EP1504846A1 - Polishing plate with a polishing cloth that does adhere only horizontally to the holder - Google Patents

Polishing plate with a polishing cloth that does adhere only horizontally to the holder Download PDF

Info

Publication number
EP1504846A1
EP1504846A1 EP04354026A EP04354026A EP1504846A1 EP 1504846 A1 EP1504846 A1 EP 1504846A1 EP 04354026 A EP04354026 A EP 04354026A EP 04354026 A EP04354026 A EP 04354026A EP 1504846 A1 EP1504846 A1 EP 1504846A1
Authority
EP
European Patent Office
Prior art keywords
fabric
support
layer
polishing
tray according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP04354026A
Other languages
German (de)
French (fr)
Other versions
EP1504846B1 (en
Inventor
Lucien Grisel
Jean Roulet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Procedes Et Equipements Pour Les Sciences Et L'industrie
Original Assignee
Procedes Et Equipements Pour Les Sciences Et L'industrie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Procedes Et Equipements Pour Les Sciences Et L'industrie filed Critical Procedes Et Equipements Pour Les Sciences Et L'industrie
Publication of EP1504846A1 publication Critical patent/EP1504846A1/en
Application granted granted Critical
Publication of EP1504846B1 publication Critical patent/EP1504846B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/22Lapping pads for working plane surfaces characterised by a multi-layered structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/20Mountings for the wheels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0072Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing

Definitions

  • the fixing of a polishing cloth on a support can intervene of different ways depending on the use of the fabric.
  • the fabric having a upper face intended to be in contact with a workpiece and a face by which the fabric is attached to the support, it can be, for example, fixed directly by gluing thanks to an adhesive coating distributed on the face lower fabric.
  • a first adhesive coating is disposed between the underside of the fabric and the flexible sheet and a second adhesive coating is disposed between the flexible sheet and the support.
  • the flexible sheet makes it possible to obtain a together having a certain rigidity.
  • the polishing cloth can not be peeled off support without being damaged.
  • the permanent fixation of the fabric on the support makes the use of the tray and its storage impractical and cumbersome. Indeed, this requires storing, for each type of fabric, a support and, when polishing a part that requires several types of fabrics, it is necessary to change, at each operation, the support of the tray on the polishing machine.
  • patent application WO-A-0153042 proposes to use a polishing cloth comprising a polishing element comprising a support on which is disposed an abrasive coating, a sub-fabric a surface of which makes it possible to fix the polishing cloth on a tray and a layer with multiple gluing.
  • the multiple gluing layer makes it possible to adhere the polishing element on the sub-fabric during the operation of polishing and then replace once used. It can also be formed by a self-adhesive adhesive system in the form of a ribbon comprising for example, an elastic support.
  • an abrasive coating comprises a self-adhesive adhesive layer disposed on the non-abrasive surface of a polishing cloth so as to fix the polishing cloth on a support of tissue.
  • the self-adhesive layer preferably has a resistance of sufficient peel to allow good adhesion between the polishing cloth and the support when in use but not too high to be removed without tearing off the bottom layer.
  • the invention aims to achieve a relatively inexpensive polishing plate and to maintain a perfect adhesion between the fabric and the support, especially when the plate is subjected to a rotational movement, while facilitating a tissue change.
  • the adhesion layer is constituted by a web of artificial cellulosic fibers, impregnated of silicone elastomer with an adhesive mass of synthetic rubber, so that the fabric adheres perfectly only horizontally to the support, the free surface of the underlayer being smooth.
  • the adhesion layer has a thickness 400 ⁇ m.
  • the adhesion means comprise also a layer of polyvinyl chloride, placed between the first layer of glue and a second layer of glue disposed on the support.
  • a polishing plate 1 comprises a support 2, preferably in the form of a metal disc and comprising upper faces 2a and lower 2b ( Figure 2).
  • a polishing cloth 3 mechanic or mechano-chemical must be attached to the upper face 2a of the support.
  • the tray is intended to be arranged by the lower face 2b of the support, in a polishing machine and, preferably, on an element of tray support.
  • the tray is generally used in applications various, such as the preparation of metallographic samples, geological or semiconductor substrates.
  • the polishing cloth 3 comprises a coating surface 4 allowing the mechanical or mechano-chemical polishing of parts.
  • the plateau is animated by a Rotational movement and parts are laid on the surface coating 4 of the fabric, so as to obtain pieces with a polished surface.
  • a abrasive liquid for facilitating the polishing of parts such as a suspension diamond, is spilled on the surface coating of the fabric.
  • the coating tissue is of the type conventionally used to realize the polishing parts. Thus, it can be diamond, composite smooth, embossed or embossed, or abrasive paper.
  • An intermediate layer 5 ensures the fixation of the surface coating 4 on a sub-layer 6 having a free surface 6a smooth.
  • the free surface 6a is intended to ensure contact and fixing the fabric on the support 2.
  • the underlayer 6 can be in any type of material having a smooth free surface 6a. It can, for example, be in polyvinyl chloride or polyester and the intermediate layer 5 is constituted by a strongly adhesive material such as a material having a acrylic adhesive mass.
  • Fixing the polishing cloth 3 on the support 2 is carried out by means of at least one adhesion layer 7 permanently attached to the face 2a upper support 2.
  • the permanent attachment of the adhesion layer 7 is achieved by means of at least a first layer of glue 8.
  • polyvinyl chloride layer 9 is preferably arranged between the first layer of glue 8 and a second layer of glue 10 disposed on the upper surface 2a of the support 2, as illustrated in FIGS. 1 and 2.
  • first and second adhesive layers 8 and 10 are preferably in one acrylic adhesive mass material and the adhesion layer 7 is constituted by a web of artificial cellulosic fibers, and preferably a fibranne®-type canvas, impregnated with silicone elastomer with a mass adhesive synthetic rubber.
  • the adhesion layer 7 a of preferably a thickness of 400 ⁇ m.
  • the adhesion layer 7 allows the fabric to adhere perfectly to the support, but only horizontally to this one, especially thanks to the free surface 6a smooth of the underlayer 6 of the fabric 3. Thus, the fabric does not adhere perfectly only horizontally to the support.
  • By only adhering horizontally to the support means that when pulling on the polishing cloth along a traction axis located in the plane of the interface 11 between the free surface 6a of the underlayer 6 and the adhesion layer 7, the fabric 3 does not move and adheres perfectly to the adhesion layer 7, the plane of the interface 11 being a horizontal plane by relative to the support 7.
  • the adhesion layer 7 being fixed so permanent support 2, the fabric 3 adheres perfectly to the support 2 in the horizontal plane.
  • the fabric when the plate is rotated according to a vertical axis of rotation s1, the fabric does not move despite the centrifugal force created, the vertical axis of rotation s1 being preferably an axis of symmetry of the 1.
  • a single support can therefore be used for different types of fabrics used in the polishing process of a room.
  • Such a mode of adhesion advantageously makes it possible to fix reversible polishing cloth 3 on the support 2 without using any element mechanical hooking.
  • it is possible to change only the fabric of polishing of the tray, at each new step of a polishing process of a piece, while retaining on the polishing machine, the same support covered by the same adhesion layer 7.
  • It also makes it possible to store, only the polishing cloths and no longer the trays. This allows, In particular, to save time during the polishing process, the change tissue being performed more quickly. This also reduces storage space polishing trays because the space required for store a predetermined amount of polishing cloth, is less than required to store the same amount of tissue respectively glued to a support.
  • the cost of the adhesion layer 7, the adhesive layers 8 and 10, and the polyvinyl chloride layer 9 is relatively low by compared to the cost of a magnetic coating and it is easier to clean the fabrics alone.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

