EP1654914B8 - Extreme uv and soft x ray generator - Google Patents
Extreme uv and soft x ray generator Download PDFInfo
- Publication number
- EP1654914B8 EP1654914B8 EP04744676A EP04744676A EP1654914B8 EP 1654914 B8 EP1654914 B8 EP 1654914B8 EP 04744676 A EP04744676 A EP 04744676A EP 04744676 A EP04744676 A EP 04744676A EP 1654914 B8 EP1654914 B8 EP 1654914B8
- Authority
- EP
- European Patent Office
- Prior art keywords
- soft
- gas
- extreme
- ray generator
- symmetry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Reciprocating Pumps (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10336273A DE10336273A1 (en) | 2003-08-07 | 2003-08-07 | Device for generating EUV and soft X-radiation |
PCT/IB2004/051323 WO2005015602A2 (en) | 2003-08-07 | 2004-07-29 | Extreme uv and soft x ray generator |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1654914A2 EP1654914A2 (en) | 2006-05-10 |
EP1654914B1 EP1654914B1 (en) | 2009-03-25 |
EP1654914B8 true EP1654914B8 (en) | 2009-08-12 |
Family
ID=34129504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04744676A Expired - Lifetime EP1654914B8 (en) | 2003-08-07 | 2004-07-29 | Extreme uv and soft x ray generator |
Country Status (9)
Country | Link |
---|---|
US (1) | US7734014B2 (en) |
EP (1) | EP1654914B8 (en) |
JP (1) | JP4814093B2 (en) |
KR (1) | KR101058068B1 (en) |
CN (1) | CN100482030C (en) |
AT (1) | ATE427026T1 (en) |
DE (2) | DE10336273A1 (en) |
TW (1) | TW200515458A (en) |
WO (1) | WO2005015602A2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007020742B8 (en) * | 2007-04-28 | 2009-06-18 | Xtreme Technologies Gmbh | Arrangement for switching large electrical currents via a gas discharge |
US20130098555A1 (en) * | 2011-10-20 | 2013-04-25 | Applied Materials, Inc. | Electron beam plasma source with profiled conductive fins for uniform plasma generation |
US9129777B2 (en) | 2011-10-20 | 2015-09-08 | Applied Materials, Inc. | Electron beam plasma source with arrayed plasma sources for uniform plasma generation |
US8951384B2 (en) | 2011-10-20 | 2015-02-10 | Applied Materials, Inc. | Electron beam plasma source with segmented beam dump for uniform plasma generation |
US9443700B2 (en) | 2013-03-12 | 2016-09-13 | Applied Materials, Inc. | Electron beam plasma source with segmented suppression electrode for uniform plasma generation |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3005931A (en) * | 1960-03-29 | 1961-10-24 | Raphael A Dandl | Ion gun |
NL298175A (en) * | 1962-11-20 | |||
JPS5763755A (en) * | 1980-10-03 | 1982-04-17 | Fujitsu Ltd | X-ray generating appratus |
JPS61218056A (en) * | 1985-03-25 | 1986-09-27 | Nippon Telegr & Teleph Corp <Ntt> | X-ray generator |
JPH0687408B2 (en) * | 1986-03-07 | 1994-11-02 | 株式会社日立製作所 | Plasma X-ray generator |
KR900003310B1 (en) * | 1986-05-27 | 1990-05-14 | 리가가구 겡큐소 | Ion producing apparatus |
US4841197A (en) * | 1986-05-28 | 1989-06-20 | Nihon Shinku Gijutsu Kabushiki Kaisha | Double-chamber ion source |
US4894546A (en) * | 1987-03-11 | 1990-01-16 | Nihon Shinku Gijutsu Kabushiki Kaisha | Hollow cathode ion sources |
JPH01117253A (en) * | 1987-10-30 | 1989-05-10 | Hamamatsu Photonics Kk | Plasma x-ray generation device |
JP2572787B2 (en) * | 1987-11-18 | 1997-01-16 | 株式会社日立製作所 | X-ray generator |
JPH01243349A (en) * | 1988-03-25 | 1989-09-28 | Hitachi Ltd | Plasma extreme ultraviolet light generator |
DE3927089C1 (en) * | 1989-08-17 | 1991-04-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
JP2819420B2 (en) * | 1989-11-20 | 1998-10-30 | 東京エレクトロン株式会社 | Ion source |
IT1246682B (en) * | 1991-03-04 | 1994-11-24 | Proel Tecnologie Spa | CABLE CATHOD DEVICE NOT HEATED FOR THE DYNAMIC GENERATION OF PLASMA |
US5397956A (en) * | 1992-01-13 | 1995-03-14 | Tokyo Electron Limited | Electron beam excited plasma system |
KR100271244B1 (en) * | 1993-09-07 | 2000-11-01 | 히가시 데쓰로 | Eletron beam excited plasma system |
US5467362A (en) * | 1994-08-03 | 1995-11-14 | Murray; Gordon A. | Pulsed gas discharge Xray laser |
