EP1718135B1 - Générateur de plasma - Google Patents

Générateur de plasma Download PDF

Info

Publication number
EP1718135B1
EP1718135B1 EP05425273A EP05425273A EP1718135B1 EP 1718135 B1 EP1718135 B1 EP 1718135B1 EP 05425273 A EP05425273 A EP 05425273A EP 05425273 A EP05425273 A EP 05425273A EP 1718135 B1 EP1718135 B1 EP 1718135B1
Authority
EP
European Patent Office
Prior art keywords
generator
main duct
waveguide
anyone
supporting element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP05425273A
Other languages
German (de)
English (en)
Other versions
EP1718135A1 (fr
Inventor
Paolo Veronesi
Cristina Leonelli
Marco Garuti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alter SRL
Original Assignee
Alter SRL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alter SRL filed Critical Alter SRL
Priority to EP05425273A priority Critical patent/EP1718135B1/fr
Priority to DE602005004124T priority patent/DE602005004124T2/de
Priority to AT05425273T priority patent/ATE383063T1/de
Publication of EP1718135A1 publication Critical patent/EP1718135A1/fr
Application granted granted Critical
Publication of EP1718135B1 publication Critical patent/EP1718135B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present invention relates to a plasma generator; in particular, the plasma generator in accordance with the invention is applicable to an apparatus suitable for carrying out working operations on predetermined materials, surface working operations for example.
  • plasma generators are able to generate a ionised gas (or plasma) starting from a non-ionised gas, such as argon (Ar), nitrogen (N 2 ), hydrogen (H 2 ), oxygen (O 2 ), methane (CH 4 ), silane (SiH 4 ), etc., causing an electromagnetic radiation of predetermined frequency to strike thereon, which radiation can either be a radio-frequency (RF) radiation, or fall within the microwave range.
  • a non-ionised gas such as argon (Ar), nitrogen (N 2 ), hydrogen (H 2 ), oxygen (O 2 ), methane (CH 4 ), silane (SiH 4 ), etc.
  • the system is provided with a microwave generator associated with a waveguide whose task is to address the radiation.
  • the plasma generator further comprises a duct connected to a tank in which the gas to be ionised is contained; this gas is introduced into a suitable cavity and then impinged on by said radiation to obtain the plasma.
  • a structure such the one briefly described above can be used in apparatus for surface treatment of materials, said apparatus being provided with a vacuum chamber in which the workpiece is positioned and maintained under suitable conditions for the treatment process.
  • the waveguide and duct for the ionised gas will flow into said vacuum chamber, thus allowing the gas susceptible of ionisation and the microwaves to freely propagated in the chamber itself.
  • ionisation is of very poor efficiency, due to the fact that the ionisation region is not well defined and the gas-radiation interaction has reduced chances of taking place correctly.
  • Another aim of the invention is to make available a plasma generator enabling the distance between the workpiece and the ionisation region to be reduced.
  • a further aim of the invention is to provide a plasma generator in which the sealing elements are not deteriorated to an important degree by heat resulting from interaction between the gas and the incident electromagnetic radiation.
  • a plasma generator in accordance with the present invention has been generally identified by reference numeral 1.
  • Generator 1 (Figs. 1 and 2) first of all comprises a main duct 10 to convey a gas to be ionised 20; in fact, generally generator 1 has the function of causing a predetermined electromagnetic radiation 30 to strike on a predetermined gas 20 so as to obtain a plasma (or ionised gas) 40 that is generated exactly due to the fact that, following interaction between the gas and microwaves, some gas atoms (or molecules) lose at least one of their electrons thus becoming positive ions.
  • the gas 20 flowing in the main duct 10 can for example be argon (Ar), nitrogen (N 2 ), hydrogen (H 2 ), oxygen (O 2 ), methane (CH 4 ), silane SiH 4 ), etc.
  • the main duct 10 can be made of quartz, sapphire or alumina, for example; generally, as clarified in the following, the main duct 10 is made of a material permeable to the electromagnetic radiation 30, so that this radiation can suitably interact with the gas 20.
  • the main duct 10 has an inlet 11 and an outlet 12; a tank 13 to hold the gas 20 can be connected to the inlet 11.
  • Control means 201 can be advantageously interposed between the inlet 11 of the main duct 10 and the tank 13, to control and/or measure the gas flow 20 to be ionised.
  • a single tank 13 is present; obviously, should use of other process gases be also required, other tanks will be provided possibly connected to the main duct 10 through a suitable header.
  • Generator 1 further comprises a waveguide 50 to guide the electromagnetic radiation 30 on the gas flowing in the main duct 10; this electromagnetic radiation 30 preferably consists of microwaves and can have, in particular for industrial use, a frequency included between 915MHz (L-band) and 3300 MHz (S-band) and be equal to 2450 MHz, for example.