The polishing sheet (1) consists of a backing layer (2) with a mechanical or mechano-chemical polishing material comprising a surface coating (4), an intermediate fixing layer (5) and an under-layer (6). (2) Has an adhesive surface of synthetic cellulose fibres impregnated with a silicone elastomer and adhesive synthetic rubber allowing the polishing material to adhere only perfectly horizontally to it.

Description

Domaine technique de l'inventionTechnical field of the invention

L'invention concerne un plateau de polissage comportant :

  • un support,
  • un tissu de polissage mécanique ou mécano-chimique comprenant un revêtement superficiel, une couche intermédiaire assurant la fixation permanente du revêtement superficiel sur une sous-couche ayant une surface libre,
  • et des moyens de fixation disposés entre le support et la surface libre de la sous-couche du tissu et comportant des moyens d'adhérence comportant au moins une couche d'adhérence fixée de manière permanente sur le support par l'intermédiaire d'une première couche de colle.
The invention relates to a polishing plate comprising:
  • a support,
  • a mechanical or mechano-chemical polishing cloth comprising a surface coating, an intermediate layer ensuring the permanent fixing of the surface coating on a sub-layer having a free surface,
  • and fixing means disposed between the support and the free surface of the underlayer of the fabric and having adhesion means comprising at least one adhesion layer permanently attached to the support via a first layer of glue.

État de la techniqueState of the art

De manière connue, la fixation d'un tissu de polissage sur un support, destiné, par exemple à être placé dans une machine de polissage, peut intervenir de différentes manières en fonction de l'utilisation du tissu. Le tissu comportant une face supérieure destinée à être en contact avec une pièce à polir et une face inférieure par laquelle le tissu est fixé au support, il peut être, par exemple, fixé directement par collage grâce à un revêtement adhésif réparti sur la face inférieure du tissu. In known manner, the fixing of a polishing cloth on a support, intended, for example to be placed in a polishing machine, can intervene of different ways depending on the use of the fabric. The fabric having a upper face intended to be in contact with a workpiece and a face by which the fabric is attached to the support, it can be, for example, fixed directly by gluing thanks to an adhesive coating distributed on the face lower fabric.