US6031241A (en) * | 1997-03-11 | 2000-02-29 | University Of Central Florida | Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
US6576917B1 (en) | 1997-03-11 | 2003-06-10 | University Of Central Florida | Adjustable bore capillary discharge |
US6815700B2 (en) * | 1997-05-12 | 2004-11-09 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
DE19753696A1 (en) | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Device and method for generating extreme ultraviolet radiation and soft X-rays from a gas discharge |
DE19962160C2 (en) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Devices for generating extreme ultraviolet and soft X-rays from a gas discharge |
DE10051986A1 (en) * | 2000-10-20 | 2002-05-16 | Schwerionenforsch Gmbh | Hollow cathode for use in a gas discharge process for ion stripping |
DE10139677A1 (en) * | 2001-04-06 | 2002-10-17 | Fraunhofer Ges Forschung | Method and device for generating extremely ultraviolet radiation and soft X-rays |
DE10134033A1 (en) * | 2001-04-06 | 2002-10-17 | Fraunhofer Ges Forschung | Method and device for generating extreme ultraviolet radiation / soft X-rays |
DE10151080C1 (en) * | 2001-10-10 | 2002-12-05 | Xtreme Tech Gmbh | Device for producing extreme ultraviolet radiation used in the semiconductor industry comprises a discharge chamber surrounded by electrode housings through which an operating gas flows under a predetermined pressure |
US7342236B2 (en) * | 2004-02-23 | 2008-03-11 | Veeco Instruments, Inc. | Fluid-cooled ion source |
-
2003
- 2003-08-07 DE DE10336273A patent/DE10336273A1/en not_active Ceased
-
2004
- 2004-07-29 CN CNB2004800226731A patent/CN100482030C/en not_active Expired - Fee Related
- 2004-07-29 WO PCT/IB2004/051323 patent/WO2005015602A2/en active Application Filing
- 2004-07-29 US US10/567,038 patent/US7734014B2/en not_active Expired - Fee Related
- 2004-07-29 AT AT04744676T patent/ATE427026T1/en not_active IP Right Cessation
- 2004-07-29 KR KR1020067002392A patent/KR101058068B1/en not_active IP Right Cessation
- 2004-07-29 DE DE502004009224T patent/DE502004009224D1/en not_active Expired - Lifetime
- 2004-07-29 JP JP2006522465A patent/JP4814093B2/en not_active Expired - Fee Related
- 2004-07-29 EP EP04744676A patent/EP1654914B8/en not_active Expired - Lifetime
- 2004-08-04 TW TW093123359A patent/TW200515458A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2005015602A3 (en) | 2005-06-02 |
JP2007501997A (en) | 2007-02-01 |
WO2005015602A2 (en) | 2005-02-17 |
JP4814093B2 (en) | 2011-11-09 |
CN1833472A (en) | 2006-09-13 |
DE502004009224D1 (en) | 2009-05-07 |
KR20060054422A (en) | 2006-05-22 |
DE10336273A1 (en) | 2005-03-10 |
US20080143228A1 (en) | 2008-06-19 |
TW200515458A (en) | 2005-05-01 |
CN100482030C (en) | 2009-04-22 |
EP1654914B1 (en) | 2009-03-25 |
ATE427026T1 (en) | 2009-04-15 |
US7734014B2 (en) | 2010-06-08 |
EP1654914A2 (en) | 2006-05-10 |
KR101058068B1 (en) | 2011-08-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2003207380A1 (en) | Device for generating uv radiation | |
AU2003300077A1 (en) | Micro-discharge devices and applications | |
EP1037510A3 (en) | Plasma focus high energy photon source with blast shield | |
AU2002316829A1 (en) | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays | |
EP1618585B8 (en) | X-ray sources | |
ATE533175T1 (en) | CORONA DISCHARGE LAMPS | |
ATE393467T1 (en) | LOW PRESSURE GAS DISCHARGE LAMP WITH MERCURY-FREE GAS FILLING | |
WO2002098188A9 (en) | Ionized air flow discharge type non-dusting ionizer | |
TW200420199A (en) | Mechanism for minimizing ion bombardment energy in a plasma chamber | |
AU2003299076A1 (en) | Electrophysiology electrode having multiple power connections and electrophysiology devices including the same | |
WO2005104168A3 (en) | Improved source for energetic electrons | |
TW200802498A (en) | Mercury-free metal halide discharge lamp | |