  • this electromagnetic radiation 30 preferably consists of microwaves and can have, in particular for industrial use, a frequency included between 915MHz (L-band) and 3300 MHz (S-band) and be equal to 2450 MHz, for example.
  • generator 1 further comprises a supporting element 60 on which the main duct 10 and waveguide 50 are mounted.
  • the supporting element 60 has a first surface 61, preferably substantially planar, facing a first space region 61a.
  • the supporting element 60 further has a second surface 62, preferably substantially planar, which is opposite to the first surface 61 and faces a second space region 62a.
  • the supporting element 60 has a platelike conformation and, as clarified in the following, defines a flat flange.
  • the waveguide 50 is provided with a first portion 51 having a transverse longitudinal extension with respect to the supporting element 60 and extending therefrom into the first space region 61a.
  • the supporting element 60 can have at least one through hole 63 into which an axial end of the first portion 51 of the waveguide 50 is inserted.
  • the first waveguide portion 51 is connected to a microwave generator 54.
  • the waveguide 50 is further provided with a second portion 52 associated with, and preferably contiguous to, the first portion 51 to receive the radiation 30 propagating therefrom.
  • the second portion 52 intersects the main duct 10 to guide this radiation 30 on the gas to be ionised 20.
  • the main duct 10 has a transverse longitudinal extension with respect to the supporting element 60; said supporting element 60 in particular can have a through hole 64 into which the main duct 10 is inserted.
  • the main duct 10 extends at least partly from the supporting element 60 into the first space region 61a.
  • the main duct portion 10 extending into the first region 61a is the portion terminating with the inlet 11 of the main duct 10 itself.
  • the microwave generator 54 and gas tank 13 are on the same side with respect to the supporting element 60.
  • the first waveguide portion 51 is perpendicular to the planar extension of the supporting element 60.
  • the main duct 10 is perpendicular to the planar extension of the supporting element 60.
  • the second waveguide portion 52 is in the second space region 62a; preferably, the second waveguide portion 52 is parallel to the planar extension of the supporting element 60.
  • the second waveguide portion 52 can be connected to the first portion 51 through a main connecting portion 55; said connecting portion 55 in particular connects an outlet 51b of the first portion 51 with an inlet 52a of the second portion.
  • the first and second waveguide portions 51, 52 (connected to each other by the main connecting portion 55) define a substantially L-shaped structure inside which the electromagnetic radiation 30 (i.e. the microwaves) can propagate.
  • said main duct 10 In order to enable the main duct 10 to intersect the second waveguide portion 52, said main duct 10 partly extends in the second space region 62a as well; practically, the main duct 10 crosses the supporting element 60 right through, passing through said through hole 64. Consequently, also the insertion between the main duct 10 and second waveguide portion 52 is in the second space region 62a.
  • the waveguide 54 further has a third portion 53 connected downstream of the second portion 52 to receive the radiation propagating into the second portion 52 itself.
  • the waveguide may comprise an auxiliary connecting portion 56.
  • the third portion 53 has a transverse longitudinal extension, and preferably a perpendicular extension, with respect to the supporting element 60; in particular the third portion 53 extends from the supporting element 60 into the first space region 61a.
  • the supporting element 60 can have a through hole 65 into which an axial end of the third portion 53 is inserted.
  • adjusting means 70 is preferably mounted for adjustment of the electromagnetic field defined by the electromagnetic radiation 30 present in the waveguide 50.
  • This adjusting means 70 can consist of a translatable short-circuit, for example.
  • the interaction efficiency between the microwaves 30 and the gas 20 can be maximised at the intersection between the waveguide 50 (second portion 52) and main duct 10.
  • first, second and third portions 51, 52, 53 of the waveguide 50 define a U-shaped structure through which the microwaves 30 propagate from the microwave generator 54, at the intersection with the main duct 10 into which the gas to be ionised 20 flows, until reaching the translatable short-circuit 70.
  • generator 1 is disposed in such a manner that the supporting element 60 has a planar extension that is substantially parallel to the ground (horizontal extension), while the main duct 10 and first and third portions 51, 53 of the waveguide 50 substantially extend in a vertical direction.
  • generator 1 can be employed in an apparatus 80 for surface treatment of materials.
  • This apparatus 80 in addition to generator 1 comprises a vacuum chamber 81 in which the workpiece 82 is to be positioned; the supporting element 60 of generator 1 in particular defines a closing wall for said vacuum chamber 81.
  • the supporting element 60 defines a flange 60a on which the main duct 10 and waveguide 50 are mounted and by which the vacuum chamber 81 is hermetically closed.