Il peut également être fixé grâce à une feuille souple en polychlorure de vinyle ou en matériau similaire. Un premier revêtement adhésif est disposé entre la face inférieure du tissu et la feuille souple et un second revêtement adhésif est disposé entre la feuille souple et le support. La feuille souple permet d'obtenir un ensemble présentant une certaine rigidité.It can also be fixed thanks to a flexible sheet of polyvinyl chloride or similar material. A first adhesive coating is disposed between the underside of the fabric and the flexible sheet and a second adhesive coating is disposed between the flexible sheet and the support. The flexible sheet makes it possible to obtain a together having a certain rigidity.

Dans ces deux cas, après fixation, le tissu de polissage ne peut pas être décollé du support sans être endommagé. Or, la fixation permanente du tissu sur le support rend l'utilisation du plateau et son stockage peu pratique et encombrante. En effet, cela oblige à stocker, pour chaque type de tissu, un support et, lors du polissage d'une pièce qui nécessite plusieurs types de tissus, il est nécessaire de changer, à chaque opération, le support du plateau sur la machine de polissage.In both cases, after fixing, the polishing cloth can not be peeled off support without being damaged. However, the permanent fixation of the fabric on the support makes the use of the tray and its storage impractical and cumbersome. Indeed, this requires storing, for each type of fabric, a support and, when polishing a part that requires several types of fabrics, it is necessary to change, at each operation, the support of the tray on the polishing machine.

Il est également connu de fixer le tissu par attraction magnétique au moyen d'un revêtement magnétique collé sur la face inférieure du tissu. Bien que ce mode de fixation permette d'utiliser un même support pour plusieurs types de tissus, il nécessite, cependant, de coller sur la face inférieure de chaque tissu un revêtement magnétique qui est relativement coûteux.It is also known to fix the fabric by magnetic attraction by means of a magnetic coating adhered to the underside of the fabric. Although this mode the same support for several types of tissue, it is possible to requires, however, to stick on the underside of each fabric a magnetic coating that is relatively expensive.

Il a été proposé d'utiliser des couches permettant de faire adhérer un tissu de polissage sur un support de manière à pouvoir le décoller facilement une fois celui-ci usé et à le remplacer. Ainsi, la demande de brevet WO-A-0153042 propose d'utiliser un tissu de polissage comportant un élément de polissage comprenant un support sur lequel est disposé un revêtement abrasif, un sous-tissu dont une surface permet de fixer le tissu de polissage sur un plateau et une couche à recollage multiple. La couche à recollage multiple permet de faire adhérer l'élément de polissage sur le sous-tissu pendant l'opération de polissage puis de le remplacer une fois celui-ci usé. Elle peut, également, être formée par un système adhésif auto-collant sous forme d'un ruban comprenant, par exemple, un support élastique.It has been proposed to use layers for adhering a tissue of polishing on a support so that it can be taken off easily once this one used and to replace it. Thus, patent application WO-A-0153042 proposes to use a polishing cloth comprising a polishing element comprising a support on which is disposed an abrasive coating, a sub-fabric a surface of which makes it possible to fix the polishing cloth on a tray and a layer with multiple gluing. The multiple gluing layer makes it possible to adhere the polishing element on the sub-fabric during the operation of polishing and then replace once used. It can also be formed by a self-adhesive adhesive system in the form of a ribbon comprising for example, an elastic support.

Dans la demande de brevet EP-A-0418093, un revêtement abrasif comporte une couche adhésive auto-collante disposée sur la surface non abrasive d'un tissu de polissage de manière à fixer le tissu de polissage sur un support de tissu. La couche auto-collante présente, de préférence, une résistance de pelage suffisante pour permettre une bonne adhésion entre le tissu de polissage et le support lors de son utilisation mais pas trop élevée pour pouvoir être retirée sans arracher la couche inférieure.In the patent application EP-A-0418093, an abrasive coating comprises a self-adhesive adhesive layer disposed on the non-abrasive surface of a polishing cloth so as to fix the polishing cloth on a support of tissue. The self-adhesive layer preferably has a resistance of sufficient peel to allow good adhesion between the polishing cloth and the support when in use but not too high to be removed without tearing off the bottom layer.

Objet de l'inventionObject of the invention

L'invention a pour but de réaliser un plateau de polissage relativement peu cher et permettant de conserver une parfaite adhésion entre le tissu et le support, notamment lorsque le plateau est soumis à un mouvement de rotation, tout en facilitant un changement de tissus.The invention aims to achieve a relatively inexpensive polishing plate and to maintain a perfect adhesion between the fabric and the support, especially when the plate is subjected to a rotational movement, while facilitating a tissue change.

Selon l'invention, ce but est atteint par les revendications annexées.According to the invention, this object is achieved by the appended claims.

Plus particulièrement, ce but est atteint par le fait que la couche d'adhérence est constituée par une toile de fibres cellulosiques artificielles, imprégnée d'élastomère de silicone avec une masse adhésive en caoutchouc synthétique, de sorte que le tissu n'adhère parfaitement qu'horizontalement au support, la surface libre de la sous-couche étant lisse.More particularly, this object is achieved by the fact that the adhesion layer is constituted by a web of artificial cellulosic fibers, impregnated of silicone elastomer with an adhesive mass of synthetic rubber, so that the fabric adheres perfectly only horizontally to the support, the free surface of the underlayer being smooth.

