EP1353352B1 - Source d'électrons haute fréquence, notamment neutralisateur - Google Patents

Source d'électrons haute fréquence, notamment neutralisateur Download PDF

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Publication number
EP1353352B1
EP1353352B1 EP03007602A EP03007602A EP1353352B1 EP 1353352 B1 EP1353352 B1 EP 1353352B1 EP 03007602 A EP03007602 A EP 03007602A EP 03007602 A EP03007602 A EP 03007602A EP 1353352 B1 EP1353352 B1 EP 1353352B1
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EP
European Patent Office
Prior art keywords
frequency
electron source
electrode
electrons
frequency electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP03007602A
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German (de)
English (en)
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EP1353352A1 (fr
Inventor
Karl-Heinz Prof. Dr. Schartner
Horst Prof. Dr. Loeb
Hans Jürgen Leiter
Hans-Peter Harmann
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Airbus DS GmbH
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Astrium GmbH
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Publication date
Application filed by Astrium GmbH filed Critical Astrium GmbH
Publication of EP1353352A1 publication Critical patent/EP1353352A1/fr
Application granted granted Critical
Publication of EP1353352B1 publication Critical patent/EP1353352B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source

Definitions

  • the invention relates to a high-frequency electron source, in particular as a neutralizer of an ion source, in particular an ion drive comprising a discharge space with at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons.
  • the neutralizer here consists of a cathode tube, which is closed in the flow direction by a cathode disc with a central bore and an anode disc with also centric bore. Inside the cathode tube is an electron emitter whose porous material is interspersed with alkaline earth metals, including barium. Externally on the cathode tube, a coil-shaped electric heater is mounted, which heats the cathode tube and the electron emitter. This in The barium emitted by the electron emitter emits electrons.
  • the cathode tube with a neutral gas eg. As xenon flows through the electrons collide with the neutral gas atoms, ionizing them, which forms a plasma that emerges through the hole in the anode disc.
  • a disadvantage of this arrangement is that the electron emitter-containing E-mitter material is hygroscopic and also reacts with oxygen at elevated temperatures. This entails severe limitations in storage prior to installation, during satellite installation, and prior to launch into space.
  • Another disadvantage of such complicated and life-limited electron sources is that a pre-heating time of the emitter is preceded by a pre-heating time before switching.
  • Such a high-frequency electron source generates electrons by a plasma which is maintained by the induction caused by an alternating magnetic field. This field is generated by the high-frequency coil through which a high-frequency current flows.
  • the electrons present in the plasma are accelerated by the induction to velocities which, in the case of a collision with a neutral atom in the plasma, can cause the ionization of the latter.
  • velocities which, in the case of a collision with a neutral atom in the plasma, can cause the ionization of the latter.
  • one or more other electrons are released from the neutral atom, resulting in a continuous flow of electrons when working gas flows in.
  • a high-frequency electron source which has a discharge space with a gas inlet for a gas to be ionized and an extraction opening for electrons.
  • the discharge space is at least partially surrounded by a first and a second electrode. Between the two electrons a changing field can be applied.
  • Object of the present invention is to provide a high-frequency electron source, on the one hand has no electron emitter and thus requires no heating time and manages without complicated, costly components, which are to be protected against oxygen and moisture. On the other hand, an electron source is to be provided which has a reduced power requirement.
  • the object is achieved according to the invention by providing means between the electrode and the keeper electrode, whereby a DC voltage can be applied in addition to the electrical high-frequency field.
  • the high-frequency electron source operates with a cold arc discharge by generating the electron-providing plasma with a high-frequency capacitive discharge which is caused by a high-frequency electric field between the electrodes is generated in the discharge space.
  • the electrodes surround the discharge space and form a cavity. They merely have to be suitable for igniting and maintaining the plasma in the discharge space.
  • the ignition of the discharge of the high-frequency electron source can be effected by a pressure surge, which is generated for example by a brief increase in the mass flow through the electron source.
  • a pressure surge which is generated for example by a brief increase in the mass flow through the electron source.
  • the ignition voltage on the so-called Paschen curve is reduced to its minimum and the gas line fails.
  • the accelerated electrons then turn out more electrons from neutral particles and ionize them. This progressive ionization produces a plasma that supplies the required electrons.
  • the advantages of the high-frequency electron source lie in the simple, uncomplicated structure. This eliminates heating including electronics and electron emitter, which also eliminates the restrictions on storage and environmental conditions during installation and operation. For example, a performance test after manufacture is possible without affecting the lifetime of the high frequency electron source under normal environmental conditions.
  • noble gases such as xenon or other suitable gases can be used for operation, which need not be specially cleaned of oxygen and residual moisture for this purpose.
  • the elimination of the preheating and the activation processes also results in a fast availability of electrons, so that when neutralizing an ion drive this can immediately provide its thrust.
  • the high-frequency electron source according to the invention Due to the possibility of operating the high frequency electron source at a relatively low frequency, it is additionally possible on the electronics side, high to achieve electrical efficiencies. In addition, the high-frequency electron source according to the invention has a very low power requirement.
  • the discharge space is surrounded by a plasma chamber.
  • a plasma chamber Preferably, an electrode is designed to form the plasma chamber.
  • an electrode forms the plasma chamber, it is preferably formed as a hollow cathode. In this way, on the one hand, an optimal geometry for the inclusion of the plasma is formed and, in addition, the capacitive coupling of the high-frequency field into the plasma is supported by such a geometry.