  • the second portion 52 of the wave guide 50 is located within the vacuum chamber 81, while the first and third portions 51, 53 extend externally of the vacuum chamber 81 itself.
  • the vacuum chamber therefore is located in the second space region 62a.
  • the apparatus 80 can further comprise a support 83 for the workpiece 82 to position said workpiece to a location facing the outlet 12 of the main duct 10 from which the ionised gas 40 comes out.
  • the support 83 is preferably made of metal material.
  • chamber 81 In order to obtain the desired atmosphere within chamber 81, the latter is connected to suitable vacuum-creating means 85 such as a pump.
  • the connecting opening 86 between the vacuum chamber 81 and vacuum-creating means 85 is at a lower height than the height to which the workpiece 82 is maintained by means of the support 83.
  • the workpiece 82 is maintained to an intermediate height between the connecting opening 86 and the outlet 12 of the main duct 10.
  • generator 1 comprises a main duct 10 into which the gas 20 to be ionised flows, and a waveguide 50 into which the microwaves 30 are conveyed.
  • the main duct 10 and waveguide 50 are intersected in such a manner that the radiation 30 and gas 20 can interact for generating the plasma 40.
  • generator 1 is further provided with spacer means 100 that is at least partly radially external to the main duct 10 and positioned at the outlet 12 of the main duct 10 itself (Figs. 2-5).
  • the outlet 12 of the main duct 10 is the axially farthest portion of the main duct 10 from which the already ionised gas 40 comes out.
  • Generator 1 further comprises a sealing element 110 coupled with the spacer means 100 for sealingly insulating the region facing the outlet 12 of the main duct 10 from at least one region 200 radially external to said main duct 10.
  • the radially external region 200 comprises the waveguide 50 and/or a heat-exchange chamber 121 to be described in the following.
  • the sealing element 110 can be a seal of the type currently known as "O-ring", for example.
  • the region facing the outlet 12 of the main duct 10 is within the vacuum chamber 81 in which the workpiece is impinged on by the plasma, while the inside of the waveguide 50 is at ambient pressure.
  • the sealing element 110 therefore keeps the inside and outside of the vacuum chamber 81 insulated from each other and in particular the region facing the outlet 12 of the main duct 10 (the inside) from the waveguide 50 (the outside).
  • the spacer means 100 has the task of keeping the sealing element 110 separated from the surface of the main duct 10; this surface increases its temperature to a very high extent, as a result of the heat developed during interaction between the gas 20 and microwaves 30, and there would be the risk of the sealing ring 110 being damaged, should it be in direct contact with the main duct 10.
  • the spacer means 100 exactly aims at avoiding occurrence of this decay.
  • the spacer means 100 is preferably positioned at the outlet 12 of the main duct 10.
  • the spacer means 100 may comprise an annular body 101 radially external to the main duct 10, at the outlet 12 of said duct.
  • the peripheral extension of the annular body 101 surrounds the main duct 10.
  • the spacer means 100 may further comprise an annular connecting element 102 to connect the outlet 12 of the main duct 10 to an axial end 101a of said annular body 101.
  • the sealing element 110 is preferably coupled with the radially external surface 101b of the annular body 101, so that it is maintained to a predetermined radial distance from the outlet 12 of the main duct 10 and therefore limits damages due to the high temperature of this portion of the main duct 10.
  • the annular body 101 and annular connecting element 102 can be made of one piece construction with the surface defining the main duct 10; for instance, the end portion of this main duct 10 can be turned over outwardly, so as to obtain the above described spacer means 100.
  • annular body 101 and annular connecting element 102 can be mutually fastened through welding, in the same manner as the annular connecting means 102 can be welded to the outlet 12 of the main duct 10.
  • generator 1 may further comprise a heat dissipation unit 120, that is active on the main duct 10 and/or the sealing element 110.
  • the heat dissipation unit 120 is active on the region radially interposed between the outlet 12 of the main duct 10 and the sealing element 110 to cause the heat generated close to the outlet 12 of the main duct 10 not to affect the sealing element 110.
  • the dissipation unit 120 comprises a heat-exchange chamber 121 interposed between the main duct 10, and in particular the outlet 12 of said duct, and the sealing element 110; in this heat-exchange chamber 121 flowing of a cooling fluid (air, for example) is caused, to avoid the sealing element 110 to be overheated too much.
  • the heat-exchange chamber 121 is defined by the end portion of the main duct 10 (i.e. the outlet 12 of the main duct 10), the annular connecting element 102 and the annular body 101 associated therewith.
  • the dissipation unit 120 may further comprise a flow deflector 122 positioned at least partly in the heat-exchange chamber 121 to define a path P of said cooling fluid in this chamber.
