NL298175A - - Google Patents
Info
- Publication number
- NL298175A NL298175A NL298175DA NL298175A NL 298175 A NL298175 A NL 298175A NL 298175D A NL298175D A NL 298175DA NL 298175 A NL298175 A NL 298175A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/10—Duoplasmatrons ; Duopigatrons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/077—Electron guns using discharge in gases or vapours as electron sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES82505A DE1208420B (en) | 1962-11-20 | 1962-11-20 | Device for generating a beam of ions or electrons in which at least two similar ion or electron sources are arranged one behind the other |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL298175A true NL298175A (en) |
Family
ID=7510392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL298175D NL298175A (en) | 1962-11-20 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3315125A (en) |
| CH (1) | CH412124A (en) |
| DE (1) | DE1208420B (en) |
| GB (1) | GB1060309A (en) |
| NL (1) | NL298175A (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3449628A (en) * | 1966-04-27 | 1969-06-10 | Xerox Corp | Plasma arc electrodes with anode heat shield |
| US3453489A (en) * | 1966-04-27 | 1969-07-01 | Xerox Corp | Multiple anode electrode assembly |
| US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
| US3458743A (en) * | 1966-12-19 | 1969-07-29 | Radiation Dynamics | Positive ion source for use with a duoplasmatron |
| US3409529A (en) * | 1967-07-07 | 1968-11-05 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability |
| US3513351A (en) * | 1968-06-26 | 1970-05-19 | Atomic Energy Commission | Duoplasmatron-type ion source including a gas reservoir |
| US3845300A (en) * | 1973-04-18 | 1974-10-29 | Atomic Energy Commission | Apparatus and method for magnetoplasmadynamic isotope separation |
| DE2923724C2 (en) * | 1979-06-12 | 1983-11-03 | W.C. Heraeus Gmbh, 6450 Hanau | Coolable deuterium lamp |
| CH632176A5 (en) * | 1979-12-06 | 1982-09-30 | Charmilles Sa Ateliers | METHOD AND DEVICE FOR MACHINING BY EROSIVE SPARKING. |
| GB2169131B (en) * | 1984-12-22 | 1988-11-09 | English Electric Valve Co Ltd | Gas discharge devices |
| CA1252581A (en) * | 1985-05-28 | 1989-04-11 | Yoshinobu Aoyagi | Electron beam-excited ion beam source |
| US4841197A (en) * | 1986-05-28 | 1989-06-20 | Nihon Shinku Gijutsu Kabushiki Kaisha | Double-chamber ion source |
| GB8803837D0 (en) * | 1988-02-18 | 1988-03-16 | Vg Instr Group | Mass spectrometer |
| DE10336273A1 (en) * | 2003-08-07 | 2005-03-10 | Fraunhofer Ges Forschung | Device for generating EUV and soft X-radiation |
| US20100024385A1 (en) * | 2006-09-19 | 2010-02-04 | University Of Southampton | Pulsed plasma thruster and method of operation thereof |
| US20160133426A1 (en) * | 2013-06-12 | 2016-05-12 | General Plasma, Inc. | Linear duoplasmatron |
| US10176977B2 (en) * | 2014-12-12 | 2019-01-08 | Agilent Technologies, Inc. | Ion source for soft electron ionization and related systems and methods |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE764127C (en) * | 1939-07-09 | 1954-05-17 | Aeg | Indirectly heated glow cathode to generate an electron beam with a large current |
| US2975277A (en) * | 1955-05-10 | 1961-03-14 | Vakutronik Veb | Ion source |
| DE1059581B (en) * | 1956-03-28 | 1959-06-18 | Siemens Ag | Plasma source for charged particles |
| US3033984A (en) * | 1959-02-17 | 1962-05-08 | United States Steel Corp | Apparatus for increasing the energy of x-rays |
| US3137801A (en) * | 1960-09-22 | 1964-06-16 | High Voltage Engineering Corp | Duoplasmatron-type ion source including a non-magnetic anode and magnetic extractor electrode |
-
0
- NL NL298175D patent/NL298175A/xx unknown
-
1962
- 1962-11-20 DE DES82505A patent/DE1208420B/en active Pending
-
1963
- 1963-06-14 US US287817A patent/US3315125A/en not_active Expired - Lifetime
- 1963-08-16 CH CH1017663A patent/CH412124A/en unknown
- 1963-11-20 GB GB45884/63A patent/GB1060309A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CH412124A (en) | 1966-04-30 |
| US3315125A (en) | 1967-04-18 |
| GB1060309A (en) | 1967-03-01 |
| DE1208420B (en) | 1966-01-05 |