  • the orientation of the electrical high-frequency field with respect to the extraction direction of the electrons may be arbitrary, but preferably the electrical high-frequency field is parallel to the extraction direction. In an alternative preferred embodiment, the field may also rest perpendicular to the extraction direction.
  • the discharge frequency can be freely selected within wide limits and can thus be optimally adapted to the requirements.
  • the frequency of the high-frequency electrical field is between 100 KHz and 50 MHz.
  • a high-frequency generator and here particularly advantageously a radio-frequency generator (RF generator) is connected, wherein the connection to the electrodes is accomplished by means of a matching network.
  • the matching network is a toroidal transformer.
  • the field strength of the electric high-frequency field can be optimally adapted to the discharge conditions.
  • the plasma chamber is formed as an electrode, it has been found that it is advantageous to put the keeper electrode on the active output of the RF generator and the electrode to ground potential.
  • the electrode and the keeper electrode are surrounded by a shield electrode.
  • the electrode is at ground potential at the active output of the RF generator and the keeper electrode.
  • the shield electrode can be omitted.
  • the DC voltage can also be applied via the auxiliary electrodes, for which purpose they are grouped around the discharge space.
  • the electrodes are preferably made of a metallic material such as titanium, molybdenum, tungsten, steel, especially stainless steel or aluminum or tantalum.
  • a metallic material such as titanium, molybdenum, tungsten, steel, especially stainless steel or aluminum or tantalum.
  • non-metallic materials are coming especially graphite, carbon composites or conductive ceramics.
  • the Fig. 1 shows the high-frequency electron source 10 with an electrode 12a, which forms a hollow cathode formed as a plasma chamber and the discharge space 11 surrounds.
  • This has a circular cross section and on one side a gas inlet 14 for the operating gas to be ionized, for example xenon.
  • the extraction opening 16 is provided for removing the plasma, including electrons.
  • the plasma chamber designed as electrode 12a is partially surrounded by the keeper electrode 12b.
  • the latter is additionally surrounded by a shield electrode 13.
  • the keeper electrode 12 b and the shield electrode 13 coaxial with the extraction opening 16 on the plasma chamber on an opening to allow removal of the plasma with electrons.
  • the gas inlet 14 is passed through the shield electrode 13.
  • the gas inlet 14 is electrically separated from the electrodes 12a, 13 by means of an insulator 15.
  • the conductive regions in particular the electrode 12a designed as a plasma chamber, must fulfill further conditions in addition to their primary function of ensuring the electrostatic confinement of the electrons. On the one hand, it has to be resistant to the plasma in order to outlast the required operating time with justifiable loss of quality; on the other hand, it must be coupled of the high-frequency electric field and the concomitant maintenance of the plasma does not shield. During operation, ions continuously strike the electrode 12a, resulting in erosion.
  • the temperature of the high frequency electron source may be 300 ° C - 400 ° C. In space technology applications, there are also relatively stringent requirements for a high frequency electron source.
  • the high frequency electron source as a neutralizer for ion engines in aerospace currently 8000 to 15000 hours of operation to guarantee.
  • the high-frequency electron source is operated in a high vacuum, which means that the material - should not have outgassing - a low vapor pressure.
  • the high-frequency electron source should survive the starting loads in transporting the device having such a high-frequency electron source into space.
  • the conductive regions, in particular the electrode 12a are made of titanium, molybdenum, tungsten, steel, aluminum, tantalum, graphite, conductive ceramics or carbon composites.
  • the control of the electrode 12a and the keeper electrode 12b for generating a high frequency electric field with the frequency of eg 1 MHz for the production of a plasma via a radio frequency generator 22, which is connected by means of a toroidal transformer 21 via leads 21a, 21b to the electrodes 12a, 12b is.
  • the supply line 21a and thus the plasma chamber is at ground potential and the supply line 21b and thus also the keeper electrode 12b at the active output of the radio-frequency network. Since no resonance effects are exploited, the discharge frequency is freely selectable within wide limits, so that values between 100 kHz to 50 MHz are possible instead of 1 MHz.
  • a DC voltage is applied to the keeper electrode 12b via the feed line 21b.
  • the leads 21a, 21b are shielded by further insulators 17 with respect to the shield electrode 13 and the keeper electrode 12b, respectively.
  • the operating gas xenon flows via the gas inlet 14 into the discharge space 10.
  • the high-frequency electric field is capacitively coupled into the discharge space 11.
  • the few free electrons that are present in the working gas in the thermal equilibrium accelerated and thus ionize with sufficient energy from the electric high-frequency field, the operating gas.
  • This ionization in turn generates secondary electrons that participate in the process. This creates an electron avalanche, which ultimately leads to the plasma.
  • the plasma in the discharge space 11 is not in thermal equilibrium since almost all of the power of the high frequency electric field is absorbed by the electrons of the plasma and they absorb more power than the ions because of their low mass compared to the ions.
  • the electron temperature is more than a factor of 100 above the ionic and neutral particle temperatures.
  • the xenon gas jet exits to the outside.
  • the gas jet 30 is designed as a supersonic jet 30 (shaded outlined).
  • the gas jet 30 thus transports the high-frequency plasma to the outside.
  • There it can be used as an electron source for the ignition of an engine or as a bridge for coupling the electron into the ion beam.
  • Constant supply of operating gas via the gas inlet constantly replenishes new gas to be ionized, so that the system remains in equilibrium despite removal of part of the plasma.
  • the Fig. 2 shows the high-frequency electron source 10 with electrodes 12a and 12b, between which an alternating electric field is applied.
  • the alternating field is perpendicular to the extraction direction of the electrons, which exit through a Plasmajet 30.
  • the discharge space is terminated electrically insulated from a dielectric discharge chamber 19 with respect to the electrodes 12a and 12b.
  • a DC voltage is applied between the auxiliary electrodes 18a and 18b which are electrically insulated from one another and which is generated by the voltage supply 23.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Ignition Installations For Internal Combustion Engines (AREA)
  • Discharge Lamp (AREA)
  • Particle Accelerators (AREA)

