EP1318524A2 - Système optique à rayons X et méthode pour former un image d'une source - Google Patents

Système optique à rayons X et méthode pour former un image d'une source Download PDF

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Publication number
EP1318524A2
EP1318524A2 EP02026625A EP02026625A EP1318524A2 EP 1318524 A2 EP1318524 A2 EP 1318524A2 EP 02026625 A EP02026625 A EP 02026625A EP 02026625 A EP02026625 A EP 02026625A EP 1318524 A2 EP1318524 A2 EP 1318524A2
Authority
EP
European Patent Office
Prior art keywords
ray
mirrors
source
mirror
reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02026625A
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German (de)
English (en)
Other versions
EP1318524A3 (fr
EP1318524B1 (fr
Inventor
Joachim Lange
Detlef Bahr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bruker AXS GmbH
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Bruker AXS GmbH
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Publication date
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Publication of EP1318524A2 publication Critical patent/EP1318524A2/fr
Publication of EP1318524A3 publication Critical patent/EP1318524A3/fr
Application granted granted Critical
Publication of EP1318524B1 publication Critical patent/EP1318524B1/fr
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Definitions

  • the invention relates to an X-ray optical system with two X-ray mirrors for imaging an X-ray source on a target area.
  • the basic mode of operation of a generic arrangement comprises two in a row concave X-ray mirrors that are set up so that the reflection plane of the first mirror perpendicular to the reflection plane of the second mirror stands.
  • the one falling on the first mirror at a very flat angle X-rays are focused in a coordinate direction and then fall also at a flat angle to the second mirror, where they are in the second coordinate direction perpendicular to it is focused.
  • the two concave X-ray mirrors can be cylindrical, elliptical or have parabolic curvature surfaces.
  • Parabolic mirrors are in particular a parallelization of the incident X-rays possible.
  • the acceptance angle of typical multilayer mirrors is in the range of 1 mrad and the usual focal lengths are in the range of a few centimeters.
  • the electron focus of the X-ray source varies in a linear range from 10 ⁇ m to a few millimeters.
  • the acceptance range of a mirror has a smallest linear dimension in a range around a few 10 ⁇ m and is typically strip-shaped.
  • the usual X-ray samples on the other hand, have linear dimensions in the range from 100 ⁇ m to a few millimeters, typically several tenths of a millimeter.
  • a main problem with the generic X-ray optical systems therefore lies in the relatively low of the mirror arrangement due to the Bragg conditions reflected the intensity of the focused X-ray radiation in relation to the theoretically possible yield due to the size of the radiating area of the x-ray source and on the other hand, the "need" for X-rays due to the area size of the sample to be examined.
  • the object of the invention is an X-ray optical system with the features mentioned at the outset, with as much as possible minor and simple technical modifications without problems Increase the intensity of the focused X-ray radiation on the sample enabled with constant emission power of the X-ray source.
  • this task is just as surprisingly simple how effective way solved by the x-ray mirror deviating from 90 ° are arranged such that they are tilted against one another in such a way that the combined acceptance range of the x-ray mirror to the shape of the X-ray source and / or the target area is adapted.
  • the above object is also achieved solved in that the X-ray mirror deviates from 90 ° with a Deviation of the tilt angle of 90 ° in amount by at least 20 °, preferably tilted between 30 ° and 85 ° against each other are arranged.
  • the combined acceptance range of the both mirrors also focus on the geometric shape of the electron and / or the sample.
  • the tilting of the X-ray mirror according to the invention results in a considerable gain in intensity because of the combined acceptance range compared to the case of the 90 ° arrangement known from the prior art can be enlarged considerably (as shown in the figure below) Drawing becomes clear).
  • the acceptance range is not from the electron focus of the source or the Target focus of the sample moves out.
  • the invention does not only show its advantages unfolded in the field of X-ray optics, but also in the field of Neutron optics and with synchrotron radiation as the source is applicable.