Selon un développement de l'invention, la couche d'adhérence a une épaisseur de 400µm. According to a development of the invention, the adhesion layer has a thickness 400μm.

Selon un mode de réalisation préférentiel, les moyens d'adhérence comportent également une couche en polychlorure de vinyle, disposée entre la première couche de colle et une seconde couche de colle disposée sur le support.According to a preferred embodiment, the adhesion means comprise also a layer of polyvinyl chloride, placed between the first layer of glue and a second layer of glue disposed on the support.

Description sommaire des dessinsBrief description of the drawings

D'autres avantages et caractéristiques ressortiront plus clairement de la description qui va suivre de modes particuliers de réalisation de l'invention donnés à titre d'exemples non limitatifs et représentés aux dessins annexés, dans lesquels :

  • La figure 1 représente schématiquement, en coupe, un plateau de polissage selon l'invention.
  • La figure 2 est une représentation schématique, en coupe, du support du plateau selon la figure 1.
  • La figure 3 est une représentation schématique, en coupe, du tissu de polissage du plateau selon la figure 2.
  • Other advantages and features will emerge more clearly from the following description of particular embodiments of the invention given by way of non-limiting example and represented in the accompanying drawings, in which:
  • Figure 1 shows schematically, in section, a polishing plate according to the invention.
  • FIG. 2 is a diagrammatic representation, in section, of the support of the plate according to FIG.
  • FIG. 3 is a diagrammatic representation, in section, of the polishing cloth of the plate according to FIG. 2.
  • Description de modes particuliers de réalisationDescription of particular embodiments

    Comme illustré aux figures 1 à 3, un plateau de polissage 1 comporte un support 2, de préférence sous forme d'un disque en métal et comprenant des faces supérieure 2a et inférieure 2b (figure 2). Un tissu de polissage 3 mécanique ou mécano-chimique doit être fixé sur la face supérieure 2a du support. Le plateau est destiné à être disposé, par la face inférieure 2b du support, dans une machine de polissage et, de préférence, sur un élément de support de plateau. Le plateau est, généralement utilisé, dans des applications diverses, telles que la préparation d'échantillons métallographiques, de pièces géologiques ou de substrats semi-conducteurs.As illustrated in FIGS. 1 to 3, a polishing plate 1 comprises a support 2, preferably in the form of a metal disc and comprising upper faces 2a and lower 2b (Figure 2). A polishing cloth 3 mechanic or mechano-chemical must be attached to the upper face 2a of the support. The tray is intended to be arranged by the lower face 2b of the support, in a polishing machine and, preferably, on an element of tray support. The tray is generally used in applications various, such as the preparation of metallographic samples, geological or semiconductor substrates.

    Comme illustré à la figure 3, le tissu de polissage 3 comprend un revêtement superficiel 4 permettant le polissage mécanique ou mécano-chimique de pièces. Ainsi, au cours d'une opération de polissage, le plateau est animé d'un mouvement de rotation et les pièces sont posées sur le revêtement superficiel 4 du tissu, de manière à obtenir des pièces avec une surface polie. De plus, lors de l'opération de polissage et selon le type de revêtement superficiel utilisé, un liquide abrasif destiné à faciliter le polissage des pièces, tel qu'une suspension diamantée, est déversé sur le revêtement superficiel du tissu. Le revêtement superficiel du tissu est du type de ceux classiquement utilisés pour réaliser le polissage de pièces. Ainsi, il peut être diamanté, composite lisse, embossé ou gaufré, ou en papier abrasif. Une couche intermédiaire 5 assure la fixation permanente du revêtement superficiel 4 sur une sous-couche 6 ayant une surface libre 6a lisse. La surface libre 6a est destinée à assurer le contact et la fixation du tissu sur le support 2. La sous-couche 6 peut être en tout type de matériau présentant une surface libre 6a lisse. Elle peut, par exemple, être en polychlorure de vinyle ou en polyester et la couche intermédiaire 5 est constituée par un matériau fortement adhésif tel qu'un matériau ayant une masse adhésive acrylique.As illustrated in FIG. 3, the polishing cloth 3 comprises a coating surface 4 allowing the mechanical or mechano-chemical polishing of parts. Thus, during a polishing operation, the plateau is animated by a Rotational movement and parts are laid on the surface coating 4 of the fabric, so as to obtain pieces with a polished surface. Moreover, of the polishing operation and depending on the type of surface coating used, a abrasive liquid for facilitating the polishing of parts, such as a suspension diamond, is spilled on the surface coating of the fabric. The coating tissue is of the type conventionally used to realize the polishing parts. Thus, it can be diamond, composite smooth, embossed or embossed, or abrasive paper. An intermediate layer 5 ensures the fixation of the surface coating 4 on a sub-layer 6 having a free surface 6a smooth. The free surface 6a is intended to ensure contact and fixing the fabric on the support 2. The underlayer 6 can be in any type of material having a smooth free surface 6a. It can, for example, be in polyvinyl chloride or polyester and the intermediate layer 5 is constituted by a strongly adhesive material such as a material having a acrylic adhesive mass.