  • Deflector 122 can have a substantially annular structure, radially interposed between the end portion of the main duct 10 and the annular body 101.
  • Deflector 122 has a longitudinal extension substantially parallel to the longitudinal extension of the main duct 10 and the annular element 101; deflector 122 longitudinally extends in the heat-exchange chamber 121 until a predetermined (non-zero) distance from the lower surface S of the chamber itself; in the embodiment shown in Fig. 3, this lower surface is defined by the annular connecting element 102.
  • generator 1 may comprise a feeding duct 130 having an inlet portion 131 and an annular portion 132.
  • the inlet portion 131 is preferably straight and enables communication with the outside; in particular, a tubular body 135 is provided to be in fluid communication with the inlet portion 131 and the region external to said vacuum chamber 81.
  • the vacuum chamber 81 is provided with a through hole 66 equipped with suitable seals, said tubular body 135 being inserted in said through hole.
  • the tubular body 135 at its end opposite to the one in engagement with the feeding duct 130, can be connected to a device for delivery of air under pressure (not shown), said air under pressure being the above mentioned cooling fluid.
  • the annular portion 132 of the feeding duct 130 is radially external to the main duct 10 and is at a location longitudinally offset relative to the outlet 12 of the main duct 10.
  • the annular portion 132 of the feeding duct 130 is in fluid communication both with the inlet portion 131 to receive the cooling fluid, and the heat-exchange chamber 121, to transfer said cooling fluid to the latter.
  • the heat-exchange chamber 121 has an annular opening 121a preferably at an opposite position relative to said annular connecting element 102; the annular portion 132 of the feeding duct 130 can be in continuous fluid communication with the heat-exchange chamber 121 along the circumferential extension of the latter.
  • a surface of the annular portion 132 of the feeding duct 130 can be defined by a wall 122a of said flow deflector 122.
  • the annular portion 132 of the feeding duct 130 is further in fluid communication with an auxiliary annular cavity 140, within which said sealing element 110 is positioned.
  • Generator 1 can further be provided with an outlet duct 133, through which the fluid introduced into the heat-exchange chamber 121 can come out, and in particular can be caused to flow into the waveguide 50.
  • the outlet duct 133 is preferably radially external to, and in particular substantially coaxial with the main duct 10.
  • the outlet duct 133 has an inlet 133a to receive the cooling fluid from the heat-exchange chamber 121, and an outlet 133b to convey said fluid into the waveguide 50.
  • the cooling fluid through the inlet portion 131 of the feeding duct 130 is introduced into the annular portion 132 and therefrom into the heat-exchange chamber 121; within said chamber, the fluid follows the path P defined by the flow deflector 122 and absorbs the heat generated within the main duct 10. Finally, through the outlet duct 133, the fluid is directed to the inside of the waveguide 50 where the stored heat can be dissipated without creating damages or malfunctions.
  • the feeding duct 130, outlet duct 133 and auxiliary annular cavity 140 can be at least partly defined by a single main body 141 mounted around the main duct 10 at the outlet 12 of the latter. Also formed in said main body 141 can be a further annular passage 142 for an auxiliary cooling circuit preferably consisting of water; a radially external wall of said annular passage 142 can be defined by a closing ring 143.
  • Generator 1 may further comprise a closing body 144, coupled with the outlet 12 of the main duct 10 and the main body 141.
  • the closing body 144 has an opening 144a facing the outlet 12 of the main duct 10.
  • the closing body 144 further has one or more teeth 144b extending longitudinally from the peripheral wall 144c of the closing body 144 itself. Said teeth 144b are in abutment against an annular spacer 145 that in turn supports the sealing element 110.
  • an annular plate 146 interposed between the closing body 144 and main body 141.
  • inventive aspects highlighted above can be employed both separately and in combination with each other, so as to obtain a generator offering optimal performance.
  • the invention achieves important advantages.
  • the generator in accordance with the invention has a reduced overall bulkiness, due to the very practical arrangement of the different elements of which it is made up.
  • the integrity of the sealing element used to insulate the inside of the waveguide and the region facing the outlet of the duct from which the plasma comes out is protected in an optimal manner.
  • a further advantage resides in that in the apparatus for surface working operations in which the generator of the invention can be utilised the distance between the workpiece and the outlet of the main duct can be greatly reduced, so that interaction between the plasma and the material to be treated is made particularly efficient and reliable.