Claims (13)

  1. Source d'électrons à haute fréquence (10), notamment sous forme de neutralisateur d'une source d'ions, notamment d'un dispositif d'entraînement à ions, comprenant un espace de décharge (11) avec au moins une entrée de gaz (14) pour un gaz ionisant et au moins une ouverture d'extraction (16) pour des électrons, l'espace de décharge (11) étant entouré au moins partiellement par au moins une électrode (12a) et une électrode d'armature (12b) et un champ électrique à haute fréquence pouvant être appliqué entre les électrodes, caractérisée en ce que des moyens sont prévus entre l'électrode (12a) et l'électrode d'armature (12b), lesquels permettent en plus du champ électrique à haute fréquence, d'appliquer une tension continue.
  2. Source d'électrons à haute fréquence (10) selon la revendication 1, caractérisée en ce que l'espace de décharge (11) est entouré par une chambre à plasma.
  3. Source d'électrons à haute fréquence (10) selon la revendication 2, caractérisée en ce que la chambre à plasma est réalisée sous la forme d'une électrode (12a, 12b).
  4. Source d'électrons à haute fréquence (10) selon la revendication 3, caractérisée en ce que l'électrode (12a) est réalisée sous la forme d'une cathode creuse.
  5. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes, caractérisée en ce que le champ électrique à haute fréquence est appliqué parallèlement au sens d'extraction des électrons.
  6. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes, caractérisée en ce que le champ électrique à haute fréquence est appliqué perpendiculairement au sens d'extraction des électrons.
  7. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes, caractérisée en ce que le champ électrique à haute fréquence présente une fréquence de 100 KHz à 50 MHz.
  8. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes, caractérisée en ce qu'un générateur à haute fréquence, notamment un générateur de radiofréquences (22) muni d'un réseau d'adaptation, notamment un transformateur à noyau torique (21), génère le champ électrique à haute fréquence.
  9. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes 3 à 8, caractérisée en ce que l'électrode d'armature (12b) est appliquée à la sortie active du générateur à haute fréquence (22) et l'électrode (12a) présente le potentiel de masse.
  10. Source d'électrons à haute fréquence (10) selon la revendication 9, caractérisée en ce que l'électrode d'armature (12b) est entourée par une électrode de blindage (13).
  11. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications 3 à 8, caractérisée en ce que l'électrode (12a) est appliquée à la sortie active du générateur à haute fréquence (22) et l'électrode d'armature (12b) présente le potentiel de masse.
  12. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes, caractérisée en ce que des électrodes auxiliaires (18a, 18b) sont montées sur l'espace de décharge (11), entre lesquelles est appliquée une tension continue.
  13. Source d'électrons à haute fréquence (10) selon une ou plusieurs des revendications précédentes, caractérisée en ce que l'électrode (12a) et/ou l'électrode d'armature (12b) et/ou les électrodes auxiliaires (18a, 18b) se composent d'un matériau métallique du groupe titane, molybdène, tungstène, aluminium, tantale, acier ou d'un matériau non métallique du groupe graphite, matériau composite à base de carbone, céramique.
EP03007602A 2002-04-09 2003-04-02 Source d'électrons haute fréquence, notamment neutralisateur Expired - Lifetime EP1353352B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10215660A DE10215660B4 (de) 2002-04-09 2002-04-09 Hochfrequenz-Elektronenquelle, insbesondere Neutralisator
DE10215660 2002-04-09

