EP1414589A2 - Kratzfestausrüstung für beschichtete substrate - Google Patents
Kratzfestausrüstung für beschichtete substrateInfo
- Publication number
- EP1414589A2 EP1414589A2 EP02726199A EP02726199A EP1414589A2 EP 1414589 A2 EP1414589 A2 EP 1414589A2 EP 02726199 A EP02726199 A EP 02726199A EP 02726199 A EP02726199 A EP 02726199A EP 1414589 A2 EP1414589 A2 EP 1414589A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- scratch
- plasma
- substrate
- resistant
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 52
- 230000003678 scratch resistant effect Effects 0.000 title claims abstract description 37
- 229920000642 polymer Polymers 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- 238000000576 coating method Methods 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 238000006116 polymerization reaction Methods 0.000 claims description 20
- 150000002894 organic compounds Chemical class 0.000 claims description 17
- 150000002739 metals Chemical class 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000005260 corrosion Methods 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 230000007797 corrosion Effects 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 7
- 229910052755 nonmetal Inorganic materials 0.000 claims description 5
- 150000002902 organometallic compounds Chemical class 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 239000003973 paint Substances 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052756 noble gas Inorganic materials 0.000 claims description 4
- 150000002843 nonmetals Chemical class 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 238000004040 coloring Methods 0.000 claims description 3
- 150000003377 silicon compounds Chemical class 0.000 claims description 3
- 229940125797 compound 12 Drugs 0.000 claims 1
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 150000000475 acetylene derivatives Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 150000005840 aryl radicals Chemical class 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000006120 scratch resistant coating Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2201/00—Polymeric substrate or laminate
Definitions
- the present invention relates to the new use of plasma polymerization and plasma polymers for the scratch-resistant treatment of coated substrates.
- the present invention relates to a new process for producing a scratch-resistant finish on a coated substrate by applying at least one scratch-resistant layer on the coated substrate by plasma polymerization.
- the present invention relates to new scratch-resistant coated substrates with at least one layer of a plasma polymer produced by plasma polymerization as the top layer.
- plasma polymer layers are mainly used for the corrosion protection of the metal surfaces.
- the question of whether the plasma polymer layers are scratch-resistant in this context, because the layers are overlaid with other coatings see the above-mentioned dissertation by Grundmeier).
- sol-gel clearcoats As described, for example, in patent applications DE 43 03 570 A1, De 34 07 087 A1, DE 40 11 045 A1, DE 40 25 215 A 1, DE 38 28 098 A 1, DE 40 20 316 A 1 or DE 41 22 743 A 1 are known. These sol-gel clearcoats or the layers produced from them are also considered organically modified by experts Ceramic materials called. One of their main areas of application is the scratch-resistant finishing of glasses or visors of motorcycle helmets.
- the known scratch-resistant finishes based on sol-gel clearcoats have a low solids content, which inevitably involves a high solvent content. This high solvent content is questionable and disadvantageous for reasons of safety and environmental protection.
- the known scratch-resistant finishes usually have a dry layer thickness of 10 ⁇ m. They have a sufficient overall visual impression (appearance). With this layer thickness, there are generally only comparatively minor problems of adhesion between the scratch-resistant finish and the coating beneath it. However, if one wants to further improve the scratch resistance and further reduce the dry layer thickness, for example to 3 to 5 ⁇ m, the appearance deteriorates.
- the object of the present invention is to provide a new scratch-resistant finish for coated substrates, in particular painted car bodies, especially painted car bodies, which no longer has the disadvantages of the prior art, but also reliably protects the coated substrates even in a thin layer Protects scratches and has a good appearance and adheres firmly to the coatings.
- the new scratch-resistant finish should be able to be produced in a simple manner, without solvents and without a large amount of material, and should have a very good appearance.
- the new method of making scratch-resistant equipment on a coated substrate by depositing at least one scratch-resistant Plasma polymer layer found on the coated substrate by plasma polymerization which is referred to below as the “inventive method”.
- the new scratch-resistant coated substrate with at least one layer of a plasma polymer produced by plasma polymerization was found as the top layer, which is referred to below as the "substrate according to the invention".