    La fixation du tissu de polissage 3 sur le support 2 est réalisée au moyen d'au moins une couche d'adhérence 7 fixée, de manière permanente, à la face supérieure 2a du support 2. La fixation permanente de la couche d'adhérence 7 est réalisée par l'intermédiaire d'au moins une première couche de colle 8. Une couche en polychlorure de vinyle 9 est, de préférence, disposée entre la première couche de colle 8 et une seconde couche de colle 10 disposée sur la surface supérieure 2a du support 2, comme illustrée aux figures 1 et 2. Les première et seconde couches de colle 8 et 10 sont, de préférence, en un matériau de masse adhésive acrylique et la couche d'adhérence 7 est constituée par une toile de fibres cellulosiques artificielles, et de préférence une toile de type fibranne®, imprégnée d'élastomère de silicone avec une masse adhésive en caoutchouc synthétique. La couche d'adhérence 7 a, de préférence, une épaisseur de 400µm.Fixing the polishing cloth 3 on the support 2 is carried out by means of at least one adhesion layer 7 permanently attached to the face 2a upper support 2. The permanent attachment of the adhesion layer 7 is achieved by means of at least a first layer of glue 8. polyvinyl chloride layer 9 is preferably arranged between the first layer of glue 8 and a second layer of glue 10 disposed on the upper surface 2a of the support 2, as illustrated in FIGS. 1 and 2. first and second adhesive layers 8 and 10 are preferably in one acrylic adhesive mass material and the adhesion layer 7 is constituted by a web of artificial cellulosic fibers, and preferably a fibranne®-type canvas, impregnated with silicone elastomer with a mass adhesive synthetic rubber. The adhesion layer 7 a, of preferably a thickness of 400 μm.

    La couche d'adhérence 7 permet au tissu d'adhérer parfaitement au support, mais uniquement horizontalement à celui-ci, notamment grâce à la surface libre 6a lisse de la sous-couche 6 du tissu 3. Ainsi, le tissu n'adhère parfaitement qu'horizontalement au support. Par n'adhérer qu'horizontalement au support, on entend que, lorsque l'on tire sur le tissu de polissage selon un axe de traction situé dans le plan de l'interface 11 entre la surface libre 6a de la sous-couche 6 et la couche d'adhérence 7, le tissu 3 ne se déplace pas et adhère parfaitement à la couche d'adhérence 7, le plan de l'interface 11 étant un plan horizontal par rapport au support 7. Ainsi, la couche d'adhérence 7 étant fixée de manière permanente au support 2, le tissu 3 adhère parfaitement au support 2 dans le plan horizontal. Ainsi, lorsque le plateau subit un mouvement de rotation selon un axe de rotation vertical s1, le tissu ne bouge pas malgré la force centrifuge créée, l'axe de rotation vertical s1 étant, de préférence, un axe de symétrie du plateau 1. Par contre, il suffit de soulever le tissu 3, c'est-à-dire de tirer sur le tissu 3 selon un axe de traction non contenu dans le plan horizontal du plateau et, de préférence, sensiblement verticalement à l'interface 11, pour que le tissu n'adhère plus au support. Il se détache alors pratiquement sans opposer aucune résistance au détachement et peut, ainsi, être très facilement retiré du support sans être endommagé. Un support unique peut donc être utilisé pour les différents types de tissus utilisés lors du procédé de polissage d'une pièce. The adhesion layer 7 allows the fabric to adhere perfectly to the support, but only horizontally to this one, especially thanks to the free surface 6a smooth of the underlayer 6 of the fabric 3. Thus, the fabric does not adhere perfectly only horizontally to the support. By only adhering horizontally to the support, means that when pulling on the polishing cloth along a traction axis located in the plane of the interface 11 between the free surface 6a of the underlayer 6 and the adhesion layer 7, the fabric 3 does not move and adheres perfectly to the adhesion layer 7, the plane of the interface 11 being a horizontal plane by relative to the support 7. Thus, the adhesion layer 7 being fixed so permanent support 2, the fabric 3 adheres perfectly to the support 2 in the horizontal plane. Thus, when the plate is rotated according to a vertical axis of rotation s1, the fabric does not move despite the centrifugal force created, the vertical axis of rotation s1 being preferably an axis of symmetry of the 1. On the other hand, it is enough to lift the fabric 3, that is to say to draw on the fabric 3 along an axis of traction not contained in the horizontal plane of the plate and, preferably, substantially vertically at the interface 11, so that the fabric no longer adhere to the support. He then stands out practically without opposing any resistance to detachment and can thus be easily removed from the support without being damaged. A single support can therefore be used for different types of fabrics used in the polishing process of a room.

