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that In, Bi, Pb, and Ga are absent when a tin halide is present.
  • the ionizable mercury-free and sodium-free composition of the radiation source further comprises at least a compound of said at least a second metal selected from the group consisting of Mn, Ni, Cu, Al, Ga, In, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, and Os.
  • the compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds and combinations thereof.
  • the metal compound is a halide.
  • the halide is an iodide.
  • the halide is a bromide.
  • a radiation source comprises an ionizable mercury-free and sodium-free composition that comprises at least a first metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof and at least a compound of a second metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof with the proviso that Ge is absent when Se is present and the proviso that In, Bi, Pb, and Ga are absent when a tin halide is present.
  • the metal compound is selected from the group consisting of halides, oxide, chalcogenides, hydroxide, hydride, organometallic compounds, and combinations thereof.
  • the first metal is preferably selected from the group consisting of Ga, Mn, and combinations thereof. In one embodiment, the first and the second metals are the same. In another embodiment, the first metal and the second metal are different. Preferably, the first and second metals are Ga. In one preferred embodiment, the first metal is Ga, and the compound of the second metal is gallium halide. In another preferred embodiment, the gallium halide is gallium iodide. In another embodiment the halide is a bromide.
  • a radiation source comprises an ionizable mercury-free and sodium-free composition that comprises an inert buffer gas and at least a compound of a metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Os, and combinations thereof.
  • the metal compound is selected from the group consisting of halides, oxides, chalcogenides, hydroxide, hydride, organometallic compounds, and combinations thereof .
  • the metal compound is gallium iodide.
  • the metal compound is bismuth iodide.
  • the radiation source comprises an ionizable mercury-free and sodium-free composition that consists of an inert buffer gas and a compound of one metal selected from the group consisting of Mn, Ni, Al, Ga, Tl, Ge, Sn, Pb, Bi, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, and Os.
  • the metal compound is a gallium halide, preferably gallium iodide.
  • the metal compound is a bismuth halide, preferably bismuth iodide.
  • the metal is present as elemental metal in an unexcited state. In another embodiment, the metal is present as a component of an alloy with at least another metal other than mercury or sodium.
  • the metal compound of the ionizable composition of the radiation source is a metal halide.
  • the metal halide is a metal iodide.
  • the metal halide is metal bromide.
  • the ionizable composition comprises at least two metal compounds.
  • the metal compound in the ionizable composition of the radiation source is gallium halide.
  • the gallium halide is gallium iodide.
  • the gallium halide is gallium bromide.
  • the inert buffer gas comprises an inert gas selected from the group consisting of helium, neon, argon, krypton, xenon, and combinations thereof.
  • the inert buffer gas enables the gas discharge to be more readily ignited.
  • the inert buffer gas also controls the steady state operation, and can be used to optimize an operation of the radiation source.
  • argon is used as the inert buffer gas.
  • Argon may be substituted, either completely or partly, with another inert gas, such as helium, neon, krypton, xenon, or combinations thereof.
  • the gas pressure of the inert gas at the operating temperature is in the range from about 1 Pascal to about 1x10 4 Pa, preferably from about 100 Pa to about 1x10 3 Pa.
  • the efficiency of the radiation source may be improved by including two or more gallium compounds in the ionizable composition.
  • the efficiency may be further improved by optimizing the internal pressure of the discharge during operation. Such optimization can be effected by controlling the partial pressure of the metal and/or metal compounds, or by controlling the pressure of the inert buffer gas, or by controlling the partial pressure of the metal and/or metal compounds and the pressure of the inert buffer gas.
  • an increase in the luminous efficacy can be achieved by controlling the operating temperature of the discharge.
  • the luminous efficacy, expressed in lumen/Watt is the ratio between the brightness of the radiation in a specific visible wavelength range and the energy for generating the radiation.
  • FIG. 1 schematically illustrates a gas discharge radiation source 10.
  • FIG. 1 shows a tubular housing or vessel 14 containing an ionizable composition of the present invention.
  • the material comprising the housing 14 may be transparent or opaque.
  • the housing 14 may have a circular or non-circular cross section, and need not be straight.
  • the discharge is desirably excited by thermionically emitting electrodes 16 connected to a voltage source 20.
  • the discharge may also be generated by other methods of excitation that provide energy to the composition. It is within the scope of this invention that various waveforms of voltage and current, including alternating or direct, are contemplated for the present invention. It is also within the scope of this invention that additional voltage sources may also be present to help maintain the electrodes at a temperature sufficient for thermionic emission of electrons.
  • FIG.2 schematically illustrates another embodiment of a gas discharge radiation source 10.
  • the housing comprises an inner envelope 24 and an outer envelope 26.
  • the space between the two envelopes is either evacuated or filled with a gas.
  • the gas discharge radiation source housing may alternatively be embodied so as to be a multiple-bent tube or inner envelope 24 surrounded by an outer envelope or bulb 26 as shown in FIG. 3.
  • the housing or the envelope of the radiation source containing the ionizable composition is preferably made of a material type that is substantially transparent.