  • the mirrors used can be flat, cylindrical, spherical, be elliptical, parabolic or hyperbolic. It can Gradient mirrors are used, in which the Layer spacing varies laterally and / or in depth. But also can also single crystals or other X-ray or neutron optical elements can be used as a mirror.
  • An embodiment of the invention is particularly preferred X-ray optical system in which at least one X-ray mirror is one Has multilayer structure. This allows a particularly high intensity of the reflected radiation.
  • the tilt angle is of the two x-ray mirrors fixed. You can do this in advance set optical adjustment to a specific geometry "freeze".
  • the tilt angle can also be variable. This allows several different geometries to be created adjust the overall arrangement.
  • the X-ray mirrors are can be snapped into different positions when tilted. On In this way, a selection of predefined ones can be made Make problem adjustments in advance, with the individual Adjustment due to the grid not much adjustment effort must become.
  • the X-ray mirror can also be continuous be tiltable against each other. This allows a completely free On-line optimization tailored to the special needs entirely realize different examination arrangements.
  • the invention is the deviation of the tilt angle of 90 ° amount at least 3 °, preferably at least 10 °, particularly preferably between 30 ° and 85 °.
  • the arrangement is exactly two X-ray mirrors (or neutron mirrors) intended.
  • the X-ray mirror a tilted Kirkpatrick-Baez arrangement, as has been common for many decades.
  • the X-ray mirror can form a tilted side-by-side arrangement like you is described in US-A 6,041,099 cited above.
  • the x-ray mirror can form a tilted multiple corner arrangement.
  • An untilted multiple-corner arrangement is, for example, from the US-A 6,014,423 known per se.
  • the condition for the deviation of the Tilt angle of 90 ° according to the further aspect discussed above the invention then applies to pairs of adjacent x-ray mirrors.
  • An X-ray spectrometer also falls within the scope of the present invention or an X-ray diffractometer or an X-ray microscope, each with an X-ray optical system as described above Art.
  • the invention is shown in the drawing and is based on exemplary embodiments explained in more detail.
  • Fig. 1 is a cross section through an X-ray mirror A is schematic shown on the radiation from an acceptance range ⁇ x in the focus of the Mirror A hits, which comes from a X-ray source, which is usually is also arranged in this focus.
  • the acceptance angle for the Useful radiation, taking into account the Bragg condition from the X-ray mirror A is reflected is denoted by ⁇ in the drawing.
  • Fig. 2a is an embodiment of a very schematically Arrangement according to the invention shown, in which two X-ray mirrors A, B tilted at an angle other than 90 ° are arranged.
  • the two X-ray mirrors A, B shown are intended in shown embodiment each a parabolic or elliptical Have surface, the radius of curvature of the long or short Dashed line a (for mirror A) or b (for mirror B) follows.
  • the focus of the first X-ray mirror A is x
  • the focus of the second X-ray mirror B is denoted by y.
  • FIG. 2b shows an enlarged section from FIG. 2a, with ⁇ x den Acceptance range of the x-ray source seen from x-ray mirror A. and ⁇ y the acceptance range of the X-ray source from the X-ray mirror B designate seen from.
  • the area F is the intersection of both Acceptance ranges ⁇ x and ⁇ y.
  • the dashed, white ellipse S is intended in shown example a commonly occurring form of an X-ray source represent.
  • FIG. 3 schematically shows the division of the effective area F as the intersection of the two acceptance ranges ⁇ x and ⁇ y of the two X-ray mirrors A, B at the location of the X-ray source.
  • the resulting parallelogram has a side length b, a long diagonal d 1 and a short diagonal d 2 .
  • the drawing shows the angle of deviation ⁇ with respect to a tilt of the two X-ray mirrors A, B by 90 °.
  • Fig. 4 finally represents the area F shown in Fig. 3 as a function of increasing angle deviation ⁇ from the angle 90 ° provided that the two acceptance ranges ⁇ x and ⁇ y with each other are equal and standardized to 1.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
EP02026625A 2001-12-08 2002-11-29 Système optique à rayons X et méthode pour former un image d'une source Expired - Lifetime EP1318524B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160472 2001-12-08
DE10160472A DE10160472B4 (de) 2001-12-08 2001-12-08 Röntgen-optisches System und Verfahren zur Abbildung einer Strahlungsquelle