Claims (24)

  1. Générateur de plasma comprenant:
    - un conduit principal (10) pour transporter un gaz à ioniser (20);
    - un guide d'onde (50) pour guider une radiation électromagnétique (30) sur le gaz transporté dans ledit conduit principal (10);
    - au moins un élément de support (60) sur lequel sont montés lesdits guide d'onde (50) et conduit principal (10), ledit élément de support (60) ayant une première surface (61) tournée vers une première zone d'espace (61a), et une deuxième surface (62) opposée à ladite première surface (61) et tournée vers une deuxième zone d'espace (62a),
    ledit conduit principal (10) ayant une extension longitudinale transversale audit élément de support (60) et s'étendant au moins partiellement dans ladite première zone (61a),
    caractérisé en ce que ledit guide d'onde comprend:
    - une première portion (51) ayant une extension longitudinale transversale audit élément de support (60) et s'étendant au moins partiellement dans ladite première zone (61a);
    - une deuxième portion (52) coupée par ledit conduit principal (10) et associée à ladite première portion (51) pour recevoir la radiation (30) se propageant dans ladite première portion (51) et la guider sur le gaz transporté dans ledit conduit principal (10) et obtenir un plasma correspondant (40).
  2. Générateur selon la revendication 1, caractérisé en ce que ledit guide d'onde (50) comprend en outre une troisième portion (53) reliée à l'aval de ladite deuxième portion (52) pour recevoir la radiation (30) se propageant dans ladite deuxième portion, ladite troisième portion (53) ayant une extension longitudinale transversale audit élément de support (60).
  3. Générateur selon la revendication 2, caractérisé en ce que ladite troisième portion (53) s'étend depuis ledit élément de support (60) jusqu'à l'intérieur de ladite première zone (61a).
  4. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce que ledit conduit principal (10) s'étend partiellement dans ladite deuxième zone (62a).
  5. Générateur selon la revendication 4, caractérisé en ce que l'intersection entre ledit conduit principal (10) et la deuxième portion de guide d'onde (52) est dans la deuxième zone (62a).
  6. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce que ladite deuxième portion de guide d'onde (52) est positionnée dans ladite deuxième zone (62a).
  7. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce que ladite première portion (51) est essentiellement perpendiculaire audit élément de support (60).
  8. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce que ladite deuxième portion (52) est essentiellement parallèle audit élément de support (60), ledit guide d'onde (50) étant également muni de préférence d'une portion de raccordement principale (54) pour la liaison entre une sortie (51b) de ladite première portion (51) et une entrée (52a) de ladite deuxième portion (52).
  9. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce que ledit conduit principal (10) est essentiellement perpendiculaire audit élément de support (60).
  10. Générateur selon l'une quelconque des revendications 2 à 9, caractérisé en ce que ladite troisième portion (53) est essentiellement perpendiculaire audit élément de support (60), ledit guide d'onde (50) étant également muni de préférence d'une portion de raccordement auxiliaire (55) pour la liaison entre une sortie (52b) de ladite deuxième portion (52) et une entrée (53a) de ladite troisième portion (53).
  11. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce que ladite radiation électromagnétique (30) se compose de micro-ondes.
  12. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce qu'il comprend en outre des moyens de réglage (70) du champ électromagnétique défini par ladite radiation électromagnétique (30), lesdits moyens de réglage (70) étant de préférence reliés à l'aval de ladite troisième portion (53) et étant en particulier munis d'un court-circuit susceptible de translation.