- the method according to the invention is based on a coated substrate.
- Suitable substrates are all those which allow the deposition of plasma polymers and are not damaged by the reaction conditions used.
- the electrically conductive substrates can be plastic parts which have been made conductive with the aid of electrically conductive pigments or with the aid of an electrically conductive layer thereon, for example made of a metal or a ceramic layer. Furthermore, it can be substrates made of electrically conductive ceramic materials. Metallic substrates are preferably used. Examples of suitable metals to be used according to the invention are titanium, iron, cobalt, nickel, magnesium, aluminum, zinc or their alloys with one another or with other suitable metals such as copper, vanadium, tungsten, molybdenum, chromium, manganese or tin. According to the invention, such metals are advantageous which are usually used in automobile construction for the production of bodies. They are therefore preferred. Examples of suitable metals of this type to be used according to the invention are steels, in particular cold-rolled steels and metal-coated steel sheets.
- the electrically non-conductive substrates are those made from conventional and known insulators such as plastics, in particular in the form of foils, glass or ceramic materials.
- other excitation frequencies are required here, for example in the microwave range. that is, a microwave plasma is used.
- the substrate can have any shape, for example the shape of a fender, a car door, a hood or a trunk lid. According to the invention, it is advantageous if the substrate is planar and in particular is in the form of a sheet or strip.
- the thickness of the substrate can vary widely and depends on the particular intended use of the substrate according to the invention. Thicknesses of 0.05 mm to 10 mm, as are usually used in automobile construction, are advantageous.
- the substrate is coated, ie there is at least one paint film and / or at least one paint on it.
- the coating serves to protect the substrate against corrosion, the absorption and dissipation of mechanical energy, the clear coat and / or the coloring and / or effect.
- suitable coatings with an anti-corrosion effect are electrochemically deposited electro-dip coatings, as described, for example, in Japanese Patent Application 1975-142501 (aanic laid-open publication JP 52-065534 A 2, Chemical Abstracts Section No. 87: 137427) or in the patents and applications US 4,375,498 A, US 4,537,926 A, US 4,761,212 A, EP 0 529 335 A 1, DE 41 25 459 A 1, EP 0 595 186 A 1, EP 0 074 634 A 1, EP 0 505 445 A 1, DE 42 35 778 A 1, EP 0 646 420 A1, EP 0 639 660 A1, EP 0 817 648 A1, DE 195 12 017 C1, EP 0 192 113 A2, DE 41 26476 A1 or WO 98/07794.
- Suitable coatings for absorption and dissipation of mechanical energy are filler coatings and
- Stone chip protection primers as described, for example, in patent applications and patents EP 0427028 A1, DE 41 42 816 A1, DE 38 05 629 C1, DE 31 08 861 C2 or DE 195 04 947 AI.
- suitable coloring and / or effect coatings are solid-color topcoats or basecoats, as described, for example, in patent applications EP 0 089 497 A1, EP 0 256 540 A1, EP 0 260 447 A1, EP 0 297 576 A1, WO 96 / 12747, EP 0 523 610 A1, EP 0 228 003 A1, EP 0 397 806 A1, EP 0 574417 A1, EP 0 531 510 A1, EP 0 581 211 A1, EP 0 708 788 A1 , EP 0 593 454 A1, DE-A-43 28 092 A1, EP 0 299 148 A1, EP 0 394737 A1, EP 0 590 484 A1, EP 0 234 362 A1, EP 0 234 361 A1 , EP 0 543 817 A 1, WO 95/14721, EP 0 521 928 A 1, EP 0 522420 A 1, EP 0 522419 A 1, EP 0 649
- Suitable clearcoats are those which are produced from single- or multicomponent clearcoats, powder clearcoats, powder slurry clearcoats, UV-curable clearcoats or sealers, as described in patent applications, patent specifications and publications DE 42 04 518 A1, EP 0 594 068 A1, EP 0 594 071 A1, EP 0 594 142 A1, EP 0 604 992 A1, EP 0 596 460 A1, WO 94/10211, WO 94/10212, WO 94/10213, WO 94/22969 or WO 92 / 22615, US 5,474,811 A 1, US 5,356,669 A 1 or US 5,605,965 A 1, DE 42 22 194 A 1, BASF Lacke + Maschinen AG, "Powder Coatings", 1990, BASF Coatings AG "Powder Coatings, Powder Coatings for Industrial Applications", January 2000 , US 4,268,542 A1, DE 195 40 977 A1, DE 195 18 392 A1, DE 196 17 086 A
- lacquer films can be found in patent applications WO94 / 09983 A, EP 0 361 823 A1, DE 195 35 934 A1, DE 195 17 069 A1, DE 195 17 067 A1 or 195 17 068 A1 or the publications by E. Bürkle in Kunsscher 87 (1997), 320-328; Modern Plastics International Volume 11, 1991, 33-34, or by G. Steinbichler and J. G thinkauf in Kunststoffe 87 (1997), 1262-1270.