  • substantially transparent means allowing a total transmission of at least about 50 percent, preferably at least about 75 percent, and more preferably at least about 90 percent, of the incident radiation within about 10 degrees of a perpendicular to a tangent drawn at any point on the surface of the housing or envelope.
  • phosphors may be used to absorb the radiation emitted by the discharge and emit other radiation in the visible wavelength region.
  • a phosphor or a combination of phosphors may be applied to the inside of the radiation source envelope.
  • the phosphor or phosphor combination may be applied to the outside of the radiation source envelope provided that the envelope is not made of any material that absorbs a significant amount of the radiation emitted by the discharge.
  • a suitable material for this embodiment is quartz, which absorbs little radiation in the UV spectrum range.
  • the phosphors may be coated on the outer surface of the inner envelope and/or the inner surface of the outer envelope.
  • the chemical composition of the phosphor determines the spectrum of the radiation emitted.
  • the materials that can suitably be used as phosphors absorb at least a portion of the radiation generated by the discharge and emit radiation in another suitable wavelength range.
  • the phosphors absorb radiation in the UV range and emit in the visible wavelength range, such as in the red, blue and green wavelength range, and enable a high fluorescence quantum yield to be achieved.
  • the radiation output is dominated by spectral transitions at about 294 nanometers, at about 403 nanometers and at about 417 nanometers, as shown in FIG. 4. Phosphors that convert radiation having at least one of these wavelengths, is used.
  • the radiation output is dominated by spectral transitions at about 299 nanometers, 302 nanometers, 306 nanometers, and 472 nanometers as shown in FIG. 5.
  • non-limiting examples of phosphors which may be used for the generation of light in the blue wavelength range are SECA/BECA; SPP:Eu; Sr(P,B)O:Eu; Ba 3 MgSi 2 0 8 :Eu; BaAl 8 O ]3 :Eu; BaMg 2 Al I6 O 27 : Eu; BaMg 2 Al 16 O 27 :Eu,Mn; Sr 4 Al 14 0 25 :Eu; (Ba,Sr)MgAli 0 O ] 7 :Eu; Sr 4 Si 3 0 8 Cl 2 :Eu; MgWO 4 ; MgGa 2 O 4 :Mn;YVO 4 :Dy; (Sr,Mg) 3 (PO 4 ) 2 :Cu, (Sr 1 Ba)Al 2 Si 2 O 8 :Eu; ZnS:Ag; Ba5SiO4C16:Eu, and mixtures thereof.
  • non-limiting examples of phosphors which may be used for the generation of light in the green wavelength range are Zn 2 Si0 4 :Mn; Y 2 Si0 5 :Ce.Tb; YAlO 3 :Ce,Tb; (Y,Gd) 3 (Al,Ga) 5 O 12 :Ce; Tb 3 AIi 5 O ⁇ Ce ZnS:Au,Cu; Al; ZnS:Cu; Al, YBO 3 :Ce,Tb, and mixtures thereof.
  • non-limiting examples of phosphors which may be used for the generation of light in the red wavelength range are Y(V,P)O 4 :Eu, Y(V,P)O 4 :Dy, Y(V,P)O 4 :In, MgFGe, Y 2 O 2 S:Eu, (Sr,Mg,Zn) 3 (PO 4 ) 2 :Sn, and mixtures thereof.
  • the radiation source is provided with a means for generating and maintaining a gas discharge.
  • the means for generating and maintaining a discharge are electrodes disposed at two points of a radiation source housing or envelope and a voltage source providing a voltage to the electrodes.
  • the electrodes are hermetically sealed within the housing.
  • the radiation source is electrodeless.
  • the means for generating and maintaining a discharge is an emitter of radio frequency present outside or inside at least one envelope containing the ionizable composition.
  • the ionizable composition is capacitively excited with a high frequency field, the electrodes being provided on the outside of the gas discharge vessel. In still another embodiment of the present invention, the ionizable composition is inductively excited using a high frequency field.
  • a cylindrical quartz discharge vessel which is transparent to UV-A radiation, having a length of about 35 cm, and a diameter of about 2.5 cm, was provided.
  • the discharge vessel was evacuated and a dose of about 0.6 mg Ga and about 8.2 mg GaI 3 and argon were added.
  • the pressure of argon was about 267 Pa at ambient temperature.
  • the vessel was inserted into a furnace and power was capacitively-coupled into the gas medium via external copper electrodes at an excitation frequency of about 13.56 MHz. Radiative emission and radiant efficiency were measured.
  • the ultraviolet and visible output power was estimated to be about 30 percent of the input electrical power at about HO 0 C.
  • the luminous efficacy was estimated to be about 80 lumens per Watt.
  • a cylindrical quartz discharge vessel which is transparent to UV-A radiation, having a length of about 35 cm, and a diameter of about 2.5 cm, was provided.
  • the discharge vessel was evacuated and a dose of about 3.0 mg Ga and about 3.7 mg GaI 3 and argon were added.
  • the pressure of argon was about 267 Pa at ambient temperature.
  • the vessel was inserted into a furnace and power was capacitively-coupled into the gas medium via external copper electrodes at an excitation frequency of about 13.56 MHz. Radiative emission and radiant efficiency were measured.
  • the ultraviolet and visible output power was estimated to be about 32 percent of the input electrical power at about 22O 0 C.
  • the luminous efficacy was estimated to be about 80 lumens per watt.
  • a cylindrical quartz discharge vessel which is transparent to UV-A radiation, having a length of about 35 cm, and a diameter of about 2.5 cm, was provided.
  • the discharge vessel was evacuated and a dose of about 3.7 mg Bi and about 1.2 mg BiI 3 and argon were added.
  • the pressure of argon was about 267 Pa at ambient temperature.
  • the vessel was inserted into a furnace and power was capacitively-coupled into the gas medium via external copper electrodes at an excitation frequency of about 13.56 MHz. Radiative emission and radiant efficiency were measured.
  • the ultraviolet and visible output power was estimated to be about 25 percent of the input electrical power at about 300 0 C.
  • the luminous efficacy was estimated to be about 55 lumens per watt.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Luminescent Compositions (AREA)
  • Discharge Lamp (AREA)