  13. Générateur selon l'une quelconque des revendications précédentes, caractérisé en ce qu'il comprend en outre:
    - des pièces-entretoises (100) disposées au moins partiellement extérieures en sens radial audit conduit principal (10);
    - un élément d'étanchéité (110) couplé auxdites pièces-entretoises (100) pour effectuer une isolation étanche entre la zone tournée vers la sortie (12) dudit conduit principal (10) et au moins une zone (200) extérieure en sens radial audit conduit principal (10).
  14. Générateur selon la revendication 13, caractérisé en ce qu'il comprend en outre une unité dissipatrice de chaleur (120) active sur ledit conduit principal (10) et/ou sur ledit élément d'étanchéité (110).
  15. Générateur selon la revendication 14, caractérisé en ce que ladite unité dissipatrice (120) comprend au moins une chambre d'échange de chaleur (121) interposée entre ledit conduit principal (10) et l'élément d'étanchéité (110).
  16. Générateur selon la revendication 15, caractérisé en ce que ladite unité dissipatrice (120) comprend en outre au moins un déflecteur d'écoulement (122) positionné au moins partiellement dans ladite chambre d'échange de chaleur (121) pour y définir un parcours P d'un fluide de refroidissement.
  17. Générateur selon l'une quelconque des revendications 13 à 16, caractérisé en ce que ladite zone extérieure en sens radial (200) comprend ledit guide d'onde (50) et/ou ladite chambre d'échange de chaleur (121).
  18. Générateur selon l'une quelconque des revendications 13 à 17, caractérisé en ce que lesdites pièces-entretoises (100) comprennent:
    - un corps annulaire (101) extérieur audit conduit principal (10) en sens radial à la sortie (12) du conduit principal lui-même;
    - un élément annulaire de raccordement (102) pour relier la sortie (12) dudit conduit principal (10) à une extrémité axiale (101a) dudit corps annulaire (101).
  19. Générateur selon la revendication 18, caractérisé en ce que ledit élément d'étanchéité (110) est couplé à une surface extérieure (101b) en sens radial dudit corps annulaire (101).
  20. Générateur selon la revendication 18 ou 19, caractérisé en ce que lesdits corps annulaire (101), élément de raccordement annulaire (102) et surface extérieure dudit conduit principal (10) définissent ladite chambre d'échange de chaleur (121).
  21. Appareillage pour le travail de surface de matériaux par l'intermédiaire de plasma, ledit appareillage (80) comprenant:
    - une chambre à vide (81) pour loger un matériau à travailler;
    - un générateur de plasma (1) selon l'une quelconque des revendications 1 à 20, ledit élément de support (60) définissant une paroi de fermeture de ladite chambre à vide (81).
  22. Appareillage selon la revendication 21, caractérisé en ce que la deuxième portion (52) dudit guide d'onde (50) est positionnée dans ladite chambre à vide (81), lesdites première et troisième portions (51, 53) étant de préférence positionnées à l'extérieur de ladite chambre à vide (81).
  23. Appareillage selon la revendication 21 ou 22, caractérisé en ce qu'il comprend en outre un support (83) pour ledit matériau à travailler (82) pour positionner ce dernier à une position en vis-à-vis de la sortie (12) dudit conduit principal (10).
  24. Appareillage selon l'une quelconque des revendications 21 à 23, caractérisé en ce que ledit élément d'étanchéité (110) définit une isolation étanche entre l'intérieur et l'extérieur de ladite chambre à vide (81).
EP05425273A 2005-04-29 2005-04-29 Générateur de plasma Not-in-force EP1718135B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP05425273A EP1718135B1 (fr) 2005-04-29 2005-04-29 Générateur de plasma
DE602005004124T DE602005004124T2 (de) 2005-04-29 2005-04-29 Plasmaerzeuger
AT05425273T ATE383063T1 (de) 2005-04-29 2005-04-29 Plasmaerzeuger