- the coatings described above are preferably pretreated with an oxidizing plasma.
- suitable oxidizing agents for generating the oxidizing plasma are fluorine, chlorine or oxygen, in particular oxygen.
- the oxidizing plasma can also contain noble gases and / or nitrogen.
- the conditions of the pre-treatment can vary widely and depend on the requirements of the individual case.
- the pressure used in the plasma depending on the material composition, can be up to 1 bar.
- partial pressures of 0.01 to 3, preferably 0.02 to 2.5, particularly preferably 0.03 to 2, very particularly preferably 0.04 to 1.5 and in particular 0.05 to 1 mbar are preferred from 200 to 800, preferably 210 to 750, particularly preferably 220 to 700, very particularly preferably 230 to 650 and in particular 240 to 600 V, current intensities from 0.1 to 5, preferably 0.2 to 4.8, particularly preferably 0, 3 to 4.4, very particularly preferably 0.4 to 4.2 and in particular 0.5 to 4 mA, volume flows from 0.1 to 3, preferably 0.2 to 2.8, particularly preferably 0.3 to 2, 4, very particularly preferably 0.4 to 2.2 and in particular 0.5 to 2 st. cm3 / min and frequencies of 0.1 to 3, preferably 0.2 to 2.7, particularly preferably 0.3 to 2.3, very particularly preferably 0.4 to 2 and in particular 0.5 to 1.5 kHz applied ,
- At least one, preferably one, layer of at least one plasma polymer is deposited by plasma polymerization on the preferably cleaned and activated surface of the coatings.
- a wide variety of organic and inorganic compounds can be used for plasma polymerization. According to the invention, it is advantageous to use at least one organic compound.
- organic compounds in particular organometallic compounds, are compounds in which at least one element other than carbon is linked to organic radicals, such as substituted or unsubstituted alkyl, cycloalkyl and / or aryl radicals, which may also contain heteroatoms.
- Suitable organometallic compounds are organometallic compounds of metals from the subgroups of the Periodic Table of the Elements. Examples of suitable elements are scandium, yttrium, lanthanum, the lanthanides, titanium, zirconium, hafnium, vanadium, niobium, chromium, tungsten, manganese, iron, cobalt, nickel, copper or zinc.
- the organometallic compounds can contain one or more metal atoms in the molecule. If they contain several metal atoms in the molecule, they can be one and the same metal or at least two different metals.
- suitable organic compounds are organic compounds of metals and non-metals of the main groups of the Periodic Table of the Elements.
- suitable metals and non-metals are boron, aluminum, gallium, indium, silicon, germanium, tin or phosphorus. Silicon is particularly well suited.
- Such element-organic compounds are organic compounds which contain at least one of the abovementioned metals of the subgroups of the periodic system of the elements and at least one of the abovementioned metals or non-metals of the main groups of the periodic system of the elements.
- organic silicon compounds such as hexamethyldisilane or hexamethyldisiloxane, in particular hexamethyldisilane.
- organic compounds of silicon preferably used according to the invention can also contain at least one further of the above-described elemental compounds in minor amounts.
- the above-described elemental organic compounds to be used according to the invention may contain purely organic compounds in minor amounts.
- Polymerizable organic compounds are preferably used.
- suitable polymerizable organic compounds are olefins and acetylenes, in particular olefins such as cyclohexene.