Abstract

Une composition ionisable exempte de mercure et de sodium est capable d'émettre un rayonnement lorsqu'elle est excitée. Une source de rayonnement comprend une composition ionisable exempte de mercure et de sodium de ce type. La composition ionisable exempte de mercure et de sodium comprend au moins un métal, un métal et un composé métallique ou un composé métallique.
EP05853897A 2004-12-20 2005-12-12 Compositions exemptes de mercure et de sodium et sources de rayonnement les comprenant Withdrawn EP1831915A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/015,636 US7847484B2 (en) 2004-12-20 2004-12-20 Mercury-free and sodium-free compositions and radiation source incorporating same
PCT/US2005/045082 WO2006068887A2 (fr) 2004-12-20 2005-12-12 Compositions exemptes de mercure et de sodium et sources de rayonnement les comprenant

Publications (1)

Publication Number Publication Date
EP1831915A2 true EP1831915A2 (fr) 2007-09-12

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060132043A1 (en) * 2004-12-20 2006-06-22 Srivastava Alok M Mercury-free discharge compositions and lamps incorporating gallium
US7944148B2 (en) * 2004-12-20 2011-05-17 General Electric Company Mercury free tin halide compositions and radiation sources incorporating same
JP4829888B2 (ja) * 2005-07-08 2011-12-07 パナソニック株式会社 プラズマディスプレイパネルおよびプラズマディスプレイパネル装置
DE102005035191A1 (de) * 2005-07-27 2007-02-01 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Niederdruckgasentladungslampe mit neuer Gasfüllung
EP2020017A2 (fr) * 2006-05-15 2009-02-04 Koninklijke Philips Electronics N.V. Lampe à décharge basse pression présentant une efficacité accrue
DE102006048983A1 (de) * 2006-10-17 2008-04-24 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Niederdruckentladungslampe
US11482394B2 (en) * 2020-01-10 2022-10-25 General Electric Technology Gmbh Bidirectional gas discharge tube