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05425273A EP1718135B1 (fr) 2005-04-29 2005-04-29 Générateur de plasma

Publications (2)

Publication Number Publication Date
EP1718135A1 EP1718135A1 (fr) 2006-11-02
EP1718135B1 true EP1718135B1 (fr) 2008-01-02

Family

ID=34981151

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05425273A Not-in-force EP1718135B1 (fr) 2005-04-29 2005-04-29 Générateur de plasma

Country Status (3)

Country Link
EP (1) EP1718135B1 (fr)
AT (1) ATE383063T1 (fr)
DE (1) DE602005004124T2 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4217900A1 (de) * 1992-05-29 1993-12-02 Leybold Ag Anordnung einer mikrowellendurchlässigen Scheibe in einem Hohlleiter und Verfahren zur Einbringung dieser Scheibe
US5714009A (en) * 1995-01-11 1998-02-03 Deposition Sciences, Inc. Apparatus for generating large distributed plasmas by means of plasma-guided microwave power
FR2815888B1 (fr) * 2000-10-27 2003-05-30 Air Liquide Dispositif de traitement de gaz par plasma

Also Published As

Publication number Publication date
EP1718135A1 (fr) 2006-11-02
DE602005004124T2 (de) 2008-12-24
ATE383063T1 (de) 2008-01-15
DE602005004124D1 (de) 2008-02-14

Similar Documents

Publication Publication Date Title
US8294071B2 (en) Microwave irradiation apparatus
CN107801286B (zh) 一种基于介质阻挡放电预电离的微波等离子体激发系统
US5423942A (en) Method and apparatus for reducing etching erosion in a plasma containment tube
JP5239021B2 (ja) プラズマ発生装置及びそれを用いたプラズマ生成方法
US6263830B1 (en) Microwave choke for remote plasma generator
US8664560B2 (en) Method and apparatus for abatement of reaction products from a vacuum processing chamber
KR100794806B1 (ko) 플라즈마 처리 장치 및 방법과, 슬롯 안테나
KR19980079855A (ko) 원격 플라즈마 공급원을 구비한 기판 가공처리 시스템을 개선하기 위한 장치 및 방법
US20080105650A1 (en) Plasma processing device and plasma processing method
KR960706572A (ko) 가스 확산기 판 조립체와 무선 주파수 전극(Gas diffuser plate assembly and RF electrode)
US20020023589A1 (en) Plasma generating apparatus
WO2006087675A2 (fr) Support de lampe pour lampe a decharge a barriere dielectrique
JP2007220586A (ja) プラズマ発生装置およびそれを用いるワーク処理装置
US10832894B2 (en) Plasma generating system having thermal barrier between plasma reactor and waveguide
EP1718135B1 (fr) Générateur de plasma
KR20080029844A (ko) 마이크로파 플라즈마 처리 장치, 일체형 슬롯 형성 부재,마이크로파 플라즈마 처리 장치의 제조 방법 및 사용 방법
US20190389745A1 (en) Device for irradiating a flowing medium with uv radiation
CN207531150U (zh) 一种基于介质阻挡放电预电离的微波等离子体激发系统
US6369493B1 (en) Microwave plasma applicator having a thermal transfer medium between a plasma containing tube and a cooling jacket
CN112055455B (zh) 一种微波等离子体炬无尖端放电的点火方法
US6562079B1 (en) Microwave discharge apparatus
JP4381318B2 (ja) 有機ハロゲン化合物放電分解装置およびその方法
CN101436745B (zh) 一种可见波段的钠原子化学激光器
JP2008021465A (ja) プラズマ処理装置およびプラズマ処理方法
RU2153781C1 (ru) Микроволновый плазматрон

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20060227

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA HR LV MK YU

AKX Designation fees paid

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REF Corresponds to:

Ref document number: 602005004124

Country of ref document: DE

Date of ref document: 20080214

Kind code of ref document: P

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: LI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080502

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080413

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080402

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080602

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080402

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080430

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

26N No opposition filed

Effective date: 20081003

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080429

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080703

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080429

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080102

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080403

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20110516

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20110428

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20110422

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20110630

Year of fee payment: 7

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20120429

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20121228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20120429

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 602005004124

Country of ref document: DE

Effective date: 20121101

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20120429

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20120430

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20121101