- the plasma polymerization of the compounds described above can be carried out in the presence of at least one oxidizing agent.
- suitable oxidizing agents are those described above.
- the plasma polymerization can be carried out in the presence of at least one noble gas, in particular argon.
- plasma polymerization has no special features, but can be carried out according to the methods and with the aid of the devices as described in the patents, patent applications and publications listed at the beginning.
- the plasma polymerization is preferably carried out for 10 minutes to 3 hours, preferably 15 minutes to 2.5 hours, particularly preferably 20 minutes to 2 hours and 15 minutes, very particularly preferably 30 minutes to 2 hours and in particular 40 minutes to 1.5 hours.
- Partial pressures of elemental organic compound of 0.001 to 0.2, preferably 0.002 to 0.18, particularly preferably 0.003 to 0.16, very particularly preferably 0.004 to 0.14 and in particular 0.005 to 0.12 mbar, if used, are preferably partial argon pressures from 0.01 to 2, preferably 0.02 to 1.8, particularly preferably 0.03 to 1.6, very particularly preferably 0.04 to 1.4 and in particular 0.0 to 1 mbar, if used, oxygen partial pressures of 0.001 to 0.2, preferably 0.002 to 0.18, particularly preferably 0.003 to 0.16, very particularly preferably 0.004 to 0.14 and in particular 0.005 to 0.12 mbar, tensions of 200 to 800, preferably 210 to 750, particularly preferably 220 to 700, very particularly
- the deposited plasma polymer layer is preferably 0.001 to 10, preferably 0.01 to 9, particularly preferably 0.1 to 8, very particularly preferably 0.5 to 7 and in particular 1 to 6 ⁇ m thick.
- the composition of the plasma polymer layer can be homogeneous or it can change vertically in different ways. For one, it can
- gradient plasma polymer Concentration of a component within the plasma polymer layer decrease or increase continuously or discontinuously.
- concentration of functional groups varies in a targeted manner, the plasma polymer is called “gradient plasma polymer”.
- This gradient plasma polymer is distinguished by the fact that it has special functional groups at the coating / plasma polymer phase boundary, for example organosilicon-functional groups Interfaces optimize the adhesion, which leads to optimal stability of the scratch-resistant finish, but the plasma polymer layer can also consist of layers of different compositions.
- the plasma polymer layer according to the invention or the coated substrates provided with it with a scratch-resistant finish are of very good optical quality (appearance), so that they can also be used for the scratch-resistant coating of automobiles in the luxury class.
- the scratch-resistant finish according to the invention adheres extremely firmly to the coated bodies and shows no damage or flaking even under mechanical influence. It is weather-stable and chemical-stable and is not attacked by bird droppings.
- the motor vehicles equipped in a scratch-resistant manner according to the invention therefore have a particularly long service life and a particularly high utility value.
- a body panel that is coated in the usual and known manner with a cathodically deposited electrodeposition coating, a filler, a metallic
- Basecoat and a clearcoat was coated in a plasma reactor, which has an evacuable glass bell with internal electrodes, Gas metering systems and a high vacuum pump included, placed on a grounded electrode.
- the painted surface of the body panel was cleaned with an oxygen plasma for 5 minutes at an oxygen partial pressure of 0.3 mbar, a voltage of 400 V, a current of 2 mA and a volume flow of 1.5 hours. cm 3 / min and a frequency of 1 kHz pretreated.
- the plasma polymer was heated for one hour at an argon partial pressure of 0.2 mbar, an oxygen partial pressure of 0.05 mbar and a hexamethyldisilane partial pressure of 0.05 mbar, a voltage of 400 V, a current of 1 mA and a volume flow of 1. 5 st. cm 3 / min and a frequency of 4 kHz.
- the plasma polymer layer was 3 ⁇ m thick. It stuck to the paintwork. Delamination was also not observed after exposure to a constant condensation climate.
- the plasma polymer layer was highly scratch-resistant and could be used under the usual and known conditions of the brush test (cf. P. Betz and A. Bartelt, Progress in Organic Coatings, 22 (1993), pages 27-37, in particular Fig. 2, page 28; Weight: 2000 g instead of 280 g) are not damaged. It was therefore particularly suitable as scratch-resistant equipment.