Publications (3)

Publication Number Publication Date
EP1318524A2 true EP1318524A2 (fr) 2003-06-11
EP1318524A3 EP1318524A3 (fr) 2007-07-04
EP1318524B1 EP1318524B1 (fr) 2009-03-18

Family

ID=7708587

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02026625A Expired - Lifetime EP1318524B1 (fr) 2001-12-08 2002-11-29 Système optique à rayons X et méthode pour former un image d'une source

Country Status (3)

Country Link
US (1) US6925147B2 (fr)
EP (1) EP1318524B1 (fr)
DE (1) DE10160472B4 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1791135A2 (fr) 2005-11-25 2007-05-30 Axo Dresden GmbH Elément de radiographie optique
US10153062B2 (en) 2015-06-30 2018-12-11 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Illumination and imaging device for high-resolution X-ray microscopy with high photon energy

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7280634B2 (en) * 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
DE102010062472A1 (de) * 2010-12-06 2012-06-06 Bruker Axs Gmbh Punkt-Strich-Konverter

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995031815A1 (fr) 1994-05-11 1995-11-23 The Regents Of The University Of Colorado Systeme optique de miroirs spheriques pour rayons x rasants
US5615245A (en) 1995-02-27 1997-03-25 Japan Atomic Energy Research Institute Monochromator for radiant X-rays
US6014423A (en) 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
US6049588A (en) 1997-07-10 2000-04-11 Focused X-Rays X-ray collimator for lithography
US6282259B1 (en) 1999-09-10 2001-08-28 Rigaku/Msc, Inc. X-ray mirror system providing enhanced signal concentration

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5259013A (en) * 1991-12-17 1993-11-02 The United States Of America As Represented By The Secretary Of Commerce Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension
JPH06294899A (ja) * 1993-04-09 1994-10-21 Mc Sci:Kk 湾曲全反射ミラーカメラ
US6167111A (en) * 1997-07-02 2000-12-26 Canon Kabushiki Kaisha Exposure apparatus for synchrotron radiation lithography
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
JP3734366B2 (ja) * 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
AU3474200A (en) * 1999-01-26 2000-08-07 Focused X-Rays Llc X-ray interferometer
US6327335B1 (en) * 1999-04-13 2001-12-04 Vanderbilt University Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam
US6625250B2 (en) * 1999-12-20 2003-09-23 Agere Systems Inc. Optical structures and methods for x-ray applications

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995031815A1 (fr) 1994-05-11 1995-11-23 The Regents Of The University Of Colorado Systeme optique de miroirs spheriques pour rayons x rasants
US5615245A (en) 1995-02-27 1997-03-25 Japan Atomic Energy Research Institute Monochromator for radiant X-rays
US6049588A (en) 1997-07-10 2000-04-11 Focused X-Rays X-ray collimator for lithography
US6014423A (en) 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
US6282259B1 (en) 1999-09-10 2001-08-28 Rigaku/Msc, Inc. X-ray mirror system providing enhanced signal concentration

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
SAUNEUF ET AL.: "large field high resolution x-ray microscope for studying laser plasmas", REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 68, no. 9, 1997
VON J. UNDERWOOD, APPLIED OPTICS, vol. 25, no. 11, 1986

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1791135A2 (fr) 2005-11-25 2007-05-30 Axo Dresden GmbH Elément de radiographie optique
EP1791135A3 (fr) * 2005-11-25 2010-03-10 Axo Dresden GmbH Elément de radiographie optique
US10153062B2 (en) 2015-06-30 2018-12-11 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Illumination and imaging device for high-resolution X-ray microscopy with high photon energy

Also Published As

Publication number Publication date
DE10160472B4 (de) 2004-06-03
US20030108153A1 (en) 2003-06-12
EP1318524A3 (fr) 2007-07-04
US6925147B2 (en) 2005-08-02
EP1318524B1 (fr) 2009-03-18
DE10160472A1 (de) 2003-06-26

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