    Un tel mode d'adhérence permet avantageusement de réaliser une fixation réversible du tissu de polissage 3 sur le support 2 sans utiliser d'élément mécanique d'accrochage. Ainsi, il est possible changer uniquement le tissu de polissage du plateau, à chaque nouvelle étape d'un procédé de polissage d'une pièce, tout en conservant sur la machine de polissage, le même support recouvert par la même couche d'adhérence 7. Il permet également de stocker, uniquement les tissus de polissage et non plus les plateaux. Ceci permet, notamment, de gagner du temps lors du procédé de polissage, le changement de tissus étant effectué plus rapidement. Ceci permet également de réduire l'espace de stockage des plateaux de polissage, car l'espace requis pour stocker une quantité prédéterminée de tissus de polissage, est inférieur à celui requis pour stocker la même quantité de tissus respectivement collés à un support. De plus, le coût de la couche d'adhérence 7, des couches de colle 8 et 10, et de la couche en polychlorure de vinyle 9 est relativement peu élevé par rapport au coût d'un revêtement magnétique et il est plus facile de nettoyer les tissus seuls.Such a mode of adhesion advantageously makes it possible to fix reversible polishing cloth 3 on the support 2 without using any element mechanical hooking. Thus, it is possible to change only the fabric of polishing of the tray, at each new step of a polishing process of a piece, while retaining on the polishing machine, the same support covered by the same adhesion layer 7. It also makes it possible to store, only the polishing cloths and no longer the trays. This allows, In particular, to save time during the polishing process, the change tissue being performed more quickly. This also reduces storage space polishing trays because the space required for store a predetermined amount of polishing cloth, is less than required to store the same amount of tissue respectively glued to a support. In addition, the cost of the adhesion layer 7, the adhesive layers 8 and 10, and the polyvinyl chloride layer 9 is relatively low by compared to the cost of a magnetic coating and it is easier to clean the fabrics alone.

    Claims (9)

    Plateau de polissage comportant: un support (2), un tissu de polissage (3) mécanique ou mécano-chimique comprenant un revêtement superficiel (4), une couche intermédiaire (5) assurant la fixation permanente du revêtement superficiel (4) sur une sous-couche (6) ayant une surface libre, et des moyens de fixation disposés entre le support (2) et la surface libre (6a) de la sous-couche (6) du tissu (3) et comportant des moyens d'adhérence comportant au moins une couche d'adhérence (7) fixée de manière permanente sur le support (2) par l'intermédiaire d'une première couche de colle, plateau caractérisé en ce que la couche d'adhérence (7) est constituée par une toile de fibres cellulosiques artificielles, imprégnée d'élastomère de silicone avec une masse adhésive en caoutchouc synthétique, de sorte que le tissu (3) n'adhère parfaitement qu'horizontalement au support (2), la surface libre de la sous-couche (6) étant lisse.Polishing tray comprising: a support (2), a mechanical or mechano-chemical polishing cloth (3) comprising a surface coating (4), an intermediate layer (5) ensuring the permanent fixing of the surface coating (4) on an underlayer (6) having a free surface, and fixing means arranged between the support (2) and the free surface (6a) of the underlayer (6) of the fabric (3) and comprising adhesion means comprising at least one adhesion layer (7) permanently fixed on the support (2) by means of a first layer of glue, tray characterized in that the adhesion layer (7) is constituted by a web of artificial cellulosic fibers impregnated with silicone elastomer with an adhesive mass of synthetic rubber, so that the fabric (3) adheres perfectly only to horizontally to the support (2), the free surface of the underlayer (6) being smooth. Plateau selon la revendication 1, caractérisé en ce que la couche d'adhérence (7) a une épaisseur de 400µm.Tray according to Claim 1, characterized in that the adhesion layer (7) has a thickness of 400 μm. Plateau selon l'une des revendications 1 et 2, caractérisé en ce que les moyens d'adhérence comportent également une couche en polychlorure de vinyle (9), disposée entre la première couche de colle (8) et une seconde couche de colle (10) disposée sur le support (2).Tray according to one of claims 1 and 2, characterized in that the adhesion means also comprise a layer of polyvinyl chloride (9) disposed between the first layer of adhesive (8) and a second layer of adhesive (10). ) disposed on the support (2). Plateau selon l'une quelconque des revendications 1 à 3, caractérisé en ce que la sous-couche (6) du tissu (3) est en polychlorure de vinyle. Tray according to any one of claims 1 to 3, characterized in that the underlayer (6) of the fabric (3) is polyvinyl chloride. Plateau selon l'une quelconque des revendications 1 à 3, caractérisé en ce que la sous-couche (6) du tissu (3) est en polyester.Tray according to any one of claims 1 to 3, characterized in that the underlayer (6) of the fabric (3) is polyester. Plateau selon l'une quelconque des revendications 1 à 5, caractérisé en ce que le revêtement superficiel (4) du tissu (3) est diamanté.Tray according to any one of claims 1 to 5, characterized in that the surface coating (4) of the fabric (3) is diamond-coated. Plateau selon l'une quelconque des revendications 1 à 5, caractérisé en ce que le revêtement superficiel (4) du tissu (3) est composite.Tray according to any one of claims 1 to 5, characterized in that the surface coating (4) of the fabric (3) is composite. Plateau selon la revendication 7, caractérisé en ce que le revêtement superficiel (4) du tissu (3) est embossé.Tray according to claim 7, characterized in that the surface coating (4) of the fabric (3) is embossed. Plateau selon l'une quelconque des revendications 1 à 5, caractérisé en ce que le revêtement superficiel (4) du tissu (3) est en papier abrasif.Tray according to any one of claims 1 to 5, characterized in that the surface coating (4) of the fabric (3) is abrasive paper.
    EP04354026A 2003-08-08 2004-08-03 Polishing plate with a polishing cloth that does adhere only horizontally to the holder Active EP1504846B1 (en)