Publications (2)

Publication Number Publication Date
EP1353352A1 EP1353352A1 (fr) 2003-10-15
EP1353352B1 true EP1353352B1 (fr) 2010-08-25

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EP03007602A Expired - Lifetime EP1353352B1 (fr) 2002-04-09 2003-04-02 Source d'électrons haute fréquence, notamment neutralisateur

Country Status (7)

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US (1) US6870321B2 (fr)
EP (1) EP1353352B1 (fr)
JP (1) JP4409846B2 (fr)
KR (1) KR100876052B1 (fr)
AT (1) ATE479196T1 (fr)
DE (2) DE10215660B4 (fr)
RU (1) RU2270491C2 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7498592B2 (en) * 2006-06-28 2009-03-03 Wisconsin Alumni Research Foundation Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams
DE102007036592B4 (de) * 2007-08-02 2014-07-10 Astrium Gmbh Hochfrequenzgenerator für Ionen- und Elektronenquellen
JP4925132B2 (ja) * 2007-09-13 2012-04-25 公立大学法人首都大学東京 荷電粒子放出装置およびイオンエンジン
DE102007044070A1 (de) * 2007-09-14 2009-04-02 Thales Electron Devices Gmbh Ionenbeschleunigeranordnung und dafür geeignete Hochspannungsisolatoranordnung
CN102767497B (zh) * 2012-05-22 2014-06-18 北京卫星环境工程研究所 基于空间原子氧的无燃料航天器推进系统及推进方法
CN102797656B (zh) * 2012-08-03 2014-08-13 北京卫星环境工程研究所 吸气式螺旋波电推进装置
CN106672267B (zh) * 2015-11-10 2018-11-27 北京卫星环境工程研究所 基于空间原子氧与物质相互作用的推进系统与方法
CN106941066B (zh) * 2017-03-22 2018-07-06 中山市博顿光电科技有限公司 一种电离效果稳定的射频离子源中和器
GB2573570A (en) * 2018-05-11 2019-11-13 Univ Southampton Hollow cathode apparatus
CN108882495B (zh) * 2018-06-08 2021-02-19 鲍铭 一种高频交流电场约束等离子体产生中子的方法
CN111734593B (zh) * 2020-06-24 2023-01-31 电子科技大学 一种基于冷阴极的离子中和器
CN114302548B (zh) * 2021-12-31 2023-07-25 中山市博顿光电科技有限公司 射频电离装置、射频中和器及其控制方法

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DE2804393A1 (de) * 1978-02-02 1979-08-09 Christiansen Jens Verfahren zur erzeugung hoher gepulster ionen- und elektronenstroeme
FR2480552A1 (fr) * 1980-04-10 1981-10-16 Anvar Generateur de plasmaŸ
US4684848A (en) * 1983-09-26 1987-08-04 Kaufman & Robinson, Inc. Broad-beam electron source
JP2531134B2 (ja) * 1986-02-12 1996-09-04 株式会社日立製作所 プラズマ処理装置
US4954751A (en) * 1986-03-12 1990-09-04 Kaufman Harold R Radio frequency hollow cathode
GB8905073D0 (en) * 1989-03-06 1989-04-19 Nordiko Ltd Ion gun
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US6291940B1 (en) * 2000-06-09 2001-09-18 Applied Materials, Inc. Blanker array for a multipixel electron source

Also Published As

Publication number Publication date
DE50313006D1 (de) 2010-10-07
US6870321B2 (en) 2005-03-22
DE10215660B4 (de) 2008-01-17
US20030209961A1 (en) 2003-11-13
KR100876052B1 (ko) 2008-12-26
KR20030081060A (ko) 2003-10-17
EP1353352A1 (fr) 2003-10-15
DE10215660A1 (de) 2003-11-06
RU2270491C2 (ru) 2006-02-20
JP2003301768A (ja) 2003-10-24
JP4409846B2 (ja) 2010-02-03
ATE479196T1 (de) 2010-09-15

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