CH412124A - Device for generating a beam of ions or electrons with at least two ion or electron sources of the same type in cascade connection and method for operating this device - Google Patents

Device for generating a beam of ions or electrons with at least two ion or electron sources of the same type in cascade connection and method for operating this device

Info

Publication number
CH412124A
CH412124A CH1017663A CH1017663A CH412124A CH 412124 A CH412124 A CH 412124A CH 1017663 A CH1017663 A CH 1017663A CH 1017663 A CH1017663 A CH 1017663A CH 412124 A CH412124 A CH 412124A
Authority
CH
Switzerland
Prior art keywords
electrons
ions
ion
generating
operating
Prior art date
Application number
CH1017663A
Other languages
German (de)
Inventor
Heinz Dr Froehlich
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH412124A publication Critical patent/CH412124A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
CH1017663A 1962-11-20 1963-08-16 Device for generating a beam of ions or electrons with at least two ion or electron sources of the same type in cascade connection and method for operating this device CH412124A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES82505A DE1208420B (en) 1962-11-20 1962-11-20 Device for generating a beam of ions or electrons in which at least two similar ion or electron sources are arranged one behind the other

Publications (1)

Publication Number Publication Date
CH412124A true CH412124A (en) 1966-04-30

Family

ID=7510392

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1017663A CH412124A (en) 1962-11-20 1963-08-16 Device for generating a beam of ions or electrons with at least two ion or electron sources of the same type in cascade connection and method for operating this device

Country Status (5)

Country Link
US (1) US3315125A (en)
CH (1) CH412124A (en)
DE (1) DE1208420B (en)
GB (1) GB1060309A (en)
NL (1) NL298175A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3044815A1 (en) * 1979-12-06 1981-09-10 Ateliers des Charmilles, S.A., Genève PROCESS FOR EDM EDMING AND DEVICE FOR IMPLEMENTING THE PROCESS

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3453489A (en) * 1966-04-27 1969-07-01 Xerox Corp Multiple anode electrode assembly
US3449628A (en) * 1966-04-27 1969-06-10 Xerox Corp Plasma arc electrodes with anode heat shield
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
US3458743A (en) * 1966-12-19 1969-07-29 Radiation Dynamics Positive ion source for use with a duoplasmatron
US3409529A (en) * 1967-07-07 1968-11-05 Kennecott Copper Corp High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability
US3513351A (en) * 1968-06-26 1970-05-19 Atomic Energy Commission Duoplasmatron-type ion source including a gas reservoir
US3845300A (en) * 1973-04-18 1974-10-29 Atomic Energy Commission Apparatus and method for magnetoplasmadynamic isotope separation
DE2923724C2 (en) * 1979-06-12 1983-11-03 W.C. Heraeus Gmbh, 6450 Hanau Coolable deuterium lamp
JPS57191950A (en) 1981-05-22 1982-11-25 Hitachi Ltd Charged-particle source
GB2169131B (en) * 1984-12-22 1988-11-09 English Electric Valve Co Ltd Gas discharge devices
EP0203573B1 (en) * 1985-05-28 1993-08-11 Rikagaku Kenkyusho Electron beam-excited ion beam source
US4841197A (en) * 1986-05-28 1989-06-20 Nihon Shinku Gijutsu Kabushiki Kaisha Double-chamber ion source
GB8803837D0 (en) * 1988-02-18 1988-03-16 Vg Instr Group Mass spectrometer
DE10336273A1 (en) * 2003-08-07 2005-03-10 Fraunhofer Ges Forschung Device for generating EUV and soft X-radiation
GB2454851A (en) * 2006-09-19 2009-05-27 Univ Southampton Improved pulsed plasma thruster and method of operation thereof
US20160133426A1 (en) * 2013-06-12 2016-05-12 General Plasma, Inc. Linear duoplasmatron
US10176977B2 (en) * 2014-12-12 2019-01-08 Agilent Technologies, Inc. Ion source for soft electron ionization and related systems and methods
CN115426759B (en) * 2022-09-07 2025-04-01 中国人民解放军空军工程大学 Cascade type high efficiency discharge device and method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE764127C (en) * 1939-07-09 1954-05-17 Aeg Indirectly heated glow cathode to generate an electron beam with a large current
US2975277A (en) * 1955-05-10 1961-03-14 Vakutronik Veb Ion source
DE1059581B (en) * 1956-03-28 1959-06-18 Siemens Ag Plasma source for charged particles
US3033984A (en) * 1959-02-17 1962-05-08 United States Steel Corp Apparatus for increasing the energy of x-rays
US3137801A (en) * 1960-09-22 1964-06-16 High Voltage Engineering Corp Duoplasmatron-type ion source including a non-magnetic anode and magnetic extractor electrode

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3044815A1 (en) * 1979-12-06 1981-09-10 Ateliers des Charmilles, S.A., Genève PROCESS FOR EDM EDMING AND DEVICE FOR IMPLEMENTING THE PROCESS

Also Published As

Publication number Publication date
DE1208420B (en) 1966-01-05
US3315125A (en) 1967-04-18
NL298175A (en)
GB1060309A (en) 1967-03-01

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