- the scratch-resistant finish and the paint had an overall good visual impression.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10114469A DE10114469A1 (de) | 2001-03-24 | 2001-03-24 | Kratzfestausrüstung für beschichtete Substrate |
| DE10114469 | 2001-03-24 | ||
| PCT/EP2002/003179 WO2002076635A2 (de) | 2001-03-24 | 2002-03-21 | Kratzfestausrüstung für beschichtete substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1414589A2 true EP1414589A2 (de) | 2004-05-06 |
| EP1414589B1 EP1414589B1 (de) | 2007-05-16 |
Family
ID=7678842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP02726199A Expired - Lifetime EP1414589B1 (de) | 2001-03-24 | 2002-03-21 | Kratzfestausrüstung für beschichtete substrate |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1414589B1 (de) |
| AT (1) | ATE362405T1 (de) |
| AU (1) | AU2002256696A1 (de) |
| DE (2) | DE10114469A1 (de) |
| ES (1) | ES2286251T3 (de) |
| WO (1) | WO2002076635A2 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10256827A1 (de) * | 2002-12-04 | 2004-06-24 | Schott Glas | Verbundmaterial mit einem Dekor und einer Funktionsschicht sowie Verfahren zu dessen Herstellung |
| FR2873309A1 (fr) | 2004-07-23 | 2006-01-27 | Solystic Sa | Procede de traitement d'envois postaux pour la preparation et la separation des tournees de facteur |
| DE102009032816A1 (de) | 2009-07-13 | 2011-01-20 | Daimler Ag | Lackfolienprodukt mit Betätigungselement, Betätigungseinheit und Verfahren zur Bereitstellung der Betätigungseinheit |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3822482A1 (de) * | 1988-07-02 | 1990-01-04 | Audi Ag | Verwendung einer plasma-vorbehandlung |
| JPH02210616A (ja) * | 1989-02-10 | 1990-08-22 | Hitachi Maxell Ltd | 磁気記録媒体 |
| JPH02214017A (ja) * | 1989-02-10 | 1990-08-27 | Hitachi Maxell Ltd | 磁気記録テープ |
| US4980196A (en) * | 1990-02-14 | 1990-12-25 | E. I. Du Pont De Nemours And Company | Method of coating steel substrate using low temperature plasma processes and priming |
| DE19732217C2 (de) * | 1997-07-26 | 2002-12-12 | Zsw | Mehrfunktions-Verkapselungsschichtstruktur für photovoltaische Halbleiterbauelemente und Verfahren zu ihrer Herstellung |
| DE19924108B4 (de) * | 1999-05-26 | 2007-05-03 | Robert Bosch Gmbh | Plasmapolymerbeschichtung und Verfahren zu deren Herstellung |
| US6376064B1 (en) * | 1999-12-13 | 2002-04-23 | General Electric Company | Layered article with improved microcrack resistance and method of making |
-
2001
- 2001-03-24 DE DE10114469A patent/DE10114469A1/de not_active Withdrawn
-
2002
- 2002-03-21 AU AU2002256696A patent/AU2002256696A1/en not_active Abandoned
- 2002-03-21 ES ES02726199T patent/ES2286251T3/es not_active Expired - Lifetime
- 2002-03-21 AT AT02726199T patent/ATE362405T1/de not_active IP Right Cessation
- 2002-03-21 WO PCT/EP2002/003179 patent/WO2002076635A2/de not_active Ceased
- 2002-03-21 EP EP02726199A patent/EP1414589B1/de not_active Expired - Lifetime
- 2002-03-21 DE DE50210168T patent/DE50210168D1/de not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| See references of WO02076635A3 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1414589B1 (de) | 2007-05-16 |
| DE50210168D1 (de) | 2007-06-28 |
| DE10114469A1 (de) | 2002-10-02 |
| ES2286251T3 (es) | 2007-12-01 |
| ATE362405T1 (de) | 2007-06-15 |
| AU2002256696A1 (en) | 2002-10-08 |
| WO2002076635A2 (de) | 2002-10-03 |
| WO2002076635A3 (de) | 2004-01-22 |
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