    Applications Claiming Priority (2)

    Application Number Priority Date Filing Date Title
    FR0309764A FR2858574B1 (en) 2003-08-08 2003-08-08 POLISHING PLATE COMPRISING A POLISHING FABRIC THAT ADDS HORIZALLALLY TO THE SUPPORT
    FR0309764 2003-08-08

    Publications (2)

    Publication Number Publication Date
    EP1504846A1 true EP1504846A1 (en) 2005-02-09
    EP1504846B1 EP1504846B1 (en) 2011-11-02

    Family

    ID=33548322

    Family Applications (1)

    Application Number Title Priority Date Filing Date
    EP04354026A Active EP1504846B1 (en) 2003-08-08 2004-08-03 Polishing plate with a polishing cloth that does adhere only horizontally to the holder

    Country Status (3)

    Country Link
    EP (1) EP1504846B1 (en)
    AT (1) ATE531480T1 (en)
    FR (1) FR2858574B1 (en)

    Cited By (1)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    CN109333390A (en) * 2018-09-26 2019-02-15 东莞市鼎泰鑫电子有限公司 A kind of rubber substrate organic ceramic abrading block and preparation method thereof

    Citations (6)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    GB799424A (en) * 1953-11-06 1958-08-06 Johnson & Johnson Pressure sensitive adhesive tapes and sheets
    US3922464A (en) * 1972-05-26 1975-11-25 Minnesota Mining & Mfg Removable pressure-sensitive adhesive sheet material
    US4427737A (en) * 1981-04-23 1984-01-24 E. R. Squibb & Sons, Inc. Microporous adhesive tape
    US4460371A (en) * 1981-11-24 1984-07-17 Dennison Manufacturing Company Silicone pressure sensitive adhesive and uses
    EP0418093A2 (en) * 1989-09-15 1991-03-20 Minnesota Mining And Manufacturing Company A coated abrasive containing a pressure-sensitive adhesive coatable from water
    WO2001053042A1 (en) * 2000-01-24 2001-07-26 3M Innovative Properties Company Polishing pad with release layer

    Patent Citations (6)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    GB799424A (en) * 1953-11-06 1958-08-06 Johnson & Johnson Pressure sensitive adhesive tapes and sheets
    US3922464A (en) * 1972-05-26 1975-11-25 Minnesota Mining & Mfg Removable pressure-sensitive adhesive sheet material
    US4427737A (en) * 1981-04-23 1984-01-24 E. R. Squibb & Sons, Inc. Microporous adhesive tape
    US4460371A (en) * 1981-11-24 1984-07-17 Dennison Manufacturing Company Silicone pressure sensitive adhesive and uses
    EP0418093A2 (en) * 1989-09-15 1991-03-20 Minnesota Mining And Manufacturing Company A coated abrasive containing a pressure-sensitive adhesive coatable from water
    WO2001053042A1 (en) * 2000-01-24 2001-07-26 3M Innovative Properties Company Polishing pad with release layer

    Cited By (2)

    * Cited by examiner, † Cited by third party
    Publication number Priority date Publication date Assignee Title
    CN109333390A (en) * 2018-09-26 2019-02-15 东莞市鼎泰鑫电子有限公司 A kind of rubber substrate organic ceramic abrading block and preparation method thereof
    CN109333390B (en) * 2018-09-26 2023-08-01 东莞市鼎泰鑫电子有限公司 Rubber substrate organic ceramic grinding block and preparation method thereof

    Also Published As

    Publication number Publication date
    EP1504846B1 (en) 2011-11-02
    FR2858574A1 (en) 2005-02-11
    ATE531480T1 (en) 2011-11-15
    FR2858574B1 (en) 2007-02-16