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2765416A (en) * 1953-09-24 1956-10-02 Westinghouse Electric Corp Vapor lamps utilizing chemical compounds
NL7107535A (fr) * 1971-06-02 1972-12-05
NL7316101A (nl) * 1973-11-26 1975-05-28 Philips Nv Hogedruk-tinhalogenide-ontladingslamp.
GB1502612A (en) 1974-06-07 1978-03-01 Thorn Electrical Ind Ltd Discharge lamps containing an inert gas and a metal halid
NL168367C (nl) * 1975-06-20 1982-03-16 Philips Nv Lagedrukkwikdampontladingslamp en werkwijze voor de vervaardiging hiervan.
NL184713C (nl) * 1978-12-28 1989-10-02 Mitsubishi Electric Corp Metaaldampontladingslamp.
US4360756A (en) * 1979-11-13 1982-11-23 General Electric Company Metal halide lamp containing ThI4 with added elemental cadmium or zinc
US4387319A (en) * 1981-03-30 1983-06-07 General Electric Company Metal halide lamp containing ScI3 with added cadmium or zinc
JPS61165947A (ja) * 1985-01-17 1986-07-26 Mitsubishi Electric Corp 金属蒸気放電灯
US4792725A (en) * 1985-12-10 1988-12-20 The United States Of America As Represented By The Department Of Energy Instantaneous and efficient surface wave excitation of a low pressure gas or gases
JPH0732000B2 (ja) * 1987-02-09 1995-04-10 ウシオ電機株式会社 金属蒸気放電灯
NL8702123A (nl) * 1987-09-08 1989-04-03 Philips Nv Lagedrukkwikdampontladingslamp.
GB8915611D0 (en) 1989-07-07 1989-08-23 Emi Plc Thorn A discharge tube arrangement
RU2027248C1 (ru) 1990-03-23 1995-01-20 Акционерное общество "Лисма" - завод специальных источников света и электровакуумного стекла Безртутная металлогалогенная лампа
JPH04332450A (ja) * 1991-01-11 1992-11-19 Toshiba Lighting & Technol Corp 片封止形メタルハライドランプ
JP2775694B2 (ja) * 1993-05-07 1998-07-16 ウシオ電機株式会社 放電ランプ
DE4438294A1 (de) * 1994-10-26 1996-05-02 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Metallhalogenid-Entladungslampe für fotooptische Zwecke
JP3196647B2 (ja) * 1996-07-22 2001-08-06 松下電器産業株式会社 無電極高圧放電ランプ
DE59805403D1 (de) * 1997-04-21 2002-10-10 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Metallhalogenid-entladungslampe mit langer lebensdauer
DE19731168A1 (de) * 1997-07-21 1999-01-28 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Beleuchtungssystem
WO1999005699A1 (fr) * 1997-07-23 1999-02-04 Koninklijke Philips Electronics N.V. Lampe d'halogenure metallique sans mercure
JPH11102663A (ja) * 1997-09-29 1999-04-13 Toshiba Lighting & Technology Corp 金属蒸気放電ランプおよび投光装置
JPH11329352A (ja) * 1998-05-15 1999-11-30 Matsushita Electric Works Ltd メタルハライドランプおよび照明装置
DE29905662U1 (de) * 1999-03-26 2000-08-10 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Metallhalogenid-Entladungslampe mit langer Lebensdauer
JP4025462B2 (ja) * 1999-06-11 2007-12-19 株式会社日本フォトサイエンス 低圧水銀蒸気放電灯およびそれを使用した紫外線照射装置
DE19937312A1 (de) * 1999-08-10 2001-02-15 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Quecksilberfreie Metallhalogenidlampe
KR100348610B1 (ko) * 2000-01-19 2002-08-13 엘지전자주식회사 금속 할로겐 무전극 램프
DE10044563A1 (de) * 2000-09-08 2002-03-21 Philips Corp Intellectual Pty Niederdruckgasentladungslampe mit kupferhaltiger Gasfüllung
DE10044562A1 (de) * 2000-09-08 2002-03-21 Philips Corp Intellectual Pty Niederdruckgasentladungslampe mit quecksilberfreier Gasfüllung
DE10114680A1 (de) * 2001-03-23 2002-09-26 Philips Corp Intellectual Pty Hochdruck-Gasentladungslampe
DE10128915A1 (de) * 2001-06-15 2002-12-19 Philips Corp Intellectual Pty Niederdruckgasentladungslampe mit quecksilberfreier Gasfüllung
JP2003016998A (ja) * 2001-06-28 2003-01-17 Matsushita Electric Ind Co Ltd メタルハライドランプ
US6861808B2 (en) * 2002-03-27 2005-03-01 Matsushita Electric Industrial Co., Ltd. Metal vapor discharge lamp
DE10214631A1 (de) * 2002-04-02 2003-10-16 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Metallhalogenidfüllung und zugehörige Lampe
JP3678212B2 (ja) * 2002-05-20 2005-08-03 ウシオ電機株式会社 超高圧水銀ランプ
DE10242049A1 (de) 2002-09-11 2004-03-25 Philips Intellectual Property & Standards Gmbh Niederdruckgasentladungslampe mit zinnhaltiger Gasfüllung
DE10254737A1 (de) 2002-11-23 2004-06-09 Philips Intellectual Property & Standards Gmbh Niederdruckgasentladungslampe mit quecksilberfreier Gasfüllung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2006068887A2 *

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WO2006068887A2 (fr) 2006-06-29
US20060132042A1 (en) 2006-06-22
CN101124652A (zh) 2008-02-13
JP2008524809A (ja) 2008-07-10
CN101124652B (zh) 2011-11-16
JP5048513B2 (ja) 2012-10-17
WO2006068887A3 (fr) 2007-05-24
US7847484B2 (en) 2010-12-07

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