WO2005057603A3 (en) | Surface structures for halo reduction in electron bombarded devices | |
TW200719983A (en) | Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus | |
ATE491324T1 (en) | DEVICE FOR GENERATING EXTREME ULTRAVIOLET AND SOFT X-RAY FROM A GAS DISCHARGE | |
WO2006046968A3 (en) | Microfabricated radiation detector assemblies methods of making and using same and interface circuit for use therewith | |
WO2005091331A3 (en) | An ionization gauge | |
AU2002358370A1 (en) | An arrangement and a method for emitting light | |
WO2004051698A3 (en) | Gas discharge lamp for euv radiation | |
EP1654914B8 (en) | Extreme uv and soft x ray generator | |
BR0314137A (en) | A mercury gas discharge device | |
WO2006043184A3 (en) | High-pressure gas discharge lamp | |
TW200613706A (en) | EUV generator | |
EP1988757A3 (en) | DBD plasma discharged static eliminator | |
WO2003075309A3 (en) | Light source |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20060307 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR |
|
DAX | Request for extension of the european patent (deleted) | ||
17Q | First examination report despatched |
Effective date: 20070306 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
RAP2 | Party data changed (patent owner data changed or rights of a patent transferred) |
Owner name: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAN Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V. |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: GERMAN |
|
REF | Corresponds to: |
Ref document number: 502004009224 Country of ref document: DE Date of ref document: 20090507 Kind code of ref document: P |
|
NLT2 | Nl: modifications (of names), taken from the european patent patent bulletin |
Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V. Effective date: 20090415 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090625 Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FD4D |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090706 Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090901 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 Ref country code: IE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090625 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
BERE | Be: lapsed |
Owner name: FRAUNHOFER-G.- ZUR FOERDERUNG DER ANGEWANDTEN FORS Effective date: 20090731 Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V. Effective date: 20090731 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090731 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
26N | No opposition filed |
Effective date: 20091229 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090731 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090731 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090731 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090626 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090729 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20100930 Year of fee payment: 7 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090729 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: HU Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090926 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20090325 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20110729 Year of fee payment: 8 Ref country code: FR Payment date: 20110810 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20110801 Year of fee payment: 8 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20130201 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20120729 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20130329 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130201 Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130201 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120729 Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120731 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 502004009224 Country of ref document: DE Effective date: 20130201 |