    Similar Documents

    Publication Publication Date Title
    EP0517594B1 (en) Polishing machine with a tensioned finishing belt and an improved work supporting head
    BE1014743A3 (en) Polishing disc system.
    EP0911431B1 (en) Single crystal silicon wafer with increased mechanical resistance
    CN1067012C (en) Method and apparatus for glueing together disc elements
    FR2758285A3 (en) METHOD OF FIXING AN ABRASIVE OR POLISHING AGENT, IN THE FORM OF A SHEET, ON A MAGNETIC SUPPORT
    KR20050030576A (en) Resilient polishing pad for chemical mechanical polishing
    EP0279734B1 (en) Substrate for a magnetic disc memory and process for its production
    FR2783055A1 (en) SUPPORT FOR OPTICAL LENS, AND METHOD FOR IMPLEMENTING SAME
    FR3007413A1 (en) METHOD FOR BORDING COMPOSITE PANELS, RIBBON FOR IMPLEMENTING THE METHOD, PANEL OBTAINED BY THE METHOD AND MACHINE FOR CARRYING OUT THE METHOD.
    EP1363151B1 (en) Individual support for optical lens
    EP1504846B1 (en) Polishing plate with a polishing cloth that does adhere only horizontally to the holder
    JP2008093811A (en) Polishing head and polishing device
    FR2720325A1 (en) Cutting and welding counter head for cutting and assembly machine
    EP0441667B1 (en) Device for removing make-up
    JPH09207064A (en) Carrier for double side polisher and method for polishing both faces of work using the carrier
    EP1979519B1 (en) Three-dimensional system having a flexible structure
    EP1289795B1 (en) Protective and/or decorative mat for equipping a motor vehicle
    EP1057590B1 (en) Consumable polishing element, specially for finishing optical glasses
    FR3072050B1 (en) ADHESIVE TEXTILE LABEL AND METHOD FOR MANUFACTURING SUCH A LABEL
    EP2075372A1 (en) Display or decoration signalling item designed to be applied to a glazed surface
    EP0365442A1 (en) Thermoformed article with one adhesive face
    FR2633860A1 (en) Rotating support plate for an abrasive disc using water
    FR2473933A1 (en) DEVICE FOR POLISHING WOOD SURFACES
    FR2768955A1 (en) ABRASIVE DISC
    TW200942361A (en) Polishing pad and method for making the same

    Legal Events

    Date Code Title Description
    PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

    Free format text: ORIGINAL CODE: 0009012

    AK Designated contracting states

    Kind code of ref document: A1

    Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

    AX Request for extension of the european patent

    Extension state: AL HR LT LV MK

    17P Request for examination filed

    Effective date: 20050802

    AKX Designation fees paid

    Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

    17Q First examination report despatched

    Effective date: 20100531

    GRAP Despatch of communication of intention to grant a patent

    Free format text: ORIGINAL CODE: EPIDOSNIGR1

    GRAS Grant fee paid

    Free format text: ORIGINAL CODE: EPIDOSNIGR3

    GRAA (expected) grant

    Free format text: ORIGINAL CODE: 0009210

    AK Designated contracting states

    Kind code of ref document: B1

    Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

    REG Reference to a national code

    Ref country code: GB

    Ref legal event code: FG4D

    Free format text: NOT ENGLISH

    REG Reference to a national code

    Ref country code: CH

    Ref legal event code: EP

    REG Reference to a national code

    Ref country code: IE

    Ref legal event code: FG4D

    REG Reference to a national code

    Ref country code: DE

    Ref legal event code: R096

    Ref document number: 602004035099

    Country of ref document: DE

    Effective date: 20120112

    REG Reference to a national code

    Ref country code: NL

    Ref legal event code: VDEP

    Effective date: 20111102

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: GR

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20120203

    Ref country code: SI

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: PL

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: NL

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: SE

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: PT

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20120302

    REG Reference to a national code

    Ref country code: IE

    Ref legal event code: FD4D

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: CY

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    REG Reference to a national code

    Ref country code: CH

    Ref legal event code: NV

    Representative=s name: CABINET ROLAND NITHARDT CONSEILS EN PROPRIETE INDU

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: CZ

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: IE

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: SK

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: DK

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: BG

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20120202

    Ref country code: EE

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: IT

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    Ref country code: RO

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    PLBE No opposition filed within time limit

    Free format text: ORIGINAL CODE: 0009261

    STAA Information on the status of an ep patent application or granted ep patent

    Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

    REG Reference to a national code

    Ref country code: AT

    Ref legal event code: MK05

    Ref document number: 531480

    Country of ref document: AT

    Kind code of ref document: T

    Effective date: 20111102

    26N No opposition filed

    Effective date: 20120803

    REG Reference to a national code

    Ref country code: DE

    Ref legal event code: R097

    Ref document number: 602004035099

    Country of ref document: DE

    Effective date: 20120803

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: AT

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    BERE Be: lapsed

    Owner name: PROCEDES ET EQUIPEMENTS POUR LES SCIENCES ET L'IN

    Effective date: 20120831

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: MC

    Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

    Effective date: 20120831

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: ES

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20120213

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: BE

    Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

    Effective date: 20120831

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: FI

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: TR

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20111102

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: LU

    Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

    Effective date: 20120803

    PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

    Ref country code: HU

    Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

    Effective date: 20040803

    REG Reference to a national code

    Ref country code: FR

    Ref legal event code: PLFP

    Year of fee payment: 13

    REG Reference to a national code

    Ref country code: FR

    Ref legal event code: PLFP

    Year of fee payment: 14

    REG Reference to a national code

    Ref country code: FR

    Ref legal event code: PLFP

    Year of fee payment: 15

    PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

    Ref country code: GB

    Payment date: 20230818

    Year of fee payment: 20

    Ref country code: CH

    Payment date: 20230919

    Year of fee payment: 20

    PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

    Ref country code: FR

    Payment date: 20230803

    Year of fee payment: 20

    Ref country code: DE

    Payment date: 20230908

    Year of